Patents by Inventor Akira Nakano

Akira Nakano has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20070059189
    Abstract: This relates to a hermetic compressor and a manufacturing method of a suction muffler, and discloses a technique for making energy efficiency higher and reducing noise. According to that technique, in a suction muffler 140 having a sound attenuation space 143, by foam-molding a wall 147, such as an opposite surface and the like, where open ends 145a, 146a within the sound attenuation space among the walls constituting a casing 140C of the suction muffler 140 are opened, it is possible to reduce the heating action of refrigerant gas released into the sound attenuation space 143 effectively in a space-saving manner, and make a sucking efficiency higher, and effectively absorb a refrigerant pulsation tone radiated in the open end 145a within the sound attenuation space, and consequently reduce the noise.
    Type: Application
    Filed: October 8, 2004
    Publication date: March 15, 2007
    Applicant: MATSUSHITA ELECTRIC INDUSTRIAL CO., LTD.
    Inventors: Akira Nakano, Ko Inagaki
  • Patent number: 7120556
    Abstract: The performance of a plasma processing apparatus which is disassembled, transferred, and reassembled is evaluated. The plasma processing apparatus has a plasma processing chamber having an electrode for exciting a plasma, a radiofrequency generator connected to the electrode, and an impedance matching circuit for performing the impedance matching between the plasma processing chamber and the radiofrequency generator. The performance of the apparatus is evaluated whether or not three times the first series resonant frequency of the plasma processing chamber is larger than the power frequency supplied to the plasma processing chamber.
    Type: Grant
    Filed: July 9, 2004
    Date of Patent: October 10, 2006
    Assignee: Alps Electric Co., Ltd.
    Inventors: Akira Nakano, Tadahiro Ohmi
  • Patent number: 7095178
    Abstract: A plasma processing apparatus includes a radio frequency generator, a plasma processing chamber, a matching circuit for impedance matching between the radio frequency generator and the plasma processing chamber, and matching circuit adjusting means for matching the output impedance of the matching circuit to the impedance of the plasma processing chamber in a nondischarge state. The matching circuit is a product matching circuit that is produced based on a circuit constant of an adjusting matching circuit. The adjusting matching circuit is disposed between the radio frequency generator and the plasma processing chamber for a required plasma treatment and the circuit constant is determined by impedance matching between the radio frequency generator and the plasma processing chamber so that the adjusting matching circuit matches the load impedance of the plasma processing chamber.
    Type: Grant
    Filed: November 21, 2002
    Date of Patent: August 22, 2006
    Assignee: ALPS Electric Co., Ltd.
    Inventors: Akira Nakano, Tadashi Kumagai, Tomofumi Oba, Tadahiro Ohmi
  • Patent number: 7087158
    Abstract: Filtration-function-equipped cooling water equipment that includes: filtration equipment connected to water-purifying, oxygen-supply-capable cooling water equipment, wherein the filtration equipment includes a filtration space for a filter, wherein the water-purifying, oxygen-supply-capable cooling water equipment comprises a cooling oxidation unit disposed inside of a tank body and comprising a honeycombed or latticed porous material, wherein the filtration-function-equipped cooling water equipment operates to enlarge a contact area between water and air when untreated water drips onto the cooling oxidation unit and flows through the cooling oxidation unit while forced air flows in a counter current against the flow of water in the cooling oxidation unit, thereby facilitating solubility of oxygen in the untreated water and augmenting a cooling capability due to evaporation provided by the water-purifying, oxygen-supply-capable cooling water equipment.
    Type: Grant
    Filed: August 30, 2004
    Date of Patent: August 8, 2006
    Assignee: Fujikin Incorporated
    Inventors: Hisashi Miyamoto, Akira Nakano
  • Publication number: 20060160831
    Abstract: A compound having GSK-3 inhibitory activity. A1 and A3 are a single bond, an aliphatic hydrocarbon group; A2 and A4 are a single bond, CO, COO, CONR, O, OCO, NR, NRCO, NRCOO, etc.; G1 is a single bond, an aliphatic hydrocarbon, aromatic hydrocarbon, heterocyclic; G2 is H, an aliphatic hydrocarbon, an alicyclic hydrocarbon, an aromatic hydrocarbon, heterocyclic; A5 is a single bond, NR; R2 is H, halogen, an aliphatic hydrocarbon, alicyclic hydrocarbon, aromatic hydrocarbon, heterocyclic; A6 is a single bond, NR, CO, NRCO, NRCONR, CONR, COO, O, etc.; R3 is H, halogen, nitro, saturated aliphatic hydrocarbon, alicyclic hydrocarbon, aromatic hydrocarbon, heterocyclic; and R3 may be a trimethylsilyl, formyl, acyl, carboxyl, alkoxylcarbonyl, carbamoyl, alkylcarbamoyl, or cyano group when A6 is CR?CR or C?C, wherein R is H or an lower aliphatic hydrocarbon group.
    Type: Application
    Filed: August 26, 2004
    Publication date: July 20, 2006
    Applicant: TEIJIN PHARMA LIMITED
    Inventors: Takaharu Tsutsumi, Satoshi Sugiura, Masahiro Koga, Yoshiyuki Matsumoto, Toshihiro Ishii, Akira Nakano, Gen Unoki, Yuri Sakai, Reiko Takarada, Hiroko Ogawa
  • Publication number: 20060097291
    Abstract: The illuminating device includes a lens formed of a resin mold and having a portion for receiving an LED which is formed on one surface thereof, the LED received in the receiving portion, and a wiring member deposited on the receiving-portion-forming surface of the lens, and light irradiated from the LED is incident to the lens. In the method of fabricating the illuminating device, a transfer film having a conductive portion is set in a lens molding cavity and a wiring member including a conductive portion is deposited on one surface of the lens while the lens is injected and molded.
    Type: Application
    Filed: October 14, 2005
    Publication date: May 11, 2006
    Inventors: Hideyuki Takahashi, Satoshi Miyazawa, Tsuyoshi Hayama, Akira Nakano, Ryosuke Uchida
  • Publication number: 20060039803
    Abstract: A compressing unit of a hermetic compressor includes a suction valve placed at an opening of a compressing room and a suction muffler. The muffler includes a suction muffler body which forms a sound-deadening space, a first communicating path which communicates with the suction valve and with the sound-deadening space, and a second communicating path which communicates with a hermetic container and with the sound-deadening space. An opening, situated in the sound-deadening space, of the first communicating path, and an opening, situated in the sound-deadening space, of the second communicating path are both open in the same direction. In addition, a sound-insulating wall is disposed on the wall of the muffler body at a place at least confronting both of the openings. This structure achieves low noise and high efficiency.
    Type: Application
    Filed: July 27, 2004
    Publication date: February 23, 2006
    Applicant: MATSUSHITA ELECTRIC INDUSTRIAL CO., LTD
    Inventors: Akira Nakano, Ko Inagaki, Yoshinori Ishida, Shuhei Sugimoto
  • Publication number: 20050277773
    Abstract: The invention provides pyrrolo[3,2-d]pyrimidine derivatives represented by formula (I), and their medically acceptable salts. The compounds of the invention exhibit GSK-3 inhibiting activity and are therefore expected to be useful as therapeutic or prophylactic agents for conditions in which GSK-3 is implicated, such as diabetes, diabetes complications, Alzheimer's disease, neurodegenerative diseases, manic depression, traumatic encephalopathy, alopecia, inflammatory diseases, cancer and immune deficiency.
    Type: Application
    Filed: February 24, 2003
    Publication date: December 15, 2005
    Inventors: Kenichiro Kataoka, Tomomi Kosugi, Toshihiro Ishii, Takahiro Takeuchi, Takaharu Tsutsumi, Akira Nakano, Gen Unoki, Masanori Yamamoto, Yuri Sakai
  • Patent number: 6954033
    Abstract: A plasma processing apparatus of the present invention includes a matching circuit for impedance matching between a radio-frequency generator and a plasma processing chamber, and one or a plurality of impedance converting circuits provided between the matching circuit and the radio-frequency generator. The impedance converting circuit converts an impedance to decrease a difference in impedance to be matched by the matching circuit, thereby decreasing a change in the output impedance with a moving amount of a capacitance control of one of variable passive elements of the matching circuit, such as a load capacitor and a tuning capacitor. Therefore, a change in the impedance of the plasma processing chamber can be finely controlled.
    Type: Grant
    Filed: November 21, 2002
    Date of Patent: October 11, 2005
    Assignees: Alps Electric Co., Ltd.
    Inventors: Akira Nakano, Tadashi Kumagai, Tadahiro Ohmi
  • Publication number: 20050189645
    Abstract: A flexible printed circuit board includes a substrate layer composed of insulating material, a protection circuit of a thin-film capacitor element, the protection circuit including a first wiring layer on the substrate layer, a dielectric layer, and a counter electrode layer. At least a portion of each of the first wiring layer and the counter electrode layer serves as a terminal. The front surface of each of the first wiring layer and the counter electrode layer, except the terminal portion, is covered with an insulating coating.
    Type: Application
    Filed: February 15, 2005
    Publication date: September 1, 2005
    Inventors: Akira Nakano, Yoshiomi Tsuji, Yoshinari Higa
  • Publication number: 20050171094
    Abstract: A pyrrolo[3,2-d]pyrimidine derivative represented by the formula (I) or a pharamaceutically acceptable salt of the derivative. The derivative or salt is useful as a GSK-3 inhibitor.
    Type: Application
    Filed: February 24, 2003
    Publication date: August 4, 2005
    Inventors: Kenichiro Kataoka, Tomomi Kosugi, Toshihiro Ishii, Takahiro Takeuchi, Takaharu Tsutsumi, Akira Nakano, Yoji Yamamoto, Noboru Yoshioka
  • Publication number: 20050153992
    Abstract: A compound having GSK-3 inhibiting function. A1 and A3 are a single bond, an aliphatic hydrocarbon group; A2 and A4 are a single bond, CO, COO, CONR, O, OCO, NR, NRCO, NRCOO, etc.; G1 is a single bond, an aliphatic hydrocarbon, aromatic hydrocarbon, heterocyclic; G2 is a hydrogen atom, an aliphatic hydrocarbon, an alicyclic hydrocarbon, an aromatic hydrocarbon, heterocyclic; A5 is a single bond, NR; R2 is H, halogen, an aliphatic hydrocarbon, alicyclic hydrocarbon, aromatic hydrocarbon, heterocyclic; A6 is a single bond, NR, CO, NRCO, NRCONR, CONR, COO, O, etc.; R3 is H, halogen, nitro, saturated aliphatic hydrocarbon, alicyclic hydrocarbon, aromatic hydrocarbon, heterocyclic; and when A6 is CR?CR or C?C; R3 may be a trimethylsilyl, formyl, acyl, carboxyl, alkoxylcarbonyl, carbamoyl, alkylcarbamoyl or cyano group; and R is H or an aliphatic hydrocarbon group.
    Type: Application
    Filed: August 26, 2004
    Publication date: July 14, 2005
    Applicant: TEIJIN PHARMA LIMITED
    Inventors: Takaharu Tsutsumi, Satoshi Sugiura, Masahiro Koga, Yoshiyuki Matsumoto, Toshihiro Ishii, Akira Nakano, Gen Unoki, Yuri Sakai, Reiko Takarada, Hiroko Ogawa
  • Patent number: 6899787
    Abstract: A plasma processing unit has two electrodes for exciting a plasma, a plasma processing chamber, an RF generator, a matching circuit for performing impedance matching between the plasma processing chamber and the RF generator, a feeder that connects an output terminal of the matching circuit to one of the electrode, and a supplier that connects the RF generator to an input terminal of the matching circuit. The feeder is arranged to decrease the average density per unit volume of the RF power supplied from the RF generator as the RF power flows from the output terminal of the matching circuit to the electrode. The section of the plasma processing unit that is DC-grounded has a surface provided with a low-resistance portion. The supplier or the feeder is fixed on a floor using RF impedance adjustors so as to prevent the RF impedance therein from changing.
    Type: Grant
    Filed: June 14, 2002
    Date of Patent: May 31, 2005
    Assignees: Alps Electric Co., Ltd., Seiko Epson Corporation
    Inventors: Akira Nakano, Shintaro Asuke, Takeshi Miyashita, Tadahiro Ohmi
  • Publication number: 20050061443
    Abstract: A plasma processing apparatus including a plasma processing chamber having a plasma excitation electrode for exciting a plasma, a radiofrequency generator for supplying a radiofrequency voltage to the electrode, a radiofrequency feeder connected to the electrode, and a matching circuit having an input terminal and an output end. The input terminal is connected to the radiofrequency generator and the output end is connected to an end of the radiofrequency feeder so as to achieve impedance matching between the plasma processing chamber and the radiofrequency generator. A frequency which is three times a first series resonant frequency f0 of the plasma processing chamber, which is measured at the end of the radiofrequency feeder, is larger than a power frequency fe of the radiofrequency waves.
    Type: Application
    Filed: September 24, 2004
    Publication date: March 24, 2005
    Inventors: Akira Nakano, Tadahiro Ohmi
  • Patent number: 6871111
    Abstract: A plasma processing apparatus has a plasma processing chamber having a plasma excitation electrode, a radiofrequency generator connected to the plasma excitation electrode, and a matching circuit for matching the impedance between the plasma processing chamber and the radiofrequency generator. The loss capacitance CX1 at a later time t1 after delivery is measured between the plasma excitation electrode and ground potential positions which are grounded. The performance is evaluated by whether or not the loss capacitance CX1 is less than 26 times the plasma electrode capacitance Ce1 at the later time t1 between the plasma excitation electrode and a counter electrode which cooperate with each other.
    Type: Grant
    Filed: September 4, 2003
    Date of Patent: March 22, 2005
    Assignees: Alps Electric Co., Ltd.
    Inventors: Akira Nakano, Tadahiro Ohmi
  • Publication number: 20050029176
    Abstract: Filtration-function-equipped cooling water equipment that includes: filtration equipment connected to water-purifying, oxygen-supply-capable cooling water equipment, wherein the filtration equipment includes a filtration space for a filter, wherein the water-purifying, oxygen-supply-capable cooling water equipment comprises a cooling oxidation unit disposed inside of a tank body and comprising a honeycombed or latticed porous material, wherein the filtration-function-equipped cooling water equipment operates to enlarge a contact area between water and air when untreated water drips onto the cooling oxidation unit and flows through the cooling oxidation unit while forced air flows in a counter current against the flow of water in the cooling oxidation unit, thereby facilitating solubility of oxygen in the untreated water and augmenting a cooling capability due to evaporation provided by the water-purifying, oxygen-supply-capable cooling water equipment.
    Type: Application
    Filed: August 30, 2004
    Publication date: February 10, 2005
    Applicant: Fujikin Incorporated
    Inventors: Hisashi Miyamoto, Akira Nakano
  • Publication number: 20050000440
    Abstract: A plasma processing apparatus comprising a plurality of plasma processing units is provided. Each of the plasma processing units has a matching circuit connected between a radiofrequency generator and a plasma excitation electrode. Among these plasma processing units, a variation <RA> between the maximum and minimum values of input-terminal-side AC resistances RA of the matching circuits defined by <RA>=(RAmax?RAmin)/(RAmax+RAmin) is adjusted to be less than 0.5. A variation between the maximum and minimum values of output-terminal-side AC resistances RB of the matching circuits defined by <RB>=(RBmax?RBmin)./(RBmax+RBmin) is also adjusted to be less than 0.5. The plasma processing units can be adjusted to achieve substantially uniform plasma results in a shorter period of time.
    Type: Application
    Filed: August 27, 2004
    Publication date: January 6, 2005
    Inventors: Akira Nakano, Tadahiro Ohmi
  • Publication number: 20040250770
    Abstract: The performance of a plasma processing apparatus which is disassembled, transferred, and reassembled is evaluated. The plasma processing apparatus has a plasma processing chamber having an electrode for exciting a plasma, a radiofrequency generator connected to the electrode, and an impedance matching circuit for performing the impedance matching between the plasma processing chamber and the radiofrequency generator. The performance of the apparatus is evaluated whether or not three times the first series resonant frequency of the plasma processing chamber is larger than the power frequency supplied to the plasma processing chamber.
    Type: Application
    Filed: July 9, 2004
    Publication date: December 16, 2004
    Inventors: Akira Nakano, Tadahiro Ohmi
  • Publication number: 20040243269
    Abstract: A plasma processing apparatus has a plasma processing chamber having a plasma excitation electrode, a radiofrequency generator connected to the plasma excitation electrode, and a matching circuit for matching the impedance between the plasma processing chamber and the radiofrequency generator. The loss capacitance CX1 at a later time t1 after delivery is measured between the plasma excitation electrode and ground potential positions which are grounded. The performance is evaluated by whether or not the loss capacitance CX1 is less than 26 times the plasma electrode capacitance Ce1 at the later time t1 between the plasma excitation electrode and a counter electrode which cooperate with each other.
    Type: Application
    Filed: September 4, 2003
    Publication date: December 2, 2004
    Inventors: Akira Nakano, Tadahiro Ohmi
  • Patent number: 6795796
    Abstract: The performance of a plasma processing apparatus which is disassembled, transferred, and reassembled is evaluated. The plasma processing apparatus has a plasma processing chamber having an electrode for exciting a plasma, a radiofrequency generator connected to the electrode, and an impedance matching circuit for performing the impedance matching between the plasma processing chamber and the radiofrequency generator. The performance of the apparatus is evaluated whether or not three times the first series resonant frequency of the plasma processing chamber is larger than the power frequency supplied to the plasma processing chamber.
    Type: Grant
    Filed: September 20, 2001
    Date of Patent: September 21, 2004
    Assignees: Alps Electric Co., Ltd.
    Inventors: Akira Nakano, Tadahiro Ohmi