Abstract: A process for the cost-effective packaging of high purity polysilicon fragments has the polysilicon fragments being packaged automatically.

Abstract: A silica glass crucible is produced by a) providing a porous amorphous silica glass green body, which is infiltrated with at least one substance that promotes crystallization of a silica glass crucible, b) drying the infiltrated silica glass green body, c) filling the green body with a metal or semimetal, and d) heating the filled green body for a period of from 1 h to 1000 h to a temperature of from 900 to 2000° C. to form at least a portion of silica crystalline phase. The process may be continued by further heating to melt the metal or semimetal and pulling a single crystal from the melt.

Abstract: A process for the cost-effective packaging of high purity polysilicon fragments has the polysilicon fragments being packaged automatically.

Abstract: A process for producing an SiO2 shaped body which is at least partially vitrified, wherein an amorphous, porous SiO2 green body is sintered or vitrified by contactless heating by means of radiation, while avoiding contamination to the SiO2 shaped body with foreign atoms, wherein the radiation used is the beam of a laser at a subatmospheric pressure below 1000 mbar.

Abstract: A device is provided for depositing semiconductor material on a heated substrate body, having a stationary current leadthrough, which is guided through the baseplate of the deposition device. This is an electrode mount with an underside, which is arranged above the current leadthrough, and an upper side, which is connected to a carbon electrode into which a substrate body can be fitted. The carbon electrode has a thermal conductivity of >145 W/m*K and a coefficient of thermal expansion which is matched to the coefficient of thermal expansion of silicon.

Abstract: A silica glass crucible is produced by

Abstract: A charging material made from semiconductor material, is used for charging or recharging a melting crucible during the Czochralski crucible-pulling process. This charging material has a polycrystalline semiconductor rod, which at one end has a groove, and a monocrystalline semiconductor rod, which at one end has a tongue, which rods are coupled by means of a tongue-and-groove connection. There is also a holding system for holding a polycrystalline silicon rod during the Czochralski crucible-pulling process or the float zone process, which has a tongue-and-groove connection between the polycrystalline semiconductor rod, which at one end has a groove, and a monocrystalline semiconductor rod, which at one end has a tongue.

Abstract: A device is provided for depositing semiconductor material on a heated substrate body, having a stationary current leadthrough, which is guided through the baseplate of the deposition device. This is an electrode mount with an underside, which is arranged above the current leadthrough, and an upper side, which is connected to a carbon electrode into which a substrate body can be fitted. The carbon electrode has a thermal conductivity of>145 W/m*K and a coefficient of thermal expansion which is matched to the coefficient of thermal expansion of silicon.

Abstract: A charging material made from semiconductor material, is used for charging or recharging a melting crucible during the Czochralski crucible-pulling process. This charging material has a polycrystalline semiconductor rod, which at one end has a groove, and a monocrystalline semiconductor rod, which at one end has a tongue, which rods are coupled by means of a tongue-and-groove connection. There is also a holding system for holding a polycrystalline silicon rod during the Czochralski crucible-pulling process or the float zone process, which has a tongue-and-groove connection between the polycrystalline semiconductor rod, which at one end has a groove, and a monocrystalline semiconductor rod, which at one end has a tongue.