Patents Examined by Thanh Nguyen
  • Patent number: 8906798
    Abstract: A mounting structure for a semiconductor device is formed to include a stepwise stress buffer layer under a stepwise UBM structure.
    Type: Grant
    Filed: December 14, 2012
    Date of Patent: December 9, 2014
    Assignee: Taiwan Semiconductor Manufacturing Company, Ltd.
    Inventors: Tzu-Yu Wang, Tzu-Wei Chiu, Shin-Puu Jeng
  • Patent number: 8907319
    Abstract: A light emitting device package includes a body having a cavity, at least one insulating layer disposed on the body, first and second electrode layers disposed on the insulating layer and electrically isolated from each other, at least one light emitting device disposed on a bottom surface of the cavity and electrically connected to the first and second electrode layer, a light-transmissive resin layer sealing the light emitting device disposed in the cavity, and a metal layer disposed on a rear surface of the body to face the light emitting device, wherein the light emitting device is grown in an m-direction on the (1123) plane of a substrate and includes a light emitting structure including a first conductive semiconductor layer, and active layer, and a second conductive semiconductor layer.
    Type: Grant
    Filed: December 11, 2012
    Date of Patent: December 9, 2014
    Assignee: LG Innotek Co., Ltd.
    Inventors: Hyeong Seon Yun, Eun Dk Lee
  • Patent number: 8895981
    Abstract: A multichip module (MCM) has redundant I/O connections between its dice. That is, the number of inter-die I/O connections used is larger than the number of connections ordinarily used to provide connectivity between the dice. Defective connections are discovered through testing after MCM assembly and avoided, with signals being rerouted through good (e.g., not defective) redundant connections. The testing can be done at assembly time and the results stored in nonvolatile memory. Alternatively, the MCM can perform the testing itself dynamically, e.g., at power up, and use the test results to configure the inter-die I/O connections.
    Type: Grant
    Filed: December 28, 2011
    Date of Patent: November 25, 2014
    Assignee: Altera Corporation
    Inventor: David Lewis
  • Patent number: 8895453
    Abstract: A layer with a laterally varying thickness, a substrate with a first surface and an insulation layer formed on the first surface of the substrate is provided. A plurality of at least one of recesses and openings is formed in the insulation layer, wherein the plurality is arranged at a pitch. Each of the at least one of recesses and openings has a lateral width, wherein at least one of the pitch and the lateral width varies in a lateral direction. The plurality of the at least one of recesses and openings defines a given region in the insulation layer. The insulation layer having the plurality of the at least one of the recesses and openings is tempered at elevated temperatures so that the insulation layer at least partially diffluences to provide the insulation layer with a laterally varying thickness at least in the given region.
    Type: Grant
    Filed: April 12, 2013
    Date of Patent: November 25, 2014
    Assignee: Infineon Technologies AG
    Inventors: Hans-Joachim Schulze, Johannes Laven, Holger Schulze
  • Patent number: 8865541
    Abstract: An integrated circuit contains a voltage protection structure having a diode isolated DENMOS transistor with a guard element proximate to the diode and the DENMOS transistor. The guard element includes an active area coupled to ground. The diode anode is connected to an I/O pad. The diode cathode is connected to the DENMOS drain. The DENMOS source is grounded. A process of forming the integrated circuit is also disclosed.
    Type: Grant
    Filed: December 19, 2013
    Date of Patent: October 21, 2014
    Assignee: Texas Instruments Incorporated
    Inventors: Farzan Farbiz, Akram A. Salman
  • Patent number: 8860134
    Abstract: A trench power device includes a semiconductor layer, a trench gate structure, a trench source structure, and a contact. The semiconductor layer has an epitaxial layer, a doped body region, a S/D region, and a doped contact-carrying region. The doped body region is formed in the epitaxial layer, the S/D region is formed in the doped body region, and the doped contact-carrying region is formed in the doped body region and outside a projecting portion defined by orthogonally projecting from the S/D region to the doped body region. The trench gate structure is embedded in the S/D region, the doped body region, and the epitaxial layer. The trench source structure is embedded in the doped body region and the epitaxial layer, and is connected to the doped contact-carrying region. The contact is connected to the S/D region and the doped contact-carrying region.
    Type: Grant
    Filed: September 3, 2013
    Date of Patent: October 14, 2014
    Assignee: Sinopower Semiconductor, Inc.
    Inventor: Po-Hsien Li
  • Patent number: 8853727
    Abstract: A high output light emitting diode (LED) based lighting module includes a plurality of LEDs on a substrate board, a fiber optic mounting assembly that securely holds a plurality of fiber bundles that form a fiber cable to said LEDs so that each LED mates to a fiber bundle making each fiber bundle slightly overlap the active area of its respective LED and mechanical means for holding each fiber optic bundle a fixed distance from said LED substrate.
    Type: Grant
    Filed: December 11, 2012
    Date of Patent: October 7, 2014
    Inventors: David Sanso, Mason Williams, Brent Hymel, Aaron Pitzer
  • Patent number: 8853668
    Abstract: A light emitting device comprises a first layer having an n-type Group III-V semiconductor, a second layer adjacent to the first layer, the second layer comprising an active material that generates light upon the recombination of electrons and holes. The active material in some cases has one or more V-pits at a density between about 1 V-pit/?m2 and 30 V-pits/?m2. The light emitting device includes a third layer adjacent to the second layer, the third layer comprising a p-type Group III-V semiconductor.
    Type: Grant
    Filed: September 29, 2011
    Date of Patent: October 7, 2014
    Assignee: Kabushiki Kaisha Toshiba
    Inventors: Jeff Ramer, Steve Ting
  • Patent number: 8847404
    Abstract: In a stacked chip configuration, the “inter chip” connection is established on the basis of functional molecules, thereby providing a fast and space-efficient communication between the different semiconductor chips.
    Type: Grant
    Filed: April 8, 2013
    Date of Patent: September 30, 2014
    Assignee: GLOBALFOUNDRIES Inc.
    Inventors: Stephan Kronholz, Markus Lenski, Ralf Richter
  • Patent number: 8835996
    Abstract: An integrated circuit configuration includes a substrate, a diffusion region, a gate structure, an extension conductor structure, a dielectric layer, a contact structure, and a metal conductor line. The diffusion region is formed in the substrate. The gate structure is formed over the substrate and spanned across the diffusion region. The extension conductor structure is formed over the semiconductor substrate and contacted with the diffusion region. The extension conductor structure is extended externally to a first position along a surface of the substrate, wherein the first position is outside the diffusion region. The dielectric layer is formed over the substrate, the gate structure and the extension conductor structure. The contact structure is penetrated through the dielectric layer to be contacted with the first position of the extension conductor structure. The metal conductor line is formed on the dielectric layer and contacted with the contact structure.
    Type: Grant
    Filed: December 28, 2011
    Date of Patent: September 16, 2014
    Assignee: United Microelectronics Corporation
    Inventor: Chin-Sheng Yang
  • Patent number: 8835225
    Abstract: A Quad Flat No-Lead (QFN) semiconductor package includes a die pad; I/O connections disposed at the periphery of the die pad; a chip mounted on the die pad; bonding wires; an encapsulant for encapsulating the die pad, the I/O connections, the chip and the bonding wires while exposing the bottom surfaces of the die pad and the I/O connections; a surface layer formed on the bottoms surfaces of the die pad and the I/O connections; a dielectric layer formed on the bottom surfaces of the encapsulant and the surface layer and having openings for exposing the surface layer. The surface layer has good bonding with the dielectric layer that helps to prevent solder material in a reflow process from permeating into the die pad and prevent solder extrusion on the interface of the I/O connections and the dielectric layer, thereby increasing product yield.
    Type: Grant
    Filed: December 4, 2013
    Date of Patent: September 16, 2014
    Assignee: Siliconware Precision Industries Co., Ltd.
    Inventors: Fu-Di Tang, Ching-Chiuan Wei, Yung-Chih Lin
  • Patent number: 8829690
    Abstract: A system and method for chip package fabrication is disclosed. The chip package includes a base re-distribution layer having an opening formed therein, an adhesive layer having a window formed therein free of adhesive material, and a die affixed to the base re-distribution layer by way of the adhesive layer, the die being aligned with the window such that only a perimeter of the die contacts the adhesive layer. A shield element is positioned between the base re-distribution layer and adhesive layer that is generally aligned with the opening formed in the base re-distribution layer and the window of the adhesive layer such that only a perimeter of the shield element is attached to the adhesive layer. The shield element is separated from the die by an air gap and is configured to be selectively removable from the adhesive layer so as to expose the front surface of the die.
    Type: Grant
    Filed: December 23, 2013
    Date of Patent: September 9, 2014
    Assignee: General Electric Company
    Inventors: Paul Alan McConnelee, Kevin Matthew Durocher, Scott Smith, Laura A. Principe
  • Patent number: 8828752
    Abstract: A light emitting diode (LED) comprises an n-type Group III-V semiconductor layer, an active layer adjacent to the n-type Group III-V semiconductor layer, and a p-type Group III-V semiconductor layer adjacent to the active layer. The active layer includes one or more V-pits. A portion of the p-type Group III-V semiconductor layer is in the V-pits. A p-type dopant injection layer provided during the formation of the p-type Group III-V layer aids in providing a predetermined concentration, distribution and/or uniformity of the p-type dopant in the V-pits.
    Type: Grant
    Filed: December 18, 2013
    Date of Patent: September 9, 2014
    Assignee: Manutius IP Inc.
    Inventor: Steve Ting
  • Patent number: 8822243
    Abstract: A light emitting device comprises a first layer of an n-type semiconductor material, a second layer of a p-type semiconductor material, and an active layer between the first layer and the second layer. A light coupling structure is disposed adjacent to one of the first layer and the second layer. In some cases, the light coupling structure is disposed adjacent to the first layer. An orifice formed in the light coupling structure extends to the first layer. An electrode formed in the orifice is in electrical communication with the first layer.
    Type: Grant
    Filed: January 14, 2014
    Date of Patent: September 2, 2014
    Assignee: Manutius IP Inc.
    Inventors: Li Yan, Chao-kun Lin, Chih-Wei Chuang
  • Patent number: 8822988
    Abstract: In at least some embodiments, a thin-film transistor (TFT) includes a gate electrode and a gate dielectric covering the gate dielectric. The TFT also includes a source electrode and a drain electrode adjacent the gate dielectric. The TFT also includes a bi-layer channel between the source electrode and the drain electrode, the bi-layer channel having a zinc indium oxide (ZIO) layer positioned adjacent the gate dielectric and a zinc tin oxide (ZTO) layer that covers the ZIO layer.
    Type: Grant
    Filed: March 31, 2009
    Date of Patent: September 2, 2014
    Assignee: Hewlett-Packard Development Company, L.P.
    Inventors: Vincent C. Korthuis, Randy Hoffman
  • Patent number: 8809203
    Abstract: It is an object to provide a method for manufacturing a semiconductor device that has a semiconductor element including a film in which mixing impurities is suppressed. It is another object to provide a method for manufacturing a semiconductor device with high yield. In a method for manufacturing a semiconductor device in which an insulating film is formed in contact with a semiconductor layer provided over a substrate having an insulating surface with use of a plasma CVD apparatus, after an inner wall of a reaction chamber of the plasma CVD apparatus is coated with a film that does not include an impurity to the insulating film, a substrate is introduced in the reaction chamber, and the insulating film is deposited over the substrate. As a result, an insulating film in which the amount of impurities is reduced can be formed.
    Type: Grant
    Filed: May 30, 2008
    Date of Patent: August 19, 2014
    Assignee: Semiconductor Energy Laboratory Co., Ltd.
    Inventors: Mitsuhiro Ichijo, Tetsuhiro Tanaka, Takashi Ohtsuki, Seiji Yasumoto, Kenichi Okazaki, Shunpei Yamazaki, Naoya Sakamoto
  • Patent number: 8810031
    Abstract: An electronic device having a stacked structure is provided. The electronic device includes a first electronic layer, a second electronic layer disposed on the first electronic layer, and at least a post. The first electronic layer has a first interface, and including a first substrate and a first device layer disposed on the first substrate. The first interface is located between the first substrate and the first device layer, and the first device layer has a surface opposite to the first interface. The post is arranged in the first device layer, and extending from the first interface to the surface of the first device layer.
    Type: Grant
    Filed: December 30, 2010
    Date of Patent: August 19, 2014
    Assignee: Industrial Technology Research Institute
    Inventors: Chi-Shih Chang, Ra-Min Tain, Shyi-Ching Liau, Wei-Chung Lo, Rong-Shen Lee
  • Patent number: 8796864
    Abstract: The semiconductor device according to the present invention has a planar semiconductor chip having projecting connection terminals provided on one surface thereof. A shelf is provided where a peripheral edge of a surface of the semiconductor chip opposite one surface thereof onto which connection terminals are provided is removed. This makes it possible to secure a larger volume of the fillet portion of the underfill, thereby helping improve the function of preventing the rising up of the excess underfill by providing a shelf in the semiconductor chip.
    Type: Grant
    Filed: June 14, 2013
    Date of Patent: August 5, 2014
    Assignee: Spansion LLC
    Inventors: Naomi Masuda, Koji Taya
  • Patent number: 8796769
    Abstract: A method including introducing a species into a substrate including semiconductor material; and translating linearly focused electromagnetic radiation across a surface of the substrate, the electromagnetic radiation being sufficient to thermally influence the species. An apparatus including an electromagnetic radiation source; a stage having dimensions suitable for accommodating a semiconductor substrate within a chamber; an optical element disposed between the electromagnetic radiation source and the stage to focus radiation from the electromagnetic radiation source into a line having a length determined by the diameter of a substrate to be placed on the stage; and a controller coupled to the electromagnetic radiation source including machine readable program instructions that allow the controller to control the depth into which a substrate is exposed to the radiation.
    Type: Grant
    Filed: September 14, 2012
    Date of Patent: August 5, 2014
    Assignee: Applied Matierials, Inc.
    Inventors: Dean C. Jennings, Amir Al-Bayati
  • Patent number: 8786000
    Abstract: A method of manufacturing a semiconductor device includes: forming a core insulating film that includes first openings, on a semiconductor substrate; forming cylindrical lower electrodes that cover sides of the first openings with a conductive film; forming a support film that covers at least an upper surface of the core insulating film between the lower electrodes; forming a mask film in which an outside of a region where at least the lower electrodes are formed is removed, by using the support film; and performing isotropic etching on the core insulating film so as to leave the core insulating film at a part of an area between the lower electrodes, after the mask film is formed.
    Type: Grant
    Filed: December 28, 2011
    Date of Patent: July 22, 2014
    Assignee: PS4 Luxco S.A.R.L.
    Inventor: Eiji Hasunuma