Patents by Inventor Armen Avoyan

Armen Avoyan has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20220252548
    Abstract: An apparatus for measuring contaminants on a surface of a component is provided. An extraction vessel for holding a measurement fluid has an opening adapted to form a meniscus using the measurement fluid. An actuator moves at least one of the extraction vessel and the component to a position where the meniscus is in contact with the surface of the component. A transducer is positioned to provide acoustic energy to the measurement fluid.
    Type: Application
    Filed: May 19, 2020
    Publication date: August 11, 2022
    Inventors: Amir A. YASSERI, Duane OUTKA, Armen AVOYAN, Kennet Cresencio BAYLON, John DAUGHERTY, Girish M. HUNDI, Cliff LA CROIX
  • Publication number: 20210205858
    Abstract: A method for conditioning a component of a wafer processing chamber is provided. The component is placed in an ultrasonic conditioning solution in an ultrasonic solution tank. Ultrasonic energy is applied through the ultrasonic conditioning solution to the component to clean the component. The component is submerged in a megasonic conditioning solution in a tank. Megasonic energy is applied through the megasonic conditioning solution to the component to clean the component.
    Type: Application
    Filed: March 24, 2021
    Publication date: July 8, 2021
    Inventors: Amir A. YASSERI, Hong SHIH, John DAUGHERTY, Duane OUTKA, Lin XU, Armen AVOYAN, Cliff LA CROIX, Girish HUNDI
  • Patent number: 10967407
    Abstract: An apparatus for conditioning a component of a processing chamber is provided. A tank for holding a megasonic conditioning solution is provided. A mount holds the component immersed in a megasonic conditioning solution, when the tank is filled with the megasonic conditioning solution. A megasonic conditioning solution inlet system delivers the megasonic conditioning solution to the tank. A megasonic transducer head comprises at least one megasonic transducer to provide megasonic energy to the megasonic conditioning solution, wherein the megasonic energy is delivered to the component via the megasonic conditioning solution. A megasonic conditioning solution drain system drains the megasonic conditioning solution from the tank at a location above where the component is held in the megasonic conditioning solution. An actuator moves the megasonic transducer head across the tank.
    Type: Grant
    Filed: May 2, 2018
    Date of Patent: April 6, 2021
    Assignee: Lam Research Corporation
    Inventors: Amir A. Yasseri, Hong Shih, John Daugherty, Duane Outka, Lin Xu, Armen Avoyan, Cliff La Croix, Girish Hundi
  • Patent number: 10391526
    Abstract: A cleaning fixture assembly for protecting an electrostatic chuck suitable for supporting semiconductor substrates during a cleaning process contains a plate configured to align with and engage a backside of the electrostatic chuck, the plate having an annular seal portion surrounding a pocket. The cleaning fixture assembly also contains a first O-ring engaging the annular seal portion of the plate, a plurality of through-holes in the pocket of the plate, and a plurality of O-rings surrounding the plurality of through-holes in the pocket of the plate. The plurality of through-holes are configured to be aligned with and in fluid communication with lift pin holes and helium holes in the backside of the electrostatic chuck, and the plurality of O-rings are positioned to allow cleaning media to engage the lift pin holes and helium holes in the electrostatic chuck during a cleaning process while sealing the cleaning media from reaching the backside of the electrostatic chuck.
    Type: Grant
    Filed: December 12, 2013
    Date of Patent: August 27, 2019
    Assignee: Lam Research Corporation
    Inventors: Armen Avoyan, Cliff LaCroix, Hong Shih, Kennet Baylon
  • Publication number: 20180318890
    Abstract: An apparatus for conditioning a component of a processing chamber is provided. A tank for holding a megasonic conditioning solution is provided. A mount holds the component immersed in a megasonic conditioning solution, when the tank is filled with the megasonic conditioning solution. A megasonic conditioning solution inlet system delivers the megasonic conditioning solution to the tank. A megasonic transducer head comprises at least one megasonic transducer to provide megasonic energy to the megasonic conditioning solution, wherein the megasonic energy is delivered to the component via the megasonic conditioning solution. A megasonic conditioning solution drain system drains the megasonic conditioning solution from the tank at a location above where the component is held in the megasonic conditioning solution. An actuator moves the megasonic transducer head across the tank.
    Type: Application
    Filed: May 2, 2018
    Publication date: November 8, 2018
    Inventors: Amir A. YASSERI, Hong SHIH, John DAUGHERTY, Duane OUTKA, Lin XU, Armen AVOYAN, Cliff LA CROIX, Girish HUNDI
  • Patent number: 9748078
    Abstract: In one embodiment, a dual phase cleaning chamber may include a turbulent mixing chamber, a fluid diffuser, an isostatic pressure chamber and a rupture mitigating nozzle. The turbulent mixing chamber may be in fluid communication with a first fluid inlet and a second fluid inlet. The fluid diffuser may be in fluid communication with the turbulent mixing chamber. The rupture mitigating nozzle may include a first fluid collecting offset, a second fluid collecting offset, and a displacement damping projection. The displacement damping projection may be disposed between the first and second fluid collecting offset and may be offset away from each of the first fluid collecting offset and the second fluid collecting offset, and towards the fluid diffuser. A pressurized cleaning fluid introduced from the first fluid inlet, the second fluid inlet, or both flows through the outlet passage of the first and second fluid collecting offset.
    Type: Grant
    Filed: January 21, 2016
    Date of Patent: August 29, 2017
    Assignee: Lam Research Corporation
    Inventors: Armen Avoyan, Cliff La Croix, Hong Shih
  • Patent number: 9623449
    Abstract: A dielectric window cleaning apparatus may be used for cleaning a dielectric window of a plasma processing device. The dielectric window cleaning apparatus may comprise a window support base, a fluid containing enclosure, a window rotating mechanism, a spray arm, and multiple fluid spraying nozzles. The fluid containing enclosure may include at least one overflow containment sidewall and may be located at least partially under and at least partially around a portion of the window support base. The window rotating mechanism may be operatively connected to the window support base and may rotate the window support base. The spray arm may be in fluid communication with a fluid source and may include a fluid flow channel. The multiple fluid spraying nozzles may each expel fluid from the fluid flow channel in a window cleansing spray.
    Type: Grant
    Filed: April 9, 2012
    Date of Patent: April 18, 2017
    Assignee: Lam Research Corporation
    Inventors: Armen Avoyan, Hong Shih, Cliff LaCroix, John Daugherty
  • Patent number: 9505036
    Abstract: A particle removal tool having a sound field transducer, a cleaning chamber, and an open sealing face. The cleaning chamber having a cleaning fluid guiding chamber extending from the sound field transducer to the open sealing face, a cleaning fluid delivery channel in fluid communication with the cleaning fluid guiding chamber, and a cleaning fluid return channel. The open sealing face has a cleaning portal disposed contiguous with a plane formed by the open sealing face and a chamber-to-surface interface seal which forms a fluid tight seal with a cleaning surface plane. The sound field transducer is disposed within a line-of-sight of the cleaning portal and generates acoustic waves with a frequency between approximately 20 kHz and approximately 2 MHz.
    Type: Grant
    Filed: March 15, 2013
    Date of Patent: November 29, 2016
    Assignee: Lam Research Corporation
    Inventors: Armen Avoyan, Cliff LaCroix, Hong Shih, John Daugherty
  • Patent number: 9406534
    Abstract: A system and method of cleaning a plasma processing chamber component includes removing the component from the plasma processing chamber, the removed component including a material deposited on the surface of the component. A heated oxidizing solution is applied to the material deposited on the component to oxidize a first portion deposited material. A stripping solution is applied to the component to remove the oxidized first portion of the deposited material. An etching solution is applied to remove a second portion of the deposited material and the cleaned component can be rinsed and dried.
    Type: Grant
    Filed: October 27, 2014
    Date of Patent: August 2, 2016
    Assignee: Lam Research Corporation
    Inventors: Armen Avoyan, Kennet Baylon
  • Patent number: 9396912
    Abstract: In one embodiment, a method for cleaning a showerhead electrode my include sealing a showerhead electrode within a cleaning assembly such that a first cleaning volume is formed on a first side of the showerhead electrode and a second cleaning volume is formed on a second side of the showerhead electrode. An acidic solution can be loaded into the first cleaning volume on the first side of the showerhead electrode. The first cleaning volume on the first side of the showerhead electrode can be pressurized such that at least a portion of the acidic solution flows through one or more of the plurality of gas passages of the showerhead electrode. An amount of purified water can be propelled through the second cleaning volume on the second side of the showerhead electrode, and into contact with the second side of the showerhead electrode.
    Type: Grant
    Filed: May 30, 2012
    Date of Patent: July 19, 2016
    Assignee: LAM RESEARCH CORPORATION
    Inventors: Armen Avoyan, Cliff La Croix, Hong Shih, John Daugherty
  • Patent number: 9390895
    Abstract: A sonic cleaning tool having a component retaining fixture, a sonic bath, and a cleaning fluid circulating system. The sonic bath has a sound field transducer and is structurally configured to place the component retaining fixture in sonic communication with the sound field transducer within the sonic bath. The component retaining fixture comprises a first end plate, a second end plate, a first component securing member, a second component securing member, and a plurality of compression studs. The first component securing member projects from the first end plate and is structurally configured for repeatable transition between a retracted position and an extended position. The second component securing member projects from the second end plate. The compression studs of the component retaining fixture span from the first end plate to the second end plate and are spaced to form a plurality of sonic transmission windows between the compression studs.
    Type: Grant
    Filed: June 28, 2013
    Date of Patent: July 12, 2016
    Assignee: Lam Research Corporation
    Inventors: Cliff LaCroix, Armen Avoyan
  • Publication number: 20160141153
    Abstract: In one embodiment, a dual phase cleaning chamber may include a turbulent mixing chamber, a fluid diffuser, an isostatic pressure chamber and a rupture mitigating nozzle. The turbulent mixing chamber may be in fluid communication with a first fluid inlet and a second fluid inlet. The fluid diffuser may be in fluid communication with the turbulent mixing chamber. The rupture mitigating nozzle may include a first fluid collecting offset, a second fluid collecting offset, and a displacement damping projection. The displacement damping projection may be disposed between the first and second fluid collecting offset and may be offset away from each of the first fluid collecting offset and the second fluid collecting offset, and towards the fluid diffuser. A pressurized cleaning fluid introduced from the first fluid inlet, the second fluid inlet, or both flows through the outlet passage of the first and second fluid collecting offset.
    Type: Application
    Filed: January 21, 2016
    Publication date: May 19, 2016
    Inventors: Armen Avoyan, Cliff la Croix, Hong Shih
  • Patent number: 9293305
    Abstract: In one embodiment, a cleaning assembly may include a modular electrode sealing housing, an acid injection inlet, and a fluid injection inlet. The modular electrode sealing housing may include a high pressure closure member that contains a first cleaning volume and a low pressure closure member that contains a second cleaning volume. The acid injection inlet can be in fluid communication with the first cleaning volume of the high pressure closure member. The fluid injection inlet can be in fluid communication with the second cleaning volume of the low pressure closure member. During normal operation, a showerhead electrode can be sealed within the modular electrode sealing housing such that the first cleaning volume is located on a first side and the second cleaning volume is located on a second side of the showerhead electrode.
    Type: Grant
    Filed: May 30, 2012
    Date of Patent: March 22, 2016
    Assignee: LAM RESEARCH CORPORATION
    Inventors: Armen Avoyan, Cliff La Croix, Hong Shih, John Daugherty
  • Publication number: 20160079096
    Abstract: A system and method of cleaning a plasma processing chamber component includes removing the component from the plasma processing chamber, the removed component including a material deposited on the surface of the component. A heated oxidizing solution is applied to the material deposited on the component to oxidize a first portion deposited material. A stripping solution is applied to the component to remove the oxidized first portion of the deposited material. An etching solution is applied to remove a second portion of the deposited material and the cleaned component can be rinsed and dried.
    Type: Application
    Filed: October 27, 2014
    Publication date: March 17, 2016
    Inventors: Armen Avoyan, Kennet Baylon
  • Patent number: 9245719
    Abstract: In one embodiment, a dual phase cleaning chamber may include a turbulent mixing chamber, a fluid diffuser, an isostatic pressure chamber and a rupture mitigating nozzle. The turbulent mixing chamber may be in fluid communication with a first fluid inlet and a second fluid inlet. The fluid diffuser may be in fluid communication with the turbulent mixing chamber. The rupture mitigating nozzle may include a first fluid collecting offset, a second fluid collecting offset, and a displacement damping projection. The displacement damping projection may be disposed between the first and second fluid collecting offset and may be offset away from each of the first fluid collecting offset and the second fluid collecting offset, and towards the fluid diffuser. A pressurized cleaning fluid introduced from the first fluid inlet, the second fluid inlet, or both flows through the outlet passage of the first and second fluid collecting offset.
    Type: Grant
    Filed: July 20, 2011
    Date of Patent: January 26, 2016
    Assignee: Lam Research Corporation
    Inventors: Armen Avoyan, Cliff La Croix, Hong Shih
  • Patent number: 9120201
    Abstract: A process is provided for polishing a silicon electrode utilizing a polishing turntable and a dual function electrode platen secured to the polishing, which can comprise a plurality of electrode mounts arranged to project from an electrode engaging face of the dual function electrode platen. The electrode mounts and mount receptacles can be configured to permit non-destructive engagement and disengagement of the electrode engaging face of the electrode platen and the platen engaging face of the silicon electrode. The silicon electrode can be polished by (i) engaging the electrode engaging face of the electrode platen and the platen engaging face of the silicon electrode via the electrode mounts and mount receptacles, (ii) utilizing the polishing turntable to impart rotary, and (iii) contacting an exposed face of the silicon electrode with a polishing surface as the silicon electrode. Additional embodiments are contemplated, disclosed and claimed.
    Type: Grant
    Filed: September 9, 2013
    Date of Patent: September 1, 2015
    Assignee: Lam Research Corporation
    Inventors: Armen Avoyan, Duane Outka, Catherine Zhou, Hong Shih
  • Patent number: 9079228
    Abstract: A method for cleaning metallic contaminants from an upper electrode used in a plasma chamber. The method comprises a step of soaking the upper electrode in a cleaning solution of concentrated ammonium hydroxide, hydrogen peroxide and water. The cleaning solution is free of hydrofluoric acid and hydrochloric acid. The method further comprises an optional step of soaking the upper electrode in dilute nitric acid and rinsing the cleaned upper electrode.
    Type: Grant
    Filed: December 7, 2010
    Date of Patent: July 14, 2015
    Assignee: Lam Research Corporation
    Inventors: Hong Shih, Armen Avoyan, Shashank C. Deshmukh, David Carman
  • Publication number: 20150165492
    Abstract: A cleaning fixture assembly for protecting an electrostatic chuck suitable for supporting semiconductor substrates during a cleaning process contains a plate configured to align with and engage a backside of the electrostatic chuck, the plate having an annular seal portion surrounding a pocket. The cleaning fixture assembly also contains a first O-ring engaging the annular seal portion of the plate, a plurality of through-holes in the pocket of the plate, and a plurality of O-rings surrounding the plurality of through-holes in the pocket of the plate. The plurality of through-holes are configured to be aligned with and in fluid communication with lift pin holes and helium holes in the backside of the electrostatic chuck, and the plurality of O-rings are positioned to allow cleaning media to engage the lift pin holes and helium holes in the electrostatic chuck during a cleaning process while sealing the cleaning media from reaching the backside of the electrostatic chuck.
    Type: Application
    Filed: December 12, 2013
    Publication date: June 18, 2015
    Applicant: Lam Research Corporation
    Inventors: Armen Avoyan, Cliff LaCroix, Hong Shih, Kennet Baylon
  • Patent number: 8945317
    Abstract: An injector cleaning apparatus with a concentric dual flow introducer and a flow-dispersing injector seat along with a method of cleaning an injector. The concentric dual flow introducer has concentric cleaning fluid flowpaths configured to communicate with a central passage and a plurality of peripheral passages of a gas injector. The input-side injector engaging interface of the concentric dual flow introducer and the flow-dispersing injector seat each have a compressible sealing portion having compressibility sufficient to yield under fluid cleaning surges attributable to initiation and termination of cleaning fluid flow through the injector cleaning apparatus along with resiliency sufficient to prevent abutment of the gas injector and a rigid facing portion of the input-side injector engaging interface and output-side injector engaging interface respectively.
    Type: Grant
    Filed: October 12, 2012
    Date of Patent: February 3, 2015
    Assignee: Lam Research Corporation
    Inventors: Armen Avoyan, Cliff La Croix, Hong Shih, Allan Ronne, John Daugherty, Catherine Zhou
  • Publication number: 20150000712
    Abstract: A sonic cleaning tool having a component retaining fixture, a sonic bath, and a cleaning fluid circulating system. The sonic bath has a sound field transducer and is structurally configured to place the component retaining fixture in sonic communication with the sound field transducer within the sonic bath. The component retaining fixture comprises a first end plate, a second end plate, a first component securing member, a second component securing member, and a plurality of compression studs. The first component securing member projects from the first end plate and is structurally configured for repeatable transition between a retracted position and an extended position. The second component securing member projects from the second end plate. The compression studs of the component retaining fixture span from the first end plate to the second end plate and are spaced to form a plurality of sonic transmission windows between the compression studs.
    Type: Application
    Filed: June 28, 2013
    Publication date: January 1, 2015
    Inventors: Cliff LaCroix, Armen Avoyan