Patents by Inventor Abraham Ravid

Abraham Ravid has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20190244842
    Abstract: Apparatus and methods of measuring and controlling the gap between a susceptor assembly and a gas distribution assembly are described. Apparatus and methods for positional control and temperature control for wafer transfer purposes are also described.
    Type: Application
    Filed: April 18, 2019
    Publication date: August 8, 2019
    Inventors: Abraham Ravid, Kevin Griffin, Joseph Yudovsky, Kaushal Gangakhedkar, Dmitry A. Dzilno, Alex Minkovich
  • Patent number: 10312120
    Abstract: Apparatus and methods of measuring and controlling the gap between a susceptor assembly and a gas distribution assembly are described. Apparatus and methods for positional control and temperature control for wafer transfer purposes are also described.
    Type: Grant
    Filed: March 14, 2014
    Date of Patent: June 4, 2019
    Assignee: Applied Materials, Inc.
    Inventors: Abraham Ravid, Kevin Griffin, Joseph Yudovsky, Kaushal Gangakhedkar, Dmitry A. Dzilno, Alex Minkovich
  • Patent number: 10260855
    Abstract: An electroplating reactor includes an electro-plating solution in a bath, a ring cathode in the bath and located to contact a workpiece such that only the front side of the workpiece is immersed in the solution, plural anodes immersed in the bath below the ring cathode, and plural anode voltage sources coupled to the plural anodes; plural thickness sensors at spatially separate locations on the back side of the workpiece with feedback control to the anode voltage sources.
    Type: Grant
    Filed: October 29, 2013
    Date of Patent: April 16, 2019
    Assignee: Applied Materials, Inc.
    Inventors: Todd J. Egan, Edward W. Budiarto, Robert O. Miller, Abraham Ravid, Bridger E. Hoerner, Robert W. Batz, Jr., Daniel J. Woodruff
  • Publication number: 20190072497
    Abstract: A system for processing a substrate is provided. The system includes a process chamber including one or more sidewalls enclosing a processing region; and a substrate support. The system further includes a passageway connected to the process chamber; and a first particle detector disposed at a first location along the passageway. The first particle detector includes an energy source configured to emit a first beam; one or more optical devices configured to direct the first beam along one or more paths, where the one or more paths extend through at least a portion of the passageway. The first particle detector further includes a first energy detector disposed at a location other than on the one or more paths. The system further includes a controller configured to communicate with the first particle detector, wherein the controller is configured to identify a fault based on signals received from the first particle detector.
    Type: Application
    Filed: May 23, 2017
    Publication date: March 7, 2019
    Applicant: Applied Materials, Inc.
    Inventors: Todd EGAN, Mehdi VAEZ-IRAVANI, Samer BANNA, Kyle TANTIWONG, Gregory KIRK, Abraham RAVID, Yaoming SHEN
  • Patent number: 10196741
    Abstract: Apparatus and methods of dimension control and monitoring between a processes fixture and a susceptor, and position determination of wafers are described.
    Type: Grant
    Filed: August 28, 2014
    Date of Patent: February 5, 2019
    Assignee: Applied Materials, Inc.
    Inventors: Kevin Griffin, Abraham Ravid, Alex Minkovich, Somesh Khandelwal, Joseph Yudovsky, Todd Egan
  • Patent number: 9880233
    Abstract: A method and apparatus to determine a parameter of a metal-containing film are provided herein. In some embodiments, a method of determining a parameter of a metal-containing film may include generating a first magnetic field by flowing an alternating current through a coil disposed adjacent to and spaced apart from the metal-containing film, wherein the first magnetic field induces a second magnetic field proximate the metal-containing film; heating the metal-containing film from a first temperature to a second temperature; measuring a response of the first magnetic field to the second magnetic field as the metal-containing film is heated from the first temperature to the second temperature; and correlating the response with a rate of temperature change of the metal-containing film as the metal-containing film is heated from the first temperature to the second temperature to determine a parameter of the metal-containing film.
    Type: Grant
    Filed: April 27, 2011
    Date of Patent: January 30, 2018
    Assignee: APPLIED MATERIALS, INC.
    Inventor: Abraham Ravid
  • Publication number: 20170226655
    Abstract: A measurement tool for measuring an electrical parameter of a metal film deposited on a front side of a workpiece includes an electrical sensor connected to a workpiece contact point, an energy beam source with a beam impact location on the front side, a holder and a translation mechanism capable of translating the holder relative to the workpiece support, the beam source supported on the holder, and a computer programmed to sense a behavior of an electrical parameter sensed by the sensor.
    Type: Application
    Filed: April 24, 2017
    Publication date: August 10, 2017
    Applicant: Applied Materials, Inc.
    Inventors: Abraham Ravid, Dmitry A. Dzilno, Todd J. Egan, Robert O. Miller
  • Publication number: 20170140525
    Abstract: A polishing system includes a polishing station including a platen to support a polishing pad, a support to hold a substrate, an in-line metrology station to measure the substrate before or after polishing of a surface of the substrate in the polishing station, and a controller. The in-line metrology station includes a color line-scan camera, a white light source, a frame supporting the light source and the camera, and a motor to cause relative motion between the camera and the support along a second axis perpendicular to the first axis to cause the light source and the camera to scan across the substrate. The controller is configured to receive a color data from the camera, to generate a 2-dimensional color image from the color data, and to control polishing at the polishing station based on the color image.
    Type: Application
    Filed: November 16, 2015
    Publication date: May 18, 2017
    Inventors: Dominic J. Benvegnu, Robert D. Tolles, Boguslaw A. Swedek, Abraham Ravid
  • Patent number: 9631919
    Abstract: A measurement tool for measuring an electrical parameter of a metal film deposited on a front side of a workpiece includes an electrical sensor connected to a workpiece contact point, an energy beam source with a beam impact location on the front side, a holder and a translation mechanism capable of translating the holder relative to the workpiece support, the beam source supported on the holder, and a computer programmed to sense a behavior of an electrical parameter sensed by the sensor.
    Type: Grant
    Filed: October 29, 2013
    Date of Patent: April 25, 2017
    Assignee: Applied Materials, Inc.
    Inventors: Abraham Ravid, Dmitry A. Dzilno, Todd J. Egan, Robert O. Miller
  • Patent number: 9490154
    Abstract: Methods and systems for alignment of substrate-scale masks are described. The alignment methods presented may improve the uniformity and repeatability of processes which are impacted by the relative lateral position of a substrate-scale mask and a substrate. The methods involve measuring the “overhang” of the substrate at multiple locations around the periphery of the substrate-scale mask. Based on the measurements, the relative position of the substrate relative to the substrate-scale mask is modified by adjustment of the substrate and/or mask position. The adjustment of the relative position is made in one adjustment in embodiments. A feature of hardware and methods involves the capability of making measurements and adjustments while a substrate processing system is fully assembled and possibly under vacuum.
    Type: Grant
    Filed: January 15, 2015
    Date of Patent: November 8, 2016
    Assignee: Applied Materials, Inc.
    Inventors: Abraham Ravid, Todd Egan, Paul Connors, Sergey Starik, Ganesh Balasubramanian
  • Patent number: 9405287
    Abstract: An optical calibration method and apparatus for calibration of wafer positioning within a reactor chamber under process conditions employs an array of cameras in a lid of the chamber using images of the wafer edge to locate the wafer relative to the reference feature.
    Type: Grant
    Filed: July 22, 2015
    Date of Patent: August 2, 2016
    Assignee: APPLIED MATERIALS, INC.
    Inventors: Abraham Ravid, Todd J. Egan, Eran Weiss, Michael R. Rice, Izya Kremerman
  • Publication number: 20160211185
    Abstract: Methods and systems for alignment of substrate-scale masks are described. The alignment methods presented may improve the uniformity and repeatability of processes which are impacted by the relative lateral position of a substrate-scale mask and a substrate. The methods involve measuring the “overhang” of the substrate at multiple locations around the periphery of the substrate-scale mask. Based on the measurements, the relative position of the substrate relative to the substrate-scale mask is modified by adjustment of the substrate and/or mask position. The adjustment of the relative position is made in one adjustment in embodiments. A feature of hardware and methods involves the capability of making measurements and adjustments while a substrate processing system is fully assembled and possibly under vacuum.
    Type: Application
    Filed: January 15, 2015
    Publication date: July 21, 2016
    Applicant: APPLIED MATERIALS, INC.
    Inventors: Abraham Ravid, Todd Egan, Paul Connors, Sergey Starik, Ganesh Balasubramanian
  • Publication number: 20160027675
    Abstract: Apparatus and methods of measuring and controlling the gap between a susceptor assembly and a gas distribution assembly are described. Apparatus and methods for positional control and temperature control for wafer transfer purposes are also described.
    Type: Application
    Filed: March 14, 2014
    Publication date: January 28, 2016
    Inventors: Abraham RAVID, Kevin GRIFFIN, Joseph YUDOVSKY, Kaushal GANGAKHEDKAR, Dmitry A. DZILNO, Alex MINKOVICH
  • Publication number: 20150376782
    Abstract: Apparatus and methods of dimension control and monitoring between a processes fixture and a susceptor, and position determination of wafers are described.
    Type: Application
    Filed: August 28, 2014
    Publication date: December 31, 2015
    Inventors: Kevin Griffin, Abraham Ravid, Alex Minkovich, Somesh Khandelwal, Joseph Yudovsky, Todd Egan
  • Publication number: 20140367265
    Abstract: A measurement tool for measuring an electrical parameter of a metal film deposited on a front side of a workpiece includes an electrical sensor connected to a workpiece contact point, an energy beam source with a beam impact location on the front side, a holder and a translation mechanism capable of translating the holder relative to the workpiece support, the beam source supported on the holder, and a computer programmed to sense a behavior of an electrical parameter sensed by the sensor.
    Type: Application
    Filed: October 29, 2013
    Publication date: December 18, 2014
    Applicant: APPLIED MATERIALS, INC.
    Inventors: Abraham Ravid, Dmitry A. Dzilno, Todd J. Egan, Robert O. Miller
  • Publication number: 20140367267
    Abstract: An electroplating reactor includes an electro-plating solution in a bath, a ring cathode in the bath and located to contact a workpiece such that only the front side of the workpiece is immersed in the solution, plural anodes immersed in the bath below the ring cathode, and plural anode voltage sources coupled to the plural anodes; plural thickness sensors at spatially separate locations on the back side of the workpiece with feedback control to the anode voltage sources.
    Type: Application
    Filed: October 29, 2013
    Publication date: December 18, 2014
    Applicant: APPLIED MATERIALS, INC.
    Inventors: Todd J. Egan, Edward W. Budiarto, Robert O. Miller, Abraham Ravid, Bridger E. Hoerner, Robert W. Batz, JR., Daniel J. Woodruff
  • Patent number: 8698889
    Abstract: A metrology system has an elongate stationary camera pixel array facing a workpiece transit path of a robot with an field of view corresponding to a workpiece diameter and extending transverse to the transit path portion, and a stationary elongate light emitting array generally parallel to the pixel array. An image control processor causes the camera to capture successive image frames while the robot is moving the workpiece through the transit path.
    Type: Grant
    Filed: February 17, 2010
    Date of Patent: April 15, 2014
    Assignee: Applied Materials, Inc.
    Inventors: Abraham Ravid, Todd Egan, Karen Lingel, Mitchell DiSanto, Hari Kishore Ambal, Edward Budiarto
  • Patent number: 8639377
    Abstract: Methods of determining thickness and phase of a GST layer on a semiconductor substrate are described using intensity spectra within the infra-red range. In particular, techniques for using certain transmission at certain frequencies are disclosed for faster thickness and phase determination in an in-line or standalone metrology/monitoring system for CMP processes.
    Type: Grant
    Filed: November 7, 2008
    Date of Patent: January 28, 2014
    Assignee: Applied Materials, Inc.
    Inventors: Kun Xu, Feng Q Liu, Yuchun Wang, Abraham Ravid, Wen-Chiang Tu
  • Patent number: 8620064
    Abstract: A method is provided for imaging a workpiece by capturing successive frames of an elongate stationary field of view transverse to a workpiece transit path of a robot, while the workpiece is transported by the robot. The robot transit path is illuminated with an elongate illumination pattern transverse to the transit path to obtain a workpiece image of successive frames. Motion-induced image distortion is prevented or reduced adjusting the camera frame rate in real time in proportion to changes in robot velocity profile of the workpiece along the transit path.
    Type: Grant
    Filed: February 17, 2010
    Date of Patent: December 31, 2013
    Assignee: Applied Materials, Inc.
    Inventors: Abraham Ravid, Todd Egan, Karen Lingel
  • Patent number: 8452077
    Abstract: A method is provided for imaging a workpiece by capturing successive frames of an elongate stationary field of view transverse to a workpiece transit path of a robot, while the workpiece is transported by the robot. The robot transit path is illuminated with an elongate illumination pattern transverse to the transit path to obtain a workpiece image of successive frames. Motion-induced image distortion is corrected by computing respective correct locations of respective ones of the frames along the transit path.
    Type: Grant
    Filed: February 17, 2010
    Date of Patent: May 28, 2013
    Assignee: Applied Materials, Inc.
    Inventors: Abraham Ravid, Todd Egan, Karen Lingel