Patents by Inventor Andrew A. Wolff

Andrew A. Wolff has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 11074494
    Abstract: In one respect, there is provided a system for classifying an instruction sequence with a machine learning model. The system may include at least one processor and at least one memory. The memory may include program code that provides operations when executed by the at least one processor. The operations may include: processing an instruction sequence with a trained machine learning model configured to detect one or more interdependencies amongst a plurality of tokens in the instruction sequence and determine a classification for the instruction sequence based on the one or more interdependencies amongst the plurality of tokens; and providing, as an output, the classification of the instruction sequence. Related methods and articles of manufacture, including computer program products, are also provided.
    Type: Grant
    Filed: November 7, 2016
    Date of Patent: July 27, 2021
    Assignee: Cylance Inc.
    Inventors: Xuan Zhao, Matthew Wolff, John Brock, Brian Wallace, Andy Wortman, Jian Luan, Mahdi Azarafrooz, Andrew Davis, Michael Wojnowicz, Derek Soeder, David Beveridge, Eric Petersen, Ming Jin, Ryan Permeh
  • Patent number: 10272082
    Abstract: Provided is a method for treating ALS in a subject, comprising administering to the subject a therapeutically effective amount of riluzole and a therapeutically effective amount of CK-2017357. Also provided are methods of reducing the variability of riluzole exposure (e.g., Cmax and/or AUC24h) in a subject, methods of reducing the variability of riluzole exposure (e.g., Cmax and/or AUC24h) between two or more subjects, methods of decreasing the total daily dose of riluzole in a subject, methods of increasing the half-life of riluzole in a subject, methods for decreasing the frequency of riluzole dosing in the subject, and methods for reducing the incidence and/or severity of adverse events in a subject treated with riluzole.
    Type: Grant
    Filed: July 12, 2012
    Date of Patent: April 30, 2019
    Assignee: Cytokinetics, Inc.
    Inventors: Jesse Cedarbaum, John Mao, Fady Malik, Andrew A. Wolff
  • Patent number: 10124464
    Abstract: The invention provides methods of inhibiting corrosion of a substrate containing metal. The substrate can be in any suitable form. In some embodiments, the metal is cobalt. The methods can be used with semiconductor wafers in some embodiments. The invention also provides chemical-mechanical polishing compositions and methods of polishing a substrate. A corrosion inhibitor can be used in the methods and compositions disclosed herein. The inhibitor comprises an amphoteric surfactant, a sulfonate, a phosphonate, a carboxylate, an amino acid derivative, a phosphate ester, an isethionate, a sulfate, a sulfosuccinate, a sulfocinnimate, or any combination thereof.
    Type: Grant
    Filed: October 21, 2015
    Date of Patent: November 13, 2018
    Assignee: Cabot Microelectronics Corporation
    Inventors: Mary Cavanaugh, Steven Kraft, Andrew Wolff, Phillip W. Carter, Elise Sikma, Jeffrey Cross, Benjamin Petro
  • Patent number: 9850403
    Abstract: The invention provides a chemical-mechanical polishing composition comprising (a) abrasive particles, (b) a cobalt accelerator selected from a compound having the formula: NR1R2R3 wherein R1, R2, and R3 are independently selected from hydrogen, carboxyalkyl, substituted carboxyalkyl, hydroxyalkyl, substituted hydroxyalkyl and aminocarbonylalkyl, wherein none or one of R1, R2, and R3 are hydrogen; dicarboxyheterocycles; heterocyclylalkyl-?-amino acids; N-(amidoalkyl)amino acids; unsubstituted heterocycles; alkyl-substituted heterocycles; substituted-alkyl-substituted heterocycles; N-aminoalkyl-?-amino acids; and combinations thereof, (c) a cobalt corrosion inhibitor, (d) an oxidizing agent that oxidizes a metal, and (e) water, wherein the polishing composition has a pH of about 3 to about 8.5. The invention further provides a method of chemically-mechanically polishing a substrate with the inventive chemical-mechanical polishing composition. Typically, the substrate contains cobalt.
    Type: Grant
    Filed: May 24, 2017
    Date of Patent: December 26, 2017
    Assignee: Cabot Microelectronics Corporation
    Inventors: Steven Kraft, Andrew Wolff, Phillip W. Carter, Kristin Hayes, Benjamin Petro
  • Patent number: 9834704
    Abstract: The invention provides a chemical-mechanical polishing composition comprising (a) abrasive particles, (b) a cobalt corrosion inhibitor, (c) a cobalt dishing control agent, wherein the cobalt dishing control agent comprises an anionic head group and a C13-C20 aliphatic tail group, (d) an oxidizing agent that oxidizes cobalt, and (e) water, wherein the polishing composition has a pH of about 3 to about 8.5. The invention further provides a method of chemically-mechanically polishing a substrate with the inventive chemical-mechanical polishing composition. Typically, the substrate contains cobalt.
    Type: Grant
    Filed: October 21, 2015
    Date of Patent: December 5, 2017
    Assignee: Cabot Microelectronics Corporation
    Inventors: Steven Kraft, Andrew Wolff, Phillip W. Carter, Benjamin Petro
  • Publication number: 20170260421
    Abstract: The invention provides a chemical-mechanical polishing composition comprising (a) abrasive particles, (b) a cobalt accelerator selected from a compound having the formula: NR1R2R3 wherein R1, R2, and R3 are independently selected from hydrogen, carboxyalkyl, substituted carboxyalkyl, hydroxyalkyl, substituted hydroxyalkyl and aminocarbonylalkyl, wherein none or one of R1, R2, and R3 are hydrogen; dicarboxyheterocycles; heterocyclylalkyl-?-amino acids; N-(amidoalkyl)amino acids; unsubstituted heterocycles; alkyl-substituted heterocycles; substituted-alkyl-substituted heterocycles; N-aminoalkyl-?-amino acids; and combinations thereof, (c) a cobalt corrosion inhibitor, (d) an oxidizing agent that oxidizes a metal, and (e) water, wherein the polishing composition has a pH of about 3 to about 8.5. The invention further provides a method of chemically-mechanically polishing a substrate with the inventive chemical-mechanical polishing composition. Typically, the substrate contains cobalt.
    Type: Application
    Filed: May 24, 2017
    Publication date: September 14, 2017
    Inventors: Steven KRAFT, Andrew WOLFF, Phillip W. CARTER, Kristin HAYES, Benjamin PETRO
  • Patent number: 9688885
    Abstract: The invention provides a chemical-mechanical polishing composition comprising (a) abrasive particles, (b) a cobalt accelerator selected from a compound having the formula: NR1R2R3 wherein R1, R2, and R3 are independently selected from hydrogen, carboxyalkyl, substituted carboxyalkyl, hydroxyalkyl, substituted hydroxyalkyl and aminocarbonylalkyl, wherein none or one of R1, R2, and R3 are hydrogen; dicarboxyheterocycles; heterocyclylalkyl-?-amino acids; N-(amidoalkyl)amino acids; unsubstituted heterocycles; alkyl-substituted heterocycles; substituted-alkyl-substituted heterocycles; N-aminoalkyl-?-amino acids; and combinations thereof, (c) a cobalt corrosion inhibitor, (d) an oxidizing agent that oxidizes a metal, and (e) water, wherein the polishing composition has a pH of about 3 to about 8.5. The invention further provides a method of chemically-mechanically polishing a substrate with the inventive chemical-mechanical polishing composition. Typically, the substrate contains cobalt.
    Type: Grant
    Filed: October 21, 2015
    Date of Patent: June 27, 2017
    Assignee: Cabot Microelectronics Corporation
    Inventors: Steven Kraft, Andrew Wolff, Phillip W. Carter, Kristin Hayes, Benjamin Petro
  • Publication number: 20170107725
    Abstract: A modular mat comprises mirror image layers. At least one fitting receiver is integrally formed in a central portion of each layer, and at least one aperture is formed in a flange portion of each layer. The layers are congruently mated and affixed such that the fitting receiver of one layer is disposed through a corresponding aperture of the flange of the opposite layer. The outer surfaces of the layers comprise traction elements, which may be of different grades, such as industrial grade on one layer and pedestrian grade on the opposing layer. A floor covering system is also disclosed comprising a plurality of modular mats disposed in partially overlapping and interlocking relation with adjacent mats.
    Type: Application
    Filed: October 7, 2016
    Publication date: April 20, 2017
    Applicant: Signature Systems Group, LLC
    Inventors: Chad H. Jones, Andrew Sneeringer, Andrew Wolff, Daniel Himes, Bart Berghuis
  • Publication number: 20170042890
    Abstract: Provided herein are compositions and methods for reducing the decline in vital capacity in a subject by administering to the subject a skeletal muscle troponin activator. Also provided are compositions and methods for reducing respiratory decline in a subject, as measured by slow vital capacity (SVC), by administering to the subject a skeletal muscle troponin activator.
    Type: Application
    Filed: April 28, 2015
    Publication date: February 16, 2017
    Inventors: Jeremy M. SHEFNER, Andrew A. WOLFF, Fady MALIK, Jinsy A. ANDREWS
  • Patent number: 9506255
    Abstract: A modular mat comprises mirror image layers. At least one fitting receiver is integrally formed in a central portion of each layer, and at least one aperture is formed in a flange portion of each layer. The layers are congruently mated and affixed such that the fitting receiver of one layer is disposed through a corresponding aperture of the flange of the opposite layer. The outer surfaces of the layers comprise traction elements, which may be of different grades, such as industrial grade on one layer and pedestrian grade on the opposing layer. A floor covering system is also disclosed comprising a plurality of modular mats disposed in partially overlapping and interlocking relation with adjacent mats.
    Type: Grant
    Filed: October 20, 2015
    Date of Patent: November 29, 2016
    Assignee: Signature Systems Group, LLC
    Inventors: Chad H. Jones, Andrew Sneeringer, Andrew Wolff, Daniel Himes, Bart Berghuis
  • Publication number: 20160115353
    Abstract: The invention provides a chemical-mechanical polishing composition comprising (a) abrasive particles, (b) a cobalt accelerator selected from a compound having the formula: NR1R2R3 wherein R1, R2, and R3 are independently selected from hydrogen, carboxyalkyl, substituted carboxyalkyl, hydroxyalkyl, substituted hydroxyalkyl and aminocarbonylalkyl, wherein none or one of R1, R2, and R3 are hydrogen; dicarboxyheterocycles; heterocyclylalkyl-?-amino acids; N-(amidoalkyl)amino acids; unsubstituted heterocycles; alkyl-substituted heterocycles; substituted-alkyl-substituted heterocycles; N-aminoalkyl-?-amino acids; and combinations thereof, (c) a cobalt corrosion inhibitor, (d) an oxidizing agent that oxidizes a metal, and (e) water, wherein the polishing composition has a pH of about 3 to about 8.5. The invention further provides a method of chemically-mechanically polishing a substrate with the inventive chemical-mechanical polishing composition. Typically, the substrate contains cobalt.
    Type: Application
    Filed: October 21, 2015
    Publication date: April 28, 2016
    Inventors: Steven Kraft, Andrew Wolff, Phillip W. Carter, Kristin Hayes, Benjamin Petro
  • Publication number: 20160108285
    Abstract: The invention provides a chemical-mechanical polishing composition comprising (a) abrasive particles, (b) a cobalt corrosion inhibitor, (c) a cobalt dishing control agent, wherein the cobalt dishing control agent comprises an anionic head group and a C13-C20 aliphatic tail group, (d) an oxidizing agent that oxidizes cobalt, and (e) water, wherein the polishing composition has a pH of about 3 to about 8.5. The invention further provides a method of chemically-mechanically polishing a substrate with the inventive chemical-mechanical polishing composition. Typically, the substrate contains cobalt.
    Type: Application
    Filed: October 21, 2015
    Publication date: April 21, 2016
    Inventors: Steven Kraft, Andrew Wolff, Phillip W. Carter
  • Publication number: 20160107289
    Abstract: The invention provides methods of inhibiting corrosion of a substrate containing metal. The substrate can be in any suitable form. In some embodiments, the metal is cobalt. The methods can be used with semiconductor wafers in some embodiments. The invention also provides chemical-mechanical polishing compositions and methods of polishing a substrate. A corrosion inhibitor can be used in the methods and compositions disclosed herein. The inhibitor comprises an amphoteric surfactant, a sulfonate, a phosphonate, a carboxylate, an amino acid derivative, a phosphate ester, an isethionate, a sulfate, a sulfosuccinate, a sulfocinnimate, or any combination thereof.
    Type: Application
    Filed: October 21, 2015
    Publication date: April 21, 2016
    Inventors: Mary Cavanaugh, Steven Kraft, Andrew Wolff, Phillip W. Carter, Elise Sikma, Jeffrey Cross
  • Publication number: 20140378465
    Abstract: Methods are provided for treating diabetes, lowering plasma level of HbA1c, glucose plasma levels, total cholesterol plasma level, and/or triglyceride plasma level while increasing HDL cholesterol levels and delaying onset of diabetic retinopathy in a diabetic, pre-diabetic, or non-diabetic mammal while minimizing undesirable side effects.
    Type: Application
    Filed: September 3, 2014
    Publication date: December 25, 2014
    Inventors: MARKUS JERLING, ANDREW A. WOLFF
  • Patent number: 8883750
    Abstract: Methods are provided for treating diabetes, lowering plasma level of HbA1c, glucose plasma levels, total cholesterol plasma level, and/or triglyceride plasma level while increasing HDL cholesterol levels and delaying onset of diabetic retinopathy in a diabetic, pre-diabetic, or non-diabetic mammal while minimizing undesirable side effects.
    Type: Grant
    Filed: October 18, 2012
    Date of Patent: November 11, 2014
    Assignee: Gilead Sciences, Inc.
    Inventors: Andrew A. Wolff, Markus Jerling
  • Patent number: 8822473
    Abstract: Methods are provided for lowering plasma level of HbA1c in a diabetic, pre-diabetic, or non-diabetic patient suffering from at least one cardiovascular disease and slowing or delaying the development of or worsening of hyperglycemia in a diabetic, pre-diabetic, or non-diabetic patient.
    Type: Grant
    Filed: May 31, 2007
    Date of Patent: September 2, 2014
    Assignee: Gilead Sciences, Inc.
    Inventors: Andrew Wolff, Marcus Jerling
  • Publication number: 20140243344
    Abstract: Provided is a method for treating ALS in a subject, comprising administering to the subject a therapeutically effective amount of riluzole and a therapeutically effective amount of CK-2017357. Also provided are methods of reducing the variability of riluzole exposure (e.g., Cmax and/or AUC24h) in a subject, methods of reducing the variability of riluzole exposure (e.g., Cmax and/or AUC24h) between two or more subjects, methods of decreasing the total daily dose of riluzole in a subject, methods of increasing the half-life of riluzole in a subject, methods for decreasing the frequency of riluzole dosing in the subject, and methods for reducing the incidence and/or severity of adverse events in a subject treated with riluzole.
    Type: Application
    Filed: July 12, 2012
    Publication date: August 28, 2014
    Inventors: Jesse Cedarbaum, John Mao, Fady Malik, Andrew A. Wolff
  • Patent number: 8314104
    Abstract: Methods are provided for treating diabetes, lowering plasma level of HbA1c, glucose plasma levels, total cholesterol plasma level, and/or triglyceride plasma level while increasing HDL cholesterol levels and delaying onset of diabetic retinopathy in a diabetic, pre-diabetic, or non-diabetic mammal while minimizing undesirable side effects.
    Type: Grant
    Filed: April 7, 2010
    Date of Patent: November 20, 2012
    Assignee: Gilead Sciences, Inc.
    Inventors: Andrew Wolff, Markus Jerling
  • Publication number: 20100197701
    Abstract: Methods are provided for treating diabetes, lowering plasma level of HbA1c, glucose plasma levels, total cholesterol plasma level, and/or triglyceride plasma level while increasing HDL cholesterol levels and delaying onset of diabetic retinopathy in a diabetic, pre-diabetic, or non-diabetic mammal while minimizing undesirable side effects.
    Type: Application
    Filed: April 7, 2010
    Publication date: August 5, 2010
    Applicant: Gilead Palo Alto, Inc.
    Inventors: Andrew Wolff, Markus Jerling
  • Patent number: D832468
    Type: Grant
    Filed: October 20, 2015
    Date of Patent: October 30, 2018
    Assignee: Signature Systems Group, LLC
    Inventors: Chad H. Jones, Andrew Sneeringer, Andrew Wolff, Daniel Himes, Bart Berghuis