Abstract: Provided is an article sorting device that can handle various containers without necessarily requiring a change of parts. The article sorting device includes a rotating table, a pocket, a guide, a position control unit, and a sorting unit. The position control unit controls a radial position of the pocket to a specified position that is a first position or a second position located radially outward relative to the first position. The sorting unit guides an article to different paths depending on whether the radial position of the pocket is at the first position or the second position when a circumferential position of the pocket reaches a sorting position.

Abstract: Provided is a transport device that can transport two or more types of articles without necessarily requiring a change of parts. The transport device includes a guide extending in a transport direction of an article, and a holding unit configured to hold the article between the holding unit and the guide and to move in the transport direction. The holding unit includes two or more roller units. In each roller unit, two or more rollers, including a first roller and a second roller with a diameter larger than a diameter of the first roller, are aligned along an axial direction. The holding unit is movable in the axial direction. The holding unit is moved in the axial direction to thereby switch the rollers abutting the article among the two or more rollers.

Abstract: A second dynamic vibration absorber is higher in resonance frequency than a first dynamic vibration absorber. At least one of the resonance frequency of the first dynamic vibration absorber or the resonance frequency of the second dynamic vibration absorber is shifted from associated at least one of the first resonance frequency or the second resonance frequency such that a peak frequency of antiresonance occurring in a higher frequency region of the first dynamic vibration absorber than the resonance frequency of the first dynamic vibration absorber is substantially different from that of antiresonance occurring in a lower frequency region of the second dynamic vibration absorber than the resonance frequency of the second dynamic vibration absorber.

Abstract: A second dynamic vibration absorber is higher in resonance frequency than a first dynamic vibration absorber. At least one of a ratio of a mass of a body of the first dynamic vibration absorber to a reciprocating inertial mass of the reciprocative rotation mechanism or a ratio of a mass of a body of the second dynamic vibration absorber to the reciprocating inertial mass of the reciprocative rotation mechanism is set such that a peak frequency of antiresonance occurring in a higher frequency region of the first dynamic vibration absorber than the resonance frequency of the first dynamic vibration absorber is substantially different from that of antiresonance occurring in a lower frequency region of the second dynamic vibration absorber than the resonance frequency of the second dynamic vibration absorber.

Abstract: A second dynamic vibration absorber is higher in resonance frequency than a first dynamic vibration absorber. At least one of a ratio of a mass of a body of the first dynamic vibration absorber to a reciprocating inertial mass of the reciprocative rotation mechanism or a ratio of a mass of a body of the second dynamic vibration absorber to the reciprocating inertial mass of the reciprocative rotation mechanism is set such that a peak frequency of antiresonance occurring in a higher frequency region of the first dynamic vibration absorber than the resonance frequency of the first dynamic vibration absorber is substantially different from that of antiresonance occurring in a lower frequency region of the second dynamic vibration absorber than the resonance frequency of the second dynamic vibration absorber.

Abstract: A second dynamic vibration absorber is higher in resonance frequency than a first dynamic vibration absorber. At least one of the resonance frequency of the first dynamic vibration absorber or the resonance frequency of the second dynamic vibration absorber is shifted from associated at least one of the first resonance frequency or the second resonance frequency such that a peak frequency of antiresonance occurring in a higher frequency region of the first dynamic vibration absorber than the resonance frequency of the first dynamic vibration absorber is substantially different from that of antiresonance occurring in a lower frequency region of the second dynamic vibration absorber than the resonance frequency of the second dynamic vibration absorber.

Abstract: An engine piston structure includes: a piston (1); a connecting rod (10) having a small end part (10a) coupled to the piston (1), and having a large end part (10b) coupled to a crankshaft; a piston pin (2) through which the piston (1) and the small end part (10a) of the connecting rod (10) are coupled together and which has a hollow cross section; and at least one dynamic vibration absorber (20) provided inside the piston pin (2) to reduce resonance of the piston (1), the piston pin (2), and the small end part (10a) of the connecting rod (10) in combination with respect to the large end part (10b) of the connecting rod (10) during a combustion stroke.

Abstract: An engine piston structure includes: a piston (1); a connecting rod (10) having a small end part (10a) coupled to the piston (1), and having a large end part (10b) coupled to a crankshaft; a piston pin (2) through which the piston (1) and the small end part (10a) of the connecting rod (10) are coupled together and which has a hollow cross section; and at least one dynamic vibration absorber (20) provided inside the piston pin (2) to reduce resonance of the piston (1), the piston pin (2), and the small end part (10a) of the connecting rod (10) in combination with respect to the large end part (10b) of the connecting rod (10) during a combustion stroke.

Abstract: A collector mirror exchanging apparatus capable of safely and easily exchanging a collector mirror for collecting extreme ultra violet light emitted from plasma generated within a chamber of an extreme ultra violet light source apparatus. The collector mirror exchanging apparatus includes: a supporting base for supporting a collector mirror or a collector mirror structure; and a guiding rail disposed on the supporting base and regulating a moving direction of the collector mirror or the collector mirror structure; wherein at least the collector mirror is taken out of the chamber by moving the collector mirror or the collector mirror structure along the guiding rail on the supporting base.

Abstract: An EUV (Extreme Ultra Violet) light source device ionizes a target material in an ionizer, and supplies the ionized target material to a point of generating a plasma. This reduces the generation of debris. The ionizer simultaneously irradiates laser beams of plural wavelengths corresponding to the excited level of tin on a target material to ionize the target material. The ionized target material is extracted from the ionizer with a high voltage applied from an ion beam extractor, and accelerated and supplied to a plasma generation chamber. When driver laser beam is irradiated on the ionized target material, a plasma is generated, thereby emitting EUV radiation.

Abstract: An extreme ultraviolet light source apparatus using a spectrum purity filter capable of obtaining EUV light with high spectrum purity. The apparatus includes a chamber; a target supply unit for supplying a target material; a driver laser using a laser gas containing a carbon dioxide gas as a laser medium, for applying a laser beam to the target material to generate plasma; a collector mirror for collecting and outputting the extreme ultraviolet light radiated from the plasma; and a spectrum purity filter provided in an optical path of the extreme ultraviolet light, for transmitting the extreme ultraviolet light and reflecting the laser beam, the spectrum purity filter including a mesh having electrical conductivity and formed with an arrangement of apertures having a pitch not larger than a half of a shortest wavelength of the laser beam applied by the driver laser.

Abstract: An EUV (Extreme Ultra Violet) light source device ionizes a target material in an ionizer, and supplies the ionized target material to a point of generating a plasma. This reduces the generation of debris. The ionizer simultaneously irradiates laser beams of plural wavelengths corresponding to the excited level of tin on a target material to ionize the target material. The ionized target material is extracted from the ionizer with a high voltage applied from an ion beam extractor, and accelerated and supplied to a plasma generation chamber. When driver laser beam is irradiated on the ionized target material, a plasma is generated, thereby emitting EUV radiation.

Abstract: An extreme ultraviolet light source apparatus using a spectrum purity filter capable of obtaining EUV light with high spectrum purity. The apparatus includes a chamber; a target supply unit for supplying a target material; a driver laser using a laser gas containing a carbon dioxide gas as a laser medium, for applying a laser beam to the target material to generate plasma; a collector mirror for collecting and outputting the extreme ultraviolet light radiated from the plasma; and a spectrum purity filter provided in an optical path of the extreme ultraviolet light, for transmitting the extreme ultraviolet light and reflecting the laser beam, the spectrum purity filter including a mesh having electrical conductivity and formed with an arrangement of apertures having a pitch not larger than a half of a shortest wavelength of the laser beam applied by the driver laser.

Abstract: An extreme ultraviolet light source apparatus using a spectrum purity filter capable of obtaining EUV light with high spectrum purity. The apparatus includes a chamber; a target supply unit for supplying a target material; a driver laser using a laser gas containing a carbon dioxide gas as a laser medium, for applying a laser beam to the target material to generate plasma; a collector mirror for collecting and outputting the extreme ultraviolet light radiated from the plasma; and a spectrum purity filter provided in an optical path of the extreme ultraviolet light, for transmitting the extreme ultraviolet light and reflecting the laser beam, the spectrum purity filter including a mesh having electrical conductivity and formed with an arrangement of apertures having a pitch not larger than a half of a shortest wavelength of the laser beam applied by the driver laser.

Abstract: An extreme ultraviolet light source apparatus provided with a magnetic field forming unit having sufficient capability of protection against ions radiated from plasma while using a relatively small magnetic source. The apparatus includes: a target nozzle for injecting a target material; a driver laser for applying a laser beam to the target material to generate plasma; a collector mirror for collecting extreme ultraviolet light radiated from the plasma; and a magnetic field forming unit including at least one magnetic source and at least one magnetic material having two leading end parts projecting from the at least one magnetic source to face each other with a plasma emission point in between, and forming a magnetic field between a trajectory of the target material and the collector mirror.

Abstract: An ion withdrawal apparatus that withdraws ions emitted from a plasma in an EUV light production apparatus in which a target at an EUV light production point is irradiated with laser light to be made in a plasma state and the target emits EUV light, the ion withdrawal apparatus which includes: a collector mirror that is disposed in a direction opposite to a laser light incidence direction to collect the EUV light and has a hole for the ions to pass therethrough; magnetic line of force production means that produces a magnetic line of force that is parallel or approximately parallel to the laser light incidence direction at or in the vicinity of the EUV light production point; and ion withdrawal means that is disposed on the opposite side of the collector mirror from the EUV light production point and withdraws the ions.

Abstract: An extreme ultraviolet light source apparatus using a spectrum purity filter capable of obtaining EUV light with high spectrum purity. The apparatus includes a chamber; a target supply unit for supplying a target material; a driver laser using a laser gas containing a carbon dioxide gas as a laser medium, for applying a laser beam to the target material to generate plasma; a collector mirror for collecting and outputting the extreme ultraviolet light radiated from the plasma; and a spectrum purity filter provided in an optical path of the extreme ultraviolet light, for transmitting the extreme ultraviolet light and reflecting the laser beam, the spectrum purity filter including a mesh having electrical conductivity and formed with an arrangement of apertures having a pitch not larger than a half of a shortest wavelength of the laser beam applied by the driver laser.

Abstract: A collector mirror exchanging apparatus is capable of safely and easily exchanging a collector mirror for collecting extreme ultra violet light emitted from plasma generated within a chamber of an extreme ultra violet light source apparatus. The collector mirror exchanging apparatus includes: a supporting base for supporting a collector mirror or a collector mirror structure; and a guiding rail disposed on the supporting base and regulating a moving direction of the collector mirror or the collector mirror structure; wherein at least the collector mirror is taken out of the chamber by moving the collector mirror or the collector mirror structure along the guiding rail on the supporting base.

Abstract: An EUV (Extreme Ultra Violet) light source device ionizes a target material in an ionizer, and supplies the ionized target material to a point of generating a plasma. This reduces the generation of debris. The ionizer simultaneously irradiates laser beams of plural wavelengths corresponding to the excited level of tin on a target material to ionize the target material. The ionized target material is extracted from the ionizer with a high voltage applied from an ion beam extractor, and accelerated and supplied to a plasma generation chamber. When driver laser beam is irradiated on the ionized target material, a plasma is generated, thereby emitting EUV radiation.

Abstract: In an extreme ultra violet light source apparatus of a laser produced plasma type, charged particles such as ions emitted from plasma are promptly ejected to the outside of a chamber. The apparatus includes a chamber, a target supply unit for supplying a target material into the chamber, a collector mirror for collecting extreme ultra violet light radiated from plasma generated by irradiating the target material with a laser beam to output the extreme ultra violet light, an electromagnet arranged outside of the chamber, and a charged particle collection mechanism provided on at least one of two surfaces of the chamber to which lines of magnetic force generated by the electromagnet extend.