Patents by Inventor Bill Crane

Bill Crane has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Adjustable doser valve
    Patent number: 9146562
    Abstract: A doser valve with a seat comprising at least one axially located slot from an outer surface of the seat and at least one radial/tangential extending passage in fluid communication with the at least one axially located slot and an exit passage out of the seat.
    Type: Grant
    Filed: July 8, 2013
    Date of Patent: September 29, 2015
    Assignee: G.W. Lisk Company, Inc.
    Inventors: Gary Garcia, Jeff Tyler, Bill Crane, Rob Gardner
  • System for purging a device
    Patent number: 8671664
    Abstract: A system for purging a device for injecting fuel into an exhaust system of an engine comprising a device having an input and an output coupled to an exhaust system, at least one air valve and at least one fuel valve. The air valve has an input an input coupled to an air supply and an output coupled to the device through a check valve. The fuel valve has an input coupled to a fuel supply and an output coupled to the device through a check valve. When the air valve is open and the fuel valve is closed, air flows from the air supply to the device and is injected into the exhaust system of the engine. When the air valve is closed and the fuel valve is open, fuel flows from the fuel supply to the device and is injected into the exhaust system of the engine.
    Type: Grant
    Filed: February 25, 2009
    Date of Patent: March 18, 2014
    Assignee: G.W. Lisk Company, Inc.
    Inventors: Gary Garcia, Rob Gardner, Bill Crane, Jeff Tyler
  • Adjustable Doser Valve
    Publication number: 20130312836
    Abstract: A doser valve with a seat comprising at least one axially located slot from an outer surface of the seat and at least one radial/tangential extending passage in fluid communication with the at least one axially located slot and an exit passage out of the seat.
    Type: Application
    Filed: July 8, 2013
    Publication date: November 28, 2013
    Applicant: G.W. Lisk Company, Inc.
    Inventors: Gary Garcia, Jeff Tyler, Bill Crane, Rob Gardner
  • Adjustable Doser Valve
    Publication number: 20110168271
    Abstract: A doser valve with a seat comprising at least one axially located slot from an outer surface of the seat and at least one radial/tangential extending passage in fluid communication with the at least one axially located slot and an exit passage out of the seat.
    Type: Application
    Filed: October 28, 2009
    Publication date: July 14, 2011
    Applicant: G.W. LISK COMPANY, INC.
    Inventors: Gary Garcia, Jeff Tyler, Bill Crane, Rob Gardner
  • SYSTEM FOR PURGING A DEVICE
    Publication number: 20110030334
    Abstract: A system for purging a device for injecting fuel into an exhaust system of an engine comprising a device having an input and an output coupled to an exhaust system, at least one air valve and at least one fuel valve. The air valve has an input an input coupled to an air supply and an output coupled to the device through a check valve. The fuel valve has an input coupled to a fuel supply and an output coupled to the device through a check valve. When the air valve is open and the fuel valve is closed, air flows from the air supply to the device and is injected into the exhaust system of the engine. When the air valve is closed and the fuel valve is open, fuel flows from the fuel supply to the device and is injected into the exhaust system of the engine.
    Type: Application
    Filed: February 25, 2009
    Publication date: February 10, 2011
    Applicant: G. W. LISK COMPANY, INC.
    Inventors: Gary Garcia, Rob Gardner, Bill Crane, Jeff Tyler
  • Conditioning of a reaction chamber
    Patent number: 7273817
    Abstract: A method is provided for forming polymer on an interior surface of a reaction chamber. A polymer-forming gas is introduced into the chamber during the etching of a photoresist layer of a semiconductor wafer within the reaction chamber and the environment is regulated to form the polymer on the interior surface of the chamber. The polymer thus formed reduces the standard deviation of the critical dimensions of the semiconductor wafer. A method for the manufacture of integrated circuits is also provided.
    Type: Grant
    Filed: November 14, 2005
    Date of Patent: September 25, 2007
    Assignee: Micron Technology, Inc.
    Inventors: William A. Polinsky, Bill Crane, John C. Gonzales, Steven Ott
  • Conditioning of a reaction chamber
    Publication number: 20060202394
    Abstract: A method is provided for forming polymer on an interior surface of a reaction chamber. A polymer-forming gas is introduced into the chamber during the etching of a photoresist layer of a semiconductor wafer within the reaction chamber and the environment is regulated to form the polymer on the interior surface of the chamber. The polymer thus formed reduces the standard deviation of the critical dimensions of the semiconductor wafer. A method for the manufacture of integrated circuits is also provided.
    Type: Application
    Filed: November 14, 2005
    Publication date: September 14, 2006
    Inventors: William Polinsky, Bill Crane, John Gonzales, Steven Ott
  • Conditioning of a reaction chamber
    Patent number: 7022620
    Abstract: A method is provided for forming polymer on an interior surface of a reaction chamber. A polymer-forming gas is introduced into the chamber and the environment is regulated to form the polymer on the interior surface of the chamber. Methods for the manufacture of integrated circuits, electronic devices, and electronic systems, are also provided.
    Type: Grant
    Filed: November 18, 2003
    Date of Patent: April 4, 2006
    Assignee: Micron Technology, Inc.
    Inventors: William A. Polinsky, Bill Crane, John C. Gonzales, Steven Ott
  • Conditioning of a reaction chamber
    Publication number: 20050106891
    Abstract: A method is provided for forming polymer on an interior surface of a reaction chamber. A polymer-forming gas is introduced into the chamber and the environment is regulated to form the polymer on the interior surface of the chamber. Methods for the manufacture of integrated circuits, electronic devices, and electronic systems, are also provided.
    Type: Application
    Filed: November 18, 2003
    Publication date: May 19, 2005
    Inventors: William Polinsky, Bill Crane, John Gonzales, Steven Ott