Patents by Inventor Atsushi Takeda

Atsushi Takeda has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20250042870
    Abstract: An object of the present invention is to provide a DP receptor antagonist. A compound represented by general formula (I): (wherein all symbols are as shown in the specification) and a pharmaceutically acceptable salt thereof have DP receptor antagonistic activity and are also highly safe, and thus are useful as active ingredients of pharmaceuticals for DP receptor-mediated diseases. In addition, the compound represented by the general formula (I) and the pharmaceutically acceptable salt thereof also have good transferability to the central nervous system, and thus are particularly useful as a preventive and/or therapeutic agent for diseases associated with DP receptors present in the central nervous system among DP receptor-mediated diseases, that is, sleep-wake disorders.
    Type: Application
    Filed: October 14, 2024
    Publication date: February 6, 2025
    Applicant: ONO PHARMACEUTICAL CO., LTD.
    Inventors: Masaki ASADA, Keisuke HANADA, Satonori HIGUCHI, Atsushi NAGANAWA, Yasuhiro TAKEDA
  • Publication number: 20250033394
    Abstract: A liquid discharge apparatus includes a carriage on which a discharge head configured to discharge a liquid is mounted, the carriage being configured to move in a predetermined direction; and an operation unit configured to be placed near a movement region of the carriage and configured to be operated by a user. When a predetermined condition is satisfied, the carriage moves to a retreat position on the movement region and then moves to a predetermined position on the movement region. The retreat position is a position on an opposite side of the predetermined position to the operation unit in the predetermined direction.
    Type: Application
    Filed: July 26, 2024
    Publication date: January 30, 2025
    Inventors: ATSUSHI KOHNOTOH, SHUHEI YAMAGUCHI, KEN TAKENAGA, DAIJU TAKEDA, KOUSUKE TANAKA
  • Publication number: 20250033391
    Abstract: A recording apparatus including a carriage configured to carry a recording head that discharges a liquid, the carriage including a main body which is provided with an opening for internally housing the recording head and which includes a locking portion and a cover which is rotatable between a closed state, in which the opening is blocked, and an open state, which exposes the opening, and which includes a locked portion that engages with the locking portion in the closed state. The cover includes an operating portion including a protruded portion which protrudes, from a surface constituting an outer wall surface of the carriage, in a rotating direction of the cover from the closed state to the open state, the operating portion having an attitude which changes so that an engagement between the locked portion and the locking portion is released due to the protruded portion being pressed.
    Type: Application
    Filed: July 11, 2024
    Publication date: January 30, 2025
    Inventors: SHUHEI YAMAGUCHI, ATSUSHI KOHNOTOH, KEN TAKENAGA, TAKASHI ABE, DAIJU TAKEDA, KOUSUKE TANAKA, YUSUKE NARATANI
  • Publication number: 20250023994
    Abstract: A recording apparatus includes: a recording unit; a cover openable and closable with respect to a housing; an opening/closing mechanism that controls opening and closing of the cover; a carriage that includes a support portion, mounts the recording unit thereon, and moves, in a movement direction intersecting a transport direction of a sheet, between a first position and a second position on the opening/closing mechanism side with respect to the first position; and a guide portion that guides the carriage. The support portion protrudes in the movement direction toward the opening/closing mechanism side with respect to the recording unit. The recording unit overlaps the opening/closing mechanism as seen from the movement direction. The support portion on the opening/closing mechanism side overlaps the opening/closing mechanism as seen from the transport direction when the carriage is at the second position.
    Type: Application
    Filed: July 11, 2024
    Publication date: January 16, 2025
    Inventors: TOSHIYA MATSUMOTO, ATSUSHI KOHNOTOH, DAIJU TAKEDA, KEN TAKENAGA, KOUSUKE TANAKA, SHUHEI YAMAGUCHI
  • Publication number: 20250018723
    Abstract: An object is to provide a technique that enables avoiding of erroneous attachment of multiple cartridges. A cartridge is attachable to a first attachment portion included in a printing apparatus. The cartridge includes a storage portion capable of storing a liquid. The cartridge includes a protruding portion configured to come into contact with another cartridge attempted to be inserted into the first attachment portion in a state where the cartridge is inserted in a second attachment portion adjacent to the first attachment portion.
    Type: Application
    Filed: July 12, 2024
    Publication date: January 16, 2025
    Inventors: KYOHEI SATO, HIROSHI KOSHIKAWA, TATSUO NANJO, KEISUKE IINUMA, ATSUSHI KOHNOTOH, KEN TAKENAGA, DAIJU TAKEDA, KOUSUKE TANAKA, SHUHEI YAMAGUCHI
  • Publication number: 20240207891
    Abstract: According to one embodiment, a deposition method includes preparing a processing substrate in which a lower electrode, a rib, and a partition including a lower portion and an upper portion arranged on the lower portion and protruding from a side surface of the lower portion are formed above a substrate, setting a spread angle of vapor of a first material emitted from a first deposition head to a first angle, and depositing the first material on the processing substrate, and setting a spread angle of vapor of a second material emitted from a second deposition head to a second angle larger than the first angle, and depositing the second material on the processing substrate on which the first material is deposited.
    Type: Application
    Filed: March 7, 2024
    Publication date: June 27, 2024
    Applicant: Japan Display Inc.
    Inventors: Takanobu TAKENAKA, Atsushi TAKEDA
  • Patent number: 11958073
    Abstract: According to one embodiment, a deposition method includes preparing a processing substrate in which a lower electrode, a rib, and a partition including a lower portion and an upper portion arranged on the lower portion and protruding from a side surface of the lower portion are formed above a substrate, setting a spread angle of vapor of a first material emitted from a first deposition head to a first angle, and depositing the first material on the processing substrate, and setting a spread angle of vapor of a second material emitted from a second deposition head to a second angle larger than the first angle, and depositing the second material on the processing substrate on which the first material is deposited.
    Type: Grant
    Filed: January 9, 2023
    Date of Patent: April 16, 2024
    Assignee: JAPAN DISPLAY INC.
    Inventors: Takanobu Takenaka, Atsushi Takeda
  • Publication number: 20230413655
    Abstract: According to one embodiment, an evaporation device includes a first chamber group including a plurality of evaporation chambers arranged in line in a first conveyance direction, a second chamber group including a plurality of evaporation chambers arranged in line in a second conveyance direction, a first rotation chamber which is connected to a first evaporation chamber located at a upstream position in the first conveyance direction and a second evaporation chamber located at a downstream position in the second conveyance direction, and a second rotation chamber which is connected to a third evaporation chamber located at a downstream position in the first conveyance direction and a fourth evaporation chamber located at a upstream position in the second conveyance direction.
    Type: Application
    Filed: June 16, 2023
    Publication date: December 21, 2023
    Applicant: Japan Display Inc.
    Inventor: Atsushi TAKEDA
  • Patent number: 11821448
    Abstract: A blind bolt with a bolt head, a shaft portion on which a male screw is formed, and a bolt. An outer nut having a polygonal outer surface, and an outer nut hole penetrating in the axial direction. A cylindrical valve sleeve formed with a sleeve hole and an inner nut having a cylindrical portion. A nut head portion formed at one end of the cylindrical portion, and an inner nut hole having a female screw formed in a part inside. A plurality of outer peripheral grooves, extending in the outer peripheral direction are formed on the outer circumference of the valve sleeve. The cylindrical portion of the inner nut being inserted into the sleeve hole of the valve sleeve, the tip portion of the cylindrical portion inserted into the outer nut hole of the outer nut to prevent the inner nut from rotating with respect to the outer nut.
    Type: Grant
    Filed: January 8, 2021
    Date of Patent: November 21, 2023
    Assignee: NEWFREY LLC
    Inventor: Atsushi Takeda
  • Publication number: 20230371344
    Abstract: According to an embodiment, a manufacturing method allows the manufacture of a display device including a partition including a lower portion provided on a rib including a pixel aperture and an upper portion protruding from a side surface of the lower portion. The method includes forming a lower electrode, forming a rib layer, forming a lower layer, forming an upper layer, forming a resist, forming the rib by a first etching process, forming the upper portion by a second etching process after the first etching process, and forming the lower portion by a third etching process after the second etching process.
    Type: Application
    Filed: May 8, 2023
    Publication date: November 16, 2023
    Applicant: Japan Display Inc.
    Inventor: Atsushi TAKEDA
  • Patent number: 11784030
    Abstract: A plasma processing apparatus includes a balun having a first unbalanced terminal, a second unbalanced terminal, a first balanced terminal, and a second balanced terminal, a grounded vacuum container, a first electrode electrically connected to the first balanced terminal, a second electrode electrically connected to the second balanced terminal, and a ground electrode arranged in the vacuum container and grounded.
    Type: Grant
    Filed: September 15, 2022
    Date of Patent: October 10, 2023
    Assignee: CANON ANELVA CORPORATION
    Inventors: Atsushi Takeda, Takayuki Moriwaki, Tadashi Inoue, Masaharu Tanabe, Kazunari Sekiya, Hiroshi Sasamoto, Tatsunori Sato, Nobuaki Tsuchiya
  • Publication number: 20230269991
    Abstract: According to one embodiment, a display device includes first and second lower electrodes, a rib, a partition including a lower portion and an upper portion, a first organic layer disposed on the first lower electrode, a second organic layer disposed on the second lower electrode, a first upper electrode disposed on the first organic layer, a second upper electrode disposed on the second organic layer, a first sealing layer disposed above the first upper electrode, in contact with the lower portion and extending to above the upper portion and a second sealing layer disposed above the second upper electrode, in contact with the lower portion, extending to above the upper portion, and spaced apart from the first sealing layer.
    Type: Application
    Filed: February 21, 2023
    Publication date: August 24, 2023
    Applicant: Japan Display Inc.
    Inventors: Toshifumi MIMURA, Hiraaki KOKAME, Kaichi FUKUDA, Atsushi TAKEDA, Noriyuki HIRATA
  • Publication number: 20230219114
    Abstract: According to one embodiment, a deposition method includes preparing a processing substrate in which a lower electrode, a rib, and a partition including a lower portion and an upper portion arranged on the lower portion and protruding from a side surface of the lower portion are formed above a substrate, setting a spread angle of vapor of a first material emitted from a first deposition head to a first angle, and depositing the first material on the processing substrate, and setting a spread angle of vapor of a second material emitted from a second deposition head to a second angle larger than the first angle, and depositing the second material on the processing substrate on which the first material is deposited.
    Type: Application
    Filed: January 9, 2023
    Publication date: July 13, 2023
    Applicant: Japan Display Inc.
    Inventors: Takanobu TAKENAKA, Atsushi TAKEDA
  • Publication number: 20230220548
    Abstract: According to one embodiment, a deposition device includes a stage, a deposition head opposed to the stage, and a chamber accommodating the stage and the deposition head. The deposition head comprises a deposition source heating a material and generating vapor, a nozzle connected to the deposition source to emit the vapor generated by the deposition source, a control plate comprising a sleeve surrounding the nozzle, and a movement mechanism moving the control plate along an extension direction of the sleeve.
    Type: Application
    Filed: January 10, 2023
    Publication date: July 13, 2023
    Applicant: Japan Display Inc.
    Inventors: Takanobu TAKENAKA, Atsushi TAKEDA
  • Publication number: 20230095767
    Abstract: Each of a plurality of internal electrodes is electrically connected to a corresponding external electrode of a plurality of external electrodes. A plurality of auxiliary internal electrodes are disposed in the same layer as the plurality of internal electrodes to be located between each of a pair of side surfaces and the plurality of internal electrodes. Each of the plurality of external electrodes includes a pair of side surface electrode portions disposed on the pair of side surfaces and including a conductive resin layer. Each of the plurality of auxiliary internal electrodes is electrically connected to the external electrode to which the internal electrode located in the same layer is not electrically connected, and is located between the conductive resin layer to which the internal electrode located in the same layer is not electrically connected and the internal electrode located in the same layer.
    Type: Application
    Filed: September 7, 2022
    Publication date: March 30, 2023
    Applicant: TDK Corporation
    Inventors: Yuichi NAGAI, Natsumi KATO, Akitoshi YOSHII, Ken MORITA, Takehisa TAMURA, Atsushi TAKEDA
  • Patent number: 11600469
    Abstract: A plasma processing apparatus includes a balun having a first unbalanced terminal, a second unbalanced terminal, a first balanced terminal, and a second balanced terminal, a grounded vacuum container, a first electrode electrically connected to the first balanced terminal, a second electrode electrically connected to the second balanced terminal, and a ground electrode arranged in the vacuum container and grounded.
    Type: Grant
    Filed: December 19, 2019
    Date of Patent: March 7, 2023
    Assignee: CANON ANELVA CORPORATION
    Inventors: Atsushi Takeda, Takayuki Moriwaki, Tadashi Inoue, Masaharu Tanabe, Kazunari Sekiya, Hiroshi Sasamoto, Tatsunori Sato, Nobuaki Tsuchiya
  • Patent number: 11600466
    Abstract: A plasma processing apparatus includes an impedance matching circuit, a balun having a first unbalanced terminal connected to the impedance matching circuit, a grounded second unbalanced terminal, a first balanced terminal and a second balanced terminal, a grounded vacuum container, a first electrode electrically connected to the first balanced terminal, a second electrode electrically connected to the second balanced terminal, an adjustment reactance configured to affect a relationship between a first voltage applied to the first electrode and a second voltage applied to the second electrode, a high-frequency power supply configured to supply a high frequency between the first unbalanced terminal and the second unbalanced terminal via the impedance matching circuit, and a controller configured to control an impedance of the impedance matching circuit and a reactance of the adjustment reactance.
    Type: Grant
    Filed: September 17, 2020
    Date of Patent: March 7, 2023
    Assignee: CANON ANELVA CORPORATION
    Inventors: Masaharu Tanabe, Kazunari Sekiya, Tadashi Inoue, Hiroshi Sasamoto, Tatsunori Sato, Nobuaki Tsuchiya, Atsushi Takeda
  • Publication number: 20230005721
    Abstract: A plasma processing apparatus includes a balun having a first unbalanced terminal, a second unbalanced terminal, a first balanced terminal, and a second balanced terminal, a grounded vacuum container, a first electrode electrically connected to the first balanced terminal, a second electrode electrically connected to the second balanced terminal, and a ground electrode arranged in the vacuum container and grounded.
    Type: Application
    Filed: September 15, 2022
    Publication date: January 5, 2023
    Applicant: Canon Anelva Corporation
    Inventors: Atsushi TAKEDA, Takayuki MORIWAKI, Tadashi INOUE, Masaharu TANABE, Kazunari SEKIYA, Hiroshi SASAMOTO, Tatsunori SATO, Nobuaki TSUCHIYA
  • Patent number: 11462391
    Abstract: A plasma processing apparatus includes an impedance matching circuit, a balun having a first unbalanced terminal connected to the impedance matching circuit, a grounded second unbalanced terminal, a first balanced terminal and a second balanced terminal, a grounded vacuum container, a first electrode electrically connected to the first balanced terminal, a second electrode electrically connected to the second balanced terminal, an adjustment reactance configured to affect a relationship between a first voltage applied to the first electrode and a second voltage applied to the second electrode, a high-frequency power supply configured to supply a high frequency between the first unbalanced terminal and the second unbalanced terminal via the impedance matching circuit, and a controller configured to control an impedance of the impedance matching circuit and a reactance of the adjustment reactance.
    Type: Grant
    Filed: September 17, 2020
    Date of Patent: October 4, 2022
    Assignee: CANON ANELVA CORPORATION
    Inventors: Masaharu Tanabe, Kazunari Sekiya, Tadashi Inoue, Hiroshi Sasamoto, Tatsunori Sato, Nobuaki Tsuchiya, Atsushi Takeda
  • Patent number: 11335541
    Abstract: A plasma processing apparatus includes an impedance matching circuit, a balun having a first unbalanced terminal connected to the impedance matching circuit, a grounded second unbalanced terminal, a first balanced terminal and a second balanced terminal, a grounded vacuum container, a first electrode electrically connected to the first balanced terminal, a second electrode electrically connected to the second balanced terminal, an adjustment reactance configured to affect a relationship between a first voltage applied to the first electrode and a second voltage applied to the second electrode, a high-frequency power supply configured to supply a high frequency between the first unbalanced terminal and the second unbalanced terminal via the impedance matching circuit, and a controller configured to control an impedance of the impedance matching circuit and a reactance of the adjustment reactance.
    Type: Grant
    Filed: September 17, 2020
    Date of Patent: May 17, 2022
    Assignee: CANON ANELVA CORPORATION
    Inventors: Masaharu Tanabe, Kazunari Sekiya, Tadashi Inoue, Hiroshi Sasamoto, Tatsunori Sato, Nobuaki Tsuchiya, Atsushi Takeda