Abstract: A polishing method capable of accurately determining a polishing end point of a substrate is disclosed. The method comprises: rotating a polishing table supporting a polishing pad; and polishing the substrate by pressing the substrate against a polishing surface of the polishing pad by a polishing head, wherein polishing the substrate includes: an oscillation polishing process of polishing the substrate while causing the polishing head to oscillate along the polishing surface; and a static polishing process of polishing the substrate with the oscillation of the polishing head stopped, the static polishing process is performed after the oscillation polishing process, and the static polishing process comprises determining a static polishing end point which is a point in time at which a rate of change of torque for rotating the polishing table has reached a change-rate threshold value.

Abstract: Provided is a test method of a semiconductor device under test, the test method comprising: controlling the semiconductor device under test to an on state by inputting a control signal to the semiconductor device under test; and observing the semiconductor device under test at a time of controlling the semiconductor device under test in the on state to an off state and evaluating the semiconductor device under test, wherein the semiconductor device under test includes one semiconductor device under test or a plurality of semiconductor devices under test, and in the controlling to the on state, a length of an on-time for which the one semiconductor device under test or the plurality of semiconductor devices under test are set to the on state is adjusted based on a magnitude of a variation in a delay time of the control signal.

Abstract: Provided is a method of manufacturing a semiconductor device capable of suppressing variation in thickness of oxide films among a plurality of SiC wafers. Forming first inorganic films on lower surfaces of a plurality of SiC wafer, and then performing etching of the plurality of SiC wafers so that 750 nm or more of the first inorganic film is left in thickness, and then forming oxide films on upper surfaces of the plurality of SiC wafers by performing thermal oxidation treatment in a state in which a first SiC wafer of the plurality of SiC wafers is placed directly below any one of at least one wafer, including at least one of a dummy wafer and a monitor wafer, and a second SiC wafer of the plurality of SiC wafers is placed directly below a third SiC wafer of the plurality of SiC wafers.

Abstract: The control method of a ship is used for the ship. The ship is equipped with a plurality of power sources including a first power source and a second power source, and has a plurality of propulsion modes in which a power source used for propulsion of a hull is different between the plurality of power sources. The control method of the ship includes adjusting an output value related to a propulsive force of a hull to a value corresponding to an operation amount of an operation acceptor and changing a correspondence relation between the operation amount and the output value in accordance with a propulsion mode.

Abstract: An image forming apparatus includes an image forming portion, a reversing portion configured to reverse the sheet received through a first feeding passage by feeding the sheet in a first direction and then in a second direction opposite to the first direction, a sheet feeding portion provided in a second feeding passage branching from the first feeding passage on a side upstream of the reversing portion with respect to the first direction, a first guiding surface forming the second feeding passage for guiding a first surface of the sheet fed by the feeding portion, and a second guiding surface for guiding a second surface, opposite from the first surface, of the sheet fed from the reversing portion in the second direction. The second guiding surface is movable with movement of the first guiding surface for opening the second feeding passage.

Abstract: A cleaning system comprise: a first pipe 20 connected to a reactor 10 used for producing polysilicon by using chlorosilane as a raw material; a heat exchanger 30 connected to the first pipe 20; a second pipe 60 provided between the heat exchanger 30 and the first pipe 20; and a driving unit 50 provided at the first pipe 20 or the second pipe 60. A cleaning liquid circulates through the first pipe 20, the heat exchanger 30 and the second pipe 60 by the driving unit 50.

Abstract: Provide is an electrolytic capacitor for a middle-to-high voltage application that is equal to or higher than 100 V which suppresses the total amount of gas to be produced in the electrolytic capacitor. The anode foil of the electrolytic capacitor includes an enlarged surface portion provided with tunnel-shape pits formed from the foil surface in the thickness direction of the foil, and a dielectric oxide film formed on the surface of the enlarged surface portion. The cathode body of the electrolytic capacitor includes a cathode foil formed of a valve acting metal, and a carbon layer formed on the cathode foil.

Abstract: An information processing apparatus executes: acquiring whether or not a first user permits another user to ride in a first vehicle; acquiring whether or not a second user is matched with each of vehicles; regarding, as the first vehicle, a vehicle which is among the vehicles and with which the second user is not matched, and matching the first vehicle with the first user, when the first user requests a ride in the first vehicle and does not permit another user to ride in the first vehicle; and not permitting the other user to be matched with the first vehicle, after matching the first user with the first vehicle.

Abstract: A drug containing, as an active ingredient, a compound having an antagonistic activity against an EP2 receptor in the prevention and/or treatment of a disease associated with the activation of an EP2 receptor, of formula (I-A): wherein all symbols have the same meanings as those described in the specification, or a pharmaceutically acceptable salt thereof.

Abstract: A cathode and an electrolytic capacitor including the cathode which can suppress production of hydrogen gas are provided. The cathode of the electrolytic capacitor includes cathode foil formed of valve action metal and a conductive layer formed on a surface of the cathode foil. A natural immersion potential of the cathode foil when immersed in an electrolyte solution is at a higher side than a natural immersion potential of reference cathode foil formed of the valve action metal with purity of 99.9%.

Abstract: An object is to deliver more packages together. A number of first packages scheduled to be delivered by a vehicle that delivers packages to a predetermined area is acquired, the cost of delivering second packages by the vehicle is set on the basis of the number of first packages, the second packages being different from the first packages, and information on the cost is provided to a user present within the predetermined area.

Abstract: Disclosed is a polishing head for a polishing apparatus for polishing a quadrangular substrate using a polishing pad attached to a polishing table, comprising a head body portion, a plurality of elastic bags disposed in a surface of the head body portion, which is to face the polishing table, and a substrate holding plate for holding the substrate, the substrate holding plate being pressed by the elastic bags in a direction away from the head body portion, the head body portion being provided with channels for bags, which are in communication with the respective elastic bags, the polishing head further including at least two support plates disposed between the elastic bags on one hand and the substrate holding plate on the other, the elastic bags being configured to press the substrate holding plate through the support plates.

Abstract: A cathode and an electrolytic capacitor including the cathode which can suppress production of hydrogen gas are provided. The cathode of the electrolytic capacitor comprising cathode foil formed of valve action metal, and a conductive layer formed on a surface of the cathode foil. When current in a range of current density of leakage current of the electrolytic capacitor flows by electrochemical polarization, potential corresponding to said current is at a higher side than a natural immersion potential of reference cathode foil formed of the valve action metal with purity of 99.9%.

Abstract: An image forming apparatus includes a fixing unit, a first guiding unit having a first surface forming a first feeding passage, and a second guiding unit forming a second feeding passage. The second guiding unit includes a first member made of metal and having a first guiding surface on which a leading end of a sheet is guided in a first section including an upstream end portion of the second feeding passage with respect to a sheet feeding direction, and includes a second member made of a resin material and having a second guiding surface on which the sheet is guided in a second section downstream of the first section in the second feeding passage with respect to the sheet feeding direction. The first guiding surface is spaced from a first phantom contact surface extending from an end portion of the first surface and contacting the second guiding surface.

Abstract: A distribution device (10) is provided with an acquisition unit (11) which acquires position information of an obstacle, and a distribution unit (12) which wirelessly distributes, from the obstacle to an aircraft, obstacle information including the acquired position information of the obstacle and identification information of the obstacle. The distribution device (10) distributes the identification information of the obstacle along with the position information of the obstacle to the aircraft, and the aircraft interprets the position, etc., of the specific obstacle.

Abstract: A phase information generator generates phase information indicating a phase an interpolation-frame. An extracted pixel determination unit generates first and second motion vector crossing pixels at which the motion vector detected for generating an interpolation-pixel intersects with the first and second frames, and determines extracted pixels based on the motion vector crossing pixels. An interpolation-phase selector selects an interpolation phase based on the phase information and whether or not the first and second motion vector crossing pixels are out of an effective pixel range. An interpolation-pixel generator generates the interpolation-pixel based on the first and second extracted pixels and the interpolation phase.

Abstract: A liquid ejecting apparatus including: a liquid ejecting portion configured to eject a liquid from a nozzle disposed in a nozzle surface; a wiping mechanism configured to perform a wiping operation of wiping the nozzle surface by moving a strip-shaped member configured to absorb the liquid relative to the nozzle surface in a state in which the strip-shaped member is in contact with the nozzle surface; and a control portion configured to perform a pre-wiping operation of moving the strip-shaped member relative to the nozzle surface at a speed higher than a speed for the relative movement during the wiping operation in a state in which the strip-shaped member is not in contact with the nozzle surface and is configured to be brought into contact with the liquid adhering to the nozzle surface, prior to the wiping operation of wiping the nozzle surface with the strip-shaped member.

Abstract: An electrolytic capacitor module includes at least two types of electrolytic capacitors (4-1, 4-2) having etching pits in electrode foils. The at least two types of electrolytic capacitors (4-1, 4-2) are different in length of the etching pits and are connected in parallel. The number of electrolytic capacitors to be mounted is the same or different. The electrolytic capacitors (4-1, 4-2) are each an electrolytic capacitor with an etching pit length of 27 [?m] or less or an electrolytic capacitor with an etching pit length over 27 [?m]. Such a configuration enhances performance of the electrolytic capacitors in a high-frequency region, keeps a rate of decrease in capacitance low in the high-frequency region, and enhances a ripple current capability in the high-frequency region.

Abstract: Provided is a decorative film formed body being capable of exhibiting excellent metallic design presentation of satin plating with less color blur through decoration with use of a vapor deposition film, a manufacturing method for a decorative film formed body, a mounting method for a transfer base material, a satin-plated preparation, a container, a casing, and a vehicle interior/exterior member. The decorative film formed body includes: a base material; an adhesive layer; a vapor deposition layer; and a protection layer, wherein the vapor deposition layer has recesses and projections formed on a surface thereof, and wherein the adhesive layer includes scale-shaped fillers.