Patents by Inventor Akihiro Shimomura

Akihiro Shimomura has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 10619255
    Abstract: Provided are an anode for alkaline water electrolysis that can achieve a low overpotential at low cost, and a method for producing the anode for alkaline water electrolysis. An anode for alkaline water electrolysis having electrode catalyst layers 2, 3 composed of a first catalyst component having either a nickel-cobalt spinel oxide or a lanthanide-nickel-cobalt perovskite oxide and a second catalyst component having at least one of iridium oxide and ruthenium oxide formed on the surface of a conductive substrate 1 composed of nickel or a nickel-based alloy, and a method for producing the anode for alkaline water electrolysis.
    Type: Grant
    Filed: April 5, 2017
    Date of Patent: April 14, 2020
    Assignees: DE NORA PERMELEC LTD, KAWASAKI JUKOGYO KABUSHIKI KAISHA
    Inventors: Akihiro Kato, Fumiya Tsujii, Yuji Kamei, Ikuo Shimomura, Ikuo Nagashima
  • Publication number: 20190074273
    Abstract: A source electrode can be patterned well in response to the densification of a semiconductor device. A first MOS transistor element is formed in a first element region and a second MOS transistor element is formed in a second element region. A first source electrode is arranged so as to straddle a first gate electrode and cover a first source layer located on both one side and the other side in a gate length direction with the first gate electrode interposed. A second source electrode is arranged so as to straddle a second gate electrode and cover a second source layer located on both one side and the other side in the gate length direction with the second gate electrode interposed.
    Type: Application
    Filed: July 12, 2018
    Publication date: March 7, 2019
    Inventors: Wataru SUMIDA, Akihiro SHIMOMURA
  • Patent number: 10170556
    Abstract: A semiconductor device manufacturing method includes preparing a semiconductor substrate of a first conductivity type, forming a semiconductor layer of the first conductivity type over a main surface of the semiconductor substrate, forming a plurality of first ditches in an upper surface portion of the semiconductor layer such that the first ditches are arranged in a first direction extending along an upper surface of the semiconductor substrate, forming a plurality of second ditches in bottom surface portions of each of the first ditches such that the second ditches are arranged in a second direction perpendicular to the first direction, and covering a side wall of each of the first ditches with a first insulating film and a side wall and a bottom surface of each of the second ditches with a second insulating film thicker than the first insulating film.
    Type: Grant
    Filed: October 30, 2017
    Date of Patent: January 1, 2019
    Assignee: RENESAS ELECTRONICS CORPORATION
    Inventors: Wataru Sumida, Akihiro Shimomura
  • Publication number: 20180047811
    Abstract: A semiconductor device manufacturing method includes preparing a semiconductor substrate of a first conductivity type, forming a semiconductor layer of the first conductivity type over a main surface of the semiconductor substrate, forming a plurality of first ditches in an upper surface portion of the semiconductor layer such that the first ditches are arranged in a first direction extending along an upper surface of the semiconductor substrate, forming a plurality of second ditches in bottom surface portions of each of the first ditches such that the second ditches are arranged in a second direction perpendicular to the first direction, and covering a side wall of each of the first ditches with a first insulating film and a side wall and a bottom surface of each of the second ditches with a second insulating film thicker than the first insulating film.
    Type: Application
    Filed: October 30, 2017
    Publication date: February 15, 2018
    Inventors: Wataru SUMIDA, Akihiro Shimomura
  • Patent number: 9837492
    Abstract: In a vertical MOSFET in which bottom portions of each gate electrode formed in a ditch are extended toward the drain region, the on resistance is reduced while preventing voltage resistance reduction and switching speed reduction caused by a capacitance increase between the gate and drain. A vertical MOSFET includes first ditches, second ditches, and gate electrodes. The first ditches are formed in an upper surface portion of an epitaxial layer formed over a semiconductor substrate and extend in a second direction extending along a main surface of the semiconductor substrate. The second ditches are formed in bottom surface portions of each of the first ditches and are arranged in the second direction. The gate electrodes are formed in the first ditches and second ditches. The gate electrodes formed in the first ditches include lower electrodes arranged in the second direction.
    Type: Grant
    Filed: March 24, 2016
    Date of Patent: December 5, 2017
    Assignee: RENESAS ELECTRONICS CORPORATION
    Inventors: Wataru Sumida, Akihiro Shimomura
  • Patent number: 9542720
    Abstract: Captured or input image data is converted into an image of a size of a specific number of pixels. Then, predetermined plural types of different effects are applied to image data obtained through the conversion. Several types of image data items with the applied effects are arranged and simultaneously displayed.
    Type: Grant
    Filed: October 11, 2013
    Date of Patent: January 10, 2017
    Assignees: Sony Corporation, Sony Mobile Communications Inc.
    Inventors: Akihiro Shimomura, Yuka Jingushi, Hidehiro Komatsu, Akira Nishiyama, Noribumi Shibayama, Ryoko Amano, Miyuki Shirakawa, Kazuya Takeuchi, Takeshi Tanigawa, Daichi Yagi, Yasuhiro Yoshioka
  • Publication number: 20160336443
    Abstract: In a vertical MOSFET in which bottom portions of each gate electrode formed in a ditch are extended toward the drain region, the on resistance is reduced while preventing voltage resistance reduction and switching speed reduction caused by a capacitance increase between the gate and drain. A vertical MOSFET includes first ditches, second ditches, and gate electrodes. The first ditches are formed in an upper surface portion of an epitaxial layer formed over a semiconductor substrate and extend in a second direction extending along a main surface of the semiconductor substrate. The second ditches are formed in bottom surface portions of each of the first ditches and are arranged in the second direction. The gate electrodes are formed in the first ditches and second ditches. The gate electrodes formed in the first ditches include lower electrodes arranged in the second direction.
    Type: Application
    Filed: March 24, 2016
    Publication date: November 17, 2016
    Inventors: Wataru Sumida, Akihiro Shimomura
  • Patent number: 9385230
    Abstract: A semiconductor device including a first conductor layer, a second conductor layer formed over the first conductor layer, a third conductor layer formed over the second conductor layer, a gate trench which passes through the third conductor layer and is formed in the second conductor layer, a first insulating film formed on an inner wall of the gate trench, a second insulating film formed on the inner wall of the gate trench, a first buried conductor layer formed in the gate trench, a gate electrode formed in the gate trench, a fourth conductor layer of the second conductivity type formed on a lower end of the first buried conductor layer and a lower end of the gate trench, and a fifth conduction layer of the first conductivity type formed over the third conductor layer. The first insulating film is thicker than the second insulating film.
    Type: Grant
    Filed: July 21, 2015
    Date of Patent: July 5, 2016
    Assignee: Renesas Electronics Corporation
    Inventors: Akihiro Shimomura, Yutaka Akiyama, Saya Shimomura, Yasutaka Nakashiba
  • Publication number: 20150325696
    Abstract: A semiconductor device including a first conductor layer, a second conductor layer formed over the first conductor layer, a third conductor layer formed over the second conductor layer, a gate trench which passes through the third conductor layer and is formed in the second conductor layer, a first insulating film formed on an inner wall of the gate trench, a second insulating film formed on the inner wall of the gate trench, a first buried conductor layer formed in the gate trench, a gate electrode formed in the gate trench, a fourth conductor layer of the second conductivity type formed on a lower end of the first buried conductor layer and a lower end of the gate trench, and a fifth conduction layer of the first conductivity type formed over the third conductor layer. The first insulating film is thicker than the second insulating film.
    Type: Application
    Filed: July 21, 2015
    Publication date: November 12, 2015
    Applicant: Renesas Electronics Corporation
    Inventors: Akihiro SHIMOMURA, Yutaka AKIYAMA, Saya SHIMOMURA, Yasutaka NAKASHIBA
  • Patent number: 9117903
    Abstract: A buried layer of a second conductivity type and a lower layer of a second conductivity type are formed in a drift layer. A boundary insulating film is formed in the boundary between the lateral portion of the buried layer of a second conductivity type and the drift layer. The lower layer of a second conductivity type is in contact with the lower end of the buried layer of a second conductivity type and the lower end of the boundary insulating film. The buried layer of a second conductivity type is electrically connected to a source electrode. A high-concentration layer of a second conductivity type is formed in the surface layer of the buried layer of a second conductivity type.
    Type: Grant
    Filed: March 11, 2014
    Date of Patent: August 25, 2015
    Assignee: Renesas Electronics Corporation
    Inventors: Akihiro Shimomura, Yutaka Akiyama, Saya Shimomura, Yasutaka Nakashiba
  • Publication number: 20140284709
    Abstract: A buried layer of a second conductivity type and a lower layer of a second conductivity type are formed in a drift layer. A boundary insulating film is formed in the boundary between the lateral portion of the buried layer of a second conductivity type and the drift layer. The lower layer of a second conductivity type is in contact with the lower end of the buried layer of a second conductivity type and the lower end of the boundary insulating film. The buried layer of a second conductivity type is electrically connected to a source electrode. A high-concentration layer of a second conductivity type is formed in the surface layer of the buried layer of a second conductivity type.
    Type: Application
    Filed: March 11, 2014
    Publication date: September 25, 2014
    Applicant: RENESAS ELECTRONICS CORPORATION
    Inventors: Akihiro SHIMOMURA, Yutaka AKIYAMA, Saya SHIMOMURA, Yasutaka NAKASHIBA
  • Publication number: 20140104319
    Abstract: Captured or input image data is converted into an image of a size of a specific number of pixels. Then, predetermined plural types of different effects are applied to image data obtained through the conversion. Several types of image data items with the applied effects are arranged and simultaneously displayed.
    Type: Application
    Filed: October 11, 2013
    Publication date: April 17, 2014
    Applicant: SONY MOBILE COMMUNICATIONS INC.
    Inventors: Akihiro SHIMOMURA, Yuka Jingushi, Hidehiro Komatsu, Akira Nishiyama, Noribumi Shibayama, Ryoko Amano, Miyuki Shirakawa, Kazuya Takeuchi, Takeshi Tanigawa, Daichi Yagi, Yasuhiro Yoshioka
  • Publication number: 20110010155
    Abstract: It is an object of the invention to evaluate a tracheal intubation technique in consideration of various points to remember related to a tracheal intubation treatment. A tracheal intubation training apparatus (10) is provided with a model (14) which has an appearance modeled on the upper body portion of a human body and an evaluation means (15) which evaluates the tracheal intubation technique carried out to the model (14). The model (14) has pressure sensors (46, 57, 62, 66) which measure pressurizing force when a tracheal intubation device (12) touches respective sections (31, 32, 34, 36, 41, 63) modeled on sections from the inside of the mouth through to that of the trachea of a living body, position detection sensors (69, 76) which detect whether the tracheal intubation device (12) exists in the predetermined areas of the tracheal part (63) and an esophageal part (64), and angle sensors (79 to 81) which detect the postures of a head/face part (28A), a neck/chest part (28B), and a lower jaw part (31).
    Type: Application
    Filed: September 30, 2008
    Publication date: January 13, 2011
    Applicants: WASEDA UNIVERSITY, KYOTO KAGAKU CO., LTD.
    Inventors: Atsuo Takanishi, Yohan Noh, Jorge Solis, Hiroyuki Ishii, Yu Ogura, Koji Nagahiro, Masanao Segawa, Akihiro Shimomura, Tamotsu Katayama, Kazuyuki Hatake
  • Patent number: 7090959
    Abstract: It is intended to provide a multicolor image forming material for laser heat transfer comprising an image receiving sheet having an image receiving layer and at least four heat transfer sheets having different colors each comprising a substrate and a light-heat conversion layer and an image forming layer provided thereon, characterized in that (a) Ra and Rz showing the surface roughness of the image receiving sheet satisfy the following relationships 3?Rz/Ra?20 and 0.5 ?m?Rz?3 ?m.
    Type: Grant
    Filed: December 18, 2002
    Date of Patent: August 15, 2006
    Assignee: Fuji Photo Film Co., Ltd.
    Inventors: Akihiro Shimomura, Yuichi Shirasaki, Hideyuki Nakamura, Susumu Sugiyama
  • Patent number: 7083891
    Abstract: A multicolor image forming material in which a laser beam irradiated region of an image forming layer of a thermal transfer sheet is transferred onto an image receiving layer of an image receiving sheet, wherein: (a) a rate of heat shrinkage in the machine direction and a rate of heat shrinkage in the traverse direction of the image receiving sheet are both not more than 1% with the rate of heat shrinkage in the traverse direction being smaller than the rate of heat shrinkage in the machine direction, (b) a coefficient of dynamic friction between the thermal transfer sheet surface and the image receiving sheet surface is not more than 0.70, (c) a stiffness in the machine direction (Msh) and a stiffness in the traverse direction (Tsh) of the thermal transfer sheet are both from 30 to 70 g, a stiffness in the machine direction (Msr) and in the traverse direction (Tsr) of the image receiving sheet are both from 40 to 90 g, Msh/Tsh and Msr/Tsr are each from 0.75 to 1.
    Type: Grant
    Filed: December 17, 2002
    Date of Patent: August 1, 2006
    Assignee: Fuji Photo Film Co., Ltd.
    Inventors: Akihiro Shimomura, Shinichi Yoshinari, Kazuhito Miyake
  • Publication number: 20060013632
    Abstract: A multi-color image-forming process is provided, which comprises a step of transferring an image to an image-receiving sheet by irradiating a heat transfer sheet with laser light in a recording device provided with a recording drum to form the image on the image-receiving sheet, wherein (a) the heat trasfer sheet comprises a image forming layer having Rz of the surface of 0.5 to 2.5 ?m, the image-receiving sheet comprises a image-receiving layer having Rz of the surface of 0.5 to 1.5 ?m, the image-receiving sheet has a longitudinal thermal shrinkage of 1.0% or less, the image-receiving sheet has a crosswise thermal shrinkage of 1.0% or less, and the a multi-color image-forming process comprises a step of retransferring the image which has been transferred to the image-receiving sheet to a final image carrier, the retransferring is effected using a pair of heated rolls each having a diameter ranging from 50 mm to 350 mm wherein the temperature of the various rolls are set to from 80° C. to 250° C.
    Type: Application
    Filed: December 17, 2002
    Publication date: January 19, 2006
    Inventors: Akihiro Shimomura, Mitsuru Yamamoto, Shinichi Yoshinari
  • Publication number: 20050227024
    Abstract: An image forming method comprises: keeping a face of a final medium to be transferred towards a face of an intermediate transfer medium, wherein the final medium to be transferred comprises a transparent support having a readily adhesive layer, and the intermediate transfer medium has an image recorded on an image receiving layer; transferring the image onto the readily adhesive layer, so as to form a transferred image; and subjecting a surface of the readily adhesive layer having the transferred image to a smoothening treatment. And a final medium to be transferred for the image forming method comprises: a transparent support; and a readily adhesive layer provided on a surface of the transparent support onto which an image is to be transferred, wherein the readily adhesive layer has a surface roughness of from 0.5 to 7 ?m in terms of Rz.
    Type: Application
    Filed: April 8, 2005
    Publication date: October 13, 2005
    Inventor: Akihiro Shimomura
  • Patent number: 6946425
    Abstract: A multicolor image-forming material comprises: an image-receiving sheet having an image-receiving layer and a support; and at least four thermal transfer sheets each including a support, a light-to-heat converting layer and an image-forming layer, in which each of the thermal transfer sheets has a different color, wherein a multicolor image is formed by: superposing the image-forming layer in each of the at least four thermal transfer sheets on the image-receiving layer, such that the image-forming layer is opposed to the image-receiving layer; irradiating the image-forming layer with a laser beam; transferring the irradiated area of the image-forming layer onto the image-receiving layer to form an image; and transferring the image on the image-receiving layer onto an actual printing paper, and each of the at least four thermal transfer sheets has a recording area being defined by a product of a length of 515 mm or more and width of 728 mm or more, and each of the at least four thermal transfer sheets is larg
    Type: Grant
    Filed: March 30, 2004
    Date of Patent: September 20, 2005
    Assignee: Fuji Photo Film Co., Ltd.
    Inventors: Mitsuru Yamamoto, Susumu Sugiyama, Akihiro Shimomura, Akira Hatakeyama
  • Patent number: 6913866
    Abstract: A multicolor image-forming material comprising: an image-receiving sheet comprising a support and an image-receiving layer; and at least four thermal transfer sheets each comprising a support, a light-to-heat converting layer and an image-forming layer, and each having a different color, wherein an image is formed by the method comprising the steps of: superposing each one of the at least four thermal transfer sheets on the image-receiving sheet to be in a state of the image-forming layer being in contact with the image-receiving layer; and irradiating the thermal transfer sheet with a laser beam to transfer an image in an area of the image-forming layer subjected to irradiation onto the image-receiving layer, and at least one layer selected from layers comprised in the image-receiving sheet and the at least four thermal transfer sheets comprises a fluorine-series surface active agent which is a homopolymer comprising a polymerizable monomer represented by the formula (1) and having a weight average molecular
    Type: Grant
    Filed: June 10, 2004
    Date of Patent: July 5, 2005
    Assignee: Fuji Photo Film Co., Ltd.
    Inventors: Akihiro Shimomura, Hideyuki Nakamura, Shinichi Yoshinari
  • Publication number: 20050123869
    Abstract: It is intended to provide a multicolor image forming material for laser heat transfer comprising an image receiving sheet having an image receiving layer and at least four heat transfer sheets having different colors each comprising a substrate and a light-heat conversion layer and an image forming layer provided thereon, characterized in that (a) Ra and Rz showing the surface roughness of the image receiving sheet satisfy the following relationships 3?Rz/Ra?20 and 0.5 ?m?Rz?3 ?m; a multicolor image forming material characterized in that: (b) the image forming layer of each of the heat transfer sheets has an optical density (OD) to film thickness ratio (OD/film thickness) of 1.
    Type: Application
    Filed: December 18, 2002
    Publication date: June 9, 2005
    Inventors: Akihiro Shimomura, Yuichi Shirasaki, Hideyuki Nakamura, Susumu Sugiyama