Patents by Inventor Alfons Dehe
Alfons Dehe has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Patent number: 10830691Abstract: A fluid sensor includes a housing and a thermal emitter in the housing to emit first thermal radiation into a detection volume of the housing at a first power level during a measurement interval and emit the first thermal radiation at a reduced first power level or not emit said first thermal radiation at all during an intermediate interval disposed outside of the measurement interval. The fluid sensor includes a measuring element in the detection volume to receive a radiation signal during the measurement interval. The fluid sensor includes a second thermal emitter in the housing to emit second thermal radiation at a second power level into the detection volume during the intermediate interval such that a thermal oscillation of thermal radiation in relation to an overall power level of the thermal radiation in the detection volume is at most ±50% during the measurement interval and the intermediate interval.Type: GrantFiled: April 16, 2019Date of Patent: November 10, 2020Assignee: INFINEON TECHNOLOGIES AGInventors: Christoph Glacer, Alfons Dehe, David Tumpold
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Publication number: 20200340904Abstract: An apparatus for analyzing the particulate matter content of an aerosol includes an aerosol chamber configured to receive an aerosol, the particulate matter content of which should be analyzed, at least one ultrasonic generator configured to produce ultrasonic waves in the aerosol received in the aerosol chamber, an ultrasonic detector configured to detect ultrasonic waves produced by the at least one ultrasonic generator in the aerosol, and an evaluator having a data exchange communication link with the ultrasonic detector and configured to ascertain the matter content on the basis of signals output by the ultrasonic detector. The ultrasonic generator and the ultrasonic detector are positioned relative to one another such that a path length to be traversed by ultrasonic waves between the ultrasonic generator and the ultrasonic detector is less than 1 cm.Type: ApplicationFiled: July 13, 2020Publication date: October 29, 2020Inventors: Alfons DEHE, Christian BRETTHAUER
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Publication number: 20200309665Abstract: A sensor element includes a membrane structure suspended on a frame structure, wherein the membrane structure includes a membrane element and an actuator. The membrane structure is deflectable in a first stable deflection state and in a second stable deflection state and is operable in a resonance mode in at least one of the first and the second stable deflection states. The actuator is configured to deflect the membrane structure in a first actuation state into one of the first and the second stable deflection states, and to operate the membrane structure in a second actuation state in a resonance mode having an associated resonance frequency.Type: ApplicationFiled: March 3, 2020Publication date: October 1, 2020Inventors: Michael Schneider, Alfons Dehe, Manuel Dorfmeister, Christoph Glacer, Ulrich Krumbein, Ulrich Schmid, David Tumpold
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Patent number: 10779101Abstract: A MEMS device includes a backplate electrode and a membrane disposed spaced apart from the backplate electrode. The membrane includes a displaceable portion and a fixed portion. The backplate electrode and the membrane are arranged such that an overlapping area of the fixed portion of the membrane with the backplate electrode is less than maximum overlapping.Type: GrantFiled: February 11, 2020Date of Patent: September 15, 2020Assignee: INFINEON TECHNOLOGIES AGInventors: Alfons Dehe, Stefan Barzen
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Patent number: 10761005Abstract: An apparatus for analysing the particulate matter content of an aerosol includes an aerosol chamber configured to receive an aerosol, the particulate matter content of which should be analysed, at least one ultrasonic generator configured to produce ultrasonic waves in the aerosol received in the aerosol chamber, an ultrasonic detector configured to detect ultrasonic waves produced by the at least one ultrasonic generator in the aerosol, and an evaluator having a data exchange communication link with the ultrasonic detector and configured to ascertain the matter content on the basis of signals output by the ultrasonic detector. The ultrasonic generator and the ultrasonic detector are positioned relative to one another such that a path length to be traversed by ultrasonic waves between the ultrasonic generator and the ultrasonic detector is less than 1 cm.Type: GrantFiled: December 4, 2017Date of Patent: September 1, 2020Assignee: Infineon Technologies AGInventors: Alfons Dehe, Christian Bretthauer
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Patent number: 10753858Abstract: Shown is a wafer arrangement for a gas sensor including a first substrate and a sescond substrate. The first substrate includes a MEMS membrane associated with a sensor element and an emitter element configured to emit electromagnetic radiation. The second substrate is arranged on top of the first substrate and defines at least a portion of a chamber disposed adjacent to the MEMS membrane.Type: GrantFiled: June 28, 2019Date of Patent: August 25, 2020Assignees: Infineon Technologies AG, Fraunhofer-Gesellschaft Zur Foerderung Der Angewandten Forschung E.V.Inventors: Stefan Kolb, Alfons Dehe, Jochen Huber, Franz Jost, Horst Theuss, Wilhelm Wiedmeier, Juergen Woellenstein
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Patent number: 10737935Abstract: In accordance with an embodiment, a MEMS sensor includes a MEMS arrangement having a movable electrode and a stator electrode arranged opposite the movable electrode. The MEMS sensor includes a first bias voltage source, which is connected to the stator electrode and which is configured to apply a first bias voltage to the stator electrode. The MEMS sensor further includes a common-mode read-out circuit connected to the stator electrode by a capacitive coupling and comprising a second bias voltage source, which is configured to apply a second bias voltage to a side of the capacitive coupling that faces away from the stator electrode.Type: GrantFiled: July 31, 2018Date of Patent: August 11, 2020Assignee: Infineon Technologies AGInventors: Alfons Dehe, Marc Fueldner, Andreas Wiesbauer
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Publication number: 20200239302Abstract: A production method for a double-membrane MEMS component includes: providing a layer arrangement on a carrier substrate, wherein the layer arrangement comprises a first membrane structure, a sacrificial material layer adjoining the first membrane structure, and a counterelectrode structure in the sacrificial material layer and at a distance from the first membrane structure, wherein at least one through opening is formed in the sacrificial material layer as far as the first membrane structure; forming a filling material structure in the at least one through opening by applying a first filling material layer on the wall region of the at least one through opening; applying a second membrane structure on the layer arrangement with the sacrificial material; and removing the sacrificial material from an intermediate region to expose the filling material structure in the intermediate region.Type: ApplicationFiled: April 16, 2020Publication date: July 30, 2020Inventors: Johann Strasser, Alfons Dehe, Gerhard Metzger-Brueckl, Juergen Wagner, Arnaud Walther
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Publication number: 20200236485Abstract: A MEMS device includes a backplate electrode and a membrane disposed spaced apart from the backplate electrode. The membrane includes a displaceable portion and a fixed portion. The backplate electrode and the membrane are arranged such that an overlapping area of the fixed portion of the membrane with the backplate electrode is less than maximum overlapping.Type: ApplicationFiled: February 11, 2020Publication date: July 23, 2020Inventors: Alfons Dehe, Stefan Barzen
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Patent number: 10715930Abstract: According to an embodiment, an optical MEMS transducer includes a diffraction structure including alternating first reflective elements and openings arranged in a first plane, a reflection structure including second reflective elements and configured to deflect with respect to the diffraction structure, and an optical element configured to direct a first optical signal at the diffraction structure and the reflection structure and to receive a second optical signal from the diffraction structure and the reflection structure. The second reflective elements are arranged in the first plane when the reflection structure is at rest. Other embodiments include corresponding systems and apparatus, each configured to perform various embodiment methods.Type: GrantFiled: April 24, 2018Date of Patent: July 14, 2020Assignee: INFINEON TECHNOLOGIES AGInventors: Ulf Bartl, Alfons Dehe
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Publication number: 20200216309Abstract: In accordance with one exemplary embodiment, a production method for a double-membrane MEMS component comprises the following steps: providing a layer arrangement on a carrier substrate, wherein the layer arrangement has a first and second membrane structure spaced apart from one another and a counterelectrode structure arranged therebetween, wherein a sacrificial material is arranged in an intermediate region between the counterelectrode structure and the first and second membrane structures respectively spaced apart therefrom, and wherein the first membrane structure has an opening structure to the intermediate region with the sacrificial material and partly removing the sacrificial material from the intermediate region in order to obtain a mechanical connection structure comprising the sacrificial material between the first and second membrane structures, which mechanical connection structure is mechanically coupled between the first and second membrane structures and is mechanically decoupled from the couType: ApplicationFiled: March 17, 2020Publication date: July 9, 2020Inventors: Marc Fueldner, Stefan Barzen, Alfons Dehe, Gunar Lorenz
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Patent number: 10689250Abstract: In accordance with one exemplary embodiment, a production method for a double-membrane MEMS component comprises the following steps: providing a layer arrangement on a carrier substrate, wherein the layer arrangement has a first and second membrane structure spaced apart from one another and a counterelectrode structure arranged therebetween, wherein a sacrificial material is arranged in an intermediate region between the counterelectrode structure and the first and second membrane structures respectively spaced apart therefrom, and wherein the first membrane structure has an opening structure to the intermediate region with the sacrificial material and partly removing the sacrificial material from the intermediate region in order to obtain a mechanical connection structure comprising the sacrificial material between the first and second membrane structures, which mechanical connection structure is mechanically coupled between the first and second membrane structures and is mechanically decoupled from the couType: GrantFiled: July 20, 2018Date of Patent: June 23, 2020Assignee: INFINEON TECHNOLOGIES AGInventors: Marc Fueldner, Stefan Barzen, Alfons Dehe, Gunar Lorenz
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Patent number: 10684163Abstract: An acoustic wave sensor may include: a continuous membrane deflectable by acoustic waves to be detected, and a piezoelectric layer provided on the membrane and including a plurality of piezoelectric layer portions respectively equipped with at least two individual electric contact structures configured to electrically connect the respective piezoelectric layer portions. Electric contact structures associated with different piezoelectric layer portions may be separated from each other.Type: GrantFiled: August 17, 2017Date of Patent: June 16, 2020Assignee: INFINEON TECHNOLOGIES AGInventors: Alfons Dehe, Manuel Dorfmeister, Ulrich Schmid, Michael Schneider
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Patent number: 10676346Abstract: A production method for a MEMS component includes providing a layer arrangement on a carrier substrate, where the layer arrangement includes a first and second layer structure. A sacrificial material is arranged in an intermediate region between the first and second layer structures, an etch stop structure extending between the first and second layer structures subdivides the intermediate region into an exposure region and an edge region laterally adjoining the exposure region, and at least one of the first layer structure or the second layer structure has access openings to the exposure region. The method further includes removing the sacrificial material from the exposure region through the access openings using an etching process to expose the exposure region. The etch stop structure provides a lateral delimitation for the etching process, and the sacrificial material present in the edge region provides a mechanical connection between the first and second layer structures.Type: GrantFiled: September 20, 2018Date of Patent: June 9, 2020Assignee: INFINEON TECHNOLOGIES AGInventors: Arnaud Walther, Alfons Dehe, Gerhard Metzger-Brueckl, Johann Strasser
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Patent number: 10669151Abstract: A production method for a double-membrane MEMS component includes: providing a layer arrangement on a carrier substrate, wherein the layer arrangement comprises a first membrane structure, a sacrificial material layer adjoining the first membrane structure, and a counterelectrode structure in the sacrificial material layer and at a distance from the first membrane structure, wherein at least one through opening is formed in the sacrificial material layer as far as the first membrane structure; forming a filling material structure in the at least one through opening by applying a first filling material layer on the wall region of the at least one through opening; applying a second membrane structure on the layer arrangement with the sacrificial material; and removing the sacrificial material from an intermediate region to expose the filling material structure in the intermediate region.Type: GrantFiled: August 30, 2018Date of Patent: June 2, 2020Assignee: INFINEON TECHNOLOGIES AGInventors: Johann Strasser, Alfons Dehe, Gerhard Metzger-Brueckl, Juergen Wagner, Arnaud Walther
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Publication number: 20200169819Abstract: For manufacturing a sound transducer structure, membrane support material is applied on a first main surface of a membrane carrier material and membrane material is applied in a sound transducing region and an edge region on a surface of the membrane support material. In addition, counter electrode support material is applied on a surface of the membrane material and recesses are formed in the sound transducing region of the membrane material. Counter electrode material is applied to the counter electrode support material and membrane carrier material and membrane support material are removed in the sound transducing region to the membrane material.Type: ApplicationFiled: January 31, 2020Publication date: May 28, 2020Inventors: Alfons Dehe, Stefan Barzen, Marc Fueldner
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Patent number: 10641626Abstract: In accordance with an embodiment, a MEMS sensor includes a membrane that is suspended from the substrate, a resonant frequency of said membrane being influenced by an ambient pressure that acts on the membrane; and an evaluation device configured to perform a first measurement based on the resonant frequency of the membrane to obtain a measurement result, where the evaluation device is configured to at least partly compensate an influence of the ambient pressure on the measurement result.Type: GrantFiled: August 21, 2018Date of Patent: May 5, 2020Assignee: INFINEON TECHNOLOGIES AGInventors: Christian Bretthauer, Alfons Dehe, Prashanth Makaram, Abidin Güçlü Onaran, Arnaud Walther
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Patent number: 10626007Abstract: In accordance with an embodiment, a microelectromechanical transducer includes a displaceable membrane having an undulated section comprising at least one undulation trough and at least one undulation peak and a plurality of piezoelectric unit cells. At least one piezoelectric unit cell is provided in each case in at least one undulation trough and at least one undulation peak, where each piezoelectric unit cell has a piezoelectric layer and at least one electrode in electrical contact with the piezoelectric layer. The membrane may be formed as a planar component having a substantially larger extent in a first and a second spatial direction, which are orthogonal to one another, than in a third spatial direction, which is orthogonal to the first and the second spatial direction and defines an axial direction of the membrane.Type: GrantFiled: July 10, 2018Date of Patent: April 21, 2020Assignee: Infineon Technologies AGInventors: Christian Bretthauer, Alfons Dehe, Alfred Sigl
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Publication number: 20200103376Abstract: An apparatus for in-situ calibration of a photoacoustic sensor is provided. The apparatus includes a light emitter to emit light along a transmission path to a gas and an acoustic sensor element configured to detect an acoustic signal emitted from the gas based on the received light. Furthermore, the apparatus includes a sensing unit configured to detect the light transmitted along the transmission path and to provide an output signal, and a calibration unit to receive the output signal from the sensing unit and to provide a calibration information based on the output signal received from the sensing unit.Type: ApplicationFiled: December 2, 2019Publication date: April 2, 2020Applicant: Infineon Technologies AGInventors: Stefan KOLB, Alfons DEHE, Jochen HUBER, Franz JOST, Horst THEUSS, Juergen WOELLENSTEIN
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Patent number: 10602290Abstract: A MEMS device includes a backplate electrode and a membrane disposed spaced apart from the backplate electrode. The membrane includes a displaceable portion and a fixed portion. The backplate electrode and the membrane are arranged such that an overlapping area of the fixed portion of the membrane with the backplate electrode is less than maximum overlapping.Type: GrantFiled: November 26, 2018Date of Patent: March 24, 2020Assignee: INFINEON TECHNOLOGIES AGInventors: Alfons Dehe, Stefan Barzen