Patents Examined by S. Carrillo
  • Patent number: 5891735
    Abstract: Nitrosyl (FeII) hemoglobin can be detected in biological samples, using a method which involves injections of samples into a photolysis cell, prior to detection of chemiluminescence generated by the reaction between nitric oxide and ozone. This method is useful for monitoring the levels of nitric oxide bioactivity in both normal physiological states, and disease states, such as septic shock, atherosclerosis, thrombosis, hyperhomocysteinemia, pulmonary hypertension, malignancy, infections and central nervous system disorders.
    Type: Grant
    Filed: March 15, 1996
    Date of Patent: April 6, 1999
    Assignee: Duke University Medical Center
    Inventor: Jonathan S. Stamler
  • Patent number: 5888826
    Abstract: The present invention provides novel test cartridges for use in the assay of liquid samples and methods of carrying out such assays. These test cartridges are particularly useful in assays which include at least one step during which the sample to be assayed and one or more components of the assay system are kept separated by a pierceable member. The test cartridges comprise a housing through which the sample flows during the assay. The housing includes a holding chamber for holding the sample and a test chamber separated by a pierceable member having a cut therein. The test chamber further includes a partition member which has an opening therethrough and includes at least one reagent for the assay. A transfer member movably mounted in the test chamber can move towards and pierce the pierceable member by moving through the cut and contact the liquid sample in the holding chamber.
    Type: Grant
    Filed: November 25, 1997
    Date of Patent: March 30, 1999
    Assignee: Dade Behring Inc.
    Inventors: Roy Ostgaard, Stephen Schoenberg, Thomas R. Stone, Sourav K. Kundu, Ted S. Geiselman
  • Patent number: 5888828
    Abstract: A method of measuring urea nitrogen on the basis of the ultraviolet absorption of urease-GLDH by a reaction rate method, which method not only permits accurate measurement of a sample containing a high concentration of urea nitrogen but also permits accurate measurement of a sample containing polyols such as mannitol without suffering the influence of the polyols, the method comprising hydrolyzing urea in a sample with urease, reacting glutamate dehydrogenase (GLDH) with ammonia formed by the hydrolysis, in the presence of .alpha.-ketoglutaric acid (.alpha.-KG) and reduced-type nicotineamide adenine dinucleotide (NADH) or reduced-type nicotineamide adenine dinucleotide phosphate (NADPH), and measuring the reduced-type nicotineamide adenine dinucleotide (NADH) or reduced-type nicotineamide adenine dinucleotide phosphate (NADPH) for a decrease rate to measure urea nitrogen derived from the urea, and characterized in that a sulfhydryl compound is co-present with the urease.
    Type: Grant
    Filed: September 12, 1997
    Date of Patent: March 30, 1999
    Assignee: Nitto Boseki Co., Ltd.
    Inventors: Hirotoshi Tanaka, Ryo Kojima, Katsuhiro Katayama
  • Patent number: 5883060
    Abstract: An aqueous cleaning composition comprises from about 0.1 to about 2 percent of hydrogen fluoride based on the volume of the composition, from about 9 to about 15 percent of hydrogen peroxide based on the volume of the composition, and from about 41 to about 47 percent of C.sub.1 to C.sub.6 alcohol based on the volume of the composition. The aqueous cleaning composition may be advantageous in that it offers increased cleaning efficiency and less corrosion in comparison to conventional cleaning solutions.
    Type: Grant
    Filed: July 1, 1998
    Date of Patent: March 16, 1999
    Assignee: Samsung Electronics Co., Ltd.
    Inventors: Kwang-shin Lim, Sang-o Park
  • Patent number: 5877027
    Abstract: An analytical method for the quantitative determination of the impurities in silicon dioxide by which trace amounts of hardly soluble impurities contained in silicon dioxide can be reliably decomposed and converted into a solution so that the contents of all of the impurities contained in silicon dioxide or, in particular, zirconium in a natural quartz powder can be accurately determined. Silicon dioxide is decomposed with hydrofluoric acid or an acid mixture of hydrofluoric acid and another inorganic acid to give a decomposition solution which is, as such or after admixture with another inorganic acid, subjected to evaporation to dryness and the residue is heated to cause fusion with addition of a salt or hydroxide of an alkali metal followed by dissolution of the salt or hydroxide of an alkali metal with pure water or with an aqueous solution of an inorganic acid to give an aqueous solution which is subjected to quantitative analysis of the impurities therein.
    Type: Grant
    Filed: August 27, 1997
    Date of Patent: March 2, 1999
    Assignee: Shin-Etsu Quartz Products Co., Ltd.
    Inventors: Katsuhiko Kemmochi, Kiyotaka Maekawa, Chuzaemon Tsuji, Manabu Saitou, Hiroyuki Miyazawa, Hiroyuki Watanabe
  • Patent number: 5876675
    Abstract: Microfluidic devices and systems, and particularly, microfluidic devices that are easier to handle by the operator, without damaging, contaminating or otherwise fouling, as a result of manual contact with the device. These microfluidic devices and systems include manual handling structures, to allow handling of the small scale devices with minimal potential for fouling as a result of manual contact with the device.
    Type: Grant
    Filed: August 5, 1997
    Date of Patent: March 2, 1999
    Assignee: Caliper Technologies Corp.
    Inventor: Colin B. Kennedy
  • Patent number: 5873948
    Abstract: A method for removing etch residue material in which the removing process is simple, and the metal is prevented from being corroded or damaged. The method for removing etch residue materials and photoresist after carrying out a dry etching includes the steps of preparing a dry chemical by using one or more gas compounds, and removing the etch residue materials by raising the dry chemical above a critical point, wherein the dry chemical comprises carbon dioxide gas and one or more gases selected from a group consisting of DMSO (dimethyl sulfoxide), DMFA (dimethyl formamide), and THF (phentydrone).
    Type: Grant
    Filed: June 24, 1997
    Date of Patent: February 23, 1999
    Assignee: LG Semicon Co., Ltd.
    Inventor: Jae-Jeong Kim
  • Patent number: 5874048
    Abstract: A spotting tip includes a tip body which is fitted on the end of a nozzle for sucking liquid contained in a container and inserted into the liquid in the container through a mouth of the container, and a lid member which is brought into contact with the mouth of the container and closes the space between the tip and the edge of the mouth when the tip is inserted into the container to a predetermined depth. At least one fine communicating passage is formed in at least one of the lid member and the tip body to communicate the inside and outside spaces of the container on opposite sides of the lid member.
    Type: Grant
    Filed: August 4, 1997
    Date of Patent: February 23, 1999
    Assignee: Fuji Photo Film Co., Ltd.
    Inventors: Shunichi Seto, Kenichiro Yazawa, Osamu Seshimoto
  • Patent number: 5868856
    Abstract: A method of removing inorganic contamination from substantially the surface of a semiconductor substrate, the method comprising the steps of: reacting the inorganic contamination with at least one conversion agent, thereby converting the inorganic contamination; removing the converted inorganic contamination by subjecting it to at least one solvent agent, the solvent agent is included in a first supercritical fluid (preferably supercritical CO.sub.2); and wherein the converted inorganic contamination is more highly soluble in the solvent agent than the inorganic contamination.
    Type: Grant
    Filed: July 23, 1997
    Date of Patent: February 9, 1999
    Assignee: Texas Instruments Incorporated
    Inventors: Monte A. Douglas, Allen C. Templeton
  • Patent number: 5868866
    Abstract: A method of and an apparatus for cleaning a thin disk-shaped workpiece that is required to have a high degree of cleanliness, e.g., a semiconductor wafer, a glass substrate, a liquid crystal display, or the like. The method of cleaning the workpiece includes a plurality of cleaning steps, and comprises the steps of holding a workpiece, and performing a liquid jet cleaning of a surface of the workpiece in a first portion of plural cleaning steps. The method further comprises the step of performing a liquid jet cleaning of the surface of the workpiece in a latter portion of the plural cleaning steps.
    Type: Grant
    Filed: March 1, 1996
    Date of Patent: February 9, 1999
    Assignee: Ebara Corporation
    Inventors: Toshiro Maekawa, Koji Ono, Manabu Tsujimura
  • Patent number: 5869007
    Abstract: Acid/base measuring sensor systems consisting of arrays of basic sensor cells are described which are constructed based on the chemical/electrical response characteristics of poly(aromatic amines). Protonation (doping) or deprotonation (de-doping) of the --N.dbd.sites in the polymers leads to characteristic conductivity vs. concentration curves which can be calibrated to produce reliable, instantaneous readings of the acid/base concentrations at various points in the working environment.
    Type: Grant
    Filed: August 22, 1996
    Date of Patent: February 9, 1999
    Assignee: Gumbs Associates, Inc.
    Inventor: Guang-Way Jang
  • Patent number: 5869001
    Abstract: A method and apparatus for the quantitative analysis of sample liquids. A sample is dried and irradiated with visible and/or infrared light. Light that is diffusely or specularly reflected from the sample and sample carrier is detected. and analysed.
    Type: Grant
    Filed: October 21, 1996
    Date of Patent: February 9, 1999
    Assignee: Boehringer Mannheim GmbH
    Inventors: Juergen Backhaus, Reinhold Mischler
  • Patent number: 5868862
    Abstract: A method of removing inorganic contamination (contamination 104 of FIGS. 2a-2b) from a layer (layer 102) overlying a substrate (substrate 100), the method comprising the steps of: removing the layer overlying the substrate with at least one removal agent; reacting the inorganic contamination with at least one conversion agent, thereby converting the inorganic contamination; removing the converted inorganic contamination by subjecting it to at least one solvent agent, the solvent agent included in a first supercritical fluid; and wherein the converted inorganic contamination is more highly soluble in the solvent agent than the inorganic contamination.
    Type: Grant
    Filed: July 31, 1997
    Date of Patent: February 9, 1999
    Assignee: Texas Instruments Incorporated
    Inventors: Monte A. Douglas, Allen C. Templeton
  • Patent number: 5858115
    Abstract: A cleaning device, cleaning system and method relating thereto are provide. The cleaning device comprises (a) a handle unit having a (i) a handle section and (ii) a support section, (b) a body comprising (i) a deformable foundation supported by the support section (ii) a lofted fibrous material overlaying the foundation (iii) water proof plastic layer covering the fibrous material to prevent water contact of the fibrous material and foundation; (c) a cleaning skirt optionally having (i) a cloth cleaning section for enveloping the body and (ii) an elastic section for selectively retaining the skirt on the body. The cleaning system comprises (a) the cleaning device and (b) a plurality of cleaning skirts. The cleaning method comprises (a) providing a cleaning device as set out above, (b) cleaning a first household item with the device, (c) replacing the used skirt with a second skirt, and (d) cleaning a second household item with the device.
    Type: Grant
    Filed: June 13, 1997
    Date of Patent: January 12, 1999
    Inventor: Velma Finch Runyon
  • Patent number: 5858107
    Abstract: A cleaning system and method utilizing sonic whistle agitation to enhance the soil removal and mass transport capacity of the liquid carbon dioxide at low process temperatures. Sonic whistles are within a cleaning chamber, and liquid carbon dioxide is forced out of the sonic whistle jets to ultrasonically emulsify and disperse non-miscible liquids or insoluble solids, such as remove low solubility oils and greases, in the liquid carbon dioxide contained in the cleaning chamber. Cleaning is accomplished at temperatures between -68.degree. F. and 88.degree. F., and the temperature of the liquid carbon dioxide is typically below 32.degree. F.
    Type: Grant
    Filed: January 7, 1998
    Date of Patent: January 12, 1999
    Assignee: Raytheon Company
    Inventors: Sidney C. Chao, Edna M. Purer, Nelson W. Sorbo
  • Patent number: 5843787
    Abstract: A method allowing fast assessment of at least one petroleum characteristic of geologic sediments from a sample of these sediments, said method comprising heating the sample in a non-oxidizing atmosphere, and which method comprises different temperature rise stages; determining at least three magnitudes S.sub.1r, S.sub.2a and S.sub.b representative of the quantity of hydrocarbons contained in said sample, and deducing at least one petroleum characteristic of the geologic sediment from these three magnitudes.
    Type: Grant
    Filed: September 16, 1996
    Date of Patent: December 1, 1998
    Assignee: Institut Francais du Petrole
    Inventors: Khomsi Trabelsi, Jean Espitalie