Patents by Inventor Akiya Kawaue

Akiya Kawaue has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20190346765
    Abstract: A chemically amplified positive-type photosensitive resin composition which is highly sensitive and in which it is easy to form a resist pattern whose cross-sectional shape is rectangular, a photosensitive dry film which includes a photosensitive resin layer formed from the composition, a method of manufacturing the photosensitive dry film, a method of manufacturing a patterned resist film using the composition, a method of manufacturing a substrate with a template using the composition and a method of manufacturing a plated article using the substrate with the template. A Lewis acid compound is included in the composition that also includes an acid generator which generates an acid by application of an active ray or radiation, and a resin whose solubility in alkali is increased by action of an acid.
    Type: Application
    Filed: April 25, 2019
    Publication date: November 14, 2019
    Inventors: Akiya KAWAUE, Shota KATAYAMA, Kazuaki EBISAWA
  • Publication number: 20190276698
    Abstract: A method of producing a structure containing a phase-separated structure, including: a step of using a resin composition for forming a phase-separated structure including a block copolymer and an ion liquid containing a compound (IL) having a cation moiety and an anion moiety to form a BCP layer (3) containing a block copolymer on a substrate (1); and a step of vaporizing at least a part of the compound (IL), and phase-separating the BCP layer (3) to obtain a structure (3?) containing a phase-separated structure.
    Type: Application
    Filed: September 26, 2017
    Publication date: September 12, 2019
    Inventors: Takahiro DAZAI, Hitoshi YAMANO, Akiya KAWAUE, Ken MIYAGI
  • Publication number: 20190121233
    Abstract: A chemically amplified positive-type photosensitive resin composition capable of suppressing the occurrence of “footing” in which the width of the bottom (the side proximal to the surface of a support) becomes narrower than that of the top (the side proximal to the surface of a resist layer) in the nonresist portion; and the generation of development residue when a resist pattern serving as a template for a plated article is formed on a metal surface of a substrate using the photosensitive resin composition. A mercapto compound having a specific structure is included in the photosensitive resin composition, and includes an acid generator which generates acid upon exposure to an irradiated active ray or radiation, and a resin whose solubility in alkali increases under the action of acid.
    Type: Application
    Filed: October 15, 2018
    Publication date: April 25, 2019
    Inventors: Akiya KAWAUE, Yuta YAMAMOTO, Kazuaki EBISAWA, Yasushi KUROIWA
  • Publication number: 20190101825
    Abstract: A chemically amplified positive-type photosensitive resin composition capable of suppressing the occurrence of “footing” in which the width of the bottom (the side proximal to the surface of a support) becomes narrower than the top (the side proximal to the surface of a resist layer) in the nonresist portion when a resist pattern serving as a template for a plated article is formed on a metal surface of a substrate having a metal surface using the composition. A mercapto compound with a specific structure is added to the composition and includes an acid generator which generates acid upon exposure to an irradiated active ray or radiation and a resin the solubility of which in alkali increases under the action of acid.
    Type: Application
    Filed: September 20, 2018
    Publication date: April 4, 2019
    Inventors: Akiya KAWAUE, Yasushi KUROIWA, Shota KATAYAMA, Kazuaki EBISAWA
  • Patent number: 10179866
    Abstract: A resin composition for forming a phase-separated structure, including: a block copolymer, and an ion liquid containing a compound (IL) having a cation moiety and an anion moiety, the cation moiety of the compound (IL) having a dipole moment of 3 debye or more.
    Type: Grant
    Filed: February 18, 2016
    Date of Patent: January 15, 2019
    Assignees: TOKYO OHKA KOGYO CO., LTD., THE UNIVERSITY OF CHICAGO
    Inventors: Akiya Kawaue, Takehiro Seshimo, Takaya Maehashi, Tasuku Matsumiya, Ken Miyagi, Hitoshi Yamano, Xuanxuan Chen, Paul Franklin Nealey
  • Patent number: 10100134
    Abstract: A method for manufacturing a polymer compound which has a constituent unit (a10) which includes a hydroxy group and a constituent unit (a1) which includes an acid decomposable group of which a polarity increases due to an effect of an acid, the method including copolymerizing a monomer for deriving a constituent unit (a0) which includes a group which protects a phenolic hydroxyl group or a hydroxy group of a carboxy group with an organic silicon compound and a monomer for deriving the constituent unit (a1) and obtaining a prepolymer which has the constituent unit (a0) and the constituent unit (a1), and selectively deprotecting the constituent unit (a0) by reacting a compound which has a fluoride anion with the prepolymer and obtaining a polymer compound which has the constituent unit (a10) and the constituent unit (a1).
    Type: Grant
    Filed: December 5, 2016
    Date of Patent: October 16, 2018
    Assignee: TOKYO OHKA KOGYO CO., LTD.
    Inventors: Masatoshi Arai, Yoshitaka Komuro, Akiya Kawaue
  • Publication number: 20180273794
    Abstract: A brush composition usable for phase-separation of a layer containing a block copolymer formed on a substrate, the brush composition including a resin component (A), the resin component (A) containing a polymeric compound (A1) in which a first polymer block and a second polymer block are bonded to each other through a linking group containing a substrate adhering group.
    Type: Application
    Filed: March 19, 2018
    Publication date: September 27, 2018
    Inventor: Akiya KAWAUE
  • Patent number: 9914847
    Abstract: A resin composition for forming a phase-separated structure, including: a block copolymer, and an ion liquid containing a compound (IL) having a cation moiety and an anion moiety, the energy of the LUMO of the cation moiety being ?4.5 eV or more, and the energy difference between the LUMO and the HOMO of the cation moiety being 10.0 ev or more, or the Log P value of the anion moiety being 1 to 3.
    Type: Grant
    Filed: June 17, 2016
    Date of Patent: March 13, 2018
    Assignees: TOKYO OHKA KOGYO CO., LTD., THE UNIVERSITY OF CHICAGO
    Inventors: Akiya Kawaue, Takehiro Seshimo, Takaya Maehashi, Tasuku Matsumiya, Ken Miyagi, Hitoshi Yamano, Xuanxuan Chen, Paul Franklin Nealey
  • Publication number: 20170362460
    Abstract: A resin composition for forming a phase-separated structure, including: a block copolymer, and an ion liquid containing a compound (IL) having a cation moiety and an anion moiety, the energy of the LUMO of the cation moiety being ?4.5 eV or more, and the energy difference between the LUMO and the HOMO of the cation moiety being 10.0 ev or more, or the Log P value of the anion moiety being 1 to 3.
    Type: Application
    Filed: June 17, 2016
    Publication date: December 21, 2017
    Inventors: Akiya KAWAUE, Takehiro SESHIMO, Takaya MAEHASHI, Tasuku MATSUMIYA, Ken MIYAGI, Hitoshi YAMANO, Xuanxuan CHEN, Paul Franklin NEALEY
  • Patent number: 9828519
    Abstract: A resin composition for forming a phase-separated structure, including a block copolymer, and an ion liquid containing a compound having a cation moiety and an anion moiety, the anion moiety being represented by general formula (a1), (a2) or (a3), in which X? represents an alkylene group of 2 to 6 carbon atoms in which at least one hydrogen atom is substituted with a fluorine atom; Y? and Z? each independently represents an alkyl group of 1 to 10 carbon atoms in which at least one hydrogen atom is substituted with a fluorine atom; R? represents an alkyl group of 1 to 5 carbon atoms in which at least one hydrogen atom is optionally substituted with a fluorine atom, m represents an integer of 1 to 6, and n represents an integer of 0 to 5, provided that m+n=6.
    Type: Grant
    Filed: February 18, 2016
    Date of Patent: November 28, 2017
    Assignees: TOKYO OHKA KOGYO CO., LTD., THE UNIVERSITY OF CHICAGO
    Inventors: Akiya Kawaue, Takehiro Seshimo, Takaya Maehashi, Tasuku Matsumiya, Ken Miyagi, Hitoshi Yamano, Xuanxuan Chen, Paul Franklin Nealey
  • Patent number: 9776208
    Abstract: A brush composition used for phase-separation of a layer containing a block copolymer having plural kinds of blocks bonded formed on a substrate, the brush composition including a resin component, the resin component having a structural unit (u1) represented by genera formula (u1-1), and having a hydroxy group on at least one terminal portion of the main chain thereof: in formula (u1-1), R represents a hydrogen atom, an alkyl group of 1 to 5 carbon atoms or a halogenated alkyl group of 1 to 5 carbon atoms; R1 represents a halogen atom, or a linear, branched or cyclic hydrocarbon group of 1 to 20 carbon atoms optionally containing an oxygen atom, a halogen atom or a silicon atom, or a combination of the linear, branched or cyclic hydrocarbon group; and p represents an integer of 1 to 5.
    Type: Grant
    Filed: December 3, 2015
    Date of Patent: October 3, 2017
    Assignee: TOKYO OHKA KOGYO CO., LTD.
    Inventors: Masahito Yahagi, Takaya Maehashi, Akiya Kawaue, Issei Suzuki, Tasuku Matsumiya, Tsuyoshi Kurosawa, Hitoshi Yamano
  • Publication number: 20170240767
    Abstract: A resin composition for forming a phase-separated structure, including a block copolymer, and an ion liquid containing a compound having a cation moiety and an anion moiety, the anion moiety being represented by general formula (a1), (a2) or (a3), in which X? represents an alkylene group of 2 to 6 carbon atoms in which at least one hydrogen atom is substituted with a fluorine atom; Y? and Z? each independently represents an alkyl group of 1 to 10 carbon atoms in which at least one hydrogen atom is substituted with a fluorine atom; R? represents an alkyl group of 1 to 5 carbon atoms in which at least one hydrogen atom is optionally substituted with a fluorine atom, m represents an integer of 1 to 6, and n represents an integer of 0 to 5, provided that m+n=6.
    Type: Application
    Filed: February 18, 2016
    Publication date: August 24, 2017
    Inventors: Akiya KAWAUE, Takehiro SESHIMO, Takaya MAEHASHI, Tasuku MATSUMIYA, Ken MIYAGI, Hitoshi YAMANO, Xuanxuan CHEN, Paul Franklin NEALEY
  • Publication number: 20170240766
    Abstract: A resin composition for forming a phase-separated structure, including: a block copolymer, and an ion liquid containing a compound (IL) having a cation moiety and an anion moiety, the cation moiety of the compound (IL) having a dipole moment of 3 debye or more.
    Type: Application
    Filed: February 18, 2016
    Publication date: August 24, 2017
    Inventors: Akiya KAWAUE, Takehiro SESHIMO, Takaya MAEHASHI, Tasuku MATSUMIYA, Ken MIYAGI, Hitoshi YAMANO, Xuanxuan CHEN, Paul Franklin NEALEY
  • Publication number: 20170166664
    Abstract: A method for manufacturing a polymer compound which has a constituent unit (a10) which includes a hydroxy group and a constituent unit (a1) which includes an acid decomposable group of which a polarity increases due to an effect of an acid, the method including copolymerizing a monomer for deriving a constituent unit (a0) which includes a group which protects a phenolic hydroxyl group or a hydroxy group of a carboxy group with an organic silicon compound and a monomer for deriving the constituent unit (a1) and obtaining a prepolymer which has the constituent unit (a0) and the constituent unit (a1), and selectively deprotecting the constituent unit (a0) by reacting a compound which has a fluoride anion with the prepolymer and obtaining a polymer compound which has the constituent unit (a10) and the constituent unit (a1).
    Type: Application
    Filed: December 5, 2016
    Publication date: June 15, 2017
    Inventors: Masatoshi ARAI, Yoshitaka KOMURO, Akiya KAWAUE
  • Publication number: 20160194751
    Abstract: A brush composition used for phase-separation of a layer containing a block copolymer having plural kinds of blocks bonded formed on a substrate, the brush composition including a resin component, the resin component having a structural unit (u1) represented by genera formula (u1-1), and having a hydroxy group on at least one terminal portion of the main chain thereof: in formula (u1-1), R represents a hydrogen atom, an alkyl group of 1 to 5 carbon atoms or a halogenated alkyl group of 1 to 5 carbon atoms; R1 represents a halogen atom, or a linear, branched or cyclic hydrocarbon group of 1 to 20 carbon atoms optionally containing an oxygen atom, a halogen atom or a silicon atom, or a combination of the linear, branched or cyclic hydrocarbon group; and p represents an integer of 1 to 5.
    Type: Application
    Filed: December 3, 2015
    Publication date: July 7, 2016
    Inventors: Masahito YAHAGI, Takaya MAEHASHI, Akiya KAWAUE, Issei SUZUKI, Tasuku MATSUMIYA, Tsuyoshi KUROSAWA, Hitoshi YAMANO
  • Patent number: 9244347
    Abstract: A resist composition comprising a compound (m0) (wherein Rb1 represents an electron withdrawing group; Rb2 and Rb3 each independently represents an aryl group, an alkyl group or an alkenyl group, provided that Rb2 and Rb3 may be mutually bonded to form a ring with the sulfur atom; and X0? represents a monovalent counteranion).
    Type: Grant
    Filed: May 30, 2014
    Date of Patent: January 26, 2016
    Assignee: TOKYO OHKA KOGYO CO., LTD.
    Inventors: Yoshitaka Komuro, Takaaki Kaiho, Toshiaki Hato, Akiya Kawaue, Junichi Tsuchiya, Yoshiyuki Utsumi
  • Patent number: 9164380
    Abstract: A resist composition containing a base component (A) that exhibits changed solubility in a developing solution under action of acid, a photoreactive quencher (C), and an acid generator component (B) that generates acid upon exposure, and further containing an acid (G) having a pKa of 4 or less.
    Type: Grant
    Filed: December 11, 2012
    Date of Patent: October 20, 2015
    Assignee: TOKYO OHKA KOGYO CO., LTD.
    Inventors: Yoshitaka Komuro, Yoshiyuki Utsumi, Akiya Kawaue, Toshiaki Hato
  • Patent number: 9063416
    Abstract: A resist composition comprising: a base component (A) that exhibits changed solubility in a developing solution by the action of acid; a photoreactive quencher (C); and an acid-generator component (B) that generates acid upon exposure, wherein the photoreactive quencher (C) contains a compound represented by general formula (c1) shown below. In the formula, R1 represents a hydrogen atom or a hydrocarbon group of 1 to 20 carbon atoms which may have a substituent; each of R2 and R3 independently represents a hydrogen atom or a hydrocarbon group of 1 to 20 carbon atoms which may have a substituent; at least two of R1 to R3 may be mutually bonded to form a ring; X represents an oxygen atom or a sulfur atom; n represents 0 or 1; and Z+ represents an organic cation.
    Type: Grant
    Filed: December 6, 2012
    Date of Patent: June 23, 2015
    Assignee: Tokyo Ohka Kogyo Co., Ltd.
    Inventors: Yoshitaka Komuro, Yoshiyuki Utsumi, Akiya Kawaue, Toshiaki Hato
  • Patent number: 9052592
    Abstract: A resist composition contains a high-molecular weight compound which has a partial structure represented by a general formula (a0-r-1) and has a constituent unit represented by a general formula (a0-1). In the formula (a0-r-1), Y1 represents a divalent linking group; each of R2 and R3 represents a group having 0 to 20 carbon atoms, which is not a fluorine atom, and either R2 or R3 may form a ring with Y1; m represents an integer of 1 or more; and Mm+ represents an m-valent organic cation. In the formula (a0-1), R represents a hydrogen atom, an alkyl group, or a halogenated alkyl group; Ya01 represents a single bond or a divalent linking group; X01 represents a sulfur atom or an oxygen atom; and Ra01 represents an optionally substituted cyclic group, chain alkyl group or chain alkenyl group.
    Type: Grant
    Filed: March 18, 2014
    Date of Patent: June 9, 2015
    Assignee: Tokyo Ohka Kogyo Co., Ltd.
    Inventors: Tsuyoshi Nakamura, Kazuishi Tanno, Akiya Kawaue, Takayoshi Mori
  • Patent number: 9040224
    Abstract: A resist composition which generates acid upon exposure and exhibits changed solubility in a developing solution under action of acid, including a base component (A) which exhibits changed solubility in a developing solution under action of acid, and a photo-decomposable quencher (D0) containing a compound represented by general formula (d0) shown below. In the formula, R1 represents a hydrocarbon group of 4 to 20 carbon atoms which may have a substituent; Y1 represents a single bond or a divalent linking group; R2 and R3 each independently represents a substituent of 0 to 20 carbon atoms other than a fluorine atom; one of R2 and R3 may form a ring with Y1; Mm+ represents an organic cation having a valency of m; and m represents an integer of 1 or more.
    Type: Grant
    Filed: December 18, 2013
    Date of Patent: May 26, 2015
    Assignee: Tokyo Ohka Kogyo Co., Ltd.
    Inventors: Akiya Kawaue, Takaaki Kaiho, Tsuyoshi Nakamura