Abstract: A method of creating data for an applique which has its lower and upper applique patches embroidered to lower and upper cloths, respectively, such that the lower cloth and applique patch and the upper cloth and applique patch can overlap and separate each other with a predetermined overlap margin. The applique data creating method includes the steps of: inputting synthetic contour data of the two applique patches when the lower and upper applique patches overlap each other with the predetermined overlap margin; inputting the individual overlap edge data of the lower and upper applique patches; creating the individual contour data of the lower and upper applique patches from the synthetic contour data and the individual overlap edge data; and creating the individual embroidering data of the lower and upper applique patches on the basis of the individual contour data of the lower and upper applique patches.