Patents by Inventor Andrew G. Haerle

Andrew G. Haerle has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 9410063
    Abstract: A polishing slurry can include zirconia particles. The polishing slurry can be used to polish conductive and insulating materials, and is particularly well suited for polishing oxide materials as well as metals. The characteristics of the zirconia particles can affect the polishing of workpieces. By selecting the proper characteristics, the polishing slurry can have a good material removal rate while still providing an acceptable surface finish. The zirconia particles can be used as a replacement for, or in conjunction with, ceria or other abrasive particles. The content of zirconia particles in the polishing slurry may be less than a comparable polishing slurry having silica or alumina particles.
    Type: Grant
    Filed: July 15, 2015
    Date of Patent: August 9, 2016
    Assignee: SAINT-GOBAIN CERAMICS & PLASTICS, INC.
    Inventors: Andrew G. Haerle, Jun Wang, Frederic Wiss
  • Patent number: 9343321
    Abstract: A method for chemical mechanical polishing of a substrate includes polishing the substrate at a stock removal rate of greater than about 2.5 ?/min to achieve a Ra of not greater than about 5.0 ?. The substrate can be a III-V substrate or a SiC substrate. The polishing utilizes a chemical mechanical polishing slurry comprising ultra-dispersed diamonds and at least 80 wt % water.
    Type: Grant
    Filed: February 6, 2015
    Date of Patent: May 17, 2016
    Assignee: SAINT-GOBAIN CERMAICS & PLASTICS, INC.
    Inventors: Jun Wang, Ronald W. Laconto, Andrew G. Haerle
  • Publication number: 20150315441
    Abstract: A polishing slurry can include zirconia particles. The polishing slurry can be used to polish conductive and insulating materials, and is particularly well suited for polishing oxide materials as well as metals. The characteristics of the zirconia particles can affect the polishing of workpieces. By selecting the proper characteristics, the polishing slurry can have a good material removal rate while still providing an acceptable surface finish. The zirconia particles can be used as a replacement for, or in conjunction with, ceria or other abrasive particles. The content of zirconia particles in the polishing slurry may be less than a comparable polishing slurry having silica or alumina particles.
    Type: Application
    Filed: July 15, 2015
    Publication date: November 5, 2015
    Inventors: Andrew G. Haerle, Jun Wang, Frederic Wiss
  • Patent number: 9120200
    Abstract: A polishing slurry can include zirconia particles. The polishing slurry can be used to polish conductive and insulating materials, and is particularly well suited for polishing oxide materials as well as metals. The characteristics of the zirconia particles can affect the polishing of workpieces. By selecting the proper characteristics, the polishing slurry can have a good material removal rate while still providing an acceptable surface finish. The zirconia particles can be used as a replacement for, or in conjunction with, ceria or other abrasive particles. The content of zirconia particles in the polishing slurry may be less than a comparable polishing slurry having silica or alumina particles.
    Type: Grant
    Filed: December 28, 2011
    Date of Patent: September 1, 2015
    Assignee: SAINT-GOBAIN CERAMICS & PLASTICS, INC.
    Inventors: Andrew G. Haerle, Jun Wang, Frederic Wiss
  • Publication number: 20150155181
    Abstract: A method for chemical mechanical polishing of a substrate includes polishing the substrate at a stock removal rate of greater than about 2.5 ?/min to achieve a Ra of not greater than about 5.0 ?. The substrate can be a III-V substrate or a SiC substrate. The polishing utilizes a chemical mechanical polishing slurry comprising ultra-dispersed diamonds and at least 80 wt % water.
    Type: Application
    Filed: February 6, 2015
    Publication date: June 4, 2015
    Inventors: Jun Wang, Ronald W. Laconto, Andrew G. Haerle
  • Publication number: 20150113882
    Abstract: A particulate material includes an abrasive particle having a superabrasive material with an external surface, and a coating including a metal overlying the external surface of the abrasive particle. The coating can include domains having an average domain size of not greater than about 260 nm, and the coating can include between about 1 wt % and about 20 wt % of the total weight of the abrasive particle and coating.
    Type: Application
    Filed: December 28, 2012
    Publication date: April 30, 2015
    Applicant: SAINT-GOBAIN CERAMICS & PLASTICS, INC.
    Inventors: Nicholas J. Tumavitch, William Mecca, Brian C. Shaffer, Andrew G. Haerle
  • Patent number: 8980113
    Abstract: A method for chemical mechanical polishing of a substrate includes polishing the substrate at a stock removal rate of greater than about 2.5 ?/min to achieve a Ra of not greater than about 5.0 ?. The substrate can be a III-V substrate or a SiC substrate. The polishing utilizes a chemical mechanical polishing slurry comprising ultra-dispersed diamonds and at least 80 wt % water.
    Type: Grant
    Filed: March 12, 2010
    Date of Patent: March 17, 2015
    Assignee: Saint-Gobain Ceramics & Plastics, Inc.
    Inventors: Jun Wang, Ronald W. Laconto, Andrew G. Haerle
  • Publication number: 20150004890
    Abstract: A method of evenly coating small abrasive particles, specifically a method of coating diamond particles?10 ?m with nickel, and an abrasive article containing the coated abrasive particles, for example, a fixed diamond wire. The method includes applying ultrasonic energy to the plating bath and adjusting the power of the ultrasonic energy that a non-agglomeration factor (NAF) of the batch of abrasive particle is at least about 0.9, the non-agglomeration factor defined as a ratio (D50sa/D50b), wherein D50b represents the median particle size of the coated abrasive particles and D50sa represents the median particle size of the abrasive particles prior to coating.
    Type: Application
    Filed: June 26, 2014
    Publication date: January 1, 2015
    Inventors: Zoran KRSTIC, William MECCA, Andrew G. HAERLE, Nicholas J. TUMAVITCH, Brian C. SHAFFER
  • Patent number: 8685123
    Abstract: An abrasive particulate material is disclosed that includes alumina particles. The alumina particles include a transition alumina and at least 5.0 wt % of an amorphous phase. The transition alumina particles also have a density not greater than about 3.20 g/cm3.
    Type: Grant
    Filed: October 14, 2005
    Date of Patent: April 1, 2014
    Assignee: Saint-Gobain Ceramics & Plastics, Inc.
    Inventors: Jun Wang, Andrew G. Haerle
  • Patent number: 8343415
    Abstract: Processes for forming ceramic particulate material. The ceramic particulate material includes alumina particles, the particles having a specific surface area (SSA) not less than 15 m2/g and not greater than 75 m2/g and a sphericity quantified by at least one of (i) a mean roundness not less than 0.710 as measured by Roundness Correlation Image Analysis, and (ii) a concavity less than 20%, wherein concavity is the percent of alumina particles based on a sample of at least 100 particles, which have a concave outer peripheral portion that extends along a distance not less than 10% of d50 by TEM inspection, the concave outer peripheral portion having a negative radius of curvature as viewed from an interior of the particle.
    Type: Grant
    Filed: February 27, 2012
    Date of Patent: January 1, 2013
    Assignee: Saint-Gobain Ceramics & Plastics, Inc.
    Inventors: Ralph Bauer, Andrew G. Haerle, Doruk O. Yener, Claire M. Theron, Michael D. Kavanaugh
  • Patent number: 8216328
    Abstract: A particulate material comprising cerium oxide particles having a secondary particle size distribution in a range of 80 nm to 199 nm and a density of at least 6.6 g/cm3.
    Type: Grant
    Filed: June 23, 2011
    Date of Patent: July 10, 2012
    Assignee: Saint-Gobain Ceramics & Plastics, Inc.
    Inventors: Andrew G. Haerle, Jun Wang
  • Publication number: 20120171936
    Abstract: A polishing slurry can include zirconia particles. The polishing slurry can be used to polish conductive and insulating materials, and is particularly well suited for polishing oxide materials as well as metals. The characteristics of the zirconia particles can affect the polishing of workpieces. By selecting the proper characteristics, the polishing slurry can have a good material removal rate while still providing an acceptable surface finish. The zirconia particles can be used as a replacement for, or in conjunction with, ceria or other abrasive particles. The content of zirconia particles in the polishing slurry may be less than a comparable polishing slurry having silica or alumina particles.
    Type: Application
    Filed: December 28, 2011
    Publication date: July 5, 2012
    Applicant: SAINT-GOBAIN CERAMICS & PLASTICS, INC.
    Inventors: Andrew G. Haerle, Jun Wang, Frederic Wiss
  • Publication number: 20120153547
    Abstract: Processes for forming ceramic particulate material. The ceramic particulate material includes alumina particles, the particles having a specific surface area (SSA) not less than 15 m2/g and not greater than 75 m2/g and a sphericity quantified by at least one of (i) a mean roundness not less than 0.710 as measured by Roundness Correlation Image Analysis, and (ii) a concavity less than 20%, wherein concavity is the percent of alumina particles based on a sample of at least 100 particles, which have a concave outer peripheral portion that extends along a distance not less than 10% of d50 by TEM inspection, the concave outer peripheral portion having a negative radius of curvature as viewed from an interior of the particle.
    Type: Application
    Filed: February 27, 2012
    Publication date: June 21, 2012
    Applicant: SAINT-GOBAIN CERAMICS & PLASTICS, INC.
    Inventors: Ralph Bauer, Andrew G. Haerle, Doruk O. Yener, Claire M. Theron, Michael D. Kavanaugh
  • Patent number: 8105135
    Abstract: A polishing slurry includes liquid medium and particulate abrasive. The particulate abrasive includes soft abrasive particles, hard abrasive particles, and colloidal silica particles, wherein the soft abrasive particles have a Mohs hardness of not greater than 8 and the hard abrasive particles have a Mohs hardness of not less than 8, and wherein the soft abrasive particles and the hard abrasive particles are present at a weight ratio of not less than 2:1.
    Type: Grant
    Filed: September 29, 2006
    Date of Patent: January 31, 2012
    Assignee: Saint-Gobain Ceramics & Plastics, Inc.
    Inventors: Ronald W. Laconto, Andrew G. Haerle
  • Publication number: 20110252714
    Abstract: A particulate material comprising cerium oxide particles having a secondary particle size distribution in a range of 80 nm to 199 nm and a density of at least 6.6 g/cm3.
    Type: Application
    Filed: June 23, 2011
    Publication date: October 20, 2011
    Applicant: Saint-Gobain Ceramics & Plastics, Inc.
    Inventors: Andrew G. Haerle, Jun Wang
  • Patent number: 7993420
    Abstract: A particulate material comprising cerium oxide particles having a secondary particle size distribution in a range of 80 nm to 199 nm and a density of at least 6.6 g/cm3.
    Type: Grant
    Filed: February 5, 2009
    Date of Patent: August 9, 2011
    Assignee: Saint-Gobain Ceramics & Plastics, Inc.
    Inventors: Andrew G. Haerle, Jun Wang
  • Publication number: 20100233880
    Abstract: A method for chemical mechanical polishing of a substrate includes polishing the substrate at a stock removal rate of greater than about 2.5 ?/min to achieve a Ra of not greater than about 5.0 ?. The substrate can be a III-V substrate or a SiC substrate. The polishing utilizes a chemical mechanical polishing slurry comprising ultra-dispersed diamonds and at least 80 wt % water.
    Type: Application
    Filed: March 12, 2010
    Publication date: September 16, 2010
    Applicant: SAINT-GOBAIN CERAMICS & PLASTICS, INC.
    Inventors: Jun Wang, Ronald W. Laconto, Andrew G. Haerle
  • Patent number: 7727919
    Abstract: A recrystallized silicon carbide body is provided that has a resistivity of not less than about 1E5 ? cm and a nitrogen content comprising nitrogen atoms bonded within the body, wherein the nitrogen content is not greater than about 200 ppm.
    Type: Grant
    Filed: October 29, 2007
    Date of Patent: June 1, 2010
    Assignee: Saint-Gobain Ceramics & Plastics, Inc.
    Inventors: Andrew G. Haerle, Edward A. Perry
  • Publication number: 20090199488
    Abstract: A particulate material comprising cerium oxide particles having a secondary particle size distribution in a range of 80 nm to 199 nm and a density of at least 6.6 g/cm3.
    Type: Application
    Filed: February 5, 2009
    Publication date: August 13, 2009
    Applicant: Saint-Gobain Ceramics & Plastics, Inc.
    Inventors: Andrew G. Haerle, Jun Wang
  • Publication number: 20090111678
    Abstract: A recrystallized silicon carbide body is provided that has a resistivity of not less than about 1E5 ?cm and a nitrogen content comprising nitrogen atoms bonded within the body, wherein the nitrogen content is not greater than about 200 ppm.
    Type: Application
    Filed: October 29, 2007
    Publication date: April 30, 2009
    Applicant: SAINT-GOBAIN CERAMICS & PLASTICS, INC.
    Inventors: Andrew G. Haerle, Edward A. Perry