Patents by Inventor Bruce M. Green
Bruce M. Green has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Patent number: 10825924Abstract: A semiconductor device includes a semiconductor substrate configured to include a channel, a gate supported by the semiconductor substrate to control current flow through the channel, a first dielectric layer supported by the semiconductor substrate and including an opening in which the gate is disposed, and a second dielectric layer disposed between the first dielectric layer and a surface of the semiconductor substrate in a first area over the channel. The gate may be configured to include a lateral overhang that is separated from an upper surface of the first dielectric layer.Type: GrantFiled: July 17, 2017Date of Patent: November 3, 2020Assignee: NXP USA, Inc.Inventors: Bruce M. Green, Darrell G. Hill, Karen E. Moore
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Patent number: 10541324Abstract: An embodiment of a semiconductor device includes a semiconductor substrate that includes a host substrate, a buffer layer that includes at least one additional layer formed over the substrate, a channel layer formed over the buffer layer, a barrier layer formed over the channel layer forming a channel, a gate electrode disposed over the substrate electrically coupled to the channel, and an ohmic contact recessed into the barrier layer. A method for fabricating the semiconductor device includes forming a semiconductor substrate that includes a mixed crystal layer, creating an isolation region that defines an active region along an upper surface of the semiconductor substrate, forming a gate electrode over the semiconductor substrate in the active region, and recessing an ohmic contact into the semiconductor substrate.Type: GrantFiled: June 19, 2017Date of Patent: January 21, 2020Assignee: NXP USA, Inc.Inventors: Bruce M. Green, Darrell G. Hill, Karen E. Moore
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Patent number: 10522670Abstract: A semiconductor device includes a semiconductor substrate configured to include a channel, a gate supported by the semiconductor substrate to control current flow through the channel, a first dielectric layer supported by the semiconductor substrate and including an opening in which the gate is disposed, and a second dielectric layer disposed between the first dielectric layer and a surface of the semiconductor substrate in a first area over the channel. The second dielectric layer is patterned such that the first dielectric layer is disposed on the surface of the semiconductor substrate in a second area over the channel.Type: GrantFiled: May 4, 2017Date of Patent: December 31, 2019Assignee: NXP USA, Inc.Inventors: Bruce M. Green, Darrell G. Hill, Karen E. Moore
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Patent number: 10249615Abstract: A semiconductor device includes a substrate comprising a heterostructure configured to support formation of a channel during operation, first and second dielectric layers supported by the substrate, the second dielectric layer being disposed between the first dielectric layer and the substrate, a gate supported by the substrate, disposed in a first opening in the first dielectric layer, and to which a bias voltage is applied during operation to control current flow through the channel, the second dielectric layer being disposed between the gate and the substrate, and an electrode supported by the substrate, disposed in a second opening in the first and second dielectric layers, and configured to establish a Schottky junction with the substrate.Type: GrantFiled: January 12, 2015Date of Patent: April 2, 2019Assignee: NXP USA, INC.Inventors: Bruce M. Green, James A. Teplik
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Patent number: 10074588Abstract: An embodiment of a semiconductor device includes a semiconductor substrate that includes a host substrate and an upper surface, an active area, a substrate opening in the semiconductor substrate that is partially defined by a recessed surface, and a thermally conductive layer disposed over the semiconductor substrate that extends between the recessed surface and a portion of the semiconductor substrate within the active area. A method for fabricating the semiconductor device includes defining an active area, forming a gate electrode over a channel in the active area, forming a source electrode and a drain electrode in the active area on opposite sides of the gate electrode, etching a substrate opening in the semiconductor substrate that is partially defined by the recessed surface, and depositing a thermally conductive layer over the semiconductor substrate that extends between the recessed surface and a portion of the semiconductor substrate over the channel.Type: GrantFiled: April 3, 2017Date of Patent: September 11, 2018Assignee: NXP USA, INC.Inventors: Lakshminarayan Viswanathan, Bruce M. Green, Darrell G. Hill, L. M. Mahalingam
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Patent number: 10033374Abstract: An embodiment of a device includes a terminal, an active transistor die electrically coupled to the terminal, a detector configured to sense a signal characteristic on the terminal, and control circuitry electrically coupled to the active transistor die and to the detector, wherein the active transistor die, detector, and control circuitry are coupled to a package. The control circuitry may include a control element and a control device. Based on the signal characteristic, the control circuitry controls which of multiple operating states the device operates. A method for controlling the operating state of the device includes sensing, using the detector, a signal characteristic at the terminal, and determining, using the control device, whether the signal characteristic conforms to a pre-set criteria, and when the signal characteristic does not conform to the pre-set criteria, modifying the state of the control element to alter the operating state of the device.Type: GrantFiled: May 22, 2017Date of Patent: July 24, 2018Assignee: NXP USA, INC.Inventors: Bruce M. Green, Enver Krvavac, Joseph Staudinger
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Patent number: 9871107Abstract: An embodiment of a device includes a semiconductor substrate, a transistor formed at the first substrate surface, a first conductive feature formed over the first substrate surface and electrically coupled to the transistor, and a second conductive feature covering only a portion of the second substrate surface to define a first conductor-less region. A cavity vertically aligned with the first conductive feature within the first conductor-less region extends into the semiconductor substrate. A dielectric medium may be disposed within the cavity and have a dielectric constant less than a dielectric constant of the semiconductor substrate. A method for forming the device may include forming a semiconductor substrate, forming a transistor on the semiconductor substrate, forming the first conductive feature, forming the second conductive feature, forming the conductor-less region, forming the cavity, and filling the cavity with the dielectric medium.Type: GrantFiled: May 22, 2015Date of Patent: January 16, 2018Assignee: NXP USA, INC.Inventors: Bruce M. Green, Jenn Hwa Huang, Vikas S. Shilimkar
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Publication number: 20170317202Abstract: A semiconductor device includes a semiconductor substrate configured to include a channel, a gate supported by the semiconductor substrate to control current flow through the channel, a first dielectric layer supported by the semiconductor substrate and including an opening in which the gate is disposed, and a second dielectric layer disposed between the first dielectric layer and a surface of the semiconductor substrate in a first area over the channel. The gate may be configured to include a lateral overhang that is separated from an upper surface of the first dielectric layer.Type: ApplicationFiled: July 17, 2017Publication date: November 2, 2017Inventors: Bruce M. Green, Darrell G. Hill, Karen E. Moore
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Patent number: 9799760Abstract: A semiconductor device includes a semiconductor substrate configured to include a channel, first and second ohmic contacts supported by the semiconductor substrate, in ohmic contact with the semiconductor substrate, and spaced from one another for current flow between the first and second ohmic contacts through the channel, and first and second dielectric layers supported by the semiconductor substrate. At least one of the first and second ohmic contacts extends through respective openings in the first and second dielectric layers. The second dielectric layer is disposed between the first dielectric layer and a surface of the semiconductor substrate, and the second dielectric layer includes a wet etchable material having an etch selectivity to a dry etchant of the first dielectric layer.Type: GrantFiled: August 17, 2015Date of Patent: October 24, 2017Assignee: NXP USA, INC.Inventors: Bruce M. Green, Darrell G. Hill, Jenn Hwa Huang, Karen E. Moore
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Publication number: 20170294531Abstract: An embodiment of a semiconductor device includes a semiconductor substrate that includes an upper surface and a channel, a gate electrode disposed over the substrate electrically coupled to the channel, and a Schottky metal layer disposed over the substrate adjacent the gate electrode. The Schottky metal layer includes a Schottky contact electrically coupled to the channel which provides a Schottky junction and at least one alignment mark disposed over the semiconductor substrate. A method for fabricating the semiconductor device includes creating an isolation region that defines an active region along an upper surface of a semiconductor substrate, forming a gate electrode over the semiconductor substrate in the active region, and forming a Schottky metal layer over the semiconductor substrate. Forming the Schottky metal layer includes forming at least one Schottky contact electrically coupled to the channel and providing a Schottky junction, and forming an alignment mark in the isolation region.Type: ApplicationFiled: June 19, 2017Publication date: October 12, 2017Inventors: Bruce M. Green, Darrell G. Hill, Karen E. Moore
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Publication number: 20170257091Abstract: An embodiment of a device includes a terminal, an active transistor die electrically coupled to the terminal, a detector configured to sense a signal characteristic on the terminal, and control circuitry electrically coupled to the active transistor die and to the detector, wherein the active transistor die, detector, and control circuitry are coupled to a package. The control circuitry may include a control element and a control device. Based on the signal characteristic, the control circuitry controls which of multiple operating states the device operates. A method for controlling the operating state of the device includes sensing, using the detector, a signal characteristic at the terminal, and determining, using the control device, whether the signal characteristic conforms to a pre-set criteria, and when the signal characteristic does not conform to the pre-set criteria, modifying the state of the control element to alter the operating state of the device.Type: ApplicationFiled: May 22, 2017Publication date: September 7, 2017Inventors: Bruce M. Green, Enver Krvavac, Joseph Staudinger
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Publication number: 20170236929Abstract: A semiconductor device includes a semiconductor substrate configured to include a channel, a gate supported by the semiconductor substrate to control current flow through the channel, a first dielectric layer supported by the semiconductor substrate and including an opening in which the gate is disposed, and a second dielectric layer disposed between the first dielectric layer and a surface of the semiconductor substrate in a first area over the channel. The second dielectric layer is patterned such that the first dielectric layer is disposed on the surface of the semiconductor substrate in a second area over the channel.Type: ApplicationFiled: May 4, 2017Publication date: August 17, 2017Inventors: Bruce M. Green, Darrell G. Hill, Karen E. Moore
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Publication number: 20170207142Abstract: An embodiment of a semiconductor device includes a semiconductor substrate that includes a host substrate and an upper surface, an active area, a substrate opening in the semiconductor substrate that is partially defined by a recessed surface, and a thermally conductive layer disposed over the semiconductor substrate that extends between the recessed surface and a portion of the semiconductor substrate within the active area. A method for fabricating the semiconductor device includes defining an active area, forming a gate electrode over a channel in the active area, forming a source electrode and a drain electrode in the active area on opposite sides of the gate electrode, etching a substrate opening in the semiconductor substrate that is partially defined by the recessed surface, and depositing a thermally conductive layer over the semiconductor substrate that extends between the recessed surface and a portion of the semiconductor substrate over the channel.Type: ApplicationFiled: April 3, 2017Publication date: July 20, 2017Inventors: Lakshminarayan Viswanathan, Bruce M. Green, Darrell G. Hill, L. M. Mahalingam
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Patent number: 9685345Abstract: An embodiment of a semiconductor device includes a semiconductor substrate that includes an upper surface and a channel, a gate electrode disposed over the substrate electrically coupled to the channel, and a Schottky metal layer disposed over the substrate adjacent the gate electrode. The Schottky metal layer includes a Schottky contact electrically coupled to the channel which provides a Schottky junction and at least one alignment mark disposed over the semiconductor substrate. A method for fabricating the semiconductor device includes creating an isolation region that defines an active region along an upper surface of a semiconductor substrate, forming a gate electrode over the semiconductor substrate in the active region, and forming a Schottky metal layer over the semiconductor substrate. Forming the Schottky metal layer includes forming at least one Schottky contact electrically coupled to the channel and providing a Schottky junction, and forming an alignment mark in the isolation region.Type: GrantFiled: November 19, 2013Date of Patent: June 20, 2017Assignee: NXP USA, INC.Inventors: Bruce M. Green, Darrell G. Hill, Karen E. Moore
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Patent number: 9660641Abstract: An embodiment of a device includes a terminal, an active transistor die electrically coupled to the terminal, a detector configured to sense a signal characteristic on the terminal, and control circuitry electrically coupled to the active transistor die and to the detector, wherein the active transistor die, detector, and control circuitry are coupled to a package. The control circuitry may include a control element and a control device. Based on the signal characteristic, the control circuitry controls which of multiple operating states the device operates. A method for controlling the operating state of the device includes sensing, using the detector, a signal characteristic at the terminal, and determining, using the control device, whether the signal characteristic conforms to a pre-set criteria, and when the signal characteristic does not conform to the pre-set criteria, modifying the state of the control element to alter the operating state of the device.Type: GrantFiled: August 5, 2016Date of Patent: May 23, 2017Assignee: NXP USA, INC.Inventors: Bruce M. Green, Enver Krvavac, Joseph Staudinger
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Patent number: 9614046Abstract: An embodiment of a semiconductor device includes a semiconductor substrate that includes a host substrate and an upper surface, an active area, a substrate opening in the semiconductor substrate that is partially defined by a recessed surface, and a thermally conductive layer disposed over the semiconductor substrate that extends between the recessed surface and a portion of the semiconductor substrate within the active area. A method for fabricating the semiconductor device includes defining an active area, forming a gate electrode over a channel in the active area, forming a source electrode and a drain electrode in the active area on opposite sides of the gate electrode, etching a substrate opening in the semiconductor substrate that is partially defined by the recessed surface, and depositing a thermally conductive layer over the semiconductor substrate that extends between the recessed surface and a portion of the semiconductor substrate over the channel.Type: GrantFiled: June 3, 2016Date of Patent: April 4, 2017Assignee: NXP USA, INC.Inventors: Lakshminarayan Viswanathan, Bruce M. Green, Darrell G. Hill, L. M. Mahalingam
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Publication number: 20160380626Abstract: An embodiment of a device includes a terminal, an active transistor die electrically coupled to the terminal, a detector configured to sense a signal characteristic on the terminal, and control circuitry electrically coupled to the active transistor die and to the detector, wherein the active transistor die, detector, and control circuitry are coupled to a package. The control circuitry may include a control element and a control device. Based on the signal characteristic, the control circuitry controls which of multiple operating states the device operates. A method for controlling the operating state of the device includes sensing, using the detector, a signal characteristic at the terminal, and determining, using the control device, whether the signal characteristic conforms to a pre-set criteria, and when the signal characteristic does not conform to the pre-set criteria, modifying the state of the control element to alter the operating state of the device.Type: ApplicationFiled: August 5, 2016Publication date: December 29, 2016Inventors: BRUCE M. GREEN, ENVER KRVAVAC, JOSEPH STAUDINGER
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Publication number: 20160343809Abstract: An embodiment of a device includes a semiconductor substrate, a transistor formed at the first substrate surface, a first conductive feature formed over the first substrate surface and electrically coupled to the transistor, and a second conductive feature covering only a portion of the second substrate surface to define a first conductor-less region. A cavity vertically aligned with the first conductive feature within the first conductor-less region extends into the semiconductor substrate. A dielectric medium may be disposed within the cavity and have a dielectric constant less than a dielectric constant of the semiconductor substrate. A method for forming the device may include forming a semiconductor substrate, forming a transistor on the semiconductor substrate, forming the first conductive feature, forming the second conductive feature, forming the conductor-less region, forming the cavity, and filling the cavity with the dielectric medium.Type: ApplicationFiled: May 22, 2015Publication date: November 24, 2016Inventors: BRUCE M. GREEN, JENN HWA HUANG, VIKAS S. SHILIMKAR
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Publication number: 20160308010Abstract: An embodiment of a semiconductor device includes a semiconductor substrate that includes a host substrate and an upper surface, an active area, a substrate opening in the semiconductor substrate that is partially defined by a recessed surface, and a thermally conductive layer disposed over the semiconductor substrate that extends between the recessed surface and a portion of the semiconductor substrate within the active area. A method for fabricating the semiconductor device includes defining an active area, forming a gate electrode over a channel in the active area, forming a source electrode and a drain electrode in the active area on opposite sides of the gate electrode, etching a substrate opening in the semiconductor substrate that is partially defined by the recessed surface, and depositing a thermally conductive layer over the semiconductor substrate that extends between the recessed surface and a portion of the semiconductor substrate over the channel.Type: ApplicationFiled: June 3, 2016Publication date: October 20, 2016Inventors: Lakshminarayan Viswanathan, Bruce M. Green, Darrell G. Hill, L. M. Mahalingam
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Patent number: 9438224Abstract: An embodiment of a device includes a terminal, an active transistor die electrically coupled to the terminal, a detector configured to sense a signal characteristic on the terminal, and control circuitry electrically coupled to the active transistor die and to the detector, wherein the active transistor die, detector, and control circuitry are coupled to a package. The control circuitry may include a control element and a control device. Based on the signal characteristic, the control circuitry controls which of multiple operating states the device operates. A method for controlling the operating state of the device includes sensing, using the detector, a signal characteristic at the terminal, and determining, using the control device, whether the signal characteristic conforms to a pre-set criteria, and when the signal characteristic does not conform to the pre-set criteria, modifying the state of the control element to alter the operating state of the device.Type: GrantFiled: June 25, 2014Date of Patent: September 6, 2016Assignee: FREESCALE SEMICONDUCTOR, INC.Inventors: Bruce M. Green, Enver Krvavac, Joseph Staudinger