Abstract: A method for adjusting an optical system that has a multilayer mirror that includes a multilayer film includes the steps of measuring wave front aberration of the optical system, determining a condition to remove part of the multilayer film in the multilayer mirror so that the wave front aberration measured in the measuring step may reduce, and removing the part of the multilayer film in the multilayer mirror based on the condition determined by the determining step.

Abstract: An optical apparatus includes an optical device arranged on an optical path extending from a light source to a predetermined position, an optical sensor, and a measuring device which measures an optical characteristic or a change in an optical characteristic of the optical device on the basis of an output from the optical sensor. The optical sensor is arranged outside the optical path and senses light which is emitted from a second light source arranged outside the optical path and is reflected by the optical device.

Abstract: An X-ray generator introducing an X-ray to an illumination optical system includes plural plasma light sources, and a reflector, movably arranged among the plural light sources, for switching light sources and for reflecting the X-ray from one of the plural light sources to the illumination optical system, wherein an angle between a plane determined by an optical axis of the X-ray emitted from the reflector and a line that connects the plural light sources to the reflector, and a polarization plane on which an electric field vector oscillates is between 45° and 135°, the polarization plane maximizing a reflectance to the X-ray of the illumination optical system.

Abstract: An X-ray generator for generating plasma and X-ray emitted from the plasma includes a unit for generating the plasma, and plural reflection optical systems for introducing the X-ray through different optical paths.

Abstract: The present invention provides a measuring device by which, even if a radiation intensity from a light source, a beam size or a beam intensity distribution of the light source changes, an optical characteristic of an optical element to be measured can be measured very precisely. In a measuring device according to the present invention, to this end, light from a light source is diffracted by a diffracting grating to thereby resolve the same into plural light beams, and by using different light beams, the object to be measured is measured and the intensity of incident light from the light source is measured. With this structure, even if the light from the light source changes, the intensity of the light from the light source is specified concurrently, and therefore, the optical characteristic of the object to be measured can be measured very accurately.

Abstract: An optical apparatus that measures a polarization dependent characteristic of a measured object includes a light source for emitting non-linearly polarized light in an extreme ultraviolet region or an X-ray region, and a rotary polarizer for reflecting the light emitted from the light source, the polarizer including a set of mirrors repeating three or more reflections and being arranged such that an optical axis of incident light and that of outgoing light are aligned with the same straight line.

Abstract: A light source unit supplies the light radiated from the plasma, and includes a stabilizer for reducing a fluctuation of a position of the light radiated from the plasma.

Abstract: A mirror retainer for retaining a mirror accommodated in a chamber that has a wall and a lid openably provided on the wall, and generates a reduced pressure environment, includes an elastic member for connecting the mirror elastically to the lid.

Abstract: A fabrication method of an optical element having a multilayer film includes the steps of forming a multilayer film on a substrate, measuring a secondary radiation radiated from the multilayer film when a light with a wavelength of 2 to 40 nm is irradiated to the multilayer film, determining a phase difference between the light irradiated to the multilayer film and the light reflected from the multilayer film based on a measurement result of the measuring step, and modifying the multilayer film based on the determined phase difference.

Abstract: An adjusting method of an optical system composed plural optical elements each having a multilayer film, said adjusting method that includes a first measuring step that obtains, for each optical element, a difference between a phase distribution of which an EUV light (Extreme Ultraviolet light) is reflected from the optical element and a phase distribution of which a light with a wavelength that is longer than the EUV light is reflected from the optical element, a second measuring step that measures a phase distribution of which the light passes the optical system, a deciding step that decides a phase distribution of which the EUV light passes through the optical system based on the phase distribution difference obtained by the first measuring step and the phase distribution measured by the second measuring step, and an adjusting step that adjusts at least one of a position and a posture of the optical element based on the phase distribution decided by the deciding step.

Abstract: Disclosed is a mirror unit and a method of producing the same. In one preferred form of the present invention, the mirror unit includes (i) a mirror with a multilayered film formed on a substrate, the multilayered film having two materials periodically laminated in layers on the substrate, and (ii) a substrate deforming device for producing deformation of a shape of the substrate of the mirror, wherein, in the multilayered film, the number of laminated layers in a predetermined region of the substrate differs from that in another region of the substrate. A mirror unit producing method according to another preferred from of the present invention includes (a) forming a multilayered film on a substrate, the multilayered film having two materials periodically laminated in layers on the substrate, (b) providing substrate deforming means in association with the substrate, the deforming means having a function for producing deformation of the shape of the substrate, and (c) partially removing the multilayered film.

Abstract: Disclosed is an exposure apparatus and an exposure method using EUV light. In one preferred form of the present invention, the exposure apparatus is arranged to expose a substrate to a pattern of an original by use of extreme ultraviolet light, and it includes a blaze type diffraction grating disposed so that light from a plasma light source is incident thereon, and an optical system for directing extreme ultraviolet light from the blaze type diffraction grating to at least one of the original and the substrate.

Abstract: There is provided a light-emitting apparatus with favorable radiation light intensity, which is excellent in light extraction efficiency, color temperature and color rendering property. The light-emitting apparatus includes a light-emitting element, a base body having, on its top surface, a placement portion for emplacing thereon the light-emitting element, a frame body attached to the top surface of the base body so as to surround the placement portion, a light transmitting member disposed inside the frame body so as to cover the light-emitting element, and phosphors contained in the light transmitting member, which performs wavelength conversion on the light emitted from the light-emitting element. The light transmitting member has a pre-cured viscosity ranging from 0.4 to 50 Pa.s.

Abstract: A measuring apparatus for measuring a spectrum of extreme ultraviolet light that diverges from a divergent center point of an extreme ultraviolet light source, includes a spectrum measuring unit that includes a spectrometer and a detector that has a spatial resolution in a spectrum forming direction of the spectrometer, and a drive mechanism that makes the spectrum measuring unit movable relative to the divergent center point.

Abstract: In manufacturing a ceramic multi-layer wiring substrate which is formed by stacking a plurality of ceramic layers and which includes an internal wiring, a ceramic paste is printed using a screen printing process on a part of a ceramic green sheet to be a ceramic layer having the internal wiring formed thereon which part does not include the internal wiring, to form between the ceramic layers a ceramic filling layer including a same ceramic component as that in the ceramic layers which ceramic filling layer is not formed on the internal wiring. The ceramic paste includes a ceramic component, an acrylic resin, and a cellulose resin, and loss factor tan ? of the paste represented by (loss modulus)/(storage modulus) in a dry condition after printing is equal to or greater than loss factor tan ? of a conductor paste layer to be the internal wiring in a dry condition.

Abstract: A light generator for irradiating a laser onto a target, for generating plasma, and for producing light from the plasma, includes a first optical system for introducing the light to the target, a second optical system for introducing the light, and a unit for irradiating the laser onto debris that attaches to at least one of the first and second optical systems by changing an irradiation condition of the laser differently from that used to generate the plasma.

Abstract: A light-emitting apparatus provides a ceramic-made base body, a frame body, a light-emitting element, a conductor layer and a light-transmitting member. The base body has on its upper surface a mounting portion for the light-emitting element. The frame body is joined to the upper surface of the base body so as to surround the mounting portion, with its inner peripheral surface shaped into a reflection surface. The wiring conductor has its one end formed on the upper surface of the base body and electrically connected to the light-emitting element, and has another end led to a side or lower surface of the base body. The light-transmitting member is disposed inside the frame body so as to cover the light-emitting element, which contains fluorescent materials for performing wavelength conversion. The base body is so designed that ceramic crystal grains range in average particle diameter from 1 to 5 ?m.

Abstract: An optical unit includes a spectrometer that includes a diffraction grating for separating light, and a beam intensity sensor for detecting a light intensity of light emitted from the spectrometer, wherein the beam intensity sensor includes, in order from a light incident side to a light exit side, an aperture having a first opening that restricts a width of incident light, and a light receiving sensor that has a second opening for detecting part of light from the aperture, wherein the second opening in the light receiving sensor is wider than the first opening in the aperture in a spectral direction of the light from the spectrometer, and wherein the second opening in the light receiving sensor is narrower than the first opening in the aperture in a direction orthogonal to the spectral direction of the light from the spectrometer.

Abstract: A differential pumping system includes a first chamber for storing a light source that emits light, a second chamber that receives light from the first chamber, and a vacuum pump, provided between the first and second chambers, which includes a hollow shaft through which the light passes, and exhausts the hollow shaft.

Abstract: A differential pumping system includes a first chamber for storing a light source that emits pulsed light, a first exhaust unit for exhausting said first chamber, a second chamber being connectible to the first chamber to receive the pulsed light, a second exhaust unit for exhausting said second chamber, and a connection control mechanism between the first and second chambers for connecting the first chamber to the second chamber when the pulsed light emits, and for disconnecting the first chamber from the second chamber when the pulsed light does not emit.