Patents by Inventor Alexander W. Hains

Alexander W. Hains has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20200190361
    Abstract: The invention provides a chemical-mechanical polishing composition comprising an abrasive, a self-stopping agent, an aqueous carrier, and a cationic polymer. This invention additionally provides a method suitable for polishing a dielectric substrate.
    Type: Application
    Filed: February 21, 2020
    Publication date: June 18, 2020
    Inventors: Alexander W. Hains, Juyeon Chang, Tina C. Li, Viet Lam, Ji Cui, Sarah Brosnan, Chul Woo Nam
  • Patent number: 10619076
    Abstract: The invention provides a chemical-mechanical polishing composition comprising an abrasive, a self-stopping agent, an aqueous carrier, and optionally, a cationic polymer, and provides a method suitable for polishing a substrate.
    Type: Grant
    Filed: February 8, 2019
    Date of Patent: April 14, 2020
    Assignee: Cabot Microelectronics Corporation
    Inventors: Alexander W. Hains, Juyeon Chang, Tina C. Li, Viet Lam, Ji Cui, Sarah Brosnan, Chul Woo Nam
  • Patent number: 10619075
    Abstract: The invention provides a chemical-mechanical polishing composition comprising an abrasive, a self-stopping agent, an aqueous carrier, and optionally, a cationic polymer, and provides a method suitable for polishing a substrate.
    Type: Grant
    Filed: March 23, 2018
    Date of Patent: April 14, 2020
    Assignee: Cabot Microelectronics Corporation
    Inventors: Alexander W. Hains, Juyeon Chang, Tina C. Li, Viet Lam, Ji Cui, Sarah Brosnan, Chul Woo Nam
  • Patent number: 10344186
    Abstract: The invention provides a chemical-mechanical polishing composition comprising (a) wet-process ceria abrasive, (b) a surfactant comprising an amine-containing anchor group and ethylene oxide-propylene oxide stabilizing group, wherein the surfactant has a molecular weight of from about 1000 Daltons to about 5000 Daltons, (c) an aromatic carboxylic acid or heteroaromatic carboxylic acid, and (d) water, wherein the polishing composition has a pH of about 3 to about 6. The invention further provides a method of chemically mechanically polishing a substrate with the inventive chemical-mechanical polishing composition. Typically, the substrates contain silicon oxide.
    Type: Grant
    Filed: June 21, 2017
    Date of Patent: July 9, 2019
    Assignee: Cabot Microelectronics Corporation
    Inventors: Alexander W. Hains, Tina Li
  • Publication number: 20190185716
    Abstract: The invention provides a chemical-mechanical polishing composition comprising an abrasive, a self-stopping agent, an aqueous carrier, and optionally, a cationic polymer, and provides a method suitable for polishing a substrate.
    Type: Application
    Filed: February 8, 2019
    Publication date: June 20, 2019
    Inventors: Alexander W. HAINS, Juyeon CHANG, Tina C. LI, Viet LAM, Ji CUI, Sarah BROSNAN, Chul Woo NAM
  • Publication number: 20180244956
    Abstract: The invention provides a chemical-mechanical polishing composition comprising an abrasive, a self-stopping agent, an aqueous carrier, and optionally, a cationic polymer, and provides a method suitable for polishing a substrate.
    Type: Application
    Filed: March 23, 2018
    Publication date: August 30, 2018
    Inventors: Alexander W. HAINS, Juyeon CHANG, Tina C. LI, Viet LAM, Ji CUI, Sarah BROSNAN, Chul Woo NAM
  • Publication number: 20170369742
    Abstract: The invention provides a chemical-mechanical polishing composition comprising (a) wet-process ceria abrasive, (b) a surfactant comprising an amine-containing anchor group and ethylene oxide-propylene oxide stabilizing group, wherein the surfactant has a molecular weight of from about 1000 Daltons to about 5000 Daltons, (c) an aromatic carboxylic acid or heteroaromatic carboxylic acid, and (d) water, wherein the polishing composition has a pH of about 3 to about 6. The invention further provides a method of chemically mechanically polishing a substrate with the inventive chemical-mechanical polishing composition. Typically, the substrates contain silicon oxide.
    Type: Application
    Filed: June 21, 2017
    Publication date: December 28, 2017
    Inventors: Alexander W. HAINS, Tina LI
  • Patent number: 9796882
    Abstract: Described are compositions useful in methods for chemical-mechanical processing a surface of a substrate, especially a substrate that contains dielectric material, wherein the composition contains cyclodextrin and an alkylamine.
    Type: Grant
    Filed: December 29, 2016
    Date of Patent: October 24, 2017
    Assignee: Cabot Microelectronics Corporation
    Inventors: Alexander W. Hains, Tina Li
  • Publication number: 20170183540
    Abstract: Described are compositions useful in methods for chemical-mechanical processing a surface of a substrate, especially a substrate that contains dielectric material, wherein the composition contains cyclodextrin and an alkylamine.
    Type: Application
    Filed: December 29, 2016
    Publication date: June 29, 2017
    Inventors: Alexander W. HAINS, Tina LI
  • Patent number: 8399761
    Abstract: An organic photovoltaic device and method of forming same. In one embodiment, the organic photovoltaic device has an anode, a cathode, an active layer disposed between the anode and the cathode; and an interfacial layer disposed between the anode and the active layer, the interfacial layer comprising 5,5?-bis[(p-trichlorosilylpropylphenyl)phenylamino]-2,2?-bithiophene (PABTSi2).
    Type: Grant
    Filed: April 30, 2010
    Date of Patent: March 19, 2013
    Assignee: Northwestern University
    Inventors: Tobin J. Marks, Alexander W. Hains
  • Patent number: 7888593
    Abstract: The present invention, in one aspect, relates to a solar cell. In one embodiment, the solar cell includes an anode; an active organic layer comprising an electron-donating organic material and an electron-accepting organic material; and an interfacial layer formed between the anode and active organic layer, where the interfacial layer comprises a hole-transporting polymer characterized with a hole-mobility higher than that of the electron-donating organic material in the active organic layer, and a small molecule that has a high hole-mobility and is capable of crosslinking on contact with air.
    Type: Grant
    Filed: March 12, 2008
    Date of Patent: February 15, 2011
    Assignee: Northwestern University
    Inventors: Iobin J. Marks, Alexander W. Hains
  • Publication number: 20100252113
    Abstract: An organic photovoltaic device and method of forming same. In one embodiment, the organic photovoltaic device has an anode, a cathode, an active layer disposed between the anode and the cathode; and an interfacial layer disposed between the anode and the active layer, the interfacial layer comprising 5,5?-bis [(p-trichlorosilylpropylphenyl) phenylamino]-2,2?-bithiophene (PABTSi2).
    Type: Application
    Filed: April 30, 2010
    Publication date: October 7, 2010
    Applicant: Northwestern University
    Inventors: Tobin J. Marks, Alexander W. Hains
  • Patent number: 7799990
    Abstract: The present invention, in one aspect, relates to a solar cell. In one embodiment, the solar cell includes an anode; an active organic layer comprising an electron-donating organic material and an electron-accepting organic material; a semiconducting layer formed between the anode and the active organic layer; and an electron-blocking layer (EBL) formed between the semiconducting layer and the active organic layer, where the EBL is transparent and adapted for blocking electron leakage from the active organic layer to the anode while transporting holes from the active organic layer to the anode.
    Type: Grant
    Filed: March 12, 2008
    Date of Patent: September 21, 2010
    Assignee: Northwestern University
    Inventors: Tobin J. Marks, Alexander W. Hains, Michael D. Irwin, He Yan
  • Publication number: 20090056810
    Abstract: The present invention, in one aspect, relates to a solar cell. In one embodiment, the solar cell includes an anode; an active organic layer comprising an electron-donating organic material and an electron-accepting organic material; and an interfacial layer formed between the anode and active organic layer, where the interfacial layer comprises a hole-transporting polymer characterized with a hole-mobility higher than that of the electron-donating organic material in the active organic layer, and a small molecule that has a high hole-mobility and is capable of crosslinking on contact with air.
    Type: Application
    Filed: March 12, 2008
    Publication date: March 5, 2009
    Applicant: NORTHWESTERN UNIVERSITY
    Inventors: Tobin J. MARKS, Alexander W. HAINS
  • Publication number: 20080223445
    Abstract: The present invention, in one aspect, relates to a solar cell. In one embodiment, the solar cell includes an anode; an active organic layer comprising an electron-donating organic material and an electron-accepting organic material; a semiconducting layer formed between the anode and the active organic layer; and an electron-blocking layer (EBL) formed between the semiconducting layer and the active organic layer, where the EBL is transparent and adapted for blocking electron leakage from the active organic layer to the anode while transporting holes from the active organic layer to the anode.
    Type: Application
    Filed: March 12, 2008
    Publication date: September 18, 2008
    Applicant: NORTHWESTERN UNIVERSITY
    Inventors: Tobin J. MARKS, Alexander W. HAINS, Michael D. IRWIN, He YAN