Abstract: A sanitation assembly for sanitation of terminals of wastewater discharging pipes includes a sanitation chamber inside which, while in use, there is located a terminal to be sanitized. A fixed UV emission means is located inside the sanitation chamber near a bottom portion thereof and arranged to emit a UV radiation upwards, the fixed UV emission means including a first plurality of LEDs arranged along a first circumference and a second plurality of LEDs arranged along a second circumference inside said first circumference, the first and the second plurality of LEDs being arranged to emit upward a UV radiation having a wavelength ranging from 200 and 300 nm. A movable UV emission means is housed inside the sanitation chamber and includes a third plurality of LEDs designed to emit a radiation ranging from 200 and 300 nm and arranged along a circumference on a vertically moving ring-shaped structure which, while in use, is arranged to surround the terminal to be subject to sanitation.

Abstract: There is provided a light irradiator including: light sources forming first and second light source rows; a heat sink; a substrate including first and second traces connected to the first and second light source rows, respectively; and a fixing part configured to fix the heat sink to the substrate. The fixing part is arranged between adjacent light sources included in the first light source row and adjacent in the first light source row; and the fixing part is not arranged between adjacent light sources included in the second light source row and adjacent in the second light source row. The first trace includes a first circumventing part configured to circumvent the fixing part; and the second trace includes a second circumventing part configured to circumvent the fixing part and having a directional component different from the first direction.

Abstract: The present invention quickly calculates values of optimal excitation parameters which are set in lenses in multiple stages. A multi charged particle beam adjustment method includes forming a multi charged particle beam, calculating, for each of lenses in two or more stages disposed corresponding to object lenses in two or more stages, a first rate of change and a second rate of change in response to change in at least an excitation parameter, the first rate of change being a rate of change in a demagnification level of a beam image of the multi charged particle beam, the second rate of change being a rate of change in a rotation level of the beam image, and calculating a first amount of correction to the excitation parameter of each of the lenses based on an amount of correction to the demagnification level and the rotation level of the beam image, the first rate of change, and the second rate of change.

Abstract: In a charged particle beam writing method according to one embodiment, a deflector is caused to deflect a charged particle beam and a pattern is written by irradiating a substrate with the charged particle beam. The charged particle beam writing method includes calculating a charge amount distribution based on a charge amount of a beam irradiation region on the substrate immediately after irradiation with the charged particle beam and a diffusion coefficient for electric charge of the substrate, calculating a position shift distribution of the charged particle beam on the substrate based on the charge amount distribution, and correcting an irradiation position of the charged particle beam based on the position shift distribution.

Abstract: A charged particle assessment tool includes: an objective lens configured to project a plurality of charged particle beams onto a sample, the objective lens having a sample-facing surface defining a plurality of beam apertures through which respective ones of the charged particle beams are emitted toward the sample; and a plurality of capture electrodes adjacent respective ones of the beam apertures and configured to capture charged particles emitted from the sample.

Abstract: A single-photon source including a monomode photonic wire wherein a single-photon emitter is located, the photonic wire being formed of two coaxial parts that are distinct and spaced from one another along the longitudinal axis, including a lower part resting in contact with a support substrate and including the single-photon emitter.

Abstract: An electrostatic lens for transporting charged particles in an axial direction includes a first group of first electrodes configured to receive a first DC potential from a DC voltage source, and a second group of second electrodes configured to receive a second DC potential from the DC voltage source different from the first DC potential. The first electrodes are interdigitated with the second electrodes. The first group and/or the second group has a geometric feature that progressively varies along the axial direction. The lens generates an axial potential profile that progressively changes along the axial direction, and thereby reduces geometrical aberrations. The lens may be part of a charged particle processing apparatus such as, for example, a mass spectrometer or an electron microscope.

Abstract: Systems and methods of measuring beam current in a multi-beam apparatus are disclosed. The multi-beam apparatus may include a charged-particle source configured to generate a primary charged-particle beam, and an aperture array. The aperture array may comprise a plurality of apertures configured to form a plurality of beamlets from the primary charged-particle beam, and a detector including circuitry to detect a current of at least a portion of the primary charged-particle beam irradiating the aperture array. The method of measuring beam current may include irradiating the primary charged-particle beam on the aperture array and detecting an electric current of at least a portion of the primary charged-particle beam.

Abstract: An object of the present disclosure is to provide a charged particle beam apparatus that can quickly find a correction condition for a new aberration that is generated in association with beam adjustment. In order to achieve the above object, the present disclosure proposes a charged particle beam apparatus configured to include an objective lens (7) configured to focus a beam emitted from a charged particle source and irradiate a specimen, a visual field movement deflector (5 and 6) configured to deflect an arrival position of the beam with respect to the specimen, and an aberration correction unit (3 and 4) disposed between the visual field movement deflector and the charged particle source, in which the aberration correction unit is configured to suppress a change in the arrival position of the beam irradiated under different beam irradiation conditions.

Abstract: A Far UV-C light apparatus has a Far UV-C lamp located within a housing emitting a Far UV-C light having a wavelength of 222±1 nm for destroying pathogens. A quarter wave generator supplies electric energy to the Far UV-C lamp. A handle connected to the housing allows the Far UV-C device to be hand held and moved to a selected location.

Abstract: A fixture system includes a housing configured to be mounted in an upper region of a room or area. A light source is supported by the housing for providing visible light to illuminate at least a portion of the room or area. An ultraviolet radiation (UVR) system is supported by the housing for emitting UVC radiation in an upper region of the room or area. The UVR system includes at least one UVC emitting source and an optic member configured to direct UVC radiation in a pattern having a vertical width dimension that is above a threshold height from a floor or ground in the room or area.

Abstract: An object of the present disclosure is to provide a charged particle beam apparatus that can quickly find a correction condition for a new aberration that is generated in association with beam adjustment. In order to achieve the above object, the present disclosure proposes a charged particle beam apparatus configured to include an objective lens (7) configured to focus a beam emitted from a charged particle source and irradiate a specimen, a visual field movement deflector (5 and 6) configured to deflect an arrival position of the beam with respect to the specimen, and an aberration correction unit (3 and 4) disposed between the visual field movement deflector and the charged particle source, in which the aberration correction unit is configured to suppress a change in the arrival position of the beam irradiated under different beam irradiation conditions.

Abstract: A sanitizing device includes a nonlinear optical element, one or more laser diodes, a lens, and a battery pack. The one or more laser diodes are each configured to direct a beam of optical energy to the nonlinear optical element. Each beam of optical energy has a first wavelength and the nonlinear optical element is configured to produce UV-C energy having a second wavelength from the beams of optical energy. The lens is configured to focus the UV-C energy to cover a desired area for sanitizing purposes. The battery pack is configured for powering the one or more laser diodes.

Abstract: A sealed, passively pumped, polycrystalline ceramic vacuum chamber and method for fabricating the chamber are disclosed. The body of the vacuum chamber is made from a polycrystalline ceramic, for example, alumina. The vacuum chamber includes one or more windows made from a transparent ceramic, for example, sapphire, to accommodate optical access, while remaining amorphous-glass free to minimize or eliminate helium permeation. The vacuum chamber components are joined via laser welding or furnace brazing and the completed chamber is bakeable at temperatures up to 400° C. The vacuum chamber can operate at high or ultra-high vacuum pressures for an extended period through the use of one or more getter-based pumps. The vacuum chamber may include one or more atomic sources depending upon the application.

Abstract: An optical trap for laser cooling and trapping atoms. Three Z pairs of laser beams are directed to cross in a vacuum chamber at a common intersection volume, wherein each pair is formed by two counterpropagating beams. Rather than having a mutually orthogonal arrangement in which each beam pair forms an angle ? of 45° to a reference axis, z, these angles are instead between 5°???40°. Moreover, in each beam pair, the counterpropagating beams are not precisely aligned in a common path, as in a conventional magneto-optical trap, but are slightly misaligned by respective misalignement angles [?, ?, ?] of typically 0.1° to 2°. The misalignment angles and beam widths are however selected so that a common intersection volume for all six beams is maintained This provides an all-optical trap in which laser cooling and trapping of atoms takes place without a magnetic field being present.

Abstract: A height measuring device includes a light source that emits light in a direction oblique to a top surface of a specimen, a slit that shapes the light from the light source to form a slit image on the specimen, an imaging element that detects reflected light reflected by the specimen, and an arithmetic unit. The arithmetic unit: identifies a slit image of the reflected light reflected by the top surface of the specimen from among a plurality of slit images based on respective positions of the plurality of slit images on a detection surface of the imaging element; and determines the height of the top surface of the specimen based on the position of the slit image of the reflected light reflected by the top surface of the specimen on the detection surface.

Abstract: According to one embodiment, a charged particle beam writing apparatus includes, a writing mechanism, a writing control circuit, a deflection operation control circuit configured to generate control data for controlling the blanking of each of the charged particle beams based on the shot data, a storage, a blanking control circuit configured to control the blanking based on the control data, and a detector. The writing control circuit is configured to, when the detector detects the abnormality during the writing, interrupt the writing, and generate interrupt position information at a position where the writing is interrupted based on the shot data which has been stored at the storage and is related to the control data that has not been used for controlling the blanking.

Abstract: An electron beam writing apparatus comprising, a cathode configured to emit an electron beam, a condition controller configured to change a condition under which the electron beam is emitted from the cathode in a plurality of ways, and a prediction unit configured to predict a life span of the cathode based on a temporal change in an amount of fluctuation of a beam characteristic of the electron beam to a change in the condition when the condition is changed.

Abstract: An apparatus for particle collection is provided. The apparatus includes a magnetic element configured to generate a tapered magnetic ion transport tunnel that collects particles from a local environment, a detector configured to perform one or more measurements of the collected particles, and ion optics configured to transport the collected particles to the detector.

Abstract: In one embodiment, a data generation method is for calculating a coverage of a polygon in each of a plurality of pixels obtained by dividing a target to be irradiated with a charged particle beam into predetermined sizes. The method includes dividing a parametric curve that defines a pattern shape into a plurality of parametric curves, calculating, for each of the plurality of parametric curves, an area of a region surrounded by a segment connecting end points among control points of the parametric curve and the parametric curve, calculating positions of vertexes of a figure having an area equivalent to the calculated area and having, as one side thereof, the segment connecting the end points, and generating the polygon by using the vertexes.