Patents Examined by Sang H. Nguyen
  • Patent number: 7821635
    Abstract: A measuring system for in-situ measurements down a well (1) by a spectrometer (4) is provided. The spectrometer (4) includes a radiation source (5) and a detector (6). A probe (15) optically connected to the spectrometer (4) and includes an optical pathway (7) for transmission of a radiation from the radiation source (5) and at least a second optical pathway for transmission of a characteristic radiation from a sample to the detector (6). A positioner is provided to position the probe (15) near a side surface (11) of the borehole (3) and to optically couple the optical pathways (7) to the side surface (11), wherein the probe (15) is traversable up and down the well (1) by way of a guide operatively connected to the probe (15) and to a fixed location at the wellhead. By use of the apparatus and method a concentration of methane or other substance of interest is obtained, and thereby, a potential production of a coal bed methane formation is obtained.
    Type: Grant
    Filed: September 24, 2003
    Date of Patent: October 26, 2010
    Inventors: John Pope, John Herries
  • Patent number: 7405835
    Abstract: A quantity (or dispersion value) of a distribution of edge position due to random noise is expected to be reduced statistically to 1/N when N edge position data items are averaged. Using this property, the single page image is averaged in a vertical direction with various values of parameter S, and then the edge roughness index is calculated. The S-dependence of the edge roughness index is analyzed and a term of a dispersion value directly proportional to 1/S is determined as being due to noise.
    Type: Grant
    Filed: June 12, 2007
    Date of Patent: July 29, 2008
    Assignee: Hitachi High-Technologies Corporation
    Inventors: Atsuko Yamaguchi, Hiroshi Fukuda, Osamu Komuro, Hiroki Kawada
  • Patent number: 7388679
    Abstract: A light irradiation device for irradiating light having a pattern onto a physical object, includes a pattern forming plate provided with a plurality of opening portions; a light irradiation unit for irradiating light towards the pattern forming plate; and a projection lens irradiated by the light irradiation unit, for integrally condensing light passed through an opening of the pattern forming plate and guiding the condensed light to the physical object, wherein the projection lens is arranged such that an image of the pattern forming plate is not focused onto the physical object, but is projected as a sinusoidal wave pattern.
    Type: Grant
    Filed: September 21, 2006
    Date of Patent: June 17, 2008
    Assignee: OMRON Corporation
    Inventors: Masanao Yoshino, Yoshiro Murata, Yoshinobu Asokawa
  • Patent number: 7378636
    Abstract: A method of evaluating a non-linear optical crystal used for non-linear wavelength conversion of laser beam which enables the non-linear optical crystal to be evaluated before the crystal is actually used as a wavelength conversion element in order for the crystal to be constantly used for an extended time with a high conversion efficiency retained and without lowering in output when non-linear optical crystals for various non-linear wavelength conversions such as a CLBO crystal are used to convert laser beams, wherein the non-linear optical crystal is moved to changed a laser beam incident position to detect the output of a laser beam emitted from the non-linear optical crystal for each changing position.
    Type: Grant
    Filed: February 13, 2003
    Date of Patent: May 27, 2008
    Assignee: RIKEN
    Inventors: Satoshi Wada, Hideo Tashiro, Masataka Morita
  • Patent number: 7375807
    Abstract: A system for the preparation and handling of multiple solid state samples, in particular for spectroscopic and microscopic analysis. The system comprises a sample holder assembly for multiple solid-state samples. The sample holder assembly comprises a sample holding body having first and second sides (3a, 4a), provided with multiple sample receiving open-ended bores (5) extending through said body between said first and second sides, each bore (5) having a first opening at the first side and a second opening at the second side. Furthermore a closure body (10) is provided adapted to be mounted against the second side of the sample holding body, said closure body (10) having a closure side adapted to rest against the second side of the sample holding body for closing off the second openings of the bores (5) in said sample holding body. Compacting (23) means are provided for compacting samples filled in bores (5) of the sample holding body as these bores are closed off on the second side by the closure body.
    Type: Grant
    Filed: July 15, 2002
    Date of Patent: May 20, 2008
    Assignee: Avantium International B.V.
    Inventors: Peter John van den Brink, André Harmen Sijpkes
  • Patent number: 7372583
    Abstract: A fabrication tool can be controlled using a support vector machine. A profile model of the structure is obtained. The profile model is defined by profile parameters that characterize the geometric shape of the structure. A set of values for the profile parameters is obtained. A set of simulated diffraction signals is generated using the set of values for the profile parameters, each simulated diffraction signal characterizing the behavior of light diffracted from the structure. The support vector machine is trained using the set of simulated diffraction signals as inputs to the support vector machine and the set of values for the profile parameters as expected outputs of the support vector machine. After the support vector machine has been trained, a fabrication process is performed using the fabrication tool to fabricate the structure on the wafer. A measured diffraction signal off the structure is obtained. The measured diffraction signal is inputted into the trained support vector machine.
    Type: Grant
    Filed: April 12, 2007
    Date of Patent: May 13, 2008
    Assignee: Tokyo Electron Limited
    Inventors: Wen Jin, Junwei Bao, Shifang Li, Manuel Madriaga
  • Patent number: 7372556
    Abstract: A system and method of inspecting material laid by a material placement machine. Light is directed onto the material in a direction essentially normal to the material to illuminate a section of the material. Laser energy is projected onto the section at an angle predetermined to reveal inconsistencies in the section. This system provides improved illumination for material widths exceeding six inches and is scalable for inspecting various material widths.
    Type: Grant
    Filed: October 31, 2005
    Date of Patent: May 13, 2008
    Assignee: The Boeing Company
    Inventors: Roger W Engelbart, Reed Hannebaum, Tim Pollock, Sam Orr, Jeff Putnam, Eric Rector
  • Patent number: 7369236
    Abstract: Inspection of objects such as semiconductor wafers can include comparisons of shapes between inspection and reference images. As part of the inspection process, relative values may be assigned to pixels within each image based on comparison of such pixels to neighboring pixels. For instance, the pixels may be ranked by relative brightness in each image. Alternatively, directional vectors may be defined based on slopes between pixels and their neighbors. Various comparison metrics may be utilized to determine the degree of correlation between the relative values for pixels in the inspection image and corresponding pixels in the reference image. Relative values may be combined with conventional techniques as part of an inspection process. The inspection may be performed using an optical inspection tool that uses conventional techniques to identify defect candidates, with relative value analysis performed on areas containing defect candidates to confirm or deny the existence of a defect.
    Type: Grant
    Filed: October 31, 2006
    Date of Patent: May 6, 2008
    Assignee: Negevtech, Ltd.
    Inventors: Erez Sali, Oren Cohen
  • Patent number: 7369225
    Abstract: A device and method for checking surfaces in the interior of holes, depressions, or the like. The device and method are developed in such a manner that a multicolor light beam can be produced with a light source, wherein a light beam, due to the chromatic aberration of the imaging optics, can be focused onto several points at different distances from the imaging optics, such that the distance to the surface can be determined from the spectrum of the detected light beam.
    Type: Grant
    Filed: December 8, 2006
    Date of Patent: May 6, 2008
    Assignee: Micro-Epsilon Messtechnik GmbH & Co. KG
    Inventors: Bernhard Messerschmidt, Karl Wisspeintner
  • Patent number: 7359043
    Abstract: A pattern inspecting method, comprising preparing a sample having a first and a second inspection regions and an imaging device having a plurality of pixels, scanning the first inspection region to a first direction using the imaging device to obtain a first measurement pattern representing at least parts of the first inspection region, scanning the second inspection region to the first direction using the imaging device to obtain a second measurement pattern representing at least parts of the second inspection region, comparing the first measurement pattern and the second measurement pattern with each other to determine presence or absence of a defect formed on the sample, and controlling a scanning condition for scanning a pattern of the second inspection region by the imaging device so as to keep the same with the scanning condition when the pattern of the first inspection region is scanned by the imaging device.
    Type: Grant
    Filed: December 24, 2003
    Date of Patent: April 15, 2008
    Assignee: Kabushiki Kaisha Toshiba
    Inventors: Hideo Tsuchiya, Yoshihide Kato, Kazuto Matsuki, Yasushi Sanada, Riki Ogawa, Takuro Nagao
  • Patent number: 7355694
    Abstract: A method and apparatus for measuring the particle diameter of foam on a malt alcoholic drink, which can detennine the quality of the foam of the malt alcoholic drink objectively, are provided. The apparatus for measuring the particle diameter of foam on a malt alcoholic drink according to the present invention includes a laser light source for irradiating a linear laser beam onto the surface of a foam layer created on a malt alcoholic drink, an imaging device for imaging a laser line reflected on the surface of the foam layer to obtain an image of the laser line, and a calculating device for obtaining edge information of the laser line from the image of the laser line to calculate the particle diameter of foam in the foam layer based on the edge information.
    Type: Grant
    Filed: September 10, 2003
    Date of Patent: April 8, 2008
    Assignee: Sapporo Breweries Limited
    Inventors: Kazuhisa Yasui, Toshio Kurihara, Masachika Takashio
  • Patent number: 7355696
    Abstract: Apparatus for sorting and orienting sperm cells has a pair or walls in confronting relationship forming a flow chamber having inlet, a downstream outlet, and intermediate detector region. The inlet receives first and second spaced apart streams of input fluid and a third stream of sample fluid containing the cells to be sorted. The first and second streams have respective flow rates relative to third stream, such that the third stream is constricted forming a relatively narrow sample stream, so that the cells are oriented parallel to the walls. A detector detect desired cells and a sorter downstream of the detector for sorting the desired cells from the stream.
    Type: Grant
    Filed: February 1, 2005
    Date of Patent: April 8, 2008
    Assignee: Arryx, Inc
    Inventors: Daniel Mueth, Amy L. Anderson, Christopher R. Knutson, Joseph Plewa
  • Patent number: 7353690
    Abstract: Apparatus and methods for characterizing atmospheric refractivity and its evolution in time and space utilizing passive radiation emission measurement devices are disclosed. Based on an instrument such as a passive microwave radiometer, ancillary meteorological measurements and other information and observations, the apparatus and methods provide useful signatures for characterizing atmospheric refractivity. The system can observe to any vector in the sky, giving directional as well as zenithal measurements of the refractivity profile, its spatial and temporal gradients, and the spatial and temporal trending of the profile and its gradients.
    Type: Grant
    Filed: January 24, 2005
    Date of Patent: April 8, 2008
    Assignee: Radiometrics Corporation
    Inventors: Fredrick S. Solheim, Randolph H. Ware, Michael L. Exner
  • Patent number: 7352477
    Abstract: A two-dimensional position detecting device includes a movable member which relatively moves parallel to a stationary member; a light source and a two-dimensional position sensor which are fixed to one and the other of the stationary member and the movable member, respectively, the two-dimensional position sensor receiving light emitted from the light source to detect a light-receiving point on a light receiving surface of the two-dimensional position sensor; and a reducing projector optical system, positioned between the light source and the two-dimensional position sensor, for converging the light that is emitted from the light source on the light receiving surface of the two-dimensional position sensor.
    Type: Grant
    Filed: January 3, 2006
    Date of Patent: April 1, 2008
    Assignee: PENTAX Corporation
    Inventor: Shuzo Seo
  • Patent number: 7349078
    Abstract: In accordance with one embodiment of the present invention, a method of characterizing a lens is provided. According to the method, an optical source such as a laser is configured to generate a collimated beam that is focused along an optical axis at a distance fext. A test lens is placed along the optical axis, wherein the test lens is characterized by an effective focal length fi that is substantially independent of incident irradiance. An output beam generated from the focused optical source and the test lens defines an output intensity profile at an observation plane located a distance Z0 from the focal point of the optical source. The on-axis intensity I of the output intensity profile along the optical axis at the observation plane is monitored as the placement of the test lens along the optical axis is varied. A z-scan signature of the test lens is generated from the monitored intensity I.
    Type: Grant
    Filed: April 28, 2006
    Date of Patent: March 25, 2008
    Assignee: University of Dayton
    Inventors: Partha P. Banerjee, Yasser A. Abdelaziez
  • Patent number: 7345806
    Abstract: The invention provides a method and apparatus for evaluating the quality of microelectromechanical devices having deformable and deflectable members using resonation techniques. Specifically, product quality characterized in terms of uniformity of the deformable and deflectable elements is inspected with an optical resonance mapping mechanism on a wafer-level.
    Type: Grant
    Filed: June 23, 2004
    Date of Patent: March 18, 2008
    Assignee: Texas Instruments Incorporated
    Inventors: Dmitri Simonian, Casey Feinstein
  • Patent number: 7342668
    Abstract: A system provides high-speed multiple line digitization for three-dimensional imaging of a physical object. A full frame of three-dimensional data may be acquired in the same order as the frame rate of a digital camera.
    Type: Grant
    Filed: September 17, 2004
    Date of Patent: March 11, 2008
    Assignee: D4D Technologies, LLC
    Inventors: Mark Quadling, Henley Quadling
  • Patent number: 7339661
    Abstract: Apparatus for inspection of a sample includes a radiation source, which is adapted to direct optical radiation onto an area of a surface of the sample, and a plurality of image sensors. Each of the image sensors is configured to receive the radiation scattered from the area into a different, respective angular range, so as to form respective images of the area. An image processor is adapted to process at least one of the respective images so as to detect a defect on the surface.
    Type: Grant
    Filed: September 8, 2003
    Date of Patent: March 4, 2008
    Inventors: Doron Korngut, Erez Admoni, Ofer Kadar, Lev Haikoviz, Haim Feldman, Avishay Guetta
  • Patent number: 7339662
    Abstract: A scanning type exposure apparatus includes a projection optical system which projects a pattern of a reticle onto a wafer, which is held by a wafer chuck, a scanning stage system which scanningly moves the reticle and the wafer synchronously with respect the projection optical system, and an inspection system which automatically inspects influence of particles on at least one of the wafer and on the wafer chuck. The inspection system includes a focus detector which measures a focus state of the wafer and a calculator which calculates outputs of the focus detector.
    Type: Grant
    Filed: April 26, 2005
    Date of Patent: March 4, 2008
    Assignee: Canon Kabushiki Kaisha
    Inventor: Hiroaki Takeishi
  • Patent number: 7339660
    Abstract: An illumination device for use with a product inspection machine inspecting products according to at least one characteristic. The invention also pertains to an illumination device for use in sorting machines that optically sort or separate nonstandard fungible objects from standard objects as they pass a viewing station by viewing such objects illuminated by at least one wavelength. The invention includes a plurality of arrays of semiconductor light sources impinging on passing product and at least one array of semiconductor light sources of wavelength and intensity equal to the plurality of arrays impinging on a background surface for detection and comparison.
    Type: Grant
    Filed: November 29, 2006
    Date of Patent: March 4, 2008
    Assignee: Satake USA, Inc.
    Inventors: Avi P. Cohn, Larry H. Mack, Jr.