Patents by Inventor Atsushi Endo

Atsushi Endo has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 9279183
    Abstract: A method of operating a film forming apparatus includes forming a carbon film on each of surfaces of a plurality of objects held by a holding unit in a processing container and performing a cleaning process with a cleaning gas to remove an unnecessary carbon film adhered on a inside of the processing container, wherein the method further includes, before the forming of the carbon film, forming, on a surface of a member contacting a processing space in the processing container, a tolerant pre-coating film which has a tolerance to the cleaning gas and improves adhesion of the carbon film to the surface of the member. Accordingly, the adhesion of the carbon film is improved, and further, the tolerant pre-coating film remains even when the cleaning process of removing the unnecessary carbon film is performed.
    Type: Grant
    Filed: October 26, 2012
    Date of Patent: March 8, 2016
    Assignee: TOKYO ELECTRON LIMITED
    Inventors: Atsushi Endo, Satoshi Mizunaga, Takehiro Otsuka
  • Publication number: 20160030430
    Abstract: Embodiments of the disclosure relate to tetrahydropyrazolopyrimidine compounds that act as antagonists or inhibitors for Toll-like receptors 7 and/or 8, and their use in pharmaceutical compositions effective for treatment of systemic lupus erythematosus (SLE) and lupus nephritis
    Type: Application
    Filed: July 22, 2015
    Publication date: February 4, 2016
    Inventors: Roch Boivin, Eric Carlson, Atsushi Endo, Hans Hansen, Lynn D. Hawkins, Sally Ishizaka, Matthew Mackey, Sridhar Narayan, Takashi Satoh, Shawn Schiller
  • Publication number: 20150364160
    Abstract: A control apparatus includes a storage unit and a processor. The storage unit is configured to store diagnosis information regarding storage apparatuses to be diagnosed. The processor is configured to receive a write request from an information processing apparatus. The write request requests to write first data into a first logical area corresponding to a first physical area of a first storage apparatus. The processor is configured to determine, on basis of the diagnosis information, whether the first storage apparatus is one of the storage apparatuses to be diagnosed. The processor is configured to cause, when it is determined that the first storage apparatus is one of the storage apparatuses to be diagnosed, the first storage apparatus to execute a write-and- verify process including: writing the first data into the first physical area, and confirming whether the first data is normally read from the first physical area.
    Type: Application
    Filed: May 27, 2015
    Publication date: December 17, 2015
    Applicant: Fujitsu Limited
    Inventors: Atsushi ENDO, Mitsuteru Sato
  • Publication number: 20150334876
    Abstract: An evaporator includes a housing in which an evaporator chamber configured to evaporate a refrigerant is formed; a heat transfer surface provided on an inner wall of the housing and having a hot area which is a part that becomes hot due to heat transferred from a heating element to the housing; and a supply port formed in the housing, opposed to the hot area and configured to eject the refrigerant supplied from a supply pipe to the hot area, wherein a narrow groove is formed in the heat transfer surface.
    Type: Application
    Filed: April 28, 2015
    Publication date: November 19, 2015
    Inventors: Atsushi Endo, Osamu Aizawa, Hideo Kubo
  • Patent number: 9145604
    Abstract: A thin film forming method which forms a seed film and an impurity-containing silicon film on a surface of an object to be processed in a processing container configured to be vacuum exhaustible includes: performing a first step which forms the seed film by supplying a seed film raw material gas including at least any one of an aminosilane-based gas and a higher silane into the processing container; and performing a second step which forms the impurity-containing silicon film in an amorphous state by supplying a silane-based gas and an impurity-containing gas into the processing container.
    Type: Grant
    Filed: September 27, 2012
    Date of Patent: September 29, 2015
    Assignee: TOKYO ELECTRON LIMITED
    Inventors: Akinobu Kakimoto, Atsushi Endo, Takahiro Miyahara, Shigeru Nakajima, Satoshi Takagi, Kazumasa Igarashi
  • Publication number: 20150270126
    Abstract: A thin film forming method which forms a seed film and an impurity-containing silicon film on a surface of an object to be processed in a processing container configured to be vacuum exhaustible, the thin film forming method includes: performing a first step which forms the seed film formed of a compound of silicon, carbon and nitrogen on the surface of the object by supplying a seed film raw material gas comprising an aminosilane-based gas into the processing container; and performing a second step which forms the impurity-containing silicon film in an amorphous state on the seed film by supplying a silane-based gas and an impurity-containing gas into the processing container.
    Type: Application
    Filed: June 4, 2015
    Publication date: September 24, 2015
    Inventors: Akinobu KAKIMOTO, Atsushi ENDO, Takahiro MIYAHARA, Shigeru NAKAJIMA, Satoshi TAKAGI, Kazumasa IGARASHI
  • Patent number: 9126999
    Abstract: Embodiments of the disclosure relate to tetrahydropyrazolopyrimidine compounds that act as antagonists or inhibitors for Toll-like receptors 7 and/or 8, and their use in pharmaceutical compositions effective for treatment of systemic lupus erythematosus (SLE) and lupus nephritis.
    Type: Grant
    Filed: May 31, 2013
    Date of Patent: September 8, 2015
    Assignee: EISAI R&D MANAGEMENT CO., LTD.
    Inventors: Roch Boivin, Eric Carlson, Atsushi Endo, Hans Hansen, Lynn D. Hawkins, Sally Ishizaka, Matthew Mackey, Sridhar Narayan, Takashi Satoh, Shawn Schiller
  • Publication number: 20150225415
    Abstract: Methods of synthesizing intermediates useful for the synthesis of halichondrin B analogs are described.
    Type: Application
    Filed: February 17, 2015
    Publication date: August 13, 2015
    Inventors: Charles E. CHASE, Atsushi ENDO, Francis G. FANG, Jing LI
  • Publication number: 20150175620
    Abstract: In general, the invention features compounds useful for the synthesis of analogs of halichondrin B, such as eribulin or pharmaceutically acceptable salts thereof, e.g., eribulin mesylate.
    Type: Application
    Filed: December 19, 2014
    Publication date: June 25, 2015
    Inventors: Atsushi ENDO, Charles E. CHASE, Francis G. FANG
  • Patent number: 8993456
    Abstract: Provided is a method of operating a film forming apparatus capable of suppressing generation of particles by improving an adhesion of a carbon film to surfaces of members which are formed of a quartz material and contact a processing space in a processing container. The method includes forming a carbon film on each of surfaces of a plurality of objects held by a holding unit in a processing container formed of a quartz material, wherein the method further includes forming an adhesion film to improve the adhesion of the carbon film, on surfaces of members which are formed of a quartz material and contact a processing space in the processing container. Accordingly, the adhesion of the carbon film to the surface of the member formed of a quartz material contacting the processing space in the processing container is improved, thereby suppressing generation of particles.
    Type: Grant
    Filed: October 26, 2012
    Date of Patent: March 31, 2015
    Assignee: Tokyo Electron Limited
    Inventors: Atsushi Endo, Satoshi Mizunaga, Takehiro Otsuka
  • Patent number: 8987479
    Abstract: Methods of synthesizing intermediates useful for the synthesis of halichondrin B analogs are described.
    Type: Grant
    Filed: December 22, 2011
    Date of Patent: March 24, 2015
    Assignee: Eisai R&D Management Co., Ltd.
    Inventors: Charles Chase, Atsushi Endo, Francis G. Fang, Jing Li
  • Publication number: 20150047806
    Abstract: A chamber system includes: a housing section that is surrounded by a bottom part, a side wall part, and a ceiling part and houses a processing apparatus; and a heat-insulating section that is provided in each of the bottom part, the side wall part, and the ceiling part, and regulates transfer of heat between the housing section and the outside of the housing section.
    Type: Application
    Filed: July 3, 2014
    Publication date: February 19, 2015
    Inventors: Takaharu MIURA, Hideki TSUKADA, Atsushi ENDO, Ryosuke INOUE
  • Publication number: 20150032955
    Abstract: A storage control apparatus including a storage unit and a processor. The processor is configured to set an issuable number with respect to a logical volume on basis of a configuration of storage devices constituting the logical volume and performance of the storage devices. The issuable number is a number of requests issuable to the logical volume during a unit time period. The processor is configured to receive a request requesting access to the logical volume. The processor is configured to accumulate the received request in the storage unit. The processor is configured to issue requests accumulated in the storage unit to the logical volume while limiting a number of issued requests during the unit time period to a range of the issuable number.
    Type: Application
    Filed: July 17, 2014
    Publication date: January 29, 2015
    Inventors: Tomonori Suzuki, Atsushi Endo
  • Patent number: 8927597
    Abstract: In general, the invention features compounds useful for the synthesis of analogs of halichondrin B, such as eribulin or pharmaceutically acceptable salts thereof, e.g., eribulin mesylate.
    Type: Grant
    Filed: January 7, 2013
    Date of Patent: January 6, 2015
    Assignee: Eisai R&D Management Co., Ltd.
    Inventors: Atsushi Endo, Charles E. Chase, Francis G. Fang
  • Patent number: 8900780
    Abstract: Disclosed are a photosensitive resin composition for a color filter and a color filter using the same. The photosensitive resin composition for a color filter includes (A) a dye represented by the following Chemical Formula 1, (B) an alkali soluble resin, (C) a photopolymerizable monomer, (D) a photopolymerization initiator, and (E) a solvent.
    Type: Grant
    Filed: May 15, 2012
    Date of Patent: December 2, 2014
    Assignee: Cheil Industries Inc.
    Inventors: Jae-Hyun Kim, Kyung-Soo Moon, Myoung-Youp Shin, Dong-Hoon Won, Seung-Hyun Kim, Atsushi Endo, Hwan-Sung Cheon, Gyu-Seok Han
  • Publication number: 20140308820
    Abstract: A method of depositing a silicon oxide film and a silicon nitride film includes depositing the silicon oxide film and the silicon nitride film on a substrate, and a gas for forming the silicon nitride film further includes boron.
    Type: Application
    Filed: June 26, 2014
    Publication date: October 16, 2014
    Inventors: Atsushi ENDO, Masaki KUROKAWA, Hiroki IRIUDA
  • Patent number: D720308
    Type: Grant
    Filed: May 10, 2012
    Date of Patent: December 30, 2014
    Assignee: Tokyo Electron Limited
    Inventors: Hirofumi Kaneko, Atsushi Endo
  • Patent number: D720309
    Type: Grant
    Filed: May 10, 2012
    Date of Patent: December 30, 2014
    Assignee: Tokyo Electron Limited
    Inventors: Hirofumi Kaneko, Atsushi Endo
  • Patent number: D724551
    Type: Grant
    Filed: May 10, 2012
    Date of Patent: March 17, 2015
    Assignee: Tokyo Electron Limited
    Inventors: Hirofumi Kaneko, Atsushi Endo
  • Patent number: D725053
    Type: Grant
    Filed: May 10, 2012
    Date of Patent: March 24, 2015
    Assignee: Tokyo Electron Limited
    Inventors: Hirofumi Kaneko, Atsushi Endo