Abstract: This invention provides a cationic electrodeposition paint composition comprising an amino-group-containing epoxy resin (A), a blocked polyisocyanate compound (B), and a modified imidazole (C) having a specific structure, wherein the cationic electrodeposition paint composition satisfies the following (i) or (ii), or both: (i) the cationic electrodeposition paint composition further comprises a rust inhibitor (D) or (ii) a blocking agent (b-2) of the blocked polyisocyanate compound (B) is an oxime-based compound (b-2-1) and/or a pyrazole-based compound (b-2-2).

Abstract: A method for producing an acrylic resin-coated silica particle dispersion by (1), mixing and heating silica particles (A), an organic solvent (B) and a monomer having a polymerizable unsaturated group and a hydrolyzable silyl group (C) to obtain a polymerizable unsaturated group-containing silica particle dispersion (i), (2) adding a tertiary amine (D) with a molecular weight of 120 to 380 and having a terminal alkyl and/or aryl group, to the component (i) dispersion, to obtain a polymerizable unsaturated group-containing silica particle dispersion (ii), and (3) reacting the component (ii) dispersion with a polymerizable unsaturated monomer (E), in a solid mass ratio of (ii):(E)=20:80 to 90:10, to obtain an acrylic resin-coated silica particle dispersion.

Abstract: There is provided a coating composition with excellent storage stability, and with excellent mar resistance for obtained coating films. The coating composition comprises a hydroxyl group-containing resin (A), a curing agent (B) and a dispersion of acrylic resin-coated silica particles (C), the dispersion of acrylic resin-coated silica particles (C) being an acrylic resin-coated silica particle dispersion obtained by reacting silica particles with a polymerizable unsaturated group (c1) and a polymerizable unsaturated monomer (c2) in a mass ratio of (c1):(c2)=20:80 to 90:10, the polymerizable unsaturated monomer (c2) including a specific polymerizable unsaturated monomer (c2-1) as at least a portion of its components, and the molecular weight of the resin covering the silica particles being 400 to 6000.

Abstract: There is provided a coating composition with excellent storage stability, and with excellent mar resistance for obtained coating films. The coating composition comprises a hydroxyl group-containing resin (A), a curing agent (B) and a dispersion of acrylic resin-coated silica particles (C), the dispersion of acrylic resin-coated silica particles (C) being an acrylic resin-coated silica particle dispersion obtained by reacting silica particles with a polymerizable unsaturated group (c1) and a polymerizable unsaturated monomer (c2) in a mass ratio of (c1):(c2)=20:80 to 90:10, the polymerizable unsaturated monomer (c2) including a specific polymerizable unsaturated monomer (c2-1) as at least a portion of its components, and the molecular weight of the resin covering the silica particles being 400 to 6000.

Abstract: Production of an acrylic resin-coated silica particle dispersion that has excellent storage stability, when added to a coating material produces a coating film with excellent mar resistance: mixing and heating silica particles (A), an organic solvent (B) and a monomer having a polymerizable unsaturated group and a hydrolyzable silyl group (C) to obtain a polymerizable unsaturated group-containing silica particle dispersion (i), adding a tertiary amine (D) with a molecular weight of 120 to 380 and having a terminal alkyl and/or aryl group, to the component (i) dispersion, to obtain a polymerizable unsaturated group-containing silica particle dispersion (ii), reacting the component (ii) dispersion with a polymerizable unsaturated monomer (E), in a solid mass ratio of (ii):(E)=20:80 to 90:10, to obtain an acrylic resin-coated silica particle dispersion.

Abstract: An object of the present invention is to provide a coating composition that has excellent storage stability, achieves water and oil repellency over a long period of time, and has excellent chemical resistance and processability. To achieve this object, the present invention provides a copolymer resin (A) comprising, as constituent components, a polybasic acid component (a1); a compound (a2) containing at least one member selected from a secondary-hydroxyl-group-containing polyhydric alcohol component (a21) and a compound (a22), which generates one or more secondary hydroxyl groups by reaction with one or more carboxyl groups; and a specific fluorine-containing diol (f), the component (f) being used in a proportion of 0.1 to 30 mass %, based on the total mass of the constituent components.

Abstract: An object of the present invention is to provide a coating composition that has excellent storage stability, achieves water and oil repellency over a long period of time, and has excellent chemical resistance and processability. To achieve this object, the present invention provides a copolymer resin (A) comprising, as constituent components, a polybasic acid component (a1); a compound (a2) containing at least one member selected from a secondary-hydroxyl-group-containing polyhydric alcohol component (a21) and a compound (a22), which generates one or more secondary hydroxyl groups by reaction with one or more carboxyl groups; and a specific fluorine-containing diol (f), the component (f) being used in a proportion of 0.1 to 30 mass %, based on the total mass of the constituent components.

Abstract: The present invention provides a method of forming a multi-layered coating film including the steps of (1) forming an undercoating film using an undercoating composition (I), and (2) forming a top coating film on the undercoating film after the formation of the undercoating film, the top coating film being formed using an active energy ray-curable top coating composition (II) containing a silsesquioxane compound (a) and a photoinitiator (b), the silsesquioxane compound (a) containing one or more organic groups each directly bonded to a silicone atom, and at least one of the organic groups having one or more urethane bonds and one (meth)acryloyloxy group.

Abstract: An object to be attained by the present invention is to provide an active energy ray-curable composition that is capable of producing a cured coating film having high scratch resistance and excellent transparency. The present invention relates to an active energy ray-curable composition containing a reactive particle (A) obtained by reacting a silica fine particle (a-1) and a hydrolysable silane (a-2) having one or more (meth)acryloyloxy groups and one or more isocyanurate ring structures in a molecule. The present invention also provides the active energy ray-curable composition according to the above, containing a photopolymerization initiator (B).

Abstract: To provide a composition comprising a silsesquioxane compound that is capable of producing a coating film with excellent heat resistance and scratch resistance, and that has excellent compatibility with general polymerizable unsaturated compounds as well as polymerizable unsaturated compounds with high polarity. A silsesquioxane compound comprising organic groups each directly attached to a silicon atom of the compound, at least one of the organic groups being an organic group having one or more urethane bonds and one (meth)acryloyloxy group.

Abstract: To provide a composition comprising a silsesquioxane compound that is capable of producing a coating film with excellent heat resistance and scratch resistance, and that has excellent compatibility with general polymerizable unsaturated compounds as well as polymerizable unsaturated compounds with high polarity. A silsesquioxane compound comprising organic groups each directly attached to a silicon atom of the compound, at least one of the organic groups being an organic group having one or more urethane bonds and one (meth)acryloyloxy group.

Abstract: To provide a composition comprising a silsesquioxane compound that is capable of producing a coating film with excellent heat resistance and scratch resistance, and that has excellent compatibility with general polymerizable unsaturated compounds as well as polymerizable unsaturated compounds with high polarity. A silsesquioxane compound comprising organic groups each directly attached to a silicon atom of the compound, at least one of the organic groups being an organic group having one or more urethane bonds and one (meth)acryloyloxy group.

Abstract: The present invention provides a method of forming a multi-layered coating film including the steps of (1) forming an undercoating film using an undercoating composition (I), and (2) forming a top coating film on the undercoating film after the formation of the undercoating film, the top coating film being formed using an active energy ray-curable top coating composition (II) containing a silsesquioxane compound (a) and a photoinitiator (b), the silsesquioxane compound (a) containing one or more organic groups each directly bonded to a silicone atom, and at least one of the organic groups having one or more urethane bonds and one (meth)acryloyloxy group.

Abstract: An object to be attained by the present invention is to provide an active energy ray-curable composition that is capable of producing a cured coating film having high scratch resistance and excellent transparency. The present invention relates to an active energy ray-curable composition containing a reactive particle (A) obtained by reacting a silica fine particle (a-1) and a hydrolysable silane (a-2) having one or more (meth)acryloyloxy groups and one or more isocyanurate ring structures in a molecule. The present invention also provides the active energy ray-curable composition according to the above, containing a photopolymerization initiator (B).

Abstract: To provide a composition comprising a silsesquioxane compound that is capable of producing a coating film with excellent heat resistance and scratch resistance, and that has excellent compatibility with general polymerizable unsaturated compounds as well as polymerizable unsaturated compounds with high polarity. A silsesquioxane compound comprising organic groups each directly attached to a silicon atom of the compound, at least one of the organic groups being an organic group having one or more urethane bonds and one (meth)acryloyloxy group.

Abstract: An object of the present invention is to provide a silsesquioxane compound that is capable of producing a coating film with excellent heat resistance and scratch resistance, and that has excellent compatibility with general polymerizable unsaturated compounds as well as polymerizable unsaturated compounds with high polarity. The present invention provides a silsesquioxane compound comprising organic groups each directly bonded to a silicon atom of the compound, at least one of the organic groups being an organic group having one or more secondary hydroxyl groups and one (meth)acryloyloxy group.

Abstract: The present invention provides a coating composition for forming a titanium oxide film, comprising (A) a specific titanium-containing aqueous liquid and (B) at least one compound selected from the group consisting of organic acids and their salts. The present invention also provides a process for forming a titanium oxide film using the coating composition, and a metal substrate coated therewith.

Abstract: The present invention provides a coating composition for forming a titanium oxide film, comprising (A) a specific titanium-containing aqueous liquid and (B) at least one compound selected from the group consisting of organic acids and their salts. The present invention also provides a process for forming a titanium oxide film using the coating composition, and a metal substrate coated therewith.

Abstract: The present invention provides a coating composition for forming a titanium oxide film, comprising (A) a specific titanium-containing aqueous liquid and (B) at least one compound selected from the group consisting of organic acids and their salts. The present invention also provides a process for forming a titanium oxide film using the coating composition, and a metal substrate coated therewith.

Abstract: A plugging meter for automatically measuring the impurity concentration in a liquid metal is designed to have parallel passages including a cooling passage provided with a plugging orifice and with a flow meter, and a by-pass passage connected in series to a main passage having another flow meter, so that the plugging points may be obtained from the outputs of both flow meters. The plugging meter has a program signal generator, a flow-rate ratio setter and a comparator, and is adapted to change the temperature of the plugging orifice in accordance with a predetermined pattern or gradient, by means of a signal representative of the temperature of plugging orifice and a flow-rate ratio signal obtained from the outputs of both flow meters. This plugging meter affords an automatic and accurate measurement of a multi-plugging phenomenon taking place at the plugging orifice.