Patents by Inventor Been-Der CHENG

Been-Der CHENG has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20210048753
    Abstract: A method to determine a curvilinear pattern of a patterning device that includes obtaining (i) an initial image of the patterning device corresponding to a target pattern to be printed on a substrate subjected to a patterning process, and (ii) a process model configured to predict a pattern on the substrate from the initial image, generating, by a hardware computer system, an enhanced image from the initial image, generating, by the hardware computer system, a level set image using the enhanced image, and iteratively determining, by the hardware computer system, a curvilinear pattern for the patterning device based on the level set image, the process model, and a cost function, where the cost function (e.g., EPE) determines a difference between a predicted pattern and the target pattern, where the difference is iteratively reduced.
    Type: Application
    Filed: February 28, 2019
    Publication date: February 18, 2021
    Applicant: ASML NETHERLANDS B.V.
    Inventors: Quan ZHANG, Been-Der CHENG, Rafael C. HOWELL, Jing SU, Yi ZOU, Yen-Wen LU