Patents Examined by Ryan L Coleman
  • Patent number: 11938520
    Abstract: An automatic machine (2) for processing objects (3) passing in a flow (F) on a conveyor (4) has a selective ejection device (1) with at least one bar (5) with nozzles (6) that is disposed transverse to the direction of said flow (F), after the outlet or tipping end of said conveyor (4), and having an active surface strip (7) that corresponds to the installation region of the outlet openings (6?) of the nozzles (6) of the pneumatic bar (5), this surface strip (7) being situated beneath the conveying plane (4?) of the conveyor (4).
    Type: Grant
    Filed: October 13, 2020
    Date of Patent: March 26, 2024
    Assignee: PELLENC SELECTIVE TECHNOLOGIES
    Inventor: Florent Masson
  • Patent number: 11935736
    Abstract: A substrate processing method for removing liquid on a substrate having an uneven pattern formed on a surface of the substrate and drying the substrate. The substrate processing method includes: forming a laminate having a two-layer structure including a first material in a solid state forming a lower layer and a second material in a solid state forming an upper layer, in a concave portion of the pattern; removing the second material from the concave portion by performing at least one of a heating process, a light-emitting process, and a reaction process using gas with respect to the second material to sublimate, decompose, and gas-react the second material; and removing the first material from the concave portion by performing at least one of the heating process, the light-emitting process, and the reaction process using gas with respect to the first material to sublimate, decompose, and gas-react the first material.
    Type: Grant
    Filed: August 9, 2019
    Date of Patent: March 19, 2024
    Assignee: TOKYO ELECTRON LIMITED
    Inventors: Rintaro Higuchi, Tsunemoto Ogata, Mitsunori Nakamori
  • Patent number: 11908681
    Abstract: In accordance with some embodiments, a semiconductor fabricating system is provided. The semiconductor fabricating system includes a wafer stage and a brush assembly moveable located below the wafer stage. The brush assembly includes a base plate, an inner brush member and an outer brush member. The inner brush member is positioned on the base plate, and the outer brush member surrounds the inner brush member. Inner grooves in the inner brush member are shallower than outer grooves in the outer brush member. The semiconductor fabricating system also includes a shaft and an actuator. The shaft is connected to the base plate, and the actuator is connected to shaft. The semiconductor fabricating system further include a controller programmed to send electric signals to the actuator to drive the base plate to rotate around a rotation axis.
    Type: Grant
    Filed: July 15, 2022
    Date of Patent: February 20, 2024
    Assignee: TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD.
    Inventors: Hsuan-Ying Mai, Hui-Chun Lee
  • Patent number: 11890653
    Abstract: A method for cleaning firearm suppressors comprising: providing a used suppressor having an internal cavity with a fouling material deposited on a surface of the internal cavity; providing a cleaning solution; providing an ultra-sonic probe; introducing the cleaning solution into the internal cavity of the used suppressor; contacting at least part of the ultra-sonic probe with the cleaning solution that is introduced inside the internal cavity of the used suppressor; operating the ultra-sonic probe; removing at least part of the fouling material from the surface of the internal cavity of the used suppressor; and, draining the cleaning solution from the used suppressor.
    Type: Grant
    Filed: January 22, 2019
    Date of Patent: February 6, 2024
    Assignee: TDA Research, Inc.
    Inventor: William Wallace Ellis, III
  • Patent number: 11889963
    Abstract: An automated cleaning machine may include one or more short cleaning cycles in which the duration of a cleaning cycle is shortened relative to the duration of a default cleaning cycle. During a short cleaning cycle, other cleaning cycle parameters may also be adjusted to ensure that the articles subjected to the short cleaning cycle are adequately cleaned and sanitized. For example, the wash temperature, rinse temperature, and/or cleaning product amounts or concentrations, may be adjusted to account for the shortened duration of the cleaning cycle. The automated cleaning machine may further include one or more short cycle mode(s) during which short cleaning cycle parameters are used and one or more default cycle mode(s) during which default cleaning cycle parameters are used.
    Type: Grant
    Filed: March 5, 2021
    Date of Patent: February 6, 2024
    Assignee: Ecolab USA Inc.
    Inventors: Rachel Marie McGinness, Jonathan Charles Butwinick, Paul R. Kraus, Alissa R. Ellingson, Conor Sylvester Smith, Paul Dominic Christian
  • Patent number: 11881417
    Abstract: First and second concentration measurements are provided in lines for first and second supply liquid lines. A dissolved concentration of gas in the second supply liquid is lower than that in the first supply liquid. In the first and second lines, first ends of branch lines are connected upstream of the concentration measurements. The second ends of the branch lines are connected to a mixing part. By mixing the first and second supply liquids, a processing liquid is generated. Respective flow rates in the branch lines are based on the first and second concentration measurements to set the dissolved concentration of the gas in the processing liquid. Thus, particles or the like can be removed from the processing liquid to be supplied to a substrate, and the dissolved concentration of the gas in the processing liquid can be set with high accuracy.
    Type: Grant
    Filed: November 28, 2017
    Date of Patent: January 23, 2024
    Inventors: Shuichi Yasuda, Kenji Kobayashi
  • Patent number: 11872600
    Abstract: A conveyor system is configured to transport the electronic substrates through cleaning modules of a cleaning apparatus. The conveyor system includes a first outer frame member, a second outer frame member, a bottom belt assembly disposed between the first outer frame member and the second outer frame member, and a top belt assembly spaced from the bottom belt assembly. The bottom belt assembly and the top belt assembly are configured to an electronic substrate therebetween to transport the electronic substrate along the conveyor system and through the at least one cleaning module. The bottom belt assembly or the top belt assembly includes a mesh material belt fabricated from heat resistant synthetic fibers. The conveyor system further includes a plurality of pins secured to the bottom belt assembly or the top belt assembly to create at least one lane along a length of the conveyor system.
    Type: Grant
    Filed: October 1, 2021
    Date of Patent: January 16, 2024
    Assignee: Illinois Tool Works Inc.
    Inventors: John Neiderman, Eric Wayne Becker, Scotty Slavens
  • Patent number: 11875991
    Abstract: A substrate treatment method according to an embodiment of the present disclosure includes a temperature raising step of raising a temperature of a concentrated sulfuric acid, and a liquid supply step of supplying the concentrated sulfuric acid having the raised temperature to a substrate placed on a substrate processing part.
    Type: Grant
    Filed: June 4, 2019
    Date of Patent: January 16, 2024
    Assignee: TOKYO ELECTRON LIMITED
    Inventor: Koji Kagawa
  • Patent number: 11871887
    Abstract: A dishwasher thermometer captures temperature data of temperature sensed within a dishwasher during a wash cycle. The dishwasher thermometer includes a wireless communication interface that transmits the captured temperature data to one or more of a server and a monitor device. When the captured temperature data indicates that the wash cycle did not achieve defined temperature threshold(s), an alert is generated at the server and/or the monitor device indicating that the wash cycle did not meet appropriate washing conditions. In embodiments, the temperature data may be accessible to a third party for certification of the dishwasher wash cycle.
    Type: Grant
    Filed: April 23, 2021
    Date of Patent: January 16, 2024
    Assignee: EWIG INDUSTRIES INTERNATIONAL CO. LIMITED
    Inventor: Luk Wah Jackson Chu
  • Patent number: 11849903
    Abstract: A method of cleaning and/or sanitizing jewelry and other small parts includes the steps of adding a microwavable fluid into a microwavable container and placing the container into a microwave oven. The microwavable fluid is heated in the microwave oven to a temperature of at least 170° F. The container is removed from the microwave oven when the desired temperature has been reached the jewelry and/or small parts are placed into the container to submerse the jewelry and/or small parts within the heated fluid and agitated, such as by spinning the container to mechanically remove contaminants from the surface of the items being cleaned and chemically cleaned with the use of a fluid that is a cleaning fluid.
    Type: Grant
    Filed: October 4, 2021
    Date of Patent: December 26, 2023
    Assignee: JEWELRY SPA HOT TUB INC.
    Inventor: Carlo Accattato
  • Patent number: 11812910
    Abstract: Dishwashing appliances and methods, as provided herein, may include features or steps such as performing a drain cycle; detecting a pressure (P1) during an activation period of the drain cycle; comparing the pressure to a first predetermined pressure limit; comparing the pressure to a second predetermined pressure limit; determining a target fill value based on a difference between a normal fill volume and a fluid volume corresponding to P1; and initiating a fill cycle based on the target fill value.
    Type: Grant
    Filed: September 23, 2021
    Date of Patent: November 14, 2023
    Assignee: HAIER US APPLIANCE SOLUTIONS, INC.
    Inventors: Christopher Brandon Ross, Kyle Edward Durham, Matthew David Mersch
  • Patent number: 11814736
    Abstract: A pickling facility includes: a pickling tank for storing an acid solution; a conveyance part for continuously conveying a steel plate immersed in the acid solution; a measurement part for measuring at least one parameter which has a correlation with a heat transfer coefficient between the acid solution and a reference surface disposed in the acid solution so as to face the steel plate; and a conveyance speed decision part configured to decide a conveyance speed of the steel plate conveyed by the conveyance part, on the basis of a measurement result of the at least one parameter.
    Type: Grant
    Filed: April 16, 2018
    Date of Patent: November 14, 2023
    Assignee: PRIMETALS TECHNOLOGIES JAPAN, LTD.
    Inventors: Kosei Tsuji, Ryusuke Nakatsuka, Masashi Yoshikawa, Shinji Nanba
  • Patent number: 11805962
    Abstract: A dishwasher thermometer captures temperature data of temperature sensed within a dishwasher during a wash cycle. The dishwasher thermometer includes a wireless communication interface that transmits the captured temperature data to one or more of a server and a monitor device. When the captured temperature data indicates that the wash cycle did not achieve defined temperature threshold(s), an alert is generated at the server and/or the monitor device indicating that the wash cycle did not meet appropriate washing conditions. In embodiments, the temperature data may be accessible to a third party for certification of the dishwasher wash cycle.
    Type: Grant
    Filed: November 4, 2022
    Date of Patent: November 7, 2023
    Assignee: Ewig Industries Macao Commercial Offshore Limited
    Inventor: Luk Wah Chu
  • Patent number: 11794222
    Abstract: Passive brushes formed from plastics, rubbers or other suitable materials may be inserted into openings of aerial vehicles or other machines and subjected to excitation at natural frequencies of vibration of the passive brushes. Where surfaces of the passive brushes are in contact with surfaces of components that are fouled by dust, dirt, grime, or other substances, the vibration of the passive brushes resulting from the excitation causes the dust, dirt, grime or other substances to be released from such surfaces. The passive brushes may have dimensions or shapes that are selected to correspond to internal dimensions of the aerial vehicles or specific components, and may be formed by 3D printing, nanolithography, or in any other suitable manner.
    Type: Grant
    Filed: November 27, 2019
    Date of Patent: October 24, 2023
    Assignee: Amazon Technologies, Inc.
    Inventor: Pragyana K. Mishra
  • Patent number: 11769661
    Abstract: A substrate processing method includes a first cleaning process and a second cleaning process. In the first cleaning process, a substrate is cleaned with a first cleaning solution. In the second cleaning process, the substrate is cleaned with a second cleaning solution having a lower cleanliness than the first cleaning solution after the first cleaning process.
    Type: Grant
    Filed: May 22, 2020
    Date of Patent: September 26, 2023
    Assignee: TOKYO ELECTRON LIMITED
    Inventors: Hirofumi Takeguchi, Kazuyoshi Shinohara, Takahisa Otsuka, Suguen Lee
  • Patent number: 11766702
    Abstract: A spray nozzle, systems and methods for cleaning at least one optical fiber end face of an optical fiber connector. The nozzle includes a housing body with a first end portion and a second end portion. A discharge passage carries an atomized mixture of cleaning fluid and positively pressurized air from the first end portion to a discharge opening at the second end portion. A vacuum return passage communicates with the discharge passage proximate the second end portion. The return passage receives the atomized mixture of cleaning fluid and positively pressurized air as well as contaminants removed from the optical fiber end face. A portion of the atomized mixture of cleaning fluid and positively pressurized air is diverted from the discharge passage to control the amount of the atomized mixture being directed at the optical fiber end face.
    Type: Grant
    Filed: December 18, 2020
    Date of Patent: September 26, 2023
    Assignee: Corning Research & Development Corporation
    Inventors: Keith Mitchell Hill, Eric Stephan ten Have
  • Patent number: 11730338
    Abstract: A method of washing induction cookware having a cookware content, using induction heating and a water jet, and comprising a washing process having the steps of: heating the cookware during a washing cycle; washing the cookware in the washing cycle with a cold-water jet; drying the cookware after the washing cycle; heat sanitization of the cookware; and steam sanitization of the cookware, whereby the washing process is analyzed by a vision system, the washing process is controlled and adjusted by a controller having parameters varying between each of the cookware content; whereby the parameters are derived from an interfaced cooking apparatus and from a manual input and whereby the vision system serves to regulate a water pressure, a water flow, a heating temperature, and time durations between each of the cookware content, with each of the cookware content having a cooking base, a food contact surface, recipe ingredients cooked, a cooking temperature, and a cooking duration.
    Type: Grant
    Filed: March 29, 2022
    Date of Patent: August 22, 2023
    Inventors: David Ben-Daviv, Yair Gordin
  • Patent number: 11731240
    Abstract: An embodiment of the present invention provides a buff process module. The buff process module includes: a buff table on which a processing target object is mounted; a buff head that holds a buff pad for applying a predetermined process to the processing target object; a buff arm that supports and swings the buff head; a dresser for dressing the buff pad; and a cleaning mechanism that is disposed between the buff table and the dresser and is for cleaning the buff pad.
    Type: Grant
    Filed: December 20, 2018
    Date of Patent: August 22, 2023
    Assignee: EBARA CORPORATION
    Inventors: Kuniaki Yamaguchi, Itsuki Kobata, Toshio Mizuno, Mitsuru Miyazaki, Naoki Toyomura, Takuya Inoue
  • Patent number: 11728765
    Abstract: A cleaning system for cleaning a circular panel or any other circular surface is provided. The system has a base mechanically fastened to the circular panel. An axis stub pivotally connected to the base and attached to a pivot member provides rotation for a blade set. The blade set includes a first blade and a second blade configured to rotate independently about the pivot member in either a clockwise or a counter clockwise direction, wherein the second blade is configured to sit above the first bade, each blade having at least one row of sprinkler holes positioned on each side of the blade running lengthwise. The at least one row of sprinkler holes are configured to eject a fluid to either clean, cool, or thaw the circular panel. The first blade includes a roller having cleaning implements configured to clean the circular panel as the first blade rotates about the pivot member.
    Type: Grant
    Filed: June 29, 2022
    Date of Patent: August 15, 2023
    Inventor: Rached Zrafi
  • Patent number: 11707189
    Abstract: A device operable to clean an imaging element of a visualization scope comprises a visualization scope engagement body, a cleaning element having a first end portion thereof located adjacent to a distal end of the visualization scope engagement body and a cleaning head attached to the visualization scope engagement body at the distal end thereof. The first end portion of the cleaning element is engaged with the cleaning head. The cleaning head is movable between a deployed configuration relative to the visualization scope engagement body and a retracted configuration relative to the visualization scope engagement body. A centerline longitudinal axis of the visualization scope engagement body extends through the cleaning head when the cleaning head is in the deployed configuration and does not extend through the cleaning head when the cleaning head is in the retracted configuration. The cleaning element is movable for cleaning debris from the imaging element.
    Type: Grant
    Filed: November 2, 2022
    Date of Patent: July 25, 2023
    Assignee: ClearCam Inc.
    Inventors: Alexander Ross Cohen, Christopher Robert Idelson, Jonathan Richmond Hearn