Patents Examined by S. Carrillo
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Patent number: 5891735Abstract: Nitrosyl (FeII) hemoglobin can be detected in biological samples, using a method which involves injections of samples into a photolysis cell, prior to detection of chemiluminescence generated by the reaction between nitric oxide and ozone. This method is useful for monitoring the levels of nitric oxide bioactivity in both normal physiological states, and disease states, such as septic shock, atherosclerosis, thrombosis, hyperhomocysteinemia, pulmonary hypertension, malignancy, infections and central nervous system disorders.Type: GrantFiled: March 15, 1996Date of Patent: April 6, 1999Assignee: Duke University Medical CenterInventor: Jonathan S. Stamler
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Patent number: 5888826Abstract: The present invention provides novel test cartridges for use in the assay of liquid samples and methods of carrying out such assays. These test cartridges are particularly useful in assays which include at least one step during which the sample to be assayed and one or more components of the assay system are kept separated by a pierceable member. The test cartridges comprise a housing through which the sample flows during the assay. The housing includes a holding chamber for holding the sample and a test chamber separated by a pierceable member having a cut therein. The test chamber further includes a partition member which has an opening therethrough and includes at least one reagent for the assay. A transfer member movably mounted in the test chamber can move towards and pierce the pierceable member by moving through the cut and contact the liquid sample in the holding chamber.Type: GrantFiled: November 25, 1997Date of Patent: March 30, 1999Assignee: Dade Behring Inc.Inventors: Roy Ostgaard, Stephen Schoenberg, Thomas R. Stone, Sourav K. Kundu, Ted S. Geiselman
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Patent number: 5888828Abstract: A method of measuring urea nitrogen on the basis of the ultraviolet absorption of urease-GLDH by a reaction rate method, which method not only permits accurate measurement of a sample containing a high concentration of urea nitrogen but also permits accurate measurement of a sample containing polyols such as mannitol without suffering the influence of the polyols, the method comprising hydrolyzing urea in a sample with urease, reacting glutamate dehydrogenase (GLDH) with ammonia formed by the hydrolysis, in the presence of .alpha.-ketoglutaric acid (.alpha.-KG) and reduced-type nicotineamide adenine dinucleotide (NADH) or reduced-type nicotineamide adenine dinucleotide phosphate (NADPH), and measuring the reduced-type nicotineamide adenine dinucleotide (NADH) or reduced-type nicotineamide adenine dinucleotide phosphate (NADPH) for a decrease rate to measure urea nitrogen derived from the urea, and characterized in that a sulfhydryl compound is co-present with the urease.Type: GrantFiled: September 12, 1997Date of Patent: March 30, 1999Assignee: Nitto Boseki Co., Ltd.Inventors: Hirotoshi Tanaka, Ryo Kojima, Katsuhiro Katayama
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Patent number: 5883060Abstract: An aqueous cleaning composition comprises from about 0.1 to about 2 percent of hydrogen fluoride based on the volume of the composition, from about 9 to about 15 percent of hydrogen peroxide based on the volume of the composition, and from about 41 to about 47 percent of C.sub.1 to C.sub.6 alcohol based on the volume of the composition. The aqueous cleaning composition may be advantageous in that it offers increased cleaning efficiency and less corrosion in comparison to conventional cleaning solutions.Type: GrantFiled: July 1, 1998Date of Patent: March 16, 1999Assignee: Samsung Electronics Co., Ltd.Inventors: Kwang-shin Lim, Sang-o Park
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Patent number: 5877027Abstract: An analytical method for the quantitative determination of the impurities in silicon dioxide by which trace amounts of hardly soluble impurities contained in silicon dioxide can be reliably decomposed and converted into a solution so that the contents of all of the impurities contained in silicon dioxide or, in particular, zirconium in a natural quartz powder can be accurately determined. Silicon dioxide is decomposed with hydrofluoric acid or an acid mixture of hydrofluoric acid and another inorganic acid to give a decomposition solution which is, as such or after admixture with another inorganic acid, subjected to evaporation to dryness and the residue is heated to cause fusion with addition of a salt or hydroxide of an alkali metal followed by dissolution of the salt or hydroxide of an alkali metal with pure water or with an aqueous solution of an inorganic acid to give an aqueous solution which is subjected to quantitative analysis of the impurities therein.Type: GrantFiled: August 27, 1997Date of Patent: March 2, 1999Assignee: Shin-Etsu Quartz Products Co., Ltd.Inventors: Katsuhiko Kemmochi, Kiyotaka Maekawa, Chuzaemon Tsuji, Manabu Saitou, Hiroyuki Miyazawa, Hiroyuki Watanabe
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Patent number: 5876675Abstract: Microfluidic devices and systems, and particularly, microfluidic devices that are easier to handle by the operator, without damaging, contaminating or otherwise fouling, as a result of manual contact with the device. These microfluidic devices and systems include manual handling structures, to allow handling of the small scale devices with minimal potential for fouling as a result of manual contact with the device.Type: GrantFiled: August 5, 1997Date of Patent: March 2, 1999Assignee: Caliper Technologies Corp.Inventor: Colin B. Kennedy
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Patent number: 5873948Abstract: A method for removing etch residue material in which the removing process is simple, and the metal is prevented from being corroded or damaged. The method for removing etch residue materials and photoresist after carrying out a dry etching includes the steps of preparing a dry chemical by using one or more gas compounds, and removing the etch residue materials by raising the dry chemical above a critical point, wherein the dry chemical comprises carbon dioxide gas and one or more gases selected from a group consisting of DMSO (dimethyl sulfoxide), DMFA (dimethyl formamide), and THF (phentydrone).Type: GrantFiled: June 24, 1997Date of Patent: February 23, 1999Assignee: LG Semicon Co., Ltd.Inventor: Jae-Jeong Kim
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Patent number: 5874048Abstract: A spotting tip includes a tip body which is fitted on the end of a nozzle for sucking liquid contained in a container and inserted into the liquid in the container through a mouth of the container, and a lid member which is brought into contact with the mouth of the container and closes the space between the tip and the edge of the mouth when the tip is inserted into the container to a predetermined depth. At least one fine communicating passage is formed in at least one of the lid member and the tip body to communicate the inside and outside spaces of the container on opposite sides of the lid member.Type: GrantFiled: August 4, 1997Date of Patent: February 23, 1999Assignee: Fuji Photo Film Co., Ltd.Inventors: Shunichi Seto, Kenichiro Yazawa, Osamu Seshimoto
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Patent number: 5868856Abstract: A method of removing inorganic contamination from substantially the surface of a semiconductor substrate, the method comprising the steps of: reacting the inorganic contamination with at least one conversion agent, thereby converting the inorganic contamination; removing the converted inorganic contamination by subjecting it to at least one solvent agent, the solvent agent is included in a first supercritical fluid (preferably supercritical CO.sub.2); and wherein the converted inorganic contamination is more highly soluble in the solvent agent than the inorganic contamination.Type: GrantFiled: July 23, 1997Date of Patent: February 9, 1999Assignee: Texas Instruments IncorporatedInventors: Monte A. Douglas, Allen C. Templeton
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Patent number: 5868866Abstract: A method of and an apparatus for cleaning a thin disk-shaped workpiece that is required to have a high degree of cleanliness, e.g., a semiconductor wafer, a glass substrate, a liquid crystal display, or the like. The method of cleaning the workpiece includes a plurality of cleaning steps, and comprises the steps of holding a workpiece, and performing a liquid jet cleaning of a surface of the workpiece in a first portion of plural cleaning steps. The method further comprises the step of performing a liquid jet cleaning of the surface of the workpiece in a latter portion of the plural cleaning steps.Type: GrantFiled: March 1, 1996Date of Patent: February 9, 1999Assignee: Ebara CorporationInventors: Toshiro Maekawa, Koji Ono, Manabu Tsujimura
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Patent number: 5869007Abstract: Acid/base measuring sensor systems consisting of arrays of basic sensor cells are described which are constructed based on the chemical/electrical response characteristics of poly(aromatic amines). Protonation (doping) or deprotonation (de-doping) of the --N.dbd.sites in the polymers leads to characteristic conductivity vs. concentration curves which can be calibrated to produce reliable, instantaneous readings of the acid/base concentrations at various points in the working environment.Type: GrantFiled: August 22, 1996Date of Patent: February 9, 1999Assignee: Gumbs Associates, Inc.Inventor: Guang-Way Jang
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Patent number: 5869001Abstract: A method and apparatus for the quantitative analysis of sample liquids. A sample is dried and irradiated with visible and/or infrared light. Light that is diffusely or specularly reflected from the sample and sample carrier is detected. and analysed.Type: GrantFiled: October 21, 1996Date of Patent: February 9, 1999Assignee: Boehringer Mannheim GmbHInventors: Juergen Backhaus, Reinhold Mischler
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Patent number: 5868862Abstract: A method of removing inorganic contamination (contamination 104 of FIGS. 2a-2b) from a layer (layer 102) overlying a substrate (substrate 100), the method comprising the steps of: removing the layer overlying the substrate with at least one removal agent; reacting the inorganic contamination with at least one conversion agent, thereby converting the inorganic contamination; removing the converted inorganic contamination by subjecting it to at least one solvent agent, the solvent agent included in a first supercritical fluid; and wherein the converted inorganic contamination is more highly soluble in the solvent agent than the inorganic contamination.Type: GrantFiled: July 31, 1997Date of Patent: February 9, 1999Assignee: Texas Instruments IncorporatedInventors: Monte A. Douglas, Allen C. Templeton
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Patent number: 5858115Abstract: A cleaning device, cleaning system and method relating thereto are provide. The cleaning device comprises (a) a handle unit having a (i) a handle section and (ii) a support section, (b) a body comprising (i) a deformable foundation supported by the support section (ii) a lofted fibrous material overlaying the foundation (iii) water proof plastic layer covering the fibrous material to prevent water contact of the fibrous material and foundation; (c) a cleaning skirt optionally having (i) a cloth cleaning section for enveloping the body and (ii) an elastic section for selectively retaining the skirt on the body. The cleaning system comprises (a) the cleaning device and (b) a plurality of cleaning skirts. The cleaning method comprises (a) providing a cleaning device as set out above, (b) cleaning a first household item with the device, (c) replacing the used skirt with a second skirt, and (d) cleaning a second household item with the device.Type: GrantFiled: June 13, 1997Date of Patent: January 12, 1999Inventor: Velma Finch Runyon
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Patent number: 5858107Abstract: A cleaning system and method utilizing sonic whistle agitation to enhance the soil removal and mass transport capacity of the liquid carbon dioxide at low process temperatures. Sonic whistles are within a cleaning chamber, and liquid carbon dioxide is forced out of the sonic whistle jets to ultrasonically emulsify and disperse non-miscible liquids or insoluble solids, such as remove low solubility oils and greases, in the liquid carbon dioxide contained in the cleaning chamber. Cleaning is accomplished at temperatures between -68.degree. F. and 88.degree. F., and the temperature of the liquid carbon dioxide is typically below 32.degree. F.Type: GrantFiled: January 7, 1998Date of Patent: January 12, 1999Assignee: Raytheon CompanyInventors: Sidney C. Chao, Edna M. Purer, Nelson W. Sorbo
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Patent number: 5843787Abstract: A method allowing fast assessment of at least one petroleum characteristic of geologic sediments from a sample of these sediments, said method comprising heating the sample in a non-oxidizing atmosphere, and which method comprises different temperature rise stages; determining at least three magnitudes S.sub.1r, S.sub.2a and S.sub.b representative of the quantity of hydrocarbons contained in said sample, and deducing at least one petroleum characteristic of the geologic sediment from these three magnitudes.Type: GrantFiled: September 16, 1996Date of Patent: December 1, 1998Assignee: Institut Francais du PetroleInventors: Khomsi Trabelsi, Jean Espitalie