Patents by Inventor Atsushi Endo

Atsushi Endo has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20140234758
    Abstract: Disclosed are a photosensitive resin composition for a color filter and a color filter using the same. The photosensitive resin composition for a color filter includes (A) a dye represented by the following Chemical Formula 1, (B) an alkali soluble resin, (C) a photopolymerizable monomer, (D) a photopolymerization initiator, and (E) a solvent.
    Type: Application
    Filed: May 15, 2012
    Publication date: August 21, 2014
    Applicant: Cheil Industries Inc.
    Inventors: Jae-Hyun Kim, Kyung-Soo Moon, Myoung-Youp Shin, Dong-Hoon Won, Seung-Hyun Kim, Atsushi Endo, Hwan-Sung Cheon, Gyu-Seok Han
  • Publication number: 20130324547
    Abstract: Embodiments of the disclosure relate to tetrahydropyrazolopyrimidine compounds that act as antagonists or inhibitors for Toll-like receptors 7 and/or 8, and their use in pharmaceutical compositions effective for treatment of systemic lupus erythematosus (SLE) and lupus nephritis
    Type: Application
    Filed: May 31, 2013
    Publication date: December 5, 2013
    Inventors: Roch Boivin, Eric Carlson, Atsushi Endo, Hans Hansen, Lynn D. Hawkins, Sally Ishizaka, Matthew Mackey, Sridhar Narayan, Takashi Satoh, Shawn Schiller
  • Patent number: 8518834
    Abstract: A method for forming an oxide film on a carbon film includes the steps of forming a carbon film on an object to be processed; forming an object-to-be-oxidized layer on the carbon film; and forming an oxide film on the object-to-be-oxidized layer while oxidizing the object-to-be-oxidized layer.
    Type: Grant
    Filed: December 27, 2011
    Date of Patent: August 27, 2013
    Assignee: Tokyo Electron Limited
    Inventors: Akinobu Kakimoto, Atsushi Endo, Kazumi Kubo
  • Publication number: 20130123519
    Abstract: In general, the invention features compounds useful for the synthesis of analogs of halichondrin B, such as eribulin or pharmaceutically acceptable salts thereof, e.g., eribulin mesylate.
    Type: Application
    Filed: January 7, 2013
    Publication date: May 16, 2013
    Inventors: Atsushi Endo, Charles E. Chase, Francis G. Fang
  • Publication number: 20130084693
    Abstract: A thin film forming method which forms a seed film and an impurity-containing silicon film on a surface of an object to be processed in a processing container configured to be vacuum exhaustible includes: performing a first step which forms the seed film by supplying a seed film raw material gas including at least any one of an aminosilane-based gas and a higher silane into the processing container; and performing a second step which forms the impurity-containing silicon film in an amorphous state by supplying a silane-based gas and an impurity-containing gas into the processing container.
    Type: Application
    Filed: September 27, 2012
    Publication date: April 4, 2013
    Applicant: TOKYO ELECTRON LIMITED
    Inventors: Akinobu KAKIMOTO, Atsushi ENDO, Takahiro MIYAHARA, Shigeru NAKAJIMA, Satoshi TAKAGI, Kazumasa IGARASHI
  • Patent number: 8350067
    Abstract: In general, the invention features compounds useful for the synthesis of analogs of halichondrin B, such as eribulin or pharmaceutically acceptable salts thereof, e.g., eribulin mesylate.
    Type: Grant
    Filed: May 22, 2012
    Date of Patent: January 8, 2013
    Assignee: Eisai R&D Management Co., Ltd.
    Inventors: Atsushi Endo, Charles E. Chase, Francis G. Fang
  • Publication number: 20120289718
    Abstract: In general, the invention features compounds useful for the synthesis of analogs of halichondrin B, such as eribulin or pharmaceutically acceptable salts thereof, e.g., eribulin mesylate.
    Type: Application
    Filed: May 22, 2012
    Publication date: November 15, 2012
    Inventors: Atsushi ENDO, Charles E. CHASE, Francis G. FANG
  • Publication number: 20120252224
    Abstract: A method of depositing a silicon oxide film and a silicon nitride film includes depositing the silicon oxide film and the silicon nitride film on a substrate, and a gas for forming the silicon nitride film further includes boron.
    Type: Application
    Filed: March 28, 2012
    Publication date: October 4, 2012
    Applicant: TOKYO ELECTRON LIMITED
    Inventors: Atsushi ENDO, Masaki KUROKAWA, Hiroki IRIUDA
  • Publication number: 20120247391
    Abstract: A vertical batch-type film forming apparatus includes: a processing chamber collectively performing a film forming process to a plurality of processing targets; a heating device heating the plurality of processing targets; an exhauster evacuating an inside of the processing chamber; an accommodating container accommodating the processing chamber; a gas supply mechanism supplying a gas used in a process into the accommodating container; and a plurality of gas introducing holes provided in a sidewall of the processing chamber. The gas used in a process is supplied into the processing chamber via the gas introducing holes in a parallel flow to processing surfaces of the plurality of processing targets, and a film forming process is collectively performed to the plurality of processing targets without setting the furnace temperature gradient in the processing chamber.
    Type: Application
    Filed: March 28, 2012
    Publication date: October 4, 2012
    Applicant: TOKYO ELECTRON LIMITED
    Inventors: Atsushi ENDO, Masaki KUROKAWA, Hiroki IRIUDA
  • Publication number: 20120164844
    Abstract: A method for forming an oxide film on a carbon film includes the steps of forming a carbon film on an object to be processed; forming an object-to-be-oxidized layer on the carbon film; and forming an oxide film on the object-to-be-oxidized layer while oxidizing the object-to-be-oxidized layer.
    Type: Application
    Filed: December 27, 2011
    Publication date: June 28, 2012
    Applicant: TOKYO ELECTRON LIMITED
    Inventors: Akinobu KAKIMOTO, Atsushi ENDO, Kazumi KUBO
  • Patent number: 8203010
    Abstract: In general, the invention features compounds useful for the synthesis of analogs of halichondrin B, such as eribulin or pharmaceutically acceptable salts thereof, e.g., eribulin mesylate.
    Type: Grant
    Filed: January 26, 2011
    Date of Patent: June 19, 2012
    Assignee: Eisai R&D Management Co., Ltd.
    Inventors: Atsushi Endo, Charles E. Chase, Francis G. Fang
  • Publication number: 20120095242
    Abstract: Methods of synthesizing intermediates useful for the synthesis of halichondrin B analogs are described.
    Type: Application
    Filed: December 22, 2011
    Publication date: April 19, 2012
    Applicant: Eisai R&D Management Co., Ltd.
    Inventors: Charles Chase, Atsushi Endo, Francis G. Fang, Jing Li
  • Publication number: 20120015525
    Abstract: A method of cleaning a thin film forming apparatus, for removing deposits adhering to an inside thereof after supplying a film-forming gas into a reaction chamber to form a amorphous carbon film on a workpiece, includes a heating operation of heating at least one of an inside of the reaction chamber and an inside of an exhaust pipe connected to the reaction chamber to a predetermined temperature; and a removing operation of supplying a cleaning gas containing oxygen gas and hydrogen gas into at least one of the inside of the reaction chamber and the inside of the exhaust pipe heated in the heating operation, heating the cleaning gas to the predetermined temperature to activate the oxygen gas and the hydrogen gas contained in the cleaning gas, and thereafter removing the deposits adhering to the inside of the thin film forming apparatus by the oxygen gas and the hydrogen gas activated.
    Type: Application
    Filed: July 15, 2011
    Publication date: January 19, 2012
    Applicant: TOKYO ELECTRON LIMITED
    Inventors: Atsushi ENDO, Kazumi KUBO, Satoshi MIZUNAGA
  • Patent number: 8093410
    Abstract: Methods of synthesizing intermediates useful for the synthesis of halichondrin B analogs are described.
    Type: Grant
    Filed: October 3, 2008
    Date of Patent: January 10, 2012
    Assignee: Eisai R&D Management Co., Ltd.
    Inventors: Charles Chase, Atsushi Endo, Frances G. Fang, Jing Li
  • Patent number: 8002895
    Abstract: A heat processing apparatus for a semiconductor process includes a reaction tube including a process field configured to store a plurality of target substrates stacked at intervals. A gas supply duct is integrally provided outside the wall of the reaction tube to extend vertically in a range that covers the process field. A plurality of gas delivery holes are formed in the side portion of the wall of the reaction tube, to be vertically arrayed in a range that covers the process field and communicate with the gas supply duct. A gas supply system is connected to a bottom portion of the gas supply duct to supply a process gas to the process field through the gas supply duct and the plurality of gas delivery holes.
    Type: Grant
    Filed: August 2, 2007
    Date of Patent: August 23, 2011
    Assignee: Tokyo Electron Limited
    Inventors: Hisashi Inoue, Atsushi Endo
  • Publication number: 20110184190
    Abstract: In general, the invention features compounds useful for the synthesis of analogs of halichondrin B, such as eribulin or pharmaceutically acceptable salts thereof, e.g., eribulin mesylate.
    Type: Application
    Filed: January 26, 2011
    Publication date: July 28, 2011
    Applicant: Eisai R&D Management Co., Ltd.
    Inventors: Atsushi Endo, Charles E. Chase, Francis G. Fang
  • Patent number: 7604010
    Abstract: A film formation apparatus for a semiconductor process includes a cleaning gas supply circuit, a concentration measuring section, and an information processor. The cleaning gas supply circuit is configured to supply a cleaning gas into a reaction chamber to perform cleaning of removing from an inner surface of the reaction chamber a by-product film derived from a film formation gas. The concentration measuring section is disposed in an exhaust system to monitor concentration of a predetermined component contained in exhaust gas from the reaction chamber. The information processor is configured to compare a measurement value obtained by the concentration measuring section with a preset value and to thereby determine an end point of the cleaning.
    Type: Grant
    Filed: August 24, 2005
    Date of Patent: October 20, 2009
    Assignees: Tokyo Electron Limited, HORIBA Ltd.
    Inventors: Kazuhide Hasebe, Nobutake Nodera, Atsushi Endo, Makoto Umeki, Katsumi Nishimura, Masakazu Minami, Makoto Yoshida
  • Patent number: 7575431
    Abstract: A vertical heat processing apparatus for performing a heat process on a plurality of target substrates all together includes a vertical process container configured to accommodate the target substrates and having a transfer port at a bottom; a holder configured to support the target substrates at intervals in a vertical direction inside the process container; and a heater disposed around the process container, and configured to supply heat rays through a sidewall of the process container, so as to heat an interior of the process container. A thermal buffer member is disposed between the heater and a lower end side of the process container to surround the lower end side, and is configured to decrease transmissibility of the lower end side for heat rays between the heater and target substrates inside the process container.
    Type: Grant
    Filed: July 3, 2007
    Date of Patent: August 18, 2009
    Assignee: Tokyo Electron Limited
    Inventors: Atsushi Endo, Yoshiyuki Fujita, Shinji Miyazaki
  • Publication number: 20090198074
    Abstract: Methods of synthesizing intermediates useful for the synthesis of halichondrin B analogs are described.
    Type: Application
    Filed: October 3, 2008
    Publication date: August 6, 2009
    Applicant: EISAI CO., LTD.
    Inventors: Charles CHASE, Atsushi ENDO, Francis G. FANG, Jing LI
  • Patent number: 7559992
    Abstract: A semiconductor processing apparatus includes a process chamber to accommodate a target substrate, a gas supply system to supply a process gas into the process chamber, an exhaust unit to exhaust the process chamber, and an exhaust line connecting the process chamber to the exhaust unit. An opening variable valve is disposed on the exhaust line, and an inactive gas line is connected to the exhaust line on an upstream side of the opening variable valve to introduce an inactive gas. A pressure control mechanism is configured to control a pressure in the process chamber by adjusting at least one of an opening ratio of the opening variable valve and a flow rate of the inactive gas during a process in the process chamber while causing the exhaust unit to exhaust the process chamber and introducing the inactive gas from the inactive gas line into the exhaust line.
    Type: Grant
    Filed: December 19, 2005
    Date of Patent: July 14, 2009
    Assignee: Tokyo Electron Limited
    Inventors: Daisuke Suzuki, Masayuki Hasegawa, Atsushi Endo