Patents by Inventor Amrita Sarkar

Amrita Sarkar has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • ANTICANCER AGENTS
    Publication number: 20220251126
    Abstract: The claimed subject matter provides for a method for conjugating an active material to a Pt complex.
    Type: Application
    Filed: August 5, 2020
    Publication date: August 11, 2022
    Applicant: Yissum Research Development Company of the Hebrew University of Jerusalem Ltd.
    Inventors: Dan GIBSON, Amrita SARKAR
  • METHODS FOR RECOVERING AND REUSING POLYMERIC BINDERS FROM COMPOSITE CATHODE FILMS
    Publication number: 20220115716
    Abstract: Materials such as poly(vinylidene fluoride) (PVDF) and lithium cobalt (III) oxide (LCO) are recovered and recycled from cathode films isolated from end-of-life batteries, including lithium-ion batteries. Cathode films are immersed in solution including N,N-dimethylformamide (DMF), N-methyl-2-pyrrolidine (NMP), a tetrahydrofuran (THF):NMP mixture, or a THF:DMF mixture. The solution is able to dissolve PVDF, which can then be separated from LCO and a conductive substrate component of the cathode films via alumina column separation. A PVDF product can be precipitated and recovered, while the LCO and conductive substrate can be recovered directly from the alumina column separator. Both the PVDF and LCO are of suitable quality for use in new cathode films. Such recovery is shown to be achievable even at low solid to liquid ratio during the dissolution process.
    Type: Application
    Filed: October 13, 2021
    Publication date: April 14, 2022
    Applicant: The Trustees of Columbia University in the City of New York
    Inventors: Lauren Elizabeth Marbella, Amrita SARKAR, Richard MAY
  • Etchant for use in rapid formation of robust porous polymers
    Patent number: 10723856
    Abstract: A trifluoroacetic acid-based etchant is described that can remove a sacrificial component of a multi-component polymer, e.g., a self-assembled block copolymer. The etchant can operate at a high etch rate and with excellent selectivity. The etchant can remove a hydrolysable sacrificial component such as a polylactide block from a self-assembled block copolymer. The etchant enables the macroscopic preservation of the nanostructure morphologies of self-assembled copolymers (e.g., poly(styrene-block-lactide) copolymers) and can yield pristine porous films of the non-hydrolysable component of the starting multi-component polymer.
    Type: Grant
    Filed: December 19, 2017
    Date of Patent: July 28, 2020
    Assignee: University of South Carolina
    Inventors: Amrita Sarkar, Morgan Stefik, Chuanbing Tang
  • Etchant for Use in Rapid Formation of Robust Porous Polymers
    Publication number: 20180171091
    Abstract: A trifluoroacetic acid-based etchant is described that can remove a sacrificial component of a multi-component polymer, e.g., a self-assembled block copolymer. The etchant can operate at a high etch rate and with excellent selectivity. The etchant can remove a hydrolysable sacrificial component such as a polylactide block from a self-assembled block copolymer. The etchant enables the macroscopic preservation of the nanostructure morphologies of self-assembled copolymers (e.g., poly(styrene-block-lactide) copolymers) and can yield pristine porous films of the non-hydrolysable component of the starting multi-component polymer.
    Type: Application
    Filed: December 19, 2017
    Publication date: June 21, 2018
    Inventors: Amrita Sarkar, Morgan Stefik, Chuanbing Tang