Patents by Inventor Björn Liebaug

Björn Liebaug has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Beam-forming and illuminating system for a lithography system, lithography system, and method
    Patent number: 11448968
    Abstract: A beam-forming and illuminating system for a lithography system, such an EUV lithography system, includes an optical element and an adjusting device. The adjusting device is configured so that, during a heat-up phase of the beam-forming and illuminating system, the adjusting device measures a field position and/or a pupil position of the beam-forming and illuminating system and adjusts the orientation and/or position of the optical element based on the measured field position and/or pupil position to keep the optical element in a desired position.
    Type: Grant
    Filed: September 14, 2020
    Date of Patent: September 20, 2022
    Assignee: Carl Zeiss SMT GmbH
    Inventors: Hubert Holderer, Klaus Abele, Björn Liebaug
  • Optical arrangement for EUV radiation with a shield for protection against the etching effect of a plasma
    Patent number: 11137687
    Abstract: An optical arrangement (1) for EUV radiation includes: at least one reflective optical element (16) having a main body (30) with a coating (31) that reflects EUV radiation (33). At least one shield (36) is fitted to at least one surface region (35) of the main body (30) and protects the at least one surface region (35) against an etching effect of a plasma (H+, H*) that surrounds the reflective optical element (16) during operation of the optical arrangement (1). A distance (A) between the shield (36) and the surface region (35) of the main body (30) is less than double the Debye length (?D), preferably less than the Debye length (?D), of the surrounding plasma (H+, H*).
    Type: Grant
    Filed: January 31, 2020
    Date of Patent: October 5, 2021
    Assignee: CARL ZEISS SMT GMBH
    Inventors: Bjoern Liebaug, Moritz Becker, Kerstin Hild, Joachim Hartjes, Simon Haas
  • BEAM-FORMING AND ILLUMINATING SYSTEM FOR A LITHOGRAPHY SYSTEM, LITHOGRAPHY SYSTEM, AND METHOD
    Publication number: 20210003925
    Abstract: A beam-forming and illuminating system for a lithography system, such an EUV lithography system, includes an optical element and an adjusting device. The adjusting device is configured so that, during a heat-up phase of the beam-forming and illuminating system, the adjusting device measures a field position and/or a pupil position of the beam-forming and illuminating system and adjusts the orientation and/or position of the optical element based on the measured field position and/or pupil position to keep the optical element in a desired position.
    Type: Application
    Filed: September 14, 2020
    Publication date: January 7, 2021
    Inventors: Hubert Holderer, Klaus Abele, Björn Liebaug
  • Lithography apparatus and method
    Patent number: 10831114
    Abstract: A lithography machine includes an optical element, an interface coupled to the optical element, and a component which is separate from the interface. The interface is directly connected to the optical element. The optical element includes an engaging section. The component has a counter engaging section configured to engage with the engaging section of the optical element to connect the component form-fittingly and/or force-fittingly to the optical element.
    Type: Grant
    Filed: August 20, 2019
    Date of Patent: November 10, 2020
    Assignee: Carl Zeiss SMT GmbH
    Inventors: Björn Liebaug, Franz-Josef Stickel, Jürgen Hofmann, Dietmar Dürr
  • OPTICAL ARRANGEMENT FOR EUV RADIATION WITH A SHIELD FOR PROTECTION AGAINST THE ETCHING EFFECT OF A PLASMA
    Publication number: 20200166847
    Abstract: An optical arrangement (1) for EUV radiation includes: at least one reflective optical element (16) having a main body (30) with a coating (31) that reflects EUV radiation (33). At least one shield (36) is fitted to at least one surface region (35) of the main body (30) and protects the at least one surface region (35) against an etching effect of a plasma (H+, H*) that surrounds the reflective optical element (16) during operation of the optical arrangement (1). A distance (A) between the shield (36) and the surface region (35) of the main body (30) is less than double the Debye length (?D), preferably less than the Debye length (?D), of the surrounding plasma (H+, H*).
    Type: Application
    Filed: January 31, 2020
    Publication date: May 28, 2020
    Inventors: Bjoern LIEBAUG, Moritz BECKER, Kerstin HILD, Joachim HARTJES, Simon HAAS
  • LITHOGRAPHY APPARATUS AND METHOD
    Publication number: 20190377273
    Abstract: A lithography machine includes an optical element, an interface coupled to the optical element, and a component which is separate from the interface. The interface is directly connected to the optical element. The optical element includes an engaging section. The component has a counter engaging section configured to engage with the engaging section of the optical element to connect the component form-fittingly and/or force-fittingly to the optical element.
    Type: Application
    Filed: August 20, 2019
    Publication date: December 12, 2019
    Inventors: Björn Liebaug, Franz-Josef Stickel, Jürgen Hofmann, Dietmar Dürr