Abstract: Methods and systems for performing sample lift-out and protective cap placement for highly reactive materials within charged particle microscopy systems are disclosed herein. Methods include preparing a nesting void in a support structure, translating at least a portion of a sample into the nesting void, and milling material from a region of the support structure that defines the nesting void. The material from the region of the support structure is milled such that at least some of the removed material redeposits to form an attachment bond between the sample and a remaining portion of the support structure. In various embodiments, the sample can then be investigated using one or more of serial sectioning tomography on the sample, enhanced insertable backscatter detector (CBS) analysis on the sample, and electron backscatter diffraction (EBSD) analysis on the sample.

Abstract: A method of using a scanning microscope to rapidly form a digital image of an area. The method includes performing an initial set of scans to form a guide pixel set for the area and using the guide pixel set to identify regions representing structures of interest in the area. Then, performing additional scans of the regions representing structures of interest, to gather further data to further evaluate pixels in the regions, and not scanning elsewhere in the area.

Abstract: A method of using a scanning microscope to rapidly form a digital image of an area. The method includes performing an initial set of scans to form a guide pixel set for the area and using the guide pixel set to identify regions representing structures of interest in the area. Then, performing additional scans of the regions representing structures of interest, to gather further data to further evaluate pixels in the regions, and not scanning elsewhere in the area.