Patents by Inventor Benjamin S. Hsaio

Benjamin S. Hsaio has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 7887311
    Abstract: A spinneret format, an electric-field reversal format and a process for post-treatment of membranes formed from electro-spinning or electro-blowing are provided, including a cleaning method and apparatus for electro-blowing or blowing-assisted electro-spinning technology.
    Type: Grant
    Filed: September 9, 2004
    Date of Patent: February 15, 2011
    Assignee: The Research Foundation of State University of New York
    Inventors: Benjamin Chu, Benjamin S. Hsaio, Dufei Fang
  • Publication number: 20090123591
    Abstract: A spinneret format, an electric-field reversal format and a process for post-treatment of membranes formed from electro-spinning or electro-blowing are provided, including a cleaning method and apparatus for electro-blowing or blowing-assisted electro-spinning technology.
    Type: Application
    Filed: September 23, 2008
    Publication date: May 14, 2009
    Applicant: The Research Foundation of SUNY
    Inventors: Benjamin Chu, Benjamin S. Hsaio, Dufei Fang
  • Publication number: 20090121379
    Abstract: A spinneret format, an electric-field reversal format and a process for post-treatment of membranes formed from electro-spinning or electro-blowing are provided, including a cleaning method and apparatus for electro-blowing or blowing-assisted electro-spinning technology.
    Type: Application
    Filed: September 23, 2008
    Publication date: May 14, 2009
    Applicant: The Research Foundation of SUNY
    Inventors: Benjamin Chu, Benjamin S. Hsaio, Dufei Fang
  • Patent number: 7323425
    Abstract: A method for producing a non-chemically crosslinked hyaluronan is provided which involves contacting a sample of hyaluronan with an acidic solvent/water mixture for a period of time and at a temperature sufficient to effect crosslinking, wherein the acidic solvent/water mixture has a content of a solvent sufficient to prevent dissolution of said hyaluronan and wherein the solvent is miscible with water, and an amount of an acid sufficient to effect crosslinking of the hyaluronan, and the crosslinked, water resistant non-woven hyaluronan resulting therefrom.
    Type: Grant
    Filed: August 27, 2004
    Date of Patent: January 29, 2008
    Assignee: Stony Brook Technology and Applied Research
    Inventors: Benjamin Chu, Benjamin S. Hsaio, Dufei Fang, Akio Okamoto