Abstract: A micromechanical rate-of-rotation sensor set-up, including a first rate-of-rotation sensor device capable of being driven rotationally by a driving device via a drive frame device, so as to oscillate about a first axis, and is for measuring a first outer rate of rotation about a second axis and a second outer rate of rotation about a third axis; and a second rate-of-rotation sensor device capable of being driven by the driving device via the drive frame device, so as to oscillate linearly along the second axis, and is for measuring a third outer rate of rotation about the first axis. The first rate-of-rotation sensor device is connected to the second rate-of-rotation sensor device by the drive frame device. The drive frame device includes a first and second drive frame, which may be driven by the driving device in phase opposition, along the third axis, in an oscillatory manner.

Abstract: A micromechanical rate-of-rotation sensor set-up, including a first rate-of-rotation sensor device capable of being driven rotationally by a driving device via a drive frame device, so as to oscillate about a first axis, and is for measuring a first outer rate of rotation about a second axis and a second outer rate of rotation about a third axis; and a second rate-of-rotation sensor device capable of being driven by the driving device via the drive frame device, so as to oscillate linearly along the second axis, and is for measuring a third outer rate of rotation about the first axis. The first rate-of-rotation sensor device is connected to the second rate-of-rotation sensor device by the drive frame device. The drive frame device includes a first and second drive frame, which may be driven by the driving device in phase opposition, along the third axis, in an oscillatory manner.

Abstract: A rotation-rate sensor having a substrate, the substrate having a main-extension-plane, and the rotation-rate sensor includes at least one first and one second mass-element which are oscillate-able, and a first main-extension-direction of the substrate points from the first mass-element to the second mass-element, and a coupling-structure is situated in the first main-extension-direction between the first and second mass-element, in which a first coupling-region of the coupling-structure is situated in a first function-layer, and a first mass-region of the first mass-element is situated in the first function-layer and a second mass-region of the first mass-element is situated in a second function-layer, the first function-layer being situated in an extension-direction perpendicular to the main-extension-plane between the substrate and the second function-layer, a second main-extension-direction being situated perpendicular to the first main-extension-direction, and the first coupling-region having a greater e

Abstract: A yaw-rate sensor with a substrate having a main extension plane. The yaw-rate sensor includes a rotation-element assembly, the rotation-element assembly being designed for detecting yaw rates prevailing in a first main extension axis of the substrate and yaw rates prevailing in a second main extension axis of the substrate perpendicular to the first main extension axis. The yaw-rate sensor has a sensor assembly, the sensor assembly being designed for detecting a yaw rate prevailing perpendicular to the main extension plane of the substrate, both the sensor assembly and the rotation-element assembly being drivable with the aid of a drive assembly, the drive assembly being designed for driving movement along the first main extension axis.

Abstract: A micromechanical rotation rate sensor system and a corresponding manufacturing method are described. The micromechanical rotation rate sensor system includes a first rotation rate sensor unit drivable rotatorily about a first axis in an oscillating manner for detecting a first outside rotation rate about a second axis and a second outside rotation rate about a third axis, the first, second and third axes being situated perpendicularly to one another, and a second rotation rate sensor unit linearly drivable by a drive unit along the second axis in an oscillating manner for detecting a third outside rotation rate about the first axis. The second rotation rate sensor unit is connected to the first rotation rate sensor unit via a first coupling unit for driving the first rotation rate sensor unit by the drive unit.

Abstract: A sensor includes a substrate having a first electrode arrangement; a first mass oscillator having (a) a first mass, (b) a first mass centroid, and (c) a second electrode arrangement including a first area centroid coinciding with the first mass centroid; and a second mass oscillator having (a) a second mass equal to the first mass, (b) a second mass centroid coinciding with the first mass centroid, and (c) a third electrode arrangement including a second area centroid coinciding with the first area centroid. Areas of the second and third electrode arrangements are equal. The sensor detects respective rotation rates around axes parallel to and perpendicular to a substrate extension. The oscillators are oscillatorily connected to each other and to the substrate, are deflectable, and experience respective forces in the directions of extension of the axes upon respective rotations around the other of the axes.

Abstract: A yaw-rate sensor with a substrate having a main extension plane. The yaw-rate sensor includes a rotation-element assembly, the rotation-element assembly being designed for detecting yaw rates prevailing in a first main extension axis of the substrate and yaw rates prevailing in a second main extension axis of the substrate perpendicular to the first main extension axis. The yaw-rate sensor has a sensor assembly, the sensor assembly being designed for detecting a yaw rate prevailing perpendicular to the main extension plane of the substrate, both the sensor assembly and the rotation-element assembly being drivable with the aid of a drive assembly, the drive assembly being designed for driving movement along the first main extension axis.

Abstract: A micromechanical rotational rate sensor system includes a first rotational rate sensor device that can be driven rotationally about a first axis in oscillating fashion for acquiring a first external rate of rotation about a second axis and a second external rate of rotation about a third axis, the first, second, and third axes being perpendicular to one another; and a second rotational rate sensor device, capable of being driven in linearly oscillating fashion along the second axis, for acquiring a third external rate of rotation about the first axis. The first rotational rate sensor device is connected to the second rotational rate sensor device via a drive frame device. The drive frame device has a first drive frame and a second drive frame that are capable of being driven in oscillating fashion by the drive device with opposite phase along the third axis.

Abstract: A rotation-rate sensor having a substrate, the substrate having a main-extension-plane, and the rotation-rate sensor includes at least one first and one second mass-element which are oscillate-able, and a first main-extension-direction of the substrate points from the first mass-element to the second mass-element, and a coupling-structure is situated in the first main-extension-direction between the first and second mass-element, in which a first coupling-region of the coupling-structure is situated in a first function-layer, and a first mass-region of the first mass-element is situated in the first function-layer and a second mass-region of the first mass-element is situated in a second function-layer, the first function-layer being situated in an extension-direction perpendicular to the main-extension-plane between the substrate and the second function-layer, a second main-extension-direction being situated perpendicular to the first main-extension-direction, and the first coupling-region having a greater e

Abstract: A sensor includes a substrate having a first electrode arrangement; a first mass oscillator having (a) a first mass, (b) a first mass centroid, and (c) a second electrode arrangement including a first area centroid coinciding with the first mass centroid; and a second mass oscillator having (a) a second mass equal to the first mass, (b) a second mass centroid coinciding with the first mass centroid, and (c) a third electrode arrangement including a second area centroid coinciding with the first area centroid. Areas of the second and third electrode arrangements are equal. The sensor detects respective rotation rates around axes parallel to and perpendicular to a substrate extension. The oscillators are oscillatorily connected to each other and to the substrate, are deflectable, and experience respective forces in the directions of extension of the axes upon respective rotations around the other of the axes.

Abstract: A micromechanical rotation rate sensor system and a corresponding manufacturing method are described. The micromechanical rotation rate sensor system includes a first rotation rate sensor unit drivable rotatorily about a first axis in an oscillating manner for detecting a first outside rotation rate about a second axis and a second outside rotation rate about a third axis, the first, second and third axes being situated perpendicularly to one another, and a second rotation rate sensor unit linearly drivable by a drive unit along the second axis in an oscillating manner for detecting a third outside rotation rate about the first axis. The second rotation rate sensor unit is connected to the first rotation rate sensor unit via a first coupling unit for driving the first rotation rate sensor unit by the drive unit.

Abstract: A rotation rate sensor including a substrate having a principal plane of extension, and a structure movable with respect to the substrate; the structure being excitable from a neutral position into an oscillation having a movement component substantially parallel to a driving direction, which is substantially parallel to the principal plane of extension. To induce the oscillation, the rotation rate sensor includes a comb electrode moved along with the structure and a comb electrode fixed in position relative to the substrate. The excitation is produced by applying a voltage to the moving comb electrode and/or to the stationary comb electrode. Due to a rotation rate of the rotation rate sensor about an axis running substantially perpendicularly to the driving direction and substantially perpendicularly to the detection direction, a force applied to the structure with a force component along a detection direction substantially perpendicular to the driving direction is detectable.

Abstract: A rotation rate sensor having a first structure movable with respect to the substrate, a second structure movable with respect to the substrate and with respect to the first structure, a first drive structure for deflecting the first structure with a motion component parallel to a first axis, and a second drive structure for deflecting the second structure with a motion component parallel to the first axis. The first and second structures are excitable to oscillate in counter-phase, with motion components parallel to the first axis, the first drive structure having a first spring mounted on the substrate to counteract a pivoting of the first structure around an axis parallel to a second axis extending perpendicularly to a principal extension plane, the second drive structure having a second spring mounted on the substrate to counteracts a pivoting of the second structure around a further axis parallel to the second axis.

Abstract: A rotation rate sensor includes first, second, third and fourth structures that are each movable relative to a substrate, a drive device configured to deflect each of the first, second, third, and fourth structures essentially parallel to a drive direction and out of respective resting positions of the first, second, third, and fourth structures, such that, at a first frequency, the first and fourth structures are excitable to an oscillation that is essentially in-phase relative to each other and essentially in phase-opposition relative to the second and third structures, and, at a second frequency, the first and second structures are excitable to an oscillation that is essentially in-phase relative to each other and essentially in phase-opposition relative to the third and fourth structures.

Abstract: A method for producing thin MEMS chips on SOI substrate including: providing an SOI substrate having a silicon layer on a front side and having an oxide intermediate layer, producing a layer structure on the front side of the SOI substrate and producing a MEMS structure from this layer structure, capping the MEMS structure and producing a cavity, and etching a back side of the SOI substrate down to the oxide intermediate layer. Also described is a micromechanical component having a substrate, a MEMS layer structure having a MEMS structure in a cavity and a cap element, the MEMS structure and its cavity being enclosed by the substrate underneath and the cap element above, the substrate being made of polycrystalline silicon.

Abstract: A rotation rate sensor including a substrate having a main plane of extension, a first rotation rate sensor structure for detecting a first rotation rate about an axis that is in parallel to a first axis extending in parallel to the main plane of extension, and a second rotation rate sensor structure for detecting a second rotation rate about an axis that is parallel to a second axis extending perpendicularly with respect to the main plane of extension. Also included is drive device for deflecting a first structure of the first rotation rate sensor structure, and a second structure of the first rotation rate sensor structure, and also for deflecting a third structure of the second rotation rate sensor structure, and a fourth structure of the second rotation rate sensor structure, in such a way that the first, second, third, and fourth structures are excitable into a mechanically coupled oscillation.

Abstract: A rotation rate sensor having a substrate having a principal extension plane and having a structure movable with respect to the substrate. The rotation rate sensor encompasses a first excitation unit for deflecting the structure out of an idle position substantially parallel to a first axis extending parallel to the principal extension plane, in such a way that the structure is excitable to oscillate at a first frequency with a motion component substantially in a direction parallel to the first axis, the rotation rate sensor encompassing a second excitation unit for deflecting the structure out of an idle position substantially parallel to a second axis extending parallel to the principal extension plane and extending perpendicularly to the first axis, in such a way that the structure is excitable to oscillate at a second frequency with a motion component substantially in a direction parallel to the second axis.

Abstract: A micromechanical rotational rate sensor system includes a first rotational rate sensor device that can be driven rotationally about a first axis in oscillating fashion for acquiring a first external rate of rotation about a second axis and a second external rate of rotation about a third axis, the first, second, and third axes being perpendicular to one another; and a second rotational rate sensor device, capable of being driven in linearly oscillating fashion along the second axis, for acquiring a third external rate of rotation about the first axis. The first rotational rate sensor device is connected to the second rotational rate sensor device via a drive frame device. The drive frame device has a first drive frame and a second drive frame that are capable of being driven in oscillating fashion by the drive device with opposite phase along the third axis.

Abstract: A method for producing thin MEMS chips on SOI substrate including: providing an SOI substrate having a silicon layer on a front side and having an oxide intermediate layer, producing a layer structure on the front side of the SOI substrate and producing a MEMS structure from this layer structure, capping the MEMS structure and producing a cavity, and etching a back side of the SOI substrate down to the oxide intermediate layer. Also described is a micromechanical component having a substrate, a MEMS layer structure having a MEMS structure in a cavity and a cap element, the MEMS structure and its cavity being enclosed by the substrate underneath and the cap element above, the substrate being made of polycrystalline silicon.

Abstract: A rotation rate sensor including a substrate having a main plane of extension, a first rotation rate sensor structure for detecting a first rotation rate about an axis that is in parallel to a first axis extending in parallel to the main plane of extension, and a second rotation rate sensor structure for detecting a second rotation rate about an axis that is parallel to a second axis extending perpendicularly with respect to the main plane of extension. Also included is drive device for deflecting a first structure of the first rotation rate sensor structure, and a second structure of the first rotation rate sensor structure, and also for deflecting a third structure of the second rotation rate sensor structure, and a fourth structure of the second rotation rate sensor structure, in such a way that the first, second, third, and fourth structures are excitable into a mechanically coupled oscillation.