Patents by Inventor Albertus Aemillius Seyno Sluijterman

Albertus Aemillius Seyno Sluijterman has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20200118788
    Abstract: The invention relates to a charged particle microscope for examining a specimen, and a method of calibrating a charged particle microscope. The charged particle microscope comprises an optics column, including a charged particle source, a final probe forming lens and a scanner, for focusing and scanning a beam of charged particles emitted from said charged particle source along an optical axis onto a specimen. Furthermore, a specimen stage is positioned downstream of said final probe forming lens and arranged for holding said specimen. Additionally, a detector device is provided, comprising at least two detector segment elements that are annularly spaced about said optical axis. A control unit is provided that is arranged for obtaining, for the at least two detector segment elements, corresponding detector segment images of said specimen by scanning the beam over said specimen.
    Type: Application
    Filed: October 9, 2019
    Publication date: April 16, 2020
    Applicant: FEI Company
    Inventors: Albertus Aemillius Seyno Sluijterman, Eric Gerardus Theodoor Bosch, Alexander Henstra
  • Patent number: 9778377
    Abstract: A Transmission Charged-Particle Microscope comprises a source of charged particles which are then directed by an illuminator onto a specimen supported by a specimen holder. Charged particles transmitted through the specimen may undergo energy loss with a distribution of losses providing information about the specimen. A dispersing device disperses the transmitted charged particles into an energy-resolved array of spectral sub-beams distributed along a dispersion direction. The dispersed charged particles are detected by a detector comprising an assembly of sub-detectors arranged along said dispersion direction, whereby different sub-detectors are adjustable to have different detection sensitivities.
    Type: Grant
    Filed: March 17, 2016
    Date of Patent: October 3, 2017
    Assignee: FEI Company
    Inventors: Luigi Mele, Albertus Aemillius Seyno Sluijterman, Gerard Nicolaas Anne van Veen
  • Publication number: 20160276130
    Abstract: A Transmission Charged-Particle Microscope, comprising: A specimen holder, for holding a specimen; A source, for producing a beam of charged particles; An illuminator, for directing said beam so as to irradiate the specimen; An imaging system, for receiving a flux of charged particles transmitted through the specimen and directing it onto a spectroscopic apparatus comprising: A dispersing device, for dispersing said flux into an energy-resolved array of spectral sub-beams distributed along a dispersion direction; A detector, said detector comprising an assembly of sub-detectors arranged along said dispersion direction, whereby different sub-detectors are adjustable to have different detection sensitivities.
    Type: Application
    Filed: March 17, 2016
    Publication date: September 22, 2016
    Applicant: FEI Company
    Inventors: Luigi Mele, Albertus Aemillius Seyno Sluijterman, Gerard Nicolaas Anne van Veen
  • Patent number: 9208993
    Abstract: A method of investigating a flux of output electrons emanating from a sample in a charged-particle microscope, which flux is produced in response to irradiation of the sample by a beam of input charged particles, the method comprising the following steps: Using a detector to intercept at least a portion of the flux so as to produce a set {Ij} of pixeled images Ij of at least part of the sample, whereby the cardinality of the set {Ij} is M>1. For each pixel p, in each image Ij, determining the accumulated signal strength Sij, thus producing an associated set of signal strengths {Sij}. Using the set {Sij} to calculate the following values: An average signal strength S per pixel position i; A variance ?2S in S per pixel position i. Using these values S and ?2S to at least one map of said part of the sample, selected from the group comprising: A first map, representing variation in energy of detected electrons as a function of position.
    Type: Grant
    Filed: December 2, 2014
    Date of Patent: December 8, 2015
    Assignee: FEI Company
    Inventors: Albertus Aemillius Seyno Sluijterman, Eric Gerardus Theodoor Bosch
  • Publication number: 20150279615
    Abstract: A multi-beam apparatus for inspecting or processing a sample with a multitude of focused beams uses a multitude of detectors for detecting secondary radiation emitted by the sample when is irradiated by the multitude of beams. Each detector signal comprises information caused by multiple beams, the apparatus equipped with a programmable controller for processing the multitude of detector signals to a multitude of output signals, using weight factors so that each output signal represents information caused by a single beam. The weight factors are dynamic weight factors depending on the scan position of the beams with respect to the detectors and the distance between sample and detectors.
    Type: Application
    Filed: March 25, 2015
    Publication date: October 1, 2015
    Applicant: FEI Company
    Inventors: Pavel Potocek, Cornelis S. Kooijman, Hendrik Nicolaas Slingerland, Gerardus Nicolaas Anne Van Veen, Faysal Boughorbel, Albertus Aemillius Seyno Sluijterman, Jacob Simon Faber
  • Publication number: 20150155131
    Abstract: A method of investigating a flux of output electrons emanating from a sample in a charged-particle microscope, which flux is produced in response to irradiation of the sample by a beam of input charged particles, the method comprising the following steps: Using a detector to intercept at least a portion of the flux so as to produce a set {Ij} of pixeled images Ij of at least part of the sample, whereby the cardinality of the set {Ij} is M>1. For each pixel p, in each image Ij, determining the accumulated signal strength Sij, thus producing an associated set of signal strengths {Sij}. Using the set {Sij} to calculate the following values: An average signal strength S per pixel position i; A variance ?2S in S per pixel position i. Using these values S and ?2S to at least one map of said part of the sample, selected from the group comprising: A first map, representing variation in energy of detected electrons as a function of position.
    Type: Application
    Filed: December 2, 2014
    Publication date: June 4, 2015
    Applicant: FEI Company
    Inventors: Albertus Aemillius Seyno Sluijterman, Eric Gerardus Theodoor Bosch
  • Patent number: 8952328
    Abstract: The invention relates to a charged particle detector system comprising a conversion plate (110) to convert incoming radiation to secondary electrons. These secondary electrons are then detected by a secondary electron detector (120), thereby providing information of the incoming radiation. Often this information is limited to, in first approximation, the flux of incoming radiation. In the case of, for example, backscattered electrons this is the current of the incoming backscattered electrons. The invention proposes to form the conversion plate as, for example, an energy dependent detector, for example a photodiode to detect electrons, so that the detector system simultaneously provides information of, for example, current (S1) and mean energy (S2) of the incoming radiation. The detector system is especially suited for use in a SEM or a DualBeam apparatus.
    Type: Grant
    Filed: August 3, 2012
    Date of Patent: February 10, 2015
    Assignee: FEI Company
    Inventors: Albertus Aemillius Seyno Sluijterman, Eric Gerardus Theodoor Bosch, Patrick David Vogelsang, Johannes Adrianus Carolus Cooijmans
  • Publication number: 20130056634
    Abstract: The invention relates to a charged particle detector system comprising a conversion plate (110) to convert incoming radiation to secondary electrons. These secondary electrons are then detected by a secondary electron detector (120), thereby providing information of the incoming radiation. Often this information is limited to, in first approximation, the flux of incoming radiation. In the case of, for example, backscattered electrons this is the current of the incoming backscattered electrons. The invention proposes to form the conversion plate as, for example, an energy dependent detector, for example a photodiode to detect electrons, so that the detector system simultaneously provides information of, for example, current (S1) and mean energy (S2) of the incoming radiation. The detector system is especially suited for use in a SEM or a DualBeam apparatus.
    Type: Application
    Filed: August 3, 2012
    Publication date: March 7, 2013
    Applicant: FEI Company
    Inventors: Albertus Aemillius Seyno Sluijterman, Eric Gerardus Theodoor Bosch, Patrick David Vogelsang, Johannes Adrianus Carolus Cooijmans
  • Patent number: 8288724
    Abstract: The invention relates to a dark-field detector for an electron microscope. The detector comprises a photodiode for detecting the scattered electrons, with an inner electrode and an outer electrode. As a result of the resistive behavior of the surface layer the current induced by a scattered electron, e.g. holes, are divided over the electrodes, so that a current I1 and I2 is induced, the sum of the current proportional to the energy of the impinging electron and the normalized ratio a function of the radial position where the electron impinges.
    Type: Grant
    Filed: December 3, 2009
    Date of Patent: October 16, 2012
    Assignee: FEI Company
    Inventors: Cornelis Sander Kooijman, Gerardus Nicolaas Anne van Veen, Albertus Aemillius Seyno Sluijterman
  • Publication number: 20100258721
    Abstract: The invention relates to a dark-field detector for an electron microscope. The detector comprises a photodiode for detecting the scattered electrons, with an inner electrode and an outer electrode. As a result of the resistive behaviour of the surface layer the current induced by a scattered electron, e.g. holes, are divided over the electrodes, so that a current I1 and I2 is induced, the sum of the current proportional to the energy of the impinging electron and the normalized ratio a function of the radial position where the electron impinges.
    Type: Application
    Filed: December 3, 2009
    Publication date: October 14, 2010
    Applicant: FEI COMPANY
    Inventors: CORNELIS SANDER KOOIJMAN, Gerardus Nicolaas Anne van Veen, Albertus Aemillius Seyno Sluijterman