Patents by Inventor Baerbel Schwaer
Baerbel Schwaer has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Patent number: 9164396Abstract: A microlithographic projection exposure apparatus comprises a projection objective which images an object onto an image plane and has a lens with a curved surface. In the projection objective there is a liquid or solid medium which directly adjoins the curved surface over a region which is usable for imaging the object. The projection exposure apparatus also has an adjustable manipulator for reducing an image field curvature which is caused by heating of the medium during the projection operation.Type: GrantFiled: October 25, 2012Date of Patent: October 20, 2015Assignee: Carl Zeiss SMT GmbHInventors: Helmut Beierl, Sascha Bleidistel, Wolfgang Singer, Toralf Gruner, Alexander Epple, Norbert Wabra, Susanne Beder, Jochen Weber, Heiko Feldmann, Baerbel Schwaer, Olaf Rogalsky, Arif Kazi
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Patent number: 8319944Abstract: A microlithographic projection exposure apparatus comprises a projection objective which images an object onto an image plane and has a lens with a curved surface. In the projection objective there is a liquid or solid medium which directly adjoins the curved surface over a region which is usable for imaging the object. The projection exposure apparatus also has an adjustable manipulator for reducing an image field curvature which is caused by heating of the medium during the projection operation.Type: GrantFiled: June 28, 2010Date of Patent: November 27, 2012Assignee: Carl Zeiss SMT GmbHInventors: Helmut Beierl, Sascha Bleidistel, Wolfgang Singer, Toralf Gruner, Alexander Epple, Norbert Wabra, Susanne Beder, Jochen Weber, Heiko Feldmann, Baerbel Schwaer, Olaf Rogalsky, Ari Kazi
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Patent number: 7990622Abstract: A projection objective of a microlithographic projection exposure apparatus comprises a manipulator for reducing rotationally asymmetric image errors. The manipulator in turn contains a lens, an optical element and an interspace formed between the lens and the optical element, which can be filled with a liquid. At least one actuator acting exclusively on the lens is furthermore provided, which can generate a rotationally asymmetric deformation of the lens.Type: GrantFiled: October 1, 2010Date of Patent: August 2, 2011Assignee: Carl Zeiss SMT GmbHInventors: Olaf Conradi, Boris Bittner, Sascha Bleidistel, Markus Hauf, Wolfgang Hummel, Arif Kazi, Baerbel Schwaer, Jochen Weber, Hubert Holderer, Payam Tayebati
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Publication number: 20110019169Abstract: A projection objective of a microlithographic projection exposure apparatus comprises a manipulator for reducing rotationally asymmetric image errors. The manipulator in turn contains a lens, an optical element and an interspace formed between the lens and the optical element, which can be filled with a liquid. At least one actuator acting exclusively on the lens is furthermore provided, which can generate a rotationally asymmetric deformation of the lens.Type: ApplicationFiled: October 1, 2010Publication date: January 27, 2011Applicant: CARL ZEISS SMT AGInventors: Olaf Conradi, Boris Bittner, Sascha Bleidistel, Markus Hauf, Wolfgang Hummel, Arif Kazi, Baerbel Schwaer, Jochen Weber, Hubert Holderer, Payam Tayebati
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Patent number: 7830611Abstract: A projection objective of a microlithographic projection exposure apparatus comprises a manipulator for reducing rotationally asymmetric image errors. The manipulator in turn contains a lens, an optical element and an interspace formed between the lens and the optical element, which can be filled with a liquid. At least one actuator acting exclusively on the lens is furthermore provided, which can generate a rotationally asymmetric deformation of the lens.Type: GrantFiled: January 9, 2008Date of Patent: November 9, 2010Assignee: Carl Zeiss SMT AGInventors: Olaf Conradi, Sascha Bleidistel, Markus Hauf, Wolfgang Hummel, Arif Kazi, Baerbel Schwaer, Jochen Weber, Hubert Holderer, Payam Tayebati, Boris Bittner
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Publication number: 20100265478Abstract: A microlithographic projection exposure apparatus comprises a projection objective which images an object onto an image plane and has a lens with a curved surface. In the projection objective there is a liquid or solid medium which directly adjoins the curved surface over a region which is usable for imaging the object. The projection exposure apparatus also has an adjustable manipulator for reducing an image field curvature which is caused by heating of the medium during the projection operation.Type: ApplicationFiled: June 28, 2010Publication date: October 21, 2010Applicant: CARL ZEISS SMT AGInventors: Helmut Beierl, Sascha Bleidistel, Wolfgang Singer, Toralf Gruner, Alexander Epple, Norbert Wabra, Susanne Beder, Jochen Weber, Heiko Feldmann, Bärbel Schwaer, Olaf Rogalsky, Arif Kazi
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Patent number: 7782440Abstract: A microlithographic projection exposure apparatus comprises a projection objective which images an object onto an image plane and has a lens with a curved surface. In the projection objective there is a liquid or solid medium which directly adjoins the curved surface over a region which is usable for imaging the object. The projection exposure apparatus also has an adjustable manipulator for reducing an image field curvature which is caused by heating of the medium during the projection operation.Type: GrantFiled: November 17, 2005Date of Patent: August 24, 2010Assignee: Carl Zeiss SMT AGInventors: Helmut Beierl, Sascha Bleidistel, Wolfgang Singer, Toralf Gruner, Alexander Epple, Norbert Wabra, Susanne Beder, Jochen Weber, Heiko Feldmann, Baerbel Schwaer, Olaf Rogalsky, Ari Kazi
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Publication number: 20100128367Abstract: A projection objective for a microlithography apparatus with improved imaging properties is provided. A manipulator for a projection objective is provided. A microlithography apparatus including a projection objective of this type and/or a manipulator of this type is provided. A method for improving the imaging properties of a projection objective is provided.Type: ApplicationFiled: March 13, 2009Publication date: May 27, 2010Applicant: CARL ZEISS SMT AGInventors: Mariella Beckenbach, Klaus Rief, Andreas Bertele, Benjamin Sigel, Sascha Bleidistel, Wolfgang Hummel, Andreas Frommeyer, Toralf Gruner, Jochen Schwaer, Baerbel Schwaer, Thomas Schletterer, Artur Hoegele, Armin Schoeppach
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Publication number: 20090141258Abstract: An imaging device in a projection exposure machine for microlithography includes at least one optical element and at least one manipulator, a linear drive for manipulating the position of the optical element. The linear drive has at least one moving element, the moving element having a shearing part and a lifting part. The shearing part is arranged to move the optical element and the lifting part is arranged to move the shearing part. The linear drive has a supporting element which is in contact with and prevents movement of the optical element while the shearing part is moved by the lifting part.Type: ApplicationFiled: January 30, 2009Publication date: June 4, 2009Applicant: Carl Zeiss SMT AGInventors: Stephan Back, Wolfgang Hummel, Juergen Fischer, Karl-Eugen Aubele, Erich Merz, Raoul Reiner, Klaus Rief, Stefan Schoengart, Markus Neumaier, Baerbel Schwaer, Ulrich Weber, Michael Muehlbeyer, Hubert Holderer, Alexander Kohl, Jochen Weber, Johannes Lippert, Thorsten Rassel
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Patent number: 7486382Abstract: An imaging device in a projection exposure machine for microlithography includes at least one optical element and at least one manipulator, a linear drive for manipulating the position of the optical element. The linear drive has at least one moving element, the moving element having a shearing part and a lifting part. The shearing part is arranged to move the optical element and the lifting part is arranged to move the shearing part. The linear drive has a supporting element which is in contact with and prevents movement of the optical element while the shearing part is moved by the lifting part.Type: GrantFiled: December 21, 2005Date of Patent: February 3, 2009Assignee: Carl Zeiss SMT AGInventors: Stephan Back, Wolfgang Hummel, Juergen Fischer, Karl-Eugen Aubele, Erich Merz, Raoul Reiner, Klaus Rief, Stefan Schoengart, Markus Neumaier, Baerbel Schwaer, Ulrich Weber, Michael Muehlbeyer, Hubert Holderer, Alexander Kohl, Jochen Weber, Johannes Lippert, Thorsten Rassel
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Publication number: 20080239503Abstract: A projection objective of a microlithographic projection exposure apparatus comprises a manipulator for reducing rotationally asymmetric image errors. The manipulator in turn contains a lens, an optical element and an interspace formed between the lens and the optical element, which can be filled with a liquid. At least one actuator acting exclusively on the lens is furthermore provided, which can generate a rotationally asymmetric deformation of the lens.Type: ApplicationFiled: January 9, 2008Publication date: October 2, 2008Applicant: CARL ZEISS SMT AGInventors: Olaf Conradi, Sascha Bleidistel, Markus Hauf, Wolfgang Hummel, Arif Kazi, Baerbel Schwaer, Jochen Weber, Hubert Holderer, Payam Tayebati, Boris Bittner
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Publication number: 20080106711Abstract: A microlithographic projection exposure apparatus comprises a projection objective which images an object onto an image plane and has a lens with a curved surface. In the projection objective there is a liquid or solid medium which directly adjoins the curved surface over a region which is usable for imaging the object. The projection exposure apparatus also has an adjustable manipulator for reducing an image field curvature which is caused by heating of the medium during the projection operation.Type: ApplicationFiled: November 17, 2005Publication date: May 8, 2008Applicant: CARL ZEISS SMT AGInventors: Helmut Beierl, Sascha Bleidistel, Wolfgang Singer, Toralf Gruner, Alexander Epple, Norbert Wabra, Susanne Beder, Jochen Weber, Heiko Feldmann, Baerbel Schwaer, Olaf Rogalsky, Ari Kazi
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Publication number: 20060164619Abstract: An imaging device in a projection exposure machine for microlithography comprises at least one optical element and at least one manipulator, a linear drive for manipulating the position of the optical element. Said linear drive has at least one moving element, said moving element having a shearing part and a lifting part. Said shearing part is arranged to move the optical element and said lifting part is arranged to move said shearing part. Said linear drive has a supporting element which is in contact with and prevents movement of the optical element while the shearing part is moved by the lifting part.Type: ApplicationFiled: December 21, 2005Publication date: July 27, 2006Applicant: Carl Zeiss SMT AGInventors: Stephan Back, Wolfgang Hummel, Juergen Fischer, Karl-Eugen Aubele, Erich Merz, Raoul Reiner, Klaus Rief, Stefan Schoengart, Markus Neumaier, Baerbel Schwaer, Ulrich Weber, Michael Muehlbeyer, Hubert Holderer, Alexander Kohl, Jochen Weber, Johannes Lippert, Thorsten Rassel