Abstract: Embodiments of the invention generally provide methods for sealing pores at a surface of a dielectric layer formed on a substrate. In one embodiment, the method includes exposing a dielectric layer formed on a substrate to a first pore sealing agent, wherein the first pore sealing agent contains a compound with a general formula CxHyOz, where x has a range of between 1 and 15, y has a range of between 2 and 22, and z has a range of between 1 and 3, and exposing the substrate to UV radiation in an atmosphere of the first pore sealing agent to form a first sealing layer on the dielectric layer.

Abstract: Embodiments of the invention generally provide methods for sealing pores at a surface of a dielectric layer formed on a substrate. In one embodiment, the method includes exposing a dielectric layer formed on a substrate to a first pore sealing agent, wherein the first pore sealing agent contains a compound with a general formula CxHyOz, where x has a range of between 1 and 15, y has a range of between 2 and 22, and z has a range of between 1 and 3, and exposing the substrate to UV radiation in an atmosphere of the first pore sealing agent to form a first sealing layer on the dielectric layer.

Abstract: A machine propelled by an electric motor and subject to a deration scheme is described wherein deration is specified by a combination of a temperature signal indicating a degree to which a machine component is overheating. The machine includes an electronic controller that receives a temperature signal indicative of a current temperature status of the electric motor. The electronic controller receives a motor speed signal indicative of a current speed status of the electric motor. The electronic controller calculates, in accordance with a derating scheme, a deration value for the electric motor, the deration value being determined by applying a set of current operating state parameter values to the derating scheme. The set of current operating state parameters include: a motor speed parameter value; and a temperature parameter value.

Abstract: The present disclosure relates to a multi-sensor indoor localization method and device. The method includes: an optical signal is received from a point light source using an optical sensor group having N optical sensors; the light intensity of the optical signal is obtained, the optical sensor group includes a polyhedron-shaped base where the normal vectors of each three faces are linearly independent, the N optical sensors are located on the faces of the base, and N?6; the current heading is obtained by a magnetic sensor group; a current unit normal vector is obtained; a system of at least three equations is established; the system of equations is solved to obtain an approximate solution of minimum residual, the approximate solution is regarded as the coordinates of the optical sensor group.

Abstract: Methods for detecting valve leakage and apparatus for the same are provided. In one embodiment, a method for detecting a valve leakage includes flowing a gas through a diverter valve, determining a pressure in a gas source provided to the diverter valve, comparing the determined pressure value with an expected pressure value, and generating a signal in response to the comparison.

Abstract: Embodiments of the present invention disclose a method, an apparatus, and a system for improving user experience of a small flow user. A base station controller (BSC) periodically collects statistics on an average data transmission rate of a terminal. The BSC compares the average data transmission rate with a set threshold and determines whether the average data transmission rate is smaller than the set threshold. The BSC sends a first priority adjustment command to a base transceiver station BTS if the average data transmission rate is smaller than the set threshold. The first priority adjustment command carries information of adjusting a scheduling priority of the terminal to a high priority, so that the BTS can adjust the scheduling priority of the terminal to the high priority.

Abstract: The current invention discloses devices and methods that may be used for detection and verification of interactions, such as collisions, between objects in application programs, such as online games. After receiving interaction information from a first terminal, a server may send the interaction information to another terminal for verification based on the first terminal's credit rating. When the credit rating is high, the server may broadcast the interaction information before the verification process, which may be conducted randomly. On the other hand, when the credit rating is low, the server may wait for the verification results from the other terminal and only broadcast the interaction information when the information is confirmed. Such an approach optimizes the interaction verification process, reduces security risk, and saves computing resources.

Abstract: The present invention provides systems, methods and apparatus for manufacturing a memory cell. The invention includes forming a feature having sidewalls in a first dielectric material; forming a first conductive material on the sidewalls of the feature; depositing a layer of a second dielectric material on the conductive material; and exposing the second dielectric material to oxidizing species and ultraviolet light to oxidize the second dielectric material. Numerous additional aspects are disclosed.

Abstract: A cleaning method for a UV chamber involves providing a first cleaning gas, a second cleaning gas, and a purge gas to one or more openings in the chamber. The first cleaning gas may be an oxygen containing gas, such as ozone, to remove carbon residues. The second cleaning gas may be a remote plasma of NF3 and O2 to remove silicon residues. The UV chamber may have two UV transparent showerheads, which together with a UV window in the chamber lid, define a gas volume proximate the UV window and a distribution volume below the gas volume. A purge gas may be flowed through the gas volume while one or more of the cleaning gases is flowed into the distribution volume to prevent the cleaning gases from impinging on the UV transparent window.

Abstract: Embodiments of the invention generally provide methods for cleaning a UV processing chamber. In one embodiment, the method includes flowing an oxygen-containing gas through a plurality of passages formed in a UV transparent gas distribution showerhead and into a processing region located between the UV transparent gas distribution showerhead and a substrate support disposed within the thermal processing chamber, exposing the oxygen-containing gas to UV radiation under a pressure scheme comprising a low pressure stage and a high pressure stage to generate reactive oxygen radicals, and removing unwanted residues or deposition build-up from exposed surfaces of chamber components presented in the thermal processing chamber using the reactive oxygen radicals.

Abstract: A machine propelled by an electric motor and subject to a deration scheme is described wherein deration is specified by a combination of a temperature signal indicating a degree to which a machine component is overheating. The machine includes an electronic controller that receives a temperature signal indicative of a current temperature status of the electric motor. The electronic controller receives a motor speed signal indicative of a current speed status of the electric motor. The electronic controller calculates, in accordance with a derating scheme, a deration value for the electric motor, the deration value being determined by applying a set of current operating state parameter values to the derating scheme. The set of current operating state parameters include: a motor speed parameter value; and a temperature parameter value.

Abstract: A brake monitoring system for a machine has at least one traction motor coupled to drive wheels of the machine. An operator input device receives a requested retarding torque from an operator of the machine and sends a signal to a controller that is configured to compare the required retarding torque to a maximum retarding torque available at a particular speed of the traction motor. The controller selectively generates a warning signal based on a comparison of the required retarding torque to a maximum retarding torque available.

Abstract: Embodiments of the invention generally provide methods for cleaning a UV processing chamber. In one embodiment, the method includes flowing an oxygen-containing gas through a plurality of passages formed in a UV transparent gas distribution showerhead and into a processing region located between the UV transparent gas distribution showerhead and a substrate support disposed within the thermal processing chamber, exposing the oxygen-containing gas to UV radiation under a pressure scheme comprising a low pressure stage and a high pressure stage to generate reactive oxygen radicals, and removing unwanted residues or deposition build-up from exposed surfaces of chamber components presented in the thermal processing chamber using the reactive oxygen radicals.

Abstract: Methods for the repair of damaged low k films are provided. Damage to the low k films occurs during processing of the film such as during etching, ashing, and planarization. The processing of the low k film causes water to store in the pores of the film and further causes hydrophilic compounds to form in the low k film structure. Repair processes incorporating ultraviolet (UV) radiation and silylation compounds remove the water from the pores and further remove the hydrophilic compounds from the low k film structure.

Abstract: Methods for depositing a carbon-based seasoning layer on exposed surfaces of the optical components within a UV processing chamber are disclosed. In one embodiment, the method includes flowing a carbon-containing precursor radially inwardly across exposed surfaces of optical components within the thermal processing chamber from a circumference of the optical components, exposing the carbon-containing precursor to a thermal radiation emitted from a heating source to form a carbon-based seasoning layer on the exposed surfaces of the optical components, exposing the carbon-based seasoning layer to ozone, wherein the ozone is introduced into the processing chamber by flowing the ozone radially inwardly across exposed surfaces of optical components from the circumference of the optical components, heating the optical components to a temperature of about 400° C. or above while flowing the ozone to remove the carbon-based seasoning layer from exposed surfaces of the optical components.

Abstract: A server management system and a method for server management, wherein the server management system comprises baseboard management controllers (BMCs) located at each of a plurality of servers, wherein each BMC comprises: a connection establishment interface component configured to establish connection with one processing device in response to a request of establishing connection with the processing device and to receive a server management instruction from the processing device; and a wireless network communication component configured to enable the BMCs to establish a wireless network through their wireless network communication component; wherein, the server that establishes connection with the processing device is designated as an interface server, and the wireless network communication component of the BMC of the interface server is further able to broadcast the server management instruction received by the connection establishment interface component to managed servers via the established wireless networ

Abstract: An electric drive machine includes an electric drive system including an internal combustion engine and an electrical power generator coupled to the internal combustion engine. An electronic controller is in control communication with the electric drive system and is configured to determine an estimated temperature of a rotor of the electrical power generator at least in part by determining a rotor temperature rise estimation, compare the estimated rotor temperature to a rotor temperature threshold, and initiate an excessive temperature action if the estimated rotor temperature is greater than or equal to the rotor temperature threshold.

Abstract: Embodiments of the present invention pertain to the formation of microelectronic structures. Low k dielectric materials need to exhibit a dielectric constant of less than about 2.6 for the next technology node of 32 nm. The present invention enables the formation of semiconductor devices which make use of such low k dielectric materials while providing an improved flexural and shear strength integrity of the microelectronic structure as a whole.

Abstract: Methods for the repair of damaged low k films are provided. Damage to the low k films occurs during processing of the film such as during etching, ashing, and planarization. The processing of the low k film causes water to store in the pores of the film and further causes hydrophilic compounds to form in the low k film structure. Repair processes incorporating ultraviolet (UV) radiation and silylation compounds remove the water from the pores and further remove the hydrophilic compounds from the low k film structure.

Abstract: The present invention provides systems, methods and apparatus for manufacturing a memory cell. The invention includes forming a feature having sidewalls in a first dielectric material; forming a first conductive material on the sidewalls of the feature; depositing a layer of a second dielectric material on the conductive material; and exposing the second dielectric material to oxidizing species and ultraviolet light to oxidize the second dielectric material. Numerous additional aspects are disclosed.