Abstract: An improved deflection amplifier interconnection circuit structure for charged particle beam write/read apparatus having a deflector stage wherein the charged particle apparatus is mounted within an evacuated housing by a support member. Transmission line-type printed wiring conductor patterns are provided within the insulating support member which serves as a combined electrical and vacuum feed-thru structure. The transmission line-type printed wiring conductor pattern interconnects the output of a deflector drive amplifier to the deflector element of the charged particle beam apparatus within the evacuated housing. An improved impedance match between the deflector drive amplifier and the deflector element is obtained along with improved cooling capability for the amplifier and elimination of the need for mounting the amplifier within a separate housing remotely located from the evacuated housing for the charged particle apparatus.

Abstract: The invention provides a modular-building block method and system of fabrication, installation, alignment and operation of a multi-beam assembly of miniaturized, all-electrostatic charged particle optical columns, such electron beam or ion beam optical columns mounted in parallel in a closely packed cluster over a small target surface area for parallel simultaneous charged particle beam writing on the target surface with the multiple-channel cluster of charged particle beam optical columns. The assembly provides a system and method of increased thru-put in the direct charged particle beam writing on semiconductor target wafers during fabrication of semiconductor micro-circuit chips.

Abstract: In an electron beam lithography apparatus a capacitance height gauge is used to determine the distance between a reticule and electron optics. In order to calibrate the capacitance gauge an optical interferometer, including a mirror are mounted on the same axis as the capacitance gauge. The mirror is moved a predetermined distance so that the movement distance measured by the capacitance gauge and the interferometer can be compared.

Abstract: A method of calibrating a capacitance height gage for an electron beam lithography machine. The electron beam apparatus having the capacitance height gage to be calibrated is first mounted in a calibration fixture wherein the distance between the gage and a calibration reticle is adjusted using a laser interferometer. The electron beam is directed to a center high backscatter point, and then deflected to a predetermined high backscatter point. The capacitance gage readings and deflection voltages are measured to define a calibration plane. The electron beam apparatus is then repositioned to the lithography station having a reticle positioned below the electron beam. The distance to the reticle is measured with the capacitance gage, and the deflection of the electron beam during lithography operations is adjusted according to the variation of the reticle plane from the calibration plane.

Abstract: In a linear tone arm tracking system for a record player where the stylus tone arm moves on a guiderail across a recording, eg. a record disc on a turntable, an improvement is provided in which the stylus tone arm is connected to a partial sleeve, which sleeve hovers partially over the guiderail and means, such as air pressure means, causes the partial sleeve to hover over the guiderail in proximity therewith, so that when the stylus rides in the record groove and is laterally shifted thereby, the tone arm and partial sleeve readily shift over the guiderail in response to the shift of the stylus.Further provided is a means for raising and lowering the guiderail which adjusts the elevation of the partial sleeve and tone arm and accordingly adjusts the vertical tracking angle of the stylus in the record groove.