Patents by Inventor Akihiro Koyama

Akihiro Koyama has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 10927034
    Abstract: A glass substrate that achieves a high strain point while having a low devitrification temperature; and a method for producing the glass substrate. This glass substrate for a display is made of a glass comprising SiO2 and Al2O3, comprising 0% or more to less than 4% B2O3 in mass %, and substantially devoiding Sb2O3, wherein 3×BaO/(MgO+CaO+SrO) is 5 or less, MgO/(CaO+SrO) is 0.36 or greater, the devitrification temperature is 1235° C. or lower, and the strain point is 700° C. or higher. The method comprises: melting, by using at least direct electrical heating, a glass material prepared to have a predetermined composition; forming, into a flat glass sheet, the molten glass that has been melted in the melting step; and annealing the flat glass sheet, wherein a condition for cooling the flat glass sheet is controlled so as to reduce the heat shrinkage rate of the flat glass sheet.
    Type: Grant
    Filed: June 28, 2016
    Date of Patent: February 23, 2021
    Assignee: AvanStrate Inc.
    Inventors: Manabu Ichikawa, Akihiro Koyama
  • Publication number: 20200392429
    Abstract: The present invention relates to a fabric treatment composition capable of enhancing cleaning properties of a soil during cleaning through treatment of a fabric to be treated and a method for treating a fabric with the fabric treatment composition. The fabric treatment composition is a fabric treatment composition containing a hydroxyalkyl cellulose (A) in which a hydroxyalkyl cellulose is bound to at least one selected from a cationic group and a hydrophobic group including a hydrocarbon group having 4 or more carbon atoms, the content of a surfactant (B) being 3.5 parts by mass or less relative to 1 part by mass of the hydroxyalkyl cellulose (A).
    Type: Application
    Filed: December 5, 2018
    Publication date: December 17, 2020
    Applicant: KAO CORPORATION
    Inventors: Yukiko YAMAWAKI, Takanori SAITO, Yoichiro IMORI, Akihiro KOYAMA
  • Publication number: 20200385492
    Abstract: The present invention relates to a polysaccharide derivative which is able to not only enhance cleaning properties of clothing, etc. but also suppress resoiling due to powder soil during washing. The polysaccharide derivative is a polysaccharide derivative having a cationic group and a hydrocarbon group (R) having 2 or more carbon atoms, wherein the hydrocarbon group (R) is bound to a group resulting from eliminating a hydrogen atom from a hydroxy group of a hydroxyalkylated polysaccharide, directly or via a hydrocarbon group having an oxygen atom; the hydroxyalkylated polysaccharide is a hydroxyethylated polysaccharide or a hydroxypropylated polysaccharide; and the hydroxyalkylated polysaccharide has a weight average molecular weight of 10,000 or more and 740,000 or less.
    Type: Application
    Filed: December 5, 2018
    Publication date: December 10, 2020
    Applicant: KAO CORPORATION
    Inventors: Akihiro KOYAMA, Yoichiro IMORI, Takanori SAITO, Akifumi KOBAYASHI, Takahiro YANO
  • Publication number: 20200369985
    Abstract: The present invention relates a composition capable of enhancing cleaning properties of a soil during cleaning by treating an object. The composition is a composition containing a modified hydroxyalkyl cellulose and at least one selected from an anionic surfactant and a nonionic surfactant, the modified hydroxyalkyl cellulose being one in which a cationic group and a hydrophobic group represented by the formula (1) are bound to a group resulting from eliminating a hydrogen atom from a hydroxy group of a hydroxyalkyl cellulose. *—Z—R1??(1) wherein, Z represents a single bond or a hydrocarbon group having an oxygen atom; R1 represents a hydrocarbon group having 2 or more carbon atoms; and * represents a binding position to a group resulting from eliminating a hydrogen atom from a hydroxy group of a hydroxyalkyl cellulose.
    Type: Application
    Filed: December 5, 2018
    Publication date: November 26, 2020
    Applicant: KAO CORPORATION
    Inventors: Takanori SAITO, Yoichiro IMORI, Akihiro KOYAMA, Yukiko YAMAWAKI
  • Publication number: 20200299615
    Abstract: The present invention relates to a soil release agent capable of enhancing cleaning properties for removing a soil during cleaning through treatment of an object, and a soil release composition containing the soil release agent. The soil release agent is a soil release agent including a modified hydroxyalkyl cellulose in which a hydroxyalkyl cellulose is bound to at least one selected from a cationic group and a hydrophobic group including a hydrocarbon group having 4 or more carbon atoms.
    Type: Application
    Filed: December 5, 2018
    Publication date: September 24, 2020
    Applicant: KAO CORPORATION
    Inventors: Takanori SAITO, Yoichiro IMORI, Akihiro KOYAMA, Yukiko YAMAWAKI
  • Patent number: 10714571
    Abstract: A semiconductor layer having n-type is made of silicon carbide, and has an element region and a terminal region. A plurality of field limiting ring regions having p-type are provided in the terminal region of the semiconductor layer, and are arranged spaced apart from one another. A field insulating film is provided in the terminal region of the semiconductor layer, and is in contact with the field limiting ring regions and the semiconductor layer. Each of the field limiting regions includes a halogen-containing field limiting ring part in contact with the field insulating film and containing halogen family atoms.
    Type: Grant
    Filed: May 19, 2017
    Date of Patent: July 14, 2020
    Assignee: MITSUBISHI ELECTRIC CORPORATION
    Inventors: Akihiro Koyama, Kohei Ebihara
  • Patent number: 10690549
    Abstract: A mounting structure of a temperature sensor is adapted to mount a temperature sensor adapted to measure a temperature of a coil to a stator constituted by arranging a plurality of sets of a stator core, the coil wound around the stator core, and an insulator ensuring insulation between the stator core and the coil. The mounting structure of a temperature sensor comprises a holder fixing portion fixed to the insulator, and a sensor holding portion formed integrally with the holder fixing portion and holding the temperature sensor on a coil end portion of the coil. In the sensor holding portion, a storage groove adapted to store the temperature sensor is formed, and at a groove bottom of the storage groove, a sensor pressing portion adapted to press the temperature sensor to the coil end portion is formed.
    Type: Grant
    Filed: May 18, 2016
    Date of Patent: June 23, 2020
    Assignees: JATCO LTD, NISSAN MOTOR CO., LTD.
    Inventors: Akihiro Koyama, Masaomi Morishita, Yasushi Arakawa
  • Patent number: 10381793
    Abstract: A ground connection structure is a structure for collectively connecting, to a body of a vehicle, a plurality of grounding wires which are connected to respective electrical components installed in the vehicle. The ground connection structure includes: a connection box to which the plurality of grounding wires are connected; a grounding terminal part connected to the vehicle in an electrically conducting state; and an electrically conducting connection part having one end connected to the connection box and the other end connected to the grounding terminal part, the electrically conducting connection part connecting the connection box and the grounding terminal part in an electrically conducting manner. The electrically conducting connection part is made of a low-inductance material having low inductance.
    Type: Grant
    Filed: July 18, 2014
    Date of Patent: August 13, 2019
    Assignee: YAZAKI CORPORATION
    Inventors: Yukinari Naganishi, Akira Baba, Takashi Odajima, Hirohito Habara, Hideaki Saitoh, Takao Ota, Akihiro Koyama, Atsushi Nakata
  • Publication number: 20190237548
    Abstract: A semiconductor layer having n-type is made of silicon carbide, and has an element region and a terminal region. A plurality of field limiting ring regions having p-type are provided in the terminal region of the semiconductor layer, and are arranged spaced apart from one another. A field insulating film is provided in the terminal region of the semiconductor layer, and is in contact with the field limiting ring regions and the semiconductor layer. Each of the field limiting regions includes a halogen-containing field limiting ring part in contact with the field insulating film and containing halogen family atoms.
    Type: Application
    Filed: May 19, 2017
    Publication date: August 1, 2019
    Applicant: Mitsubishi Electric Corporation
    Inventors: Akihiro KOYAMA, Kohei EBIHARA
  • Patent number: 10020367
    Abstract: An object of the present invention is to provide a silicon carbide semiconductor device with which the electric field at the time of switching is relaxed and the element withstand voltage can be enhanced. The distance between the outer peripheral end of a second surface electrode and the inner peripheral end of a field insulation film is smaller than the distance between an outer peripheral end of the second surface electrode and an inner peripheral end of the field insulation film in the case where the electric field strength applied to the outer peripheral lower end of the second surface electrode is calculated so as to become equal to the smallest dielectric breakdown strength among the dielectric breakdown strength of the field insulation film and the dielectric breakdown strength of the surface protective film at the time of switching when the value of dV/dt is greater than or equal to 10 kV/?s.
    Type: Grant
    Filed: December 15, 2014
    Date of Patent: July 10, 2018
    Assignee: Mitsubishi Electric Corporation
    Inventors: Kohei Ebihara, Akihiro Koyama, Hidenori Koketsu, Akemi Nagae, Kotaro Kawahara, Hiroshi Watanabe, Kensuke Taguchi, Shiro Hino
  • Publication number: 20180186684
    Abstract: A glass substrate that achieves a high strain point while having a low devitrification temperature; and a method for producing the glass substrate. This glass substrate for a display is made of a glass comprising SiO2 and Al2O3, comprising 0% or more to less than 4% B2O3 in mass %, and substantially devoiding Sb2O3, wherein 3×BaO/(MgO+CaO+SrO) is 5 or less, MgO/(CaO+SrO) is 0.36 or greater, the devitrification temperature is 1235° C. or lower, and the strain point is 700° C. or higher. The method comprises: melting, by using at least direct electrical heating, a glass material prepared to have a predetermined composition; forming, into a flat glass sheet, the molten glass that has been melted in the melting step; and annealing the flat glass sheet, wherein a condition for cooling the flat glass sheet is controlled so as to reduce the heat shrinkage rate of the flat glass sheet.
    Type: Application
    Filed: June 28, 2016
    Publication date: July 5, 2018
    Applicant: AvanStrate Inc.
    Inventors: Manabu ICHIKAWA, Akihiro KOYAMA
  • Publication number: 20180156669
    Abstract: A mounting structure of a temperature sensor is adapted to mount a temperature sensor adapted to measure a temperature of a coil to a stator constituted by arranging a plurality of sets of a stator core, the coil wound around the stator core, and an insulator ensuring insulation between the stator core and the coil. The mounting structure of a temperature sensor comprises a holder fixing portion fixed to the insulator, and a sensor holding portion formed integrally with the holder fixing portion and holding the temperature sensor on a coil end portion of the coil. In the sensor holding portion, a storage groove adapted to store the temperature sensor is formed, and at a groove bottom of the storage groove, a sensor pressing portion adapted to press the temperature sensor to the coil end portion is formed.
    Type: Application
    Filed: May 18, 2016
    Publication date: June 7, 2018
    Applicants: JATCO Ltd, NISSAN MOTOR CO., LTD.
    Inventors: Akihiro KOYAMA, Masaomi MORISHITA, Yasushi ARAKAWA
  • Patent number: 9874596
    Abstract: The present invention provides a method for manufacturing silicon carbide semiconductor apparatus including a testing step of testing a PN diode for the presence or absence of stacking faults in a relatively short time and an energization test apparatus. The present invention sets the temperature of a bipolar semiconductor element at 150° C. or higher and 230° C. or lower, causes a forward current having a current density of 120 [A/cm2] or more and 400 [A/cm2] or less to continuously flow through the bipolar semiconductor element, calculates, in a case where a forward resistance of the bipolar semiconductor element through which the forward current flows reaches a saturation state, the degree of change in the forward resistance, and determines whether the calculated degree of change is smaller than a threshold value.
    Type: Grant
    Filed: March 10, 2014
    Date of Patent: January 23, 2018
    Assignee: MITSUBISHI ELECTRIC CORPORATION
    Inventors: Shoyu Watanabe, Akihiro Koyama, Shigehisa Yamamoto, Yukiyasu Nakao, Kazuya Konishi
  • Publication number: 20170221998
    Abstract: An object of the present invention is to provide a silicon carbide semiconductor device with which the electric field at the time of switching is relaxed and the element withstand voltage can be enhanced. The distance between the outer peripheral end of a second surface electrode and the inner peripheral end of a field insulation film is smaller than the distance between an outer peripheral end of the second surface electrode and an inner peripheral end of the field insulation film in the case where the electric field strength applied to the outer peripheral lower end of the second surface electrode is calculated so as to become equal to the smallest dielectric breakdown strength among the dielectric breakdown strength of the field insulation film and the dielectric breakdown strength of the surface protective film at the time of switching when the value of dV/dt is greater than or equal to 10 kV/?s.
    Type: Application
    Filed: December 15, 2014
    Publication date: August 3, 2017
    Applicant: Mitsubishi Electric Corporation
    Inventors: Kohei EBIHARA, Akihiro KOYAMA, Hidenori KOKETSU, Akemi NAGAE, Kotaro KAWAHARA, Hiroshi WATANABE, Kensuke TAGUCHI, Shiro HINO
  • Patent number: 9676933
    Abstract: Regarding a durability test of a moisture-curing composition, it is difficult to both suppress foaming in the inside of a cured product and to stably maintain the physical properties of a cured product. A moisture-curing composition containing the components (A) to (D), the moisture-curing composition containing 0.5 to 5.0 parts by mass of the component (C) relative to 100 parts by mass of the component (A): Component (A): an oligomer which has a polymer of (meth)acrylic monomers as a main chain and which has a hydrolyzable silyl group in the molecule Component (B): specific polydialkylsiloxane Component (C): silicate Component (D): a curing catalyst.
    Type: Grant
    Filed: July 7, 2014
    Date of Patent: June 13, 2017
    Assignee: Three Bond Fine Chemical Co., Ltd.
    Inventors: Yosuke Watanabe, Hiroki Sadanaga, Akihiro Koyama
  • Patent number: 9580352
    Abstract: A substrate for p-Si TFT flat panel displays made of a glass having a high low-temperature-viscosity characteristic temperature and manufactured while avoiding erosion/wear of a melting tank during melting through direct electrical heating. The glass substrate comprises 52-78 mass % of SiO2, 3-25 mass % of Al2O3, 3-15 mass % of B2O3, 3-20 mass % of RO, wherein RO is total amount of MgO, CaO, SrO, and BaO, 0.01-0.8 mass % of R2O, wherein R2O is total amount of Li2O, Na2O, and K2O, and 0-0.3 mass % of Sb2O3, and substantially does not comprise As2O3, wherein the mass ratio CaO/RO is equal to or greater than 0.65, the mass ratio (SiO2+Al2O3)/B2O3 is in a range of 7-30, and the mass ratio (SiO2+Al2O3)/RO is equal to or greater than 5. A related method involves melting glass raw materials blended to provide the glass composition; a forming step of forming the molten glass into a flat-plate glass; and an annealing step of annealing the flat-plate glass.
    Type: Grant
    Filed: April 14, 2015
    Date of Patent: February 28, 2017
    Assignee: AvanStrate Inc.
    Inventors: Akihiro Koyama, Satoshi Ami, Manabu Ichikawa
  • Patent number: 9469564
    Abstract: A flat panel display glass substrate according to the present invention includes a glass comprising, as expressed in mol %, 55-80% SiO2, 3-20% Al2O3, 3-15% B2O3, 3-25% RO (the total amount of MgO, CaO, SrO, and BaO), and substantially no As2O3, and Sb2O3. The devitrification temperature of the glass is 1250° C. or less. The glass substrate has a heat shrinkage rate of 75 ppm or less. The heat shrinkage rate is calculated from the amount of shrinkage of the glass substrate measured after a heat treatment which is performed at a temperature rising and falling rate of 10° C./min and at 550° C. for 2 hours by the heat shrinkage rate (ppm)={the amount of shrinkage of the glass substrate after the heat treatment/the length of the glass substrate before the heat treatment}×106.
    Type: Grant
    Filed: May 13, 2014
    Date of Patent: October 18, 2016
    Assignee: AvanStrate Inc.
    Inventors: Akihiro Koyama, Satoshi Ami, Manabu Ichikawa
  • Patent number: 9434644
    Abstract: The disclosed cover glass is produced by etching a glass substrate that has been formed by a down-drawing process, and chemically strengthening the glass substrate to provide the glass substrate with a compressive-stress layer on the principal surfaces thereof. The glass substrate contains, as components thereof, 50% to 70% by mass of SiO2, 5% to 20% by mass of Al2O3, 6% to 30% by mass of Na2O, and 0% to less than 8% by mass of Li2O. The glass substrate may also contain 0% to 2.6% by mass of CaO, if necessary. The glass substrate has an etching characteristic in which the etching rate is at least 3.7 ?m/minute in an etching environment having a temperature of 22° C. and containing hydrogen fluoride with a concentration of 10% by mass.
    Type: Grant
    Filed: September 28, 2011
    Date of Patent: September 6, 2016
    Assignees: AVANSTRATE INC., HOYA CORPORATION
    Inventors: Akihiro Koyama, Mikiko Morishita, Satoshi Ami, Kazuaki Hashimoto, Tetsuo Takano
  • Publication number: 20160160035
    Abstract: In durability tests of a moisture-curing composition, it is difficult to both suppress foaming inside of the cured product and to stably maintain the physical properties of the cured products. [Solution] This moisture-curing composition contains components (A)-(D), and contains 0.5-5.0 parts by mass of component (C) per 100 parts by mass of component (A).
    Type: Application
    Filed: July 7, 2014
    Publication date: June 9, 2016
    Applicant: Three Bond Fine Chemical Co., Ltd.
    Inventors: Yosuke WATANABE, Hiroki SADANAGA, Akihiro KOYAMA
  • Patent number: 9321671
    Abstract: A glass substrate for p-Si TFT flat panel displays that is composed of a glass comprising 52-78 mass % of SiO2, 3-25 mass % of Al2O3, 3-15 mass % of B2O3, 3-25 mass % of RO, wherein RO is total amount of MgO, CaO, SrO, and BaO, 0.01-1 mass % of Fe2O3, and 0-0.3 mass % of Sb2O3, and substantially not comprising As2O3, the glass having a mass ratio (SiO2+Al2O3)/B2O3 in a range of 7-30 and a mass ratio (SiO2+Al2O3)/RO equal to or greater than 6. A method for manufacturing a glass substrate involves: a melting step of obtaining a molten glass by melting, by employing at least direct electrical heating, glass raw materials blended so as to provide the aforementioned glass composition; a forming step of forming the molten glass into a flat-plate glass; and an annealing step of annealing the flat-plate glass.
    Type: Grant
    Filed: May 15, 2014
    Date of Patent: April 26, 2016
    Assignee: AvanStrate Inc.
    Inventors: Akihiro Koyama, Satoshi Ami, Manabu Ichikawa