Patents by Inventor Bartolomeus Petrus Rijpers
Bartolomeus Petrus Rijpers has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Patent number: 11106144Abstract: Method of determining a photodetector contribution to a measurement of apodization of a projection system of an immersion lithography apparatus, the method comprising providing a beam of radiation, illuminating an object with the beam of radiation, using the projection system to project an image of the object through a liquid layer and onto a photodetector, performing a first set of measurements of radiation intensity across a pupil plane of the projection system at a first liquid layer thickness, performing a second set of measurements of radiation intensity across the pupil plane of the projection system at a different liquid layer thickness, determining a set of intensity differences from the first set of measurements and the second set of measurements, comparing the determined set of intensity differences to an expected set of intensity difference, and using the results of the comparison to determine the photodetector contribution to a measurement of apodization.Type: GrantFiled: June 12, 2018Date of Patent: August 31, 2021Assignee: ASML Netherlands B.V.Inventors: Paulus Hubertus Petrus Koller, Johannes Jacobus Matheus Baselmans, Bartolomeus Petrus Rijpers
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Publication number: 20210132507Abstract: Method of determining a photodetector contribution to a measurement of apodization of a projection system of an immersion lithography apparatus, the method comprising providing a beam of radiation, illuminating an object with the beam of radiation, using the projection system to project an image of the object through a liquid layer and onto a photodetector, performing a first set of measurements of radiation intensity across a pupil plane of the projection system at a first liquid layer thickness, performing a second set of measurements of radiation intensity across the pupil plane of the projection system at a different liquid layer thickness, determining a set of intensity differences from the first set of measurements and the second set of measurements, comparing the determined set of intensity differences to an expected set of intensity difference, and using the results of the comparison to determine the photodetector contribution to a measurement of apodization.Type: ApplicationFiled: June 12, 2018Publication date: May 6, 2021Applicant: ASML Netherlands B.V.Inventors: Paulus Hubertus Petrus KOLLER, Johannes Jacobus Matheus BASELMANS, Bartolomeus Petrus RIJPERS
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Patent number: 10416577Abstract: A method of measuring a position of an alignment target on a substrate using an optical system. The method includes measuring a sub-segmented target by illuminating the sub-segmented target with radiation and detecting radiation diffracted by the sub-segmented target using a detector system to obtain signals containing positional information of the one sub-segmented target. The sub-segmented target has structures arranged periodically in at least a first direction, at least some of the structures including smaller sub-structures, and each sub-segmented target is formed with a positional offset between the structures and the sub-structures that is a combination of both known and unknown components. The signals, together with information on differences between known offsets of the sub-segmented target are used to calculate a measured position of an alignment target which is corrected for the unknown component of the positional offset.Type: GrantFiled: November 29, 2016Date of Patent: September 17, 2019Assignees: ASML Holding N.V., ASML Netherlands B.V.Inventors: Ralph Brinkhof, Simon Gijsbert Josephus Mathijssen, Maikel Robert Goosen, Vassili Demergis, Bartolomeus Petrus Rijpers
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Publication number: 20150343461Abstract: A method for depositing a protective layer of material on a localized area on a substrate, such as a pattern of photo resist, includes forming a controlled environment around the substrate and positioning a hollow needle adjacent to the localized area on the substrate. A liquid comprising the material is directed through the hollow needle onto the localized area, so as to deposit a layer of the material on the localized area. The layer of material may act as a Z-contrast forming layer in TEM.Type: ApplicationFiled: August 12, 2015Publication date: December 3, 2015Applicant: ASML Netherlands B.V.Inventors: Bartolomeus Petrus RIJPERS, Jurriaan Hendrik Koenraad VAN SCHAIK
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Patent number: 9116086Abstract: A method for depositing a protective layer of material on a localized area on a substrate, such as a pattern of photo resist, includes forming a controlled environment around the substrate and positioning a hollow needle adjacent to the localized area on the substrate. A liquid comprising the material is directed through the hollow needle onto the localized area, so as to deposit a layer of the material on the localized area. The layer of material may act as a Z-contrast forming layer in TEM.Type: GrantFiled: June 16, 2010Date of Patent: August 25, 2015Assignee: ASML Netherlands B.V.Inventors: Bartolomeus Petrus Rijpers, Jurriaan Hendrik Koenraad Van Schaik
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Patent number: 8722179Abstract: A substrate comprises a first mark and a second mark. The first mark comprises a first pattern with at least one mark feature formed by a first material and at least one further region formed by a second material. The first and second materials have different material characteristics with respect to a chemical-mechanical polishing process such that a step height in a direction substantially perpendicular to the surface of the substrate may be created by applying the chemical-mechanical polishing process. The second mark can be provided with a second step height by applying the chemical-mechanical polishing process. The second step height is substantially different from the first step height.Type: GrantFiled: December 12, 2006Date of Patent: May 13, 2014Assignee: ASML Netherlands B.V.Inventors: Richard Johannes Franciscus Van Haren, Bartolomeus Petrus Rijpers, Harminder Singh, Gerald Arthur Finken
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Patent number: 8609441Abstract: A substrate comprises a first mark and a second mark. The first mark comprises a first pattern with at least one mark feature formed by a first material and at least one region formed by a second material. The first and second materials have different material characteristics with respect to a substrate treatment process such that a step height in a direction substantially perpendicular to the surface of the substrate may be created by applying the substrate treatment process. The second mark can be provided with a second step height by applying the substrate treatment process. The second step height is substantially different from the first step height.Type: GrantFiled: December 12, 2007Date of Patent: December 17, 2013Assignee: ASML Netherlands B.V.Inventors: Richard Johannes Franciscus Van Haren, Bartolomeus Petrus Rijpers, Harminder Singh, Gerald Arthur Finken
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Publication number: 20100330280Abstract: A method for depositing a protective layer of material on a localized area on a substrate, such as a pattern of photo resist, includes forming a controlled environment around the substrate and positioning a hollow needle adjacent to the localized area on the substrate. A liquid comprising the material is directed through the hollow needle onto the localized area, so as to deposit a layer of the material on the localized area. The layer of material may act as a Z-contrast forming layer in TEM.Type: ApplicationFiled: June 16, 2010Publication date: December 30, 2010Applicant: ASML Netherlands B.V.Inventors: Bartolomeus Petrus Rijpers, Jurriaan Hendrik Koenraad Van Schaik
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Publication number: 20100068830Abstract: The invention includes a lithographic system having a first source for generating radiation with a first wavelength and an alignment system with a second source for generating radiation with a second wavelength. The second wavelength is larger than the first wavelength. A marker structure is provided having a first layer and a second layer. The second layer is present either directly or indirectly on top of said first layer. The first layer has a first periodic structure and the second layer has a second periodic structure. At least one of the periodic structures has a plurality of features in at least one direction with a dimension smaller than 400 nm. Additionally, a combination of the first and second periodic structure forms a diffractive structure arranged to be illuminated by radiation with the second wavelength.Type: ApplicationFiled: November 3, 2009Publication date: March 18, 2010Applicant: ASML NETHERLANDS B.V.Inventors: Richard Johannes Franciscus VAN HAREN, Arie Jeffrey Den Boef, Jacobus Burghoorn, Maurits Van Der Schaar, Bartolomeus Petrus Rijpers
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Patent number: 7629697Abstract: The invention includes a lithographic system having a first source for generating radiation with a first wavelength and an alignment system with a second source for generating radiation with a second wavelength. The second wavelength is larger than the first wavelength. A marker structure is provided having a first layer and a second layer. The second layer is present either directly or indirectly on top of said first layer. The first layer has a first periodic structure and the second layer has a second periodic structure. At least one of the periodic structures has a plurality of features in at least one direction with a dimension smaller than 400 nm. Additionally, a combination of the first and second periodic structure forms a diffractive structure arranged to be illuminated by radiation with the second wavelength.Type: GrantFiled: November 12, 2004Date of Patent: December 8, 2009Assignee: ASML Netherlands B.V.Inventors: Richard Johannes Franciscus Van Haren, Arie Jeffrey Den Boef, Jacobus Burghoorn, Maurits Van Der Schaar, Bartolomeus Petrus Rijpers
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Publication number: 20080212057Abstract: A substrate comprises a first mark and a second mark. The first mark comprises a first pattern with at least one mark feature formed by a first material and at least one region formed by a second material. The first and second materials have different material characteristics with respect to a substrate treatment process such that a step height in a direction substantially perpendicular to the surface of the substrate may be created by applying the substrate treatment process. The second mark can be provided with a second step height by applying the substrate treatment process. The second step height is substantially different from the first step height.Type: ApplicationFiled: December 12, 2007Publication date: September 4, 2008Applicant: ASML Netherlands B.V.Inventors: Richard Johannes Franciscus Van Haren, Bartolomeus Petrus Rijpers, Harminder Singh, Gerald Arthur Finken
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Publication number: 20080138623Abstract: A substrate comprises a first mark and a second mark. The first mark comprises a first pattern with at least one mark feature formed by a first material and at least one further region formed by a second material. The first and second materials have different material characteristics with respect to a chemical-mechanical polishing process such that a step height in a direction substantially perpendicular to the surface of the substrate may be created by applying the chemical-mechanical polishing process. The second mark can be provided with a second step height by applying the chemical-mechanical polishing process. The second step height is substantially different from the first step height.Type: ApplicationFiled: December 12, 2006Publication date: June 12, 2008Applicant: ASML Netherlands B.V.Inventors: Richard Johannes Franciscus Van Haren, Bartolomeus Petrus Rijpers, Harminder Singh, Gerald Arthur Finken