Abstract: Embodiments of the present disclosure provide a thin film transistor (TFT) and a method of manufacturing the same, which enables to decrease the vertical resistance from the source and the drain to the polarity inversion region, so that the current from the source and the drain to the polarity inversion region may be increased, thereby improving the performances of the TFT. An active layer of the TFT is provided with a first groove and a second groove which neither pass through the active layer. A source and a drain of the TFT are formed at least partially in the first groove and the second groove, respectively. The source and the drain contact the active layer through the first groove and the second groove, respectively.

Abstract: The present disclosure provides a touch substrate, a touch display panel and a display device which belong to a field of touch display. The touch substrate includes a plurality of photo-sensing thin film transistor arranged on the substrate, the touch substrate further includes a piezoelectric sensing structure arranged above at least one of the photo-sensing thin film transistors, and a breakover current between a source and a drain of the photo-sensing thin film transistor corresponding to the piezoelectric sensing structure is changed, when the at least one piezoelectric sensing structure is pressed.

Abstract: The present disclosure provides an array substrate and manufacturing method thereof, and a display device. Moreover, it relates to the technical field of display apparatus and can solve the problem that the organic insulating layer in an existing array substrate easily causes deficiencies in other structures. The array substrate of the present disclosure comprises an insulating layer. The insulating layer is provided with an opening and comprises: a first insulating layer; a second insulating layer arranged on the first insulating layer. A slope angle of the second insulating layer at the opening is smaller than a slope angle of the first insulating layer.

Abstract: A method for displaying a position of an alignment mark, an array substrate and a manufacturing method thereof are provided. The method for displaying the position of the alignment mark includes: forming an alignment mark on a surface of a base substrate; forming a first isolation layer covering the alignment mark; forming a via hole in the first isolation layer to expose the alignment mark; applying a first material in the via hole to form a first material pattern; and applying a second material on surfaces of the first material pattern and the first isolation layer to form a second material film, wherein the first material and the second material are configured to have different polarities, so that the second material cannot be attached to the first material pattern.

Abstract: The present disclosure relates to a display device, a touch panel and a method for manufacturing the touch panel. The method includes: forming a patterned metal lead and a patterned metal bridge on a substrate through one patterning process; depositing an insulation layer and a transparent electrode layer, and forming a pattern of the insulation layer and patterns of a first electrode and a second electrode for touching through one patterning process. In the method, patterns of the insulation layer, the first electrode and the second electrode can be formed simultaneously through one patterning process, thereby increasing efficiency of manufacturing the touch panel at the extreme, saving manufacturing cost and increasing competitiveness of production line.

Abstract: A method for fabricating a one glass solution touch panel is provided. The method includes forming a protective layer on a first surface of a substrate, and forming a black matrix, a plurality of first electrodes, a plurality of second electrodes, a first over coat layer, and a plurality of conductive bridges on a second surface of the substrate, wherein the second surface includes a visual area in which the first electrodes and the second electrodes are arranged in an alternating pattern, and a non-visual area where the black matrix is provided, wherein the second electrode includes a plurality of conductive lumps, wherein each of the conductive lumps is located between adjacent first electrodes, wherein the first over coat layer separates the conductive lumps from the first electrodes, and wherein each conductive bridge connects the conductive lumps belonging to the same second electrode.

Abstract: Embodiments of the present disclosure provide a thin film transistor (TFT) and a method of manufacturing the same, which enables to decrease the vertical resistance from the source and the drain to the polarity inversion region, so that the current from the source and the drain to the polarity inversion region may be increased, thereby improving the performances of the TFT. An active layer of the TFT is provided with a first groove and a second groove which neither pass through the active layer. A source and a drain of the TFT are formed at least partially in the first groove and the second groove, respectively. The source and the drain contact the active layer through the first groove and the second groove, respectively.

Abstract: An oxide thin film transistor array substrate, a manufacturing method thereof and a display panel are provided. The oxide TFT array substrate includes a base substrate and an oxide TFT, a gate line, a data line and a pixel electrode provided on the base substrate, the drain electrode of the oxide TFT being connected with the pixel electrode, wherein a connection structure is provided between the source electrode of the oxide TFT and the data line, by which the source electrode of the oxide TFT and the data line are electrically connected, and the resistivity of the connection structure is larger than the resistivity of the source electrode.

Abstract: A method for displaying a position of an alignment mark, an array substrate and a manufacturing method thereof are provided. The method for displaying the position of the alignment mark includes: forming an alignment mark on a surface of a base substrate; forming a first isolation layer covering the alignment mark; forming a via hole in the first isolation layer to expose the alignment mark; applying a first material in the via hole to form a first material pattern; and applying a second material on surfaces of the first material pattern and the first isolation layer to form a second material film, wherein the first material and the second material are configured to have different polarities, so that the second material cannot be attached to the first material pattern.

Abstract: The present disclosure provides a COA substrate, a display device and a method for manufacturing the COA substrate. The COA substrate includes: a passivation layer pattern arranged on a first conductive layer pattern including a data line, and a source electrode and a drain electrode of a TFT, and including a first via-hole at a position corresponding to the drain electrode; a second conductive layer pattern arranged on the passivation layer pattern and including a conductive connection pattern arranged at a region defined by a gate line, the data line and the TFT, and connected to the drain electrode of the TFT through the via-hole; and a color filter layer pattern arranged on the second conductive layer pattern and including a second via-hole at a position corresponding to the conductive connection pattern.

Abstract: An array substrate and manufacturing method thereof and a display device having the array substrate are provided. The array substrate includes a non-pixel region distributed in the form of a grid and a plurality of sub-pixel regions formed by being surrounded by the non-pixel region, a plurality of scan lines (12) and data lines (16) disposed in a crossing manner are provided within the non-pixel region, and a common electrode (20) is provided in the sub-pixel regions and the non-pixel region. A zone of the common electrode (20) corresponding to the sub-pixel regions has a first thickness, a zone of the common electrode (20) corresponding to the scan lines (12) and/or the data lines (16) has a second thickness, and the first thickness is smaller than the second thickness.

Abstract: The present invention provides a display substrate comprising a plurality of pixel regions and a thin film transistor provided in each of the pixel regions. Each of the pixel regions comprises a transmissive region and a reflective region, and a protection layer is provided on the thin film transistor. A portion of the protection layer corresponding to the reflective region is a protrusion portion, and a portion of the protection layer corresponding to the thin film transistor is provided with a via therein.

Abstract: A thin film transistor and a fabrication method thereof, an array substrate, and a display device are provided. The fabrication method comprises: forming a gate line on a base substrate; performing a treatment for alleviating a bulge of the gate line on the base substrate with the gate line formed thereon, and forming a gate insulating layer on the base substrate after the treatment. Thereby, a problem of bulge of the gate line occurring in a fabrication process of the thin film transistor can be alleviated or even avoided, so that resistance of the gate line is uniform, which further renders uniform display of the display device, and improves display quality of the display device.

Abstract: The present invention discloses a conductive structure, a method of manufacturing the conductive structure, and an array substrate. The method of manufacturing the conductive structure, comprising steps of: Forming a barrier metal film and a copper metal film in this order on a substrate, wherein the copper metal film being laminated on the barrier metal film; forming a preset photoresist pattern on the copper metal film; etching the barrier metal film and the copper metal film; oxidizing an exposed sidewall of the etched barrier metal film and an exposed sidewall of the etched copper metal film, so as to generate metal oxide layers on the exposed sidewall of the etched barrier metal film and the exposed sidewall of the etched copper metal film, respectively; and stripping off the photoresist pattern by means of a photoresist stripping liquid.

Abstract: An array substrate and manufacturing method thereof and a display device having the array substrate are provided. The array substrate includes a non-pixel region distributed in the form of a grid and a plurality of sub-pixel regions formed by being surrounded by the non-pixel region, a plurality of scan lines (12) and data lines (16) disposed in a crossing manner are provided within the non-pixel region, and a common electrode (20) is provided in the sub-pixel regions and the non-pixel region. A zone of the common electrode (20) corresponding to the sub-pixel regions has a first thickness, a zone of the common electrode (20) corresponding to the scan lines (12) and/or the data lines (16) has a second thickness, and the first thickness is smaller than the second thickness.

Abstract: An array substrate of a liquid crystal display, comprising: a substrate; a first electrode disposed on the substrate; a second electrode located above and electrically insulated from the first electrode; and an orientation film disposed on the second electrode, wherein the array substrate further comprising: at least one shunt electrode connected to at least one of first electrodes to divert residual charges left over a surface of a liquid crystal molecule, and the shunt electrode is located at a side of the orientation film not contacting the liquid crystal molecule.

Abstract: Embodiments of the invention provide an array substrate, a manufacturing method thereof and a display device. The array substrate comprises: a base substrate; a gate line and a gate electrode formed on the base substrate; a gate insulating layer formed on the gate line and the gate electrode; a source electrode, a drain electrode and a pixel electrode formed on the gate insulating layer, wherein the pixel electrode is directly connected to the drain electrode; and an active layer formed on the gate insulating layer, the source electrode and the drain electrode.

Abstract: An oxide thin film transistor array substrate, a manufacturing method thereof and a display panel are provided. The oxide TFT array substrate includes a base substrate and an oxide TFT, a gate line, a data line and a pixel electrode provided on the base substrate, the drain electrode of the oxide TFT being connected with the pixel electrode, wherein a connection structure is provided between the source electrode of the oxide TFT and the data line, by which the source electrode of the oxide TFT and the data line are electrically connected, and the resistivity of the connection structure is larger than the resistivity of the source electrode.

Abstract: Embodiments of the invention provide an array substrate, a manufacturing method thereof and a display device. The array substrate comprises: a base substrate; a gate line and a gate electrode formed on the base substrate; a gate insulating layer formed on the gate line and the gate electrode; a source electrode, a drain electrode and a pixel electrode formed on the gate insulating layer, wherein the pixel electrode is directly connected to the drain electrode; and an active layer formed on the gate insulating layer, the source electrode and the drain electrode.

Abstract: An optical touch screen and a display device are disclosed. The optical touch screen (200) comprises an optical touch panel (210) and a first sensor (220) and a second sensor (230). The optical touch panel (210) comprises a first optical transmission channel (211) and a second optical transmission channel (212) which are intersected with each other. The first sensor (220) is disposed on at least one end of the first optical transmission channel (211) and configured to receive light emitted by the first optical transmission channel (211). The second sensor (230) is disposed on at least one end of the second optical transmission channel (212) and configured to receive light emitted by the second optical transmission channel (212). The optical touch screen and the display device can improve the positioning accuracy of the touch position.