Patents Examined by Samuel A. Barts
-
Patent number: 7518018Abstract: Provided are processes for the preparation of sertraline and sertraline hydrochloride.Type: GrantFiled: January 9, 2008Date of Patent: April 14, 2009Assignee: Teva Pharmaceutical Industries Ltd.Inventors: Harish Ranjan, Sanjay Nayal, Pankaj Singh, Vinod Kumar Kansal, Marioara Mendelovici
-
Patent number: 7501453Abstract: Disclosed are aromatic cyclopropane compounds with CNS activity. These compounds can be used for alleviating symptoms of CNS disorders.Type: GrantFiled: March 12, 2007Date of Patent: March 10, 2009Assignee: The Research Foundation of State University of New YorkInventors: Huw M. L. Davies, Timothy Gregg
-
Patent number: 7498467Abstract: The present invention provides antioxidants made of an aromatic hydroxyamine derivative having a structure represented by the general formula (I): wherein R1, R2 and R3 are each independently a hydrogen atom or an alkyl group having 1 to 20 carbon atoms; X is a hydrogen atom or an OH group; Y is a hydrogen atom or an NHR1 group; A is a direct bond, —O—, —NH—, —SO2—, —CH2— or —C(CH3)2—, and when an OH group and an NHR1 group are introduced to a unilateral benzene ring, these groups are respectively bonded to adjacent positions of the benzene ring; and n is 0 or 1 with the proviso that when n is 0, R1 is not a hydrogen atom, as well as bisaminophenol derivatives represented by the above general formula (I) wherein n is 1; R2 and R3 are each a hydrogen atom; X is an OH group; Y is an NHR1 group; A is —C(CH3)2—; and R1 is isopropyl, isobutyl or isohexyl.Type: GrantFiled: February 29, 2008Date of Patent: March 3, 2009Assignee: Idemitsu Kosan Co., Ltd.Inventor: Yasushi Shiraki
-
Patent number: 7495119Abstract: ?-ketocarbonyl-functional organosilicon compounds are prepared by reacting, organosilicon compounds containing an SiC-bonded organic radical having a primary amino group, with organic ester compounds containing a group of the formula —O—C(?O)— and, reacting the product with diketenes or diketene derivatives, to produce ?-ketocarbonyl-functional organosilicon compounds containing at least one SiC-bonded radical of the formulae —R1{—N[C(?O)—CHR5—C(?O)—CH2R5]—R1}x—NH—C(?O)—(O)v—R4{—O—[C(?O)—CHR5—C(?O)—CHR5]yH}z or —R1(—NR2?—R1)x—NH—C(?O)—(O)v—R4{—O—[C(?O)—CHR5—C(?O)—CHR5]yH}z R1 is a divalent C1-18 organic radical R2 is a hydrogen atom or a monovalent C1-18 organic radical, R5 is hydrogen, v is 1, x is 0 or an integer from 1 to 10, R2? has one of the meanings of R2 with the proviso that R2? is not a hydrogen atom, y is 0 or 1, and z is 1 or 2.Type: GrantFiled: May 3, 2007Date of Patent: February 24, 2009Assignee: Wacker Chemie AGInventor: Christian Herzig
-
Patent number: 7491848Abstract: Desvenlafaxine is formed from venlafaxine by the use of a demethylating agent comprising a metal sulfide, such as sodium sulfide, and optionally selenium.Type: GrantFiled: December 20, 2006Date of Patent: February 17, 2009Assignee: Synthon IP Inc.Inventors: Karel Pospisilik, Lambertus Thijs
-
Patent number: 7482404Abstract: This invention discloses a process for manufacturing an elastomeric article by liquid injection molding, said process comprising the steps of: (I) heating a curable composition comprised of (1) a liquid polymer comprised of repeat units that are derived from a conjugated diolefin monomer, wherein said liquid polymer has a weight average molecular weight which is within the range of 5,000 to 100,000, and wherein the liquid polymer is functionalized with an amine moiety, (2) a carbonyl inhibited platinum catalyst, and (3) a tetrakis(dialkyl siloxy) silane crosslinking agent, to a temperature which is within the range of 30° C. to 100° C.; (II) injecting the heated curable composition into a mold at a temperature which is within the range of 100° C. to 210° C. to produce the elastomeric article; and (III) removing the elastomeric article from the mold.Type: GrantFiled: September 15, 2004Date of Patent: January 27, 2009Assignee: The Goodyear Tire & Rubber CompanyInventors: Lawson Gibson Wideman, Vanessa Marika Guscoff, Michael Joseph Rachita
-
Patent number: 7479567Abstract: Chlorosilanes such as dimethyldichlorosilane are hydrolyzed in a first super-azeotropic hydrochloric acid distillation column A to produce cyclosiloxanes, chlorosiloxanes, and hydrogen chloride gas. The cyclosiloxanes and the chlorosiloxanes are washed and separated according to their volatility in a second sub-azeotropic hydrochloric acid distillation column B, to produce a substantially chloride free volatile cyclosiloxane stream and a substantially chloride free non-volatile siloxane stream. The process is substantially chloride efficient.Type: GrantFiled: March 15, 2006Date of Patent: January 20, 2009Assignee: Dow Corning CorporationInventors: Andrew Bruce Gammie, Christopher Darren Gatti, Roland Lee Halm, Christopher James Kozenski, Dennis Gene Van Koevering
-
Patent number: 7470803Abstract: The present invention relates to a compound which is flexibly amenable to the alteration, without impairing its photosensitivity, of its structural moiety which affects film forming ability and the resulting surface properties, the compound being capable of undergoing surface alteration by irradiation with relatively low energy wavelength, and of forming an organic thin film on a substrate with good reproducibility, and an organic thin film formed body, the compound being represented by formula (1). (In the formula, X represents a heteroatom-containing functional group capable of interacting with a surface of a metal or a metallic oxide, R represents a C1 to C20 alkyl group, a C1 to C20 alkoxy group, an aryl group, or a C1 to C20 alkoxycarbonyl group; n represents an integer of 1 to 30, and m represents an integer of 0 to 5; G1 represents a single bond or a bivalent hydrocarbon radical having carbon atoms of 1 to 3; Ar represents an aromatic group which may have a substituent; G2 represents O, S, or Nr.Type: GrantFiled: January 30, 2004Date of Patent: December 30, 2008Assignee: Nippon Soda Co., Ltd.Inventors: Haruo Saso, Yoshitaka Fujita, Toshiaki Takahashi
-
Patent number: 7470804Abstract: An organopolysiloxane composition comprising an organopolysiloxane, an organosilicon compound having at least three hydrolyzable radicals in the molecule, an acid anhydride and optionally a filler cures at room temperature and exhibits excellent adherence to magnesium alloys.Type: GrantFiled: August 31, 2005Date of Patent: December 30, 2008Assignee: Shin-Etsu Chemical Co., Ltd.Inventors: Tadashi Araki, Tsuneo Kimura
-
Patent number: 7468460Abstract: A method for producing unprotected or carbamate-protected amines of formulae (II) and (III) or R1—NH2 (II) or R1—NHCO2R2 (III) by reacting hydroxamic acids of formula (I) (R1 CONHOH) with a) alkylpliosphonic acid anhydrite's, b) alcohol R2OH and c) optionally with a base, at a temperature ranging from 100 to +120°C., wherein the hydroxainic acid (I) is produced prior to or during reacting (in situ) and R1 is an optionally substituted linear or branched C1-C12 alkyl radical, substituted C3-C10 cycloalkyl, alkenyl, aryl or heteroaryl radical and R2 is an open-chain, cyclic or branched allyl, aryl or C1 to C12-alkyl radicals, or aryloxy, allyloxy or alkoxy radical possibly substituted with open-chain, cyclic or branched C1 to C12-alkyl radicals.Type: GrantFiled: July 5, 2006Date of Patent: December 23, 2008Assignee: Archimica GmbHInventors: Andreas Meudt, Claudius Boehm
-
Patent number: 7465830Abstract: A method of making high diastereoselective and enantiomerically pure pseudonorephedrine and the hitherto unknown compound (1R,2R) pseudonorephedrine.Type: GrantFiled: August 9, 2007Date of Patent: December 16, 2008Assignee: Illinois State UniversityInventors: Shawn R. Hitchcock, Jonathan Andrew Groeper
-
Patent number: 7465719Abstract: This invention pertains to certain carbamic acid compounds of the formula (I), which inhibit HDAC (histone deacetylase) activity: wherein: J is a linking functional group and is independently:—O —C(?O)— or —C(?O)—O — or —C(?O)—; Cy is a cyclyl group and is independently: C3-20carbocyclyl, C3-20heterocyclyl, or C5-20aryl; and is optionally substituted; Q1 is a cyclyl leader group, and is independently a divalent bidentate group obtained by removing two hydrogen atoms from a ring carbon atom of a saturated monocyclic hydrocarbon having from 4 to 7 ring atoms, or by removing two hydrogen atoms from a ring carbon atom of saturated monocyclic heterocyclic compound having from 4 to 7 ring atoms including 1 nitrogen ring atom or 1 oxygen ring atom; and is optionally substituted; Q2 is an acid leader group, and is independently: C1-8alkylene; and is optionally substituted; or: Q2 is an acid leader group, and is independently: C5-20arylene; C5-20arylene-C1-7alkylene; C1-7alkylene-C5-20arylene; or C1-7alkylene-C5-20aryType: GrantFiled: January 19, 2004Date of Patent: December 16, 2008Assignee: Topotarget UK LimitedInventors: Paul W. Finn, Ivars Kalvinsh, Einars Loza, Aleksandrs Gutcaits, Irena Olutnika, Ludmila Serpionova, Vija Gailite, Rasma Bokaldere
-
Patent number: 7465820Abstract: The present invention relates to heparin-binding calixarene compounds of general Formula (I) in which R, R1, L and n have the meanings indicated in the description and their use in the biomedical field.Type: GrantFiled: September 16, 2004Date of Patent: December 16, 2008Assignee: Consiglio Nazionale Delle RicercheInventors: Francesca Cunsolo, Grazia Maria Letizia Consoli, Corrada Geraci, Tommaso Mecca
-
Patent number: 7462743Abstract: A crystalline Form II of memantine hydrochloride, pharmaceutical compositions containing crystalline Form II, and methods of preparing crystalline Forms I and II of memantine hydrochloride are provided.Type: GrantFiled: January 11, 2006Date of Patent: December 9, 2008Assignee: Teva Pharmaceutical Fine Chemicals S.r.l.Inventors: Valeriano Merli, Paola Daverio, Adrienne Kovacsne-Mezei, Judith Aronhime
-
Patent number: 7462742Abstract: An in situ or one-pot process for the preparation of the compounds of formula (I) uses a compound of general formula (I): and includes: a) the hydrogenation of a nitrile group of the compound of general formula (II): in which R1 to R4 are especially H or alkyl and n varies from 0 to 4, in the presence of a hydrogenation catalyst, a methylating agent and an organic acid as solvent, and at a temperature Ta below the initiation temperature of a reductive amination reaction, to give a primary amine from the nitrile group; and b) the reductive amination of the primary amine in the presence of hydrogen, at a temperature Tb above Ta, to give the dimethylated amine of general formula (I) by activation of the methylating age.Type: GrantFiled: January 23, 2007Date of Patent: December 9, 2008Assignee: Zach SystemInventors: Alain Burgos, Jacques Tonnel, Valéry Dambrin, Denis Lucet, Patricia Poirier
-
Patent number: 7459576Abstract: Useful products are recovered from the bottoms of aminoalkylsilane production in high yield and purity by reaction with alcohol, increasing the economics of aminoalkylsilane synthesis.Type: GrantFiled: February 23, 2006Date of Patent: December 2, 2008Assignee: Wacker Chemie AGInventors: Andreas Bauer, Oliver Schäfer
-
Patent number: 7456307Abstract: A method for the preparation of a chain hydrocarbon halosilylated at its terminal carbon atom or terminal carbon atoms by subjecting a diene-type compound and a hydrogenhalosilane to a hydrosilylation reaction in the presence of a hydrosilylation catalyst and an ether compound having no aliphatic triple bond. A method of conducting a hydrosilylation reaction between a diene-type compound that has vinyl groups on both terminals and a hydrogenhalosilane in the presence of a hydrosilylation catalyst and an ether compound having no aliphatic triple bond.Type: GrantFiled: October 1, 2004Date of Patent: November 25, 2008Assignee: Dow Corning Toray Company, Ltd.Inventor: Takeaki Saiki
-
Patent number: 7449593Abstract: This invention is about anthracene, at least one having silyl substituted group on ring 9 and 10, the anthracene can be a organic light emitting diodes (OLED) material and used for organic electroluminescent device. wherein X is an triarylsilyl group having 6 to 20 carbon atoms, an trialkylsilyl group having 1 to 12 carbon atoms, a substituted or unsubstituted aryl group having 6 to 20 carbon atoms, a substituted or unsubstituted heteroaryl group having 2 to 20 carbon atoms, or a substituted or unsubstituted alkyl group having 1 to 12 carbon atoms. R1 and R2 is independently a hydrogen, halogen, or a substituted or unsubstituted alkyl group having 1 to 12 carbon atoms. R3 to R5 is independently a substituted or unsubstituted aryl group having 6 to 20 carbon atoms, or a substituted or unsubstituted alkyl group having 1 to 12 carbon atoms.Type: GrantFiled: March 29, 2007Date of Patent: November 11, 2008Assignee: Au Optronics CorporationInventors: Chen-Ping Yu, Chia-Liang Tai, Fan-Hsiu Chang
-
Patent number: 7446217Abstract: This invention relates to silicon precursor compositions for forming silicon-containing films by low temperature (e.g., <300° C.) chemical vapor deposition processes for fabrication of ULSI devices and device structures. Such silicon precursor compositions comprise at least one disilane derivative compound that is fully substituted with alkylamino and/or dialkylamino functional groups.Type: GrantFiled: October 31, 2003Date of Patent: November 4, 2008Assignee: Advanced Technology Materials, Inc.Inventors: Ziyun Wang, Chongying Xu, Thomas H. Baum, Bryan Hendrix, Jeffrey F. Roeder
-
Patent number: 7446227Abstract: A process for preparation of protriptyline hydrochloride from 5-dihydrobenzocycloheptatriene of formula (1) by coupling with chloropropyl alcohol in the presence of excess n-butyl Lithium in tetrahydrofuran under inert atmosphere, followed by preparation of mesylate derivative of formula (3) and finally the nucleophilic displacement of the mesylate group by reacting methylamine solution in methanol to give protriptyline free base of the formula (4). Also the present process reveals the hydrochloride salt formation and purification of the same to give pure pharmaceutical grade protriptyline hydrochloride with impurities less than 0.1% w/w.Type: GrantFiled: December 11, 2006Date of Patent: November 4, 2008Assignee: Apicore, LLCInventors: Satyam Nampalli, Brijesh Patel, Peter Xavier Tharial, Ravishanker Kovi