Patents by Inventor Alexander Nikolov

Alexander Nikolov has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 11325058
    Abstract: Apparatuses and methods to rejuvenate spent filtration media are described. The apparatuses include a filtration unit to filter a liquid having solids that need to be removed and a rejuvenation unit to heat the spent filtration media that has reduced filtering capacity. The methods include using the apparatus to rejuvenate spent filtration media by removing solids deposited on the filtration media to allow its repeated reuse rather than being discarded and replaced with new filtration media.
    Type: Grant
    Filed: August 22, 2019
    Date of Patent: May 10, 2022
    Assignees: The United States of America, as represented by the Secretary of Agriculture, The Penn State Research Foundation
    Inventors: Clinton D. Church, Ray B. Bryant, Peter J. Kleinman, Alexander Nikolov Hristov
  • Patent number: 10781678
    Abstract: Methods and systems are provided for recovery of oil from a subterranean reservoir employing nanofluid injection at a controlled flow rate. The method comprises the step of injecting nanofluid through at least one well that traverses the subterranean reservoir and into the subterranean reservoir at a controlled flow rate. And, the system comprises: at least one well that traverses the subterranean reservoir; and injection means for injecting nanofluid through the well and into the subterranean reservoir at a controlled flow rate.
    Type: Grant
    Filed: January 4, 2017
    Date of Patent: September 22, 2020
    Assignees: SCHLUMBERGER TECHNOLOGY CORPORATION, ILLINOIS INSTITUTE OF TECHNOLOGY
    Inventors: Hua Zhang, Terizhandur S. Ramakrishnan, Alexander Nikolov, Darsh Wasan
  • Patent number: 10609938
    Abstract: A feed composition for ruminants may include feed particles that contain a saturated fatty acid component as well as a urease inhibitor such that ingestion of the feed by lactating ruminants may provide for an increase in the amount of milk produced by the ruminant and/or an increase in the fat content of the milk produced, and a decrease in ammonia production from breakdown of urea.
    Type: Grant
    Filed: July 21, 2014
    Date of Patent: April 7, 2020
    Assignee: Nutes Oy
    Inventor: Alexander Nikolov Hristov
  • Publication number: 20200078707
    Abstract: Apparatuses and methods to rejuvenate spent filtration media are described. The apparatuses include a filtration unit to filter a liquid having solids that need to be removed and a rejuvenation unit to heat the spent filtration media that has reduced filtering capacity. The methods include using the apparatus to rejuvenate spent filtration media by removing solids deposited on the filtration media to allow its repeated reuse rather than being discarded and replaced with new filtration media.
    Type: Application
    Filed: August 22, 2019
    Publication date: March 12, 2020
    Inventors: Clinton D. Church, Ray B. Bryant, Peter J. Kleinman, Alexander Nikolov Hristov
  • Publication number: 20190024487
    Abstract: Methods and systems are provided for recovery of oil from a subterranean reservoir employing nanofluid injection at a controlled flow rate. The method comprises the step of injecting nanofluid through at least one well that traverses the subterranean reservoir and into the subterranean reservoir at a controlled flow rate. And, the system comprises: at least one well that traverses the subterranean reservoir; and injection means for injecting nanofluid through the well and into the subterranean reservoir at a controlled flow rate.
    Type: Application
    Filed: January 4, 2017
    Publication date: January 24, 2019
    Inventors: Hua Zhang, Terizhandur S. Ramakrishnan, Alexander Nikolov, Darsh Wasan
  • Patent number: 9778574
    Abstract: An apparatus comprising at least one sealing aperture (40) comprising a hollow part (41), having an inner surface (42), extending at an interface between different zones (50;60) of the apparatus; and a member (43) positioned in the hollow part configured to substantially transmit EUV radiation and to substantially filter non-EUV radiation at the interface; wherein the inner surface of the hollow part has a surface treatment configured to increase absorption of the non-EUV radiation that is transferred by the member to the hollow part.
    Type: Grant
    Filed: November 4, 2014
    Date of Patent: October 3, 2017
    Assignee: ASML Netherlands B.V.
    Inventors: Sander Catharina Reinier Derks, Eric Willem Felix Casimiri, Marcel Mathijs Theodore Dierichs, Sumant Sukdew Ramanujan Oemrawsingh, Wilhelmus Theodorus Anthonius Johannes Van Den Einden, Johannes Fransiscus Maria Velthuis, Alexander Nikolov Zdravkov, Wassim Zein Eddine
  • Publication number: 20170231253
    Abstract: A feed composition for ruminants may include feed particles that contain a saturated fatty acid component as well as a urease inhibitor such that ingestion of the feed by lactating ruminants may provide for an increase in the amount of milk produced by the ruminant and/or an increase in the fat content of the milk produced, and a decrease in ammonia production from breakdown of urea.
    Type: Application
    Filed: July 21, 2014
    Publication date: August 17, 2017
    Applicant: Benemilk Oy
    Inventor: Alexander Nikolov HRISTOV
  • Publication number: 20160282723
    Abstract: An apparatus comprising at least one sealing aperture (40) comprising a hollow part (41), having an inner surface (42), extending at an interface between different zones (50;60) of the apparatus; and a member (43) positioned in the hollow part configured to substantially transmit EUV radiation and to substantially filter non-EUV radiation at the interface; wherein the inner surface of the hollow part has a surface treatment configured to increase absorption of the non-EUV radiation that is transferred by the member to the hollow part.
    Type: Application
    Filed: November 4, 2014
    Publication date: September 29, 2016
    Applicant: ASML Nethrlands B.V.
    Inventors: Sander Catharina Reinier DERKS, Eric Willem Felix CASIMIRI, Marcel Mathijs Theodore DIERICHS, Sumant Sukdew Ramanujan OEMRAWSINGH, Wilhelmus Theodorus Anthonius VAN DEN EINDEN, Johannes Fransiscus Maria VELTHUIS, Alexander Nikolov ZDRAVKOV, Wassim ZEIN EDDINE
  • Patent number: 8941815
    Abstract: A cover is provided for a substrate table in an immersion lithographic apparatus that covers at least the gap between a substrate and a recess in a substrate table in which the substrate is received.
    Type: Grant
    Filed: June 22, 2010
    Date of Patent: January 27, 2015
    Assignee: ASML Netherlands B.V.
    Inventors: Raymond Wilhelmus Louis Lafarre, Jozef Petrus Henricus Benschop, Nicolaas Ten Kate, Niek Jacobus Johannes Roset, Gerardus Adrianus Antonius Maria Kusters, Alexander Nikolov Zdravkov, Hrishikesh Patel, Sander Van Opstal
  • Patent number: 8659742
    Abstract: An immersion lithographic apparatus is disclosed that has a fluid handling system configured to provide immersion liquid between a final element of a projection system and a surface which includes, in cross-section, a feature, and has an adjustment fluid source configured to locally change the composition of the immersion liquid to cause a local decrease in surface tension of the immersion liquid at least when a meniscus of the immersion liquid contacts the feature.
    Type: Grant
    Filed: December 16, 2010
    Date of Patent: February 25, 2014
    Assignee: ASML Netherlands B.V.
    Inventors: Niek Jacobus Johannes Roset, Nicolaas Ten Kate, Raymond Wilhelmus Louis Lafarre, Alexander Nikolov Zdravkov
  • Patent number: 8634052
    Abstract: A lithographic apparatus that includes a substrate table holding a substrate, a projection system configured to project a patterned beam of radiation onto the substrate, a liquid supply system configured to provide a liquid to a space between the projection system and the substrate table, and a ring located such that it covers a gap between the substrate and the substrate table, the ring being in contact with the substrate and with the substrate table.
    Type: Grant
    Filed: November 27, 2007
    Date of Patent: January 21, 2014
    Assignee: ASML Netherlands B.V.
    Inventors: Suzan Leonie Auer-Jongepier, Jeroen Johannes Sophia Maria Mertens, Frank Bernhard Sperling, Teunis Cornelis Van Den Dool, Eva Mondt, Alexander Nikolov Zdravkov, Paulus Martinus Hubertus Vissers
  • Patent number: 8416383
    Abstract: A lithographic apparatus is disclosed that includes a seal provided in a substrate table, the seal being actuatable from an open configuration to a closed configuration, the closed configuration being such that when a substrate is located on the substrate table, the seal closes a gap between the substrate and the substrate table.
    Type: Grant
    Filed: November 26, 2007
    Date of Patent: April 9, 2013
    Assignee: ASML Netherlands B.V.
    Inventors: Hernes Jacobs, Eva Mondt, Alexander Nikolov Zdravkov
  • Publication number: 20130077065
    Abstract: A method and apparatus to clean a cover to seal a gap between an object located in a recess of a table and the upper surface of the table outside of the recess. In-line and off-line arrangements are disclosed. Cleaning can be carried out using abrasion, UV radiation or flushing with a cleaning fluid for example.
    Type: Application
    Filed: September 20, 2012
    Publication date: March 28, 2013
    Inventors: Raymond Wilhelmus Louis LAFARRE, Roelof Frederik De Graaf, Niek Jacobus Johannes Roset, Arjan Hubrecht Josef Anna Martens, Alexander Nikolov Zdravkov, Kornelis Tijmen Hoekerd, Nina Vladimirovna Dziomkina
  • Publication number: 20120249994
    Abstract: An immersion lithographic apparatus includes a surface having at least one active group (e.g., lyophobic group) which, during use, comes into contact with immersion liquid, and an immersion liquid supply system configured to provide immersion liquid comprising a protection component which is more reactive with a product of photoionization of the immersion liquid than the active group of the surface, the protection component being present in an amount of between 1 ppm and 0.1 ppm.
    Type: Application
    Filed: February 8, 2012
    Publication date: October 4, 2012
    Applicant: ASML NETHERLANDS B.V.
    Inventors: Emilius Willem Adriaan VISSER, Alexander Nikolov ZDRAVKOV, Nina Vladimirovna DZIOMKINA
  • Publication number: 20120069309
    Abstract: A fluid handling structure successively having, at a boundary from a space configured to contain immersion fluid to a region external to the fluid handling structure: a meniscus pinning feature to resist passage of immersion fluid in a radially outward direction from the space; and a fluid supply opening radially outward of the meniscus pinning feature to supply a fluid soluble in the immersion fluid which on dissolution into the immersion fluid lowers the surface tension of the immersion fluid.
    Type: Application
    Filed: August 22, 2011
    Publication date: March 22, 2012
    Applicant: ASML NETHERLANDS B.V.
    Inventors: Paul WILLEMS, Nicolaas Ten Kate, Stephan Koelink, Pieter Jacob Kramer, Anthonie Kuijper, Alexander Nikolov Zdravkov, Rogier Hendrikus Magdalena Cortie
  • Publication number: 20110228248
    Abstract: A cover is provided for a substrate table in an immersion lithographic apparatus that covers at least the gap between a substrate and a recess in a substrate table in which the substrate is received.
    Type: Application
    Filed: March 14, 2011
    Publication date: September 22, 2011
    Applicant: ASML NETHERLANDS B.V.
    Inventors: Raymond Wilhelmus Louis Lafarre, Niek Jacobus Johannes Roset, Alexander Nikolov Zdravkov, Jan Willem Stouwdam, Bernardus Lambertus Johannes Bijl
  • Publication number: 20110149257
    Abstract: An immersion lithographic apparatus is disclosed that has a fluid handling system configured to provide immersion liquid between a final element of a projection system and a surface which comprises, in cross-section, a feature, and an adjustment fluid source configured to locally change the composition of the immersion liquid to cause a local decrease in surface tension of the immersion liquid at least when a meniscus of the immersion liquid contacts the feature.
    Type: Application
    Filed: December 16, 2010
    Publication date: June 23, 2011
    Applicant: ASML NETHERLANDS B.V.
    Inventors: Niek Jacobus Johannes ROSET, Nicolaas Ten Kate, Raymond Wilhelmus Louis Lafarre, Alexander Nikolov Zdravkov
  • Publication number: 20110013169
    Abstract: A cover is provided for a substrate table in an immersion lithographic apparatus that covers at least the gap between a substrate and a recess in a substrate table in which the substrate is received.
    Type: Application
    Filed: June 22, 2010
    Publication date: January 20, 2011
    Applicant: ASML NETHERLANDS B.V.
    Inventors: Raymond Wilhelmus Louis Lafarre, Jozef Petrus Henricus Benschop, Nicolaas Ten Kate, Niek Jacobus Johannes Roset, Gerardus Adrianus Antonius Maria Kusters, Alexander Nikolov Zdravkov, Hrishikesh Patel, Sander Van Opstal
  • Publication number: 20080186460
    Abstract: A lithographic apparatus is disclosed that includes a substrate table holding a substrate, a projection system configured to project a patterned beam of radiation onto the substrate, a liquid supply system configured to provide a liquid to a space between the projection system and the substrate table, and a ring located such that it covers a gap between the substrate and the substrate table, the ring being in contact with the substrate and with the substrate table.
    Type: Application
    Filed: November 27, 2007
    Publication date: August 7, 2008
    Applicant: ASML NETHERLANDS B.V.
    Inventors: Suzan Leonie Auer-Jongepier, Jeroen Johannes Sophia Maria Mertens, Frank Bernhard Sperling, Teunis Cornelis Van Den Dool, Eva Mondt, Alexander Nikolov Zdravkov, Paulus Martinus Hubertus Vissers
  • Publication number: 20080165331
    Abstract: A lithographic apparatus is disclosed that includes a seal provided in a substrate table, the seal being actuatable from an open configuration to a closed configuration, the closed configuration being such that when a substrate is located on the substrate table, the seal closes a gap between the substrate and the substrate table.
    Type: Application
    Filed: November 26, 2007
    Publication date: July 10, 2008
    Applicant: ASML NETHERLANDS B.V.
    Inventors: Hernes Jacobs, Eva Mondt, Alexander Nikolov Zdravkov