Patents by Inventor Akira Ikegami

Akira Ikegami has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20210027976
    Abstract: The present disclosure aims at proposing a multi-beam irradiation device capable of correcting off-axis aberrations. In order to achieve the above object, a beam irradiation device is proposed, which includes a beam source which emits a plurality of beams; an objective lens (17) which focuses a beam on a sample; a first lens (16) which is arranged such that a lens main surface is positioned at an object point of the objective lens and deflects a plurality of incident beams toward an intersection point of a lens main surface of the objective lens and an optical axis; a second lens (15) which is arranged closer to a beam source side than the first lens and focuses the plurality of beams on a lens main surface of the first lens; and a third lens (14) which is arranged closer to the beam source side than the second lens and deflects the plurality of beams toward an intersection point of a lens main surface of the second lens and the optical axis.
    Type: Application
    Filed: October 1, 2020
    Publication date: January 28, 2021
    Inventors: Akira IKEGAMI, Yuta KAWAMOTO, Naomasa SUZUKI, Manabu YANO, Yasushi EBIZUKA, Naoma BAN
  • Publication number: 20210007980
    Abstract: The present invention provides a salivator that is in a form for use in the mouth (a form for intraoral use), or in a form for use by oral administration (a form for oral administration). The salivator can be prepared by using enzymatically modified isoquercitrin, or a combination of enzyme-modified isoquercitrin and a thickening polysaccharide. The present invention further provides an additive that is useful for preparing an oral composition (a food or beverage, a pharmaceutical product for oral administration) (an additive for an oral composition) and that can impart at least one effect selected from the group consisting of a salivation-promoting effect, a deglutition-improving effect (swallowing-assisting effect), and a mastication-improving effect (chewing-assisting effect) to the oral composition. The additive can be prepared by using a combination of enzymatically modified isoquercitrin and a thickening polysaccharide.
    Type: Application
    Filed: September 23, 2020
    Publication date: January 14, 2021
    Applicant: SAN-EI GEN F.F.I., INC.
    Inventors: Hiroyuki SATO, Makoto NAKAUMA, Akira IKEGAMI, Takahiro FUNAMI, Hideyuki ORIKOSHI
  • Publication number: 20210005417
    Abstract: A charged particle beam application apparatus includes a beam separator. The beam separator includes a first magnetic pole, a second magnetic pole facing the first magnetic pole, a first electrode and a second electrode that extend along an optical axis of a primary beam and are arranged in a first direction perpendicular to the optical axis, on a first surface of the first magnetic pole which faces the second magnetic pole, and a third electrode and a fourth electrode that extend along the optical axis and face the first electrode and the second electrode, respectively, on a second surface of the second magnetic pole which faces the first magnetic pole.
    Type: Application
    Filed: March 30, 2018
    Publication date: January 7, 2021
    Inventors: Yasuhiro Shirasaki, Takashi Dobashi, Momoyo Enyama, Akira Ikegami, Yuta Kawamoto
  • Patent number: 10844237
    Abstract: An ink jet recording method including the steps of a first recording step for applying a first ink to a recording medium and a second recording step for applying a second ink to the recording medium so as to overlap at least a region provided with the first ink, wherein the first ink is an aqueous ink containing silver particles, the second ink is an aqueous ink containing a dye, a time difference between applications of the first ink and the second ink to the recording medium is 1 sec or more to 7,200 sec or less, and the dye is a predetermined dye.
    Type: Grant
    Filed: November 12, 2019
    Date of Patent: November 24, 2020
    Assignee: CANON KABUSHIKI KAISHA
    Inventors: Yoko Taira, Masayuki Ikegami, Yuhei Shimizu, Akira Kuriyama
  • Patent number: 10832886
    Abstract: The present disclosure aims at proposing a multi-beam irradiation device capable of correcting off-axis aberrations. In order to achieve the above object, a beam irradiation device is proposed, which includes a beam source which emits a plurality of beams; an objective lens (17) which focuses a beam on a sample; a first lens (16) which is arranged such that a lens main surface is positioned at an object point of the objective lens and deflects a plurality of incident beams toward an intersection point of a lens main surface of the objective lens and an optical axis; a second lens (15) which is arranged closer to a beam source side than the first lens and focuses the plurality of beams on a lens main surface of the first lens; and a third lens (14) which is arranged closer to the beam source side than the second lens and deflects the plurality of beams toward an intersection point of a lens main surface of the second lens and the optical axis.
    Type: Grant
    Filed: March 4, 2019
    Date of Patent: November 10, 2020
    Assignee: Hitachi High-Tech Corporation
    Inventors: Akira Ikegami, Yuta Kawamoto, Naomasa Suzuki, Manabu Yano, Yasushi Ebizuka, Naoma Ban
  • Publication number: 20200294757
    Abstract: An object of the present disclosure is to provide a charged particle beam apparatus that can quickly find a correction condition for a new aberration that is generated in association with beam adjustment. In order to achieve the above object, the present disclosure proposes a charged particle beam apparatus configured to include an objective lens (7) configured to focus a beam emitted from a charged particle source and irradiate a specimen, a visual field movement deflector (5 and 6) configured to deflect an arrival position of the beam with respect to the specimen, and an aberration correction unit (3 and 4) disposed between the visual field movement deflector and the charged particle source, in which the aberration correction unit is configured to suppress a change in the arrival position of the beam irradiated under different beam irradiation conditions.
    Type: Application
    Filed: February 5, 2020
    Publication date: September 17, 2020
    Inventors: Yuta KAWAMOTO, Akira IKEGAMI, Yasushi EBIZUKA, Nobuo FUJINAGA
  • Publication number: 20200185186
    Abstract: To provide a charged particle beam device capable of preventing generation of geometric aberration by aligning axes of electrostatic lenses with high accuracy even when center holes of respective electrodes which constitute the electrostatic lens are not disposed coaxially. The charged particle beam device according to the invention includes an electrostatic lens disposed between an acceleration electrode and an objective lens, wherein at least one of the electrodes which constitutes the electrostatic lens is formed of a magnetic body, and two or more magnetic field generating elements are disposed along an outer periphery of the electrode.
    Type: Application
    Filed: October 25, 2019
    Publication date: June 11, 2020
    Inventors: Yuta KAWAMOTO, Akira IKEGAMI, Masahiro FUKUTA
  • Patent number: 10647141
    Abstract: An aqueous ink for inkjet printing contains silver particles having a particle size of 60 nm or less at a cumulative volume of 90%.
    Type: Grant
    Filed: October 2, 2018
    Date of Patent: May 12, 2020
    Assignee: Canon Kabushiki Kaisha
    Inventors: Masayuki Ikegami, Yuhei Shimizu, Akira Kuriyama, Yoko Taira
  • Publication number: 20200079968
    Abstract: An ink jet recording method including the steps of a first recording step for applying a first ink to a recording medium and a second recording step for applying a second ink to the recording medium so as to overlap at least a region provided with the first ink, wherein the first ink is an aqueous ink containing silver particles, the second ink is an aqueous ink containing a dye, a time difference between applications of the first ink and the second ink to the recording medium is 1 sec or more to 7,200 sec or less, and the dye is a predetermined dye.
    Type: Application
    Filed: November 12, 2019
    Publication date: March 12, 2020
    Inventors: Yoko Taira, Masayuki Ikegami, Yuhei Shimizu, Akira Kuriyama
  • Patent number: 10559450
    Abstract: The present invention enlarges a range of movement of field of view by beam deflection with a simple deflector configuration and suppresses deterioration of a signal electron detection rate caused by the beam deflection. A scanning electron microscope according to the present invention is provided with a first deflection field setting module that sets plural deflectors to move a scanning area on a specimen by a primary electron beam to a position deviated from an axis extended from an electron source toward the center of an objective lens and a second deflection field setting module that sets the plural deflectors so that trajectories of signal electrons are corrected without changing the scanning area set by the first deflection field setting module. The control unit controls the plural deflectors by adding a setting value set by the second deflection field setting module to a setting value set by the first deflection field setting module.
    Type: Grant
    Filed: August 28, 2018
    Date of Patent: February 11, 2020
    Assignee: HITACHI HIGH-TECHNOLOGIES CORPORATION
    Inventors: Noritsugu Takahashi, Yasunari Sohda, Akira Ikegami, Yuta Kawamoto
  • Publication number: 20190393014
    Abstract: The objective of the present invention is to provide a charged-particle beam device capable of moving a field-of-view to an exact position even when moving the field-of-view above an actual sample. In order to attain this objective, a charged-particle beam device is proposed comprising an objective lens whereby a charged-particle beam is focused and irradiated onto a sample: a field-of-view moving deflector for deflecting the charged-particle beam; and a stage onto which the sample is placed.
    Type: Application
    Filed: January 12, 2017
    Publication date: December 26, 2019
    Inventors: Yuta KAWAMOTO, Akira IKEGAMI, Yasushi EBIZUKA, Naoma BAN
  • Publication number: 20190287754
    Abstract: The present disclosure aims at proposing a multi-beam irradiation device capable of correcting off-axis aberrations. In order to achieve the above object, a beam irradiation device is proposed, which includes a beam source which emits a plurality of beams; an objective lens (17) which focuses a beam on a sample; a first lens (16) which is arranged such that a lens main surface is positioned at an object point of the objective lens and deflects a plurality of incident beams toward an intersection point of a lens main surface of the objective lens and an optical axis; a second lens (15) which is arranged closer to a beam source side than the first lens and focuses the plurality of beams on a lens main surface of the first lens; and a third lens (14) which is arranged closer to the beam source side than the second lens and deflects the plurality of beams toward an intersection point of a lens main surface of the second lens and the optical axis.
    Type: Application
    Filed: March 4, 2019
    Publication date: September 19, 2019
    Inventors: Akira IKEGAMI, Yuta KAWAMOTO, Naomasa SUZUKI, Manabu YANO, Yasushi EBIZUKA, Naoma BAN
  • Patent number: 10304654
    Abstract: A purpose of the present invention is to provide a charged particle beam device that suppresses an off-axis amount when a field of view moves, said move causing an aberration, and allows large field of view moves to be carried out. In order to achieve the above-mentioned purpose, this charged particle beam device is provided with an objective lens and deflectors for field of view moves, said deflectors deflecting a charged particle beam, and is further provided with an accelerating tube positioned between the objective lens and the deflectors for field of view moves, a power source that applies a voltage to the accelerating tube, and a control device that controls the voltage to be applied to the power source in response to the deflection conditions of the deflectors for field of view moves.
    Type: Grant
    Filed: July 27, 2016
    Date of Patent: May 28, 2019
    Assignee: Hitachi High-Technologies Corporation
    Inventors: Akira Ikegami, Yuta Kawamoto, Hideto Dohi, Manabu Yano, Yutaka Tandai, Hideyuki Kazumi
  • Publication number: 20190074159
    Abstract: The present invention enlarges a range of movement of field of view by beam deflection with a simple deflector configuration and suppresses deterioration of a signal electron detection rate caused by the beam deflection. A scanning electron microscope according to the present invention is provided with a first deflection field setting module that sets plural deflectors to move a scanning area on a specimen by a primary electron beam to a position deviated from an axis extended from an electron source toward the center of an objective lens and a second deflection field setting module that sets the plural deflectors so that trajectories of signal electrons are corrected without changing the scanning area set by the first deflection field setting module. The control unit controls the plural deflectors by adding a setting value set by the second deflection field setting module to a setting value set by the first deflection field setting module.
    Type: Application
    Filed: August 28, 2018
    Publication date: March 7, 2019
    Inventors: Noritsugu Takahashi, Yasunari Sohda, Akira Ikegami, Yuta Kawamoto
  • Publication number: 20180344633
    Abstract: The present invention provides a salivator that is in a form for use in the mouth (a form for intraoral use), or in a form for use by oral administration (a form for oral administration). The salivator can be prepared by using enzymatically modified isoquercitrin, or a combination of enzyme-modified isoquercitrin and a thickening polysaccharide. The present invention further provides an additive that is useful for preparing an oral composition (a food or beverage, a pharmaceutical product for oral administration)(an additive for an oral composition) and that can impart at least one effect selected from the group consisting of a salivation-promoting effect, a deglutition-improving effect (swallowing-assisting effect), and a mastication-improving effect (chewing-assisting effect) to the oral composition. The additive can be prepared by using a combination of enzymatically modified isoquercitrin and a thickening polysaccharide.
    Type: Application
    Filed: December 2, 2016
    Publication date: December 6, 2018
    Applicant: SAN-EI GEN F.F.I., INC.
    Inventors: Hiroyuki SATO, Makoto NAKAUMA, Akira IKEGAMI, Takahiro FUNAMI, Hideyuki ORIKOSHI
  • Publication number: 20180233320
    Abstract: A purpose of the present invention is to provide a charged particle beam device that suppresses an off-axis amount when a field of view moves, said move causing an aberration, and allows large field of view moves to be carried out. In order to achieve the above-mentioned purpose, this charged particle beam device is provided with an objective lens and deflectors for field of view moves, said deflectors deflecting a charged particle beam, and is further provided with an accelerating tube positioned between the objective lens and the deflectors for field of view moves, a power source that applies a voltage to the accelerating tube, and a control device that controls the voltage to be applied to the power source in response to the deflection conditions of the deflectors for field of view moves.
    Type: Application
    Filed: July 27, 2016
    Publication date: August 16, 2018
    Inventors: Akira IKEGAMI, Yuta KAWAMOTO, Hideto DOHI, Manabu YANO, Yutaka TANDAI, Hideyuki KAZUMI
  • Patent number: 9997326
    Abstract: In a charged particle beam device including an objective lens that focuses a charged particle beam; a first deflector that deflects the charged particle beam to emit the charged particle beam to a sample from a direction different from an ideal optical axis of the objective lens; and a second deflector that deflects a charged particle emitted from the sample, a charged particle focusing lens to focus the charged particle emitted from the sample is disposed between the sample and the second deflector and strengths of the objective lens and the charged particle focusing lens are controlled, according to deflection conditions of the first deflector.
    Type: Grant
    Filed: January 26, 2016
    Date of Patent: June 12, 2018
    Assignee: Hitachi High-Technologies Corporation
    Inventors: Hideto Dohi, Akira Ikegami, Hideyuki Kazumi
  • Patent number: 9941095
    Abstract: An object of the invention is to provide a charged particle beam apparatus which can perform optimized adjustment of a focusing condition of a charged particle beam focused on a sample and optimized adjustment of an orbit of a charged particle emitted from the sample. In order to achieve the above-described object, there is provided a charged particle beam apparatus including a passage restriction member that partially restricts passage of a charged particle emitted from a sample, a first lens that is arranged between the passage restriction member and the sample, and that controls an orbit of the charged particle emitted from the sample, and a second lens that is arranged between the passage restriction member and the charged particle source, and that changes a focusing condition of the charged particle beam in accordance with a control condition of the first lens.
    Type: Grant
    Filed: June 16, 2016
    Date of Patent: April 10, 2018
    Assignee: Hitachi High-Technologies Corporation
    Inventors: Ryota Watanabe, Yuko Sasaki, Akira Ikegami
  • Patent number: 9704687
    Abstract: The charged particle beam application device is provided with a charged particle source and an objective lens that converges charged particle beam generated by the charged particle source onto a sample. In this case, the charged particle beam application device is further provided with an aberration generating element installed between the charged particle beam source and the objective lens, a tilt-use deflector installed between the aberration generating element and the objective lens, a deflection aberration control unit for controlling the aberration generating element, a first electromagnetic field superposing multipole installed between the aberration generating element and the objective lens, and an electromagnetic field superposing multipole control unit for controlling the first electromagnetic field superposing multipole.
    Type: Grant
    Filed: June 16, 2015
    Date of Patent: July 11, 2017
    Assignee: Hitachi High-Technologies Corporation
    Inventors: Momoyo Enyama, Akira Ikegami, Hideto Dohi, Hideyuki Kazumi, Naomasa Suzuki
  • Patent number: 9653256
    Abstract: Provided is a charged-particle-beam device capable of simultaneously cancelling out a plurality of aberrations caused by non-uniform distribution of the opening angle and energy of a charged particle beam. The charged-particle-beam device is provided with an aberration generation lens for generating an aberration due to the charged particle beam passing off-axis, and a corrective lens for causing the trajectory of the charged particle beam to converge on the main surface of an objective lens irrespective of the energy of the charged particle beam. The main surface of the corrective lens is disposed at a crossover position at which a plurality of charged particle beams having differing opening angles converge after passing through the aberration generation lens.
    Type: Grant
    Filed: November 5, 2014
    Date of Patent: May 16, 2017
    Assignee: Hitachi High-Technologies Corporation
    Inventors: Akira Ikegami, Hideto Dohi, Hideyuki Kazumi, Yoichi Ose, Naomasa Suzuki, Momoyo Enyama, Ryuji Nishi, Akio Takaoka