Patents by Inventor Alex Rubinchik

Alex Rubinchik has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Sensor for measuring a substrate temperature
    Publication number: 20020139790
    Abstract: A temperature sensor for measuring a temperature of a substrate in a thermal processing chamber is described. The chamber includes a reflector forming a reflecting cavity with a substrate when the substrate is positioned in the chamber. The temperature sensor includes a probe having an input end positioned to receive radiation from the reflecting cavity, and a detector optically coupled to an output end of the probe. The radiation entering the probe includes reflected radiation and non-reflected radiation. The detector measures an intensity of a first portion of the radiation entering the probe to generate a first intensity signal and measures an intensity of a second portion of the radiation entering the probe to generate a second intensity signal. The detector is configured so that a ratio of the reflected radiation to the non-reflected radiation is higher in the first portion than the second portion. The two intensity signals are used to calculate the temperature and emissivity of the substrate.
    Type: Application
    Filed: April 5, 2002
    Publication date: October 3, 2002
    Applicant: Applied Materials, Inc.
    Inventors: Bruce Adams, Aaron Hunter, Alex Rubinchik, Mark Yam, Paul A. O'Brien
  • Sensor for measuring a substrate temperature
    Patent number: 6406179
    Abstract: A temperature sensor for measuring a temperature of a substrate in a thermal processing chamber is described. The chamber includes a reflector forming a reflecting cavity with a substrate when the substrate is positioned in the chamber. The temperature sensor includes a probe having an input end positioned to receive radiation from the reflecting cavity, and a detector optically coupled to an output end of the probe. The radiation entering the probe includes reflected radiation and non-reflected radiation. The detector measures an intensity of a first portion of the radiation entering the probe to generate a first intensity signal and measures an intensity of a second portion of the radiation entering the probe to generate a second intensity signal. The detector is configured so that a ratio of the reflected radiation to the non-reflected radiation is higher in the first portion than the second portion. The two intensity signals are used to calculate the temperature and emissivity of the substrate.
    Type: Grant
    Filed: January 8, 2001
    Date of Patent: June 18, 2002
    Assignee: Applied Materials, Inc.
    Inventors: Bruce Adams, Aaron Hunter, Alex Rubinchik, Mark Yam, Paul A. O'Brien
  • Sensor for measuring a substrate temperature
    Publication number: 20010006530
    Abstract: A temperature sensor for measuring a temperature of a substrate in a thermal processing chamber is described. The chamber includes a reflector forming a reflecting cavity with a substrate when the substrate is positioned in the chamber. The temperature sensor includes a probe having an input end positioned to receive radiation from the reflecting cavity, and a detector optically coupled to an output end of the probe. The radiation entering the probe includes reflected radiation and non-reflected radiation. The detector measures an intensity of a first portion of the radiation entering the probe to generate a first intensity signal and measures an intensity of a second portion of the radiation entering the probe to generate a second intensity signal. The detector is configured so that a ratio of the reflected radiation to the non-reflected radiation is higher in the first portion than the second portion. The two intensity signals are used to calculate the temperature and emissivity of the substrate.
    Type: Application
    Filed: January 8, 2001
    Publication date: July 5, 2001
    Applicant: Applied Materials, Inc.
    Inventors: Bruce Adams, Aaron Hunter, Alex Rubinchik, Mark Yam, Paul A. O'Brien
  • Apparatus for substrate temperature measurement using a reflecting cavity and detector
    Patent number: 6183130
    Abstract: A temperature sensor for measuring a temperature of a substrate in a thermal processing chamber is described. The chamber includes a reflector forming a reflecting cavity with a substrate when the substrate is positioned in the chamber. The temperature sensor includes a probe having an input end positioned to receive radiation from the reflecting cavity, and a detector optically coupled to an output end of the probe. The radiation entering the probe includes reflected radiation and non-reflected radiation. The detector measures an intensity of a first portion of the radiation entering the probe to generate a first intensity signal and measures an intensity of a second portion of the radiation entering the probe to generate a second intensity signal. The detector is configured so that a ratio of the reflected radiation to the non-reflected radiation is higher in the first portion than the second portion. The two intensity signals are used to calculate the temperature and emissivity of the substrate.
    Type: Grant
    Filed: August 6, 1998
    Date of Patent: February 6, 2001
    Assignee: Applied Materials, Inc.
    Inventors: Bruce Adams, Aaron Hunter, Alex Rubinchik, Mark Yam, Paul A. O'Brien