Patents by Inventor Akihiro Furuta

Akihiro Furuta has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 5922270
    Abstract: A process for producing a hollow article in an assembly comprising first and second mold members movable relative to each other between a closed position in which an inner surface of the assembly defines a cavity and an open position. The cavity is shaped to define a corresponding configuration to the article. According to this process, a charge containing at least one molten thermoplastic resin is supplied at the first and/or second mold member while the mold members are not in the closed position. The first mold member is moved relative to the second mold member into the closed position so as to define the cavity, and a first clamping force F1 is applied to the first and second mold members. The charge is then compressed within the mold cavity under the first clamping force F1. Thereafter, the clamping force is reduced from the first clamping force F1 to a second clamping force F2 before the molten thermoplastic resin in the mold cavity has completely solidified.
    Type: Grant
    Filed: February 20, 1997
    Date of Patent: July 13, 1999
    Assignee: Sumitomo Chemical Co., Ltd.
    Inventors: Masahito Matsumoto, Nobuhiro Usui, Satoru Funakoshi, Akihiro Furuta
  • Patent number: 5862242
    Abstract: A speaker has a diaphragm of which plane shape as seen from a vibrating direction has a major axis and a minor axis, a band-shaped edge connected to the outer circumference of the diaphragm for holding so that the diaphragm may be free to vibrate, and a frame for holding the outer circumference of the edge, wherein a viscoelastic member is affixed to part of the edge and/or diaphragm.
    Type: Grant
    Filed: September 3, 1996
    Date of Patent: January 19, 1999
    Assignee: Matsushita Electric Industrial Co., Ltd.
    Inventors: Hiroyuki Takewa, Akihiro Furuta, Kazue Satoh, Mikio Iwasa, Kuniaki Sakai
  • Patent number: 5664024
    Abstract: The loudspeaker of the invention includes: a frame; a diaphragm, a planar shape thereof being non-axisymmetric having a larger diameter and a smaller diameter when the diaphragm is viewed from a vibration direction thereof; a band-shaped edge portion provided around an outer periphery of the diaphragm, an outer periphery of the edge portion being connected to the frame and an inner periphery of the edge portion being connected to the diaphragm; a cylindrical voice coil bobbin in a non-axisymmetric shape having a larger diameter and a smaller diameter which includes a pair of opposed faces parallel to each other in a larger diameter direction, one end portion of the voice coil bobbin being connected to the diaphragm; a voice coil wound around the voice coil bobbin; a plurality of voice coil bobbin reinforcing members in a plate shape which are bridged between the pair of opposed faces parallel to each other of the voice coil bobbin; and a plurality of magnetic circuits having a gap for applying magnetic fluxes
    Type: Grant
    Filed: April 24, 1995
    Date of Patent: September 2, 1997
    Assignee: Matsushita Electric Industrial Co., Ltd.
    Inventors: Akihiro Furuta, Kazue Satoh, Hiroyuki Takewa, Mikio Iwasa, Shinya Mizone, Kuniaki Sakai
  • Patent number: 5354644
    Abstract: A photoresist composition which includes a sensitizing compound, a resin and, as a light absorber, a styryl compound of the formula: ##STR1## wherein R.sub.1, R.sub.2 and R.sub.11 are the same or different and a hydrogen atom, an optionally substituted alkyl, alkenyl or aralkyl group or R.sub.1 and R.sub.2 may form a ring together with the nitrogen atom to which they are bonded, which ring may include at least one hetero atom in addition to said nitrogen atom; R.sub.10 is an optionally substituted alkylene group; R.sub.3 is --OH, --OCOR.sub.5 or --OSi(R.sub.5).sub.3 in which R.sup.5 is an alkyl group; R.sub.12 and R.sub.13 are independently a hydrogen atom, an optionally substituted lower alkyl or alkoxy group, an amide group or a halogen atom; X, Y, W and Z are the same or different and an electron attracting group, and n is a number of 2-15.
    Type: Grant
    Filed: September 1, 1992
    Date of Patent: October 11, 1994
    Assignee: Sumitomo Chemical Company, Limited
    Inventors: Takanori Yamamoto, Shinji Konishi, Ryotaro Hanawa, Akihiro Furuta, Takeshi Hioki, Jun Tomioka
  • Patent number: 4863829
    Abstract: A positive type photoresist composition comprising a novolak resin and O-quinone diazide compound, the novolak resin being one which is obtained by the addition condensation reaction of a phenol and formaldehyde which is performed in one stage by using as a catalyst an organic acid salt of a divalent metal which is more electropositive than hydrogen, or in two stages by using an acid catalyst in the subsequent stage, the phenol being at least one compound represented by the formula ##STR1## wherein R is hydrogen or an alkyl group of carbon number 1 to 4, the compound being such that the average carbon number in the substituent per one phenol nucelus is 0.5 to 1.5 and the ones with the substituent at the ortho- or para-position with respect to the hydroxyl group account for less than 50 mol %, is disclosed. The positive type photoresist composition of the invention has an improved resolving power, i.e., .gamma.-value.
    Type: Grant
    Filed: March 29, 1988
    Date of Patent: September 5, 1989
    Assignee: Sumitomo Chemical Company, Limited
    Inventors: Akihiro Furuta, Makoto Hanabata, Seimei Yasui, Osamu Hiroaki, Naoyoshi Jinno
  • Patent number: 4812551
    Abstract: A novolak resin for a positive photoresist is provided herein, which resin is produced by the addition condensation reaction of a phenol with formaldehyde. This novolak resin has improved heat resistant and sensitivity properties and the thickness retention of the novolak resins are very high.
    Type: Grant
    Filed: November 9, 1987
    Date of Patent: March 14, 1989
    Assignee: Sumitomo Chemical Company, Limited
    Inventors: Fumio Oi, Haruyoshi Osaki, Akihiro Furuta, Yukikazu Uemura, Takao Ninomiya, Yasunori Uetani, Makoto Hanabata
  • Patent number: 4696886
    Abstract: A positive type photoresist composition comprising an m-hydroxy-.alpha.-methylstyrene polymer and as a photo-sensitizer a quinonediazide compound is disclosed. A positive type photoresist composition comprising an m-hydroxy-.alpha.-methylstyrene polymer, a novolak resin, and as a photo-sensitizer a quinonediazide compound, is also disclosed.
    Type: Grant
    Filed: June 24, 1985
    Date of Patent: September 29, 1987
    Assignee: Sumitomo Chemical Company, Limited
    Inventors: Makoto Hanabata, Akihiro Furuta, Seimei Yasui, Kunihiko Tanaka
  • Patent number: 4309513
    Abstract: A resin composition based on a polyphenylene ether comprising 99 to 1 part by weight of a polyphenylene ether copolymer derived from 99.5 to 85 mole-% of 2,6-dimethylphenol and 0.5 to 15 mole-% of 3-methyl-6-tert-butylphenol and 1 to 99 parts by weight of a styrene polymer (making up 100 parts by weight in total); and said resin composition further containing 0.1 to 100 parts by weight of a rubber-like polymer for 100 parts by weight of the said resin composition. These resin compositions have excellent mechanical strength, heat resistance, and moldability and are suitable as molding resin materials in practical use fields.
    Type: Grant
    Filed: January 13, 1981
    Date of Patent: January 5, 1982
    Assignee: Sumitomo Chemical Company, Limited
    Inventors: Katsuji Ueno, Haruo Inoue, Akihiro Furuta
  • Patent number: 4302528
    Abstract: An improved process for producing a photo-curable composite material using a liquid photo-curable resin, which comprises holding a liquid photo-curable resin with a screen material between two films, at least one of the films having photo-transmitting properties, and passing the films holding the liquid photo-curable resin and the screen material through a gap (e.g. between two rollers). The process of the present invention can produce photo-curable composite materials useful for preparing various stencils for screen printing, textile printing, or the like at a low cost and with less production of defects.
    Type: Grant
    Filed: July 11, 1979
    Date of Patent: November 24, 1981
    Assignee: Sumitomo Chemical Company, Limited
    Inventors: Takezo Sano, Haruo Inoue, Akihiro Furuta
  • Patent number: 4288529
    Abstract: A photo-curable composite material used for preparing various stencils for screen printing, textile printing or the like, which comprises a flat, flexible and photo-transmitting thin film (A); a flat and flexible film (B); a liquid photo-curable resin and a flat screen material, said films (A) and (B) being air-tightly bonded to each other at the peripheral portion thereof to form a flat inner space therein, said liquid resin being filled in said inner space to form a layer and said screen material also being placed in the inner space substantially in parallel with the inner walls of the films (A) and (B).
    Type: Grant
    Filed: January 25, 1980
    Date of Patent: September 8, 1981
    Assignee: Sumitomo Chemical Company Limited
    Inventors: Takezo Sano, Haruo Inoue, Akihiro Furuta
  • Patent number: 4247621
    Abstract: An original pattern plate obtained by the use of a photo-sensitive resin composition comprising:(A) an unsaturated polyester having an acid value of from 10 to 40 and having not less than 50% by mole of unsaturated acids in the acid component,(B) a photo-polymerizable, ethylenically unsaturated compound which essentially contains a compound having a photo-polymerizable, ethylenically unsaturated linkage and at least one hydroxyl group,(C) a melamine compound of the formula:(C.sub.3 H.sub.6-(m+n) N.sub.6)(CH.sub.2 OH).sub.m (CH.sub.2 OR).sub.nwherein R is an alkyl group having 1 to 4 carbon atoms, m is from 0 to 6, n is from 0 to 6 and m+n is from 1.5 to 6, or its condensate having an average condensation degree of not more than 4,(D) a photo-polymerization initiator, and(E) a thermal polymerization inhibitor,the weight proportion of the components (A), (B) and (C) satisfying the relationships of the following equations: 1/5.ltoreq.B/(A+B).ltoreq.3/5 and 1/50.ltoreq.C/(A+B+C).ltoreq.
    Type: Grant
    Filed: March 26, 1976
    Date of Patent: January 27, 1981
    Assignee: Sumitomo Chemical Company, Limited
    Inventors: Takezo Sano, Tadanori Inoue, Yukikazu Uemura, Akihiro Furuta
  • Patent number: 4216287
    Abstract: A photo-curable composite material used for preparing various stencils for screen printing, textile printing or the like, which comprises a flat, flexible and photo-transmitting thin film (A); a flat and flexible film (B); a liquid photo-curable resin and a flat screen material, said films (A) and (B) being air-tightly bonded to each other at the peripheral portion thereof to form a flat inner space therein, said liquid resin being filled in said inner space to form a layer and said screen material also being placed in the inner space substantially in parallel with the inner walls of the films (A) and (B).
    Type: Grant
    Filed: March 22, 1978
    Date of Patent: August 5, 1980
    Assignee: Sumitomo Chemical Company, Limited
    Inventors: Takezo Sano, Haruo Inoue, Akihiro Furuta
  • Patent number: 4140605
    Abstract: A crosslinkable composition comprising:(I) a melamine compound of the formula:(C.sub.3 H.sub.6-(m+n) N.sub.6) (CH.sub.2 OH.sub.m (CH.sub.2 OR).sub.nwherein R is an alkyl group having 1 to 4 carbon atoms, m is from 0 to 6, n is from 0 to 6 and m + n is from 1.5 to 6, or its condensate having an average condensation degree of not more than 4;(II) a compound having at least two functional groups condensable with the component (I) and an average molecular weight of not less than 1,000;(III) a compound having an ethylenically un-unsaturated linkage photopolymerizable by actinic light;(IV) a photopolymerization initiator; and(V) a thermal polymerization inhibitor.
    Type: Grant
    Filed: April 21, 1977
    Date of Patent: February 20, 1979
    Assignee: Sumitomo Chemical Company, Limited
    Inventors: Takezo Sano, Tadanori Inoue, Yukikazu Uemura, Akihiro Furuta
  • Patent number: 3960685
    Abstract: A photosensitive resin composition comprising pullulan, which is a polymer having repetition units of maltotriose and is represented by the formula, ##SPC1##Wherein n is an integer of 20 to 8,000, and/or a derivative thereof, a photopolymerizable monomer, a photosensitizer and a thermal polymerization inhibitor, or comprising the said pullulan, which has been incorporated with a photoactive reaction group to provide photosensitivity, and a photosensitizer, is a novel composition low in viscosity which can be prepared by use of water and can be formed into a photosensitive plate capable of being developed with water to give a clear image. Since the pullulan in said composition has no toxicity, the waste water formed at the time of development of said photosensitive plate can be treated with ease.
    Type: Grant
    Filed: November 5, 1974
    Date of Patent: June 1, 1976
    Assignees: Sumitomo Chemical Company, Limited, Hayashibara Biochemical Laboratories, Incorporated
    Inventors: Takezo Sano, Yukikazu Uemura, Akihiro Furuta