Patents by Inventor Byung-Hwan Kong

Byung-Hwan Kong has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • SUBSTRATE PROCESSING APPARATUS
    Publication number: 20200373175
    Abstract: A substrate processing apparatus includes a process chamber, a support part, disposed in the process chamber, having a substrate loading region in which a substrate is seated, a heating part disposed in a location opposing the substrate loading region to heat the substrate loading region, and a reflective member, disposed in a location opposing the substrate loading region in the process chamber, in which a sealed hollow portion is disposed.
    Type: Application
    Filed: November 25, 2019
    Publication date: November 26, 2020
    Applicant: Samsung Electronics Co., Ltd.
    Inventors: Byeong Hoon KIM, Byung Hwan Kong, Seung Yong Bae, Jae Hyun An
  • Heating apparatus and substrate processing apparatus having the same
    Patent number: 10508333
    Abstract: A heating apparatus including a side wall heat insulator configured to provide an inner space for receiving a reaction tube, an upper wall heat insulator covering a top portion of the side wall heat insulator, a heat generation part in an inner surface of the side wall heat insulator, and a heat compensating part on a lower surface of the upper wall heat insulator, the heat compensating part including a reflection surface in a first region on the lower surface of the upper wall heat insulator, the first region having a first emissivity less than an emissivity of the upper wall heat insulator may be provided.
    Type: Grant
    Filed: January 27, 2017
    Date of Patent: December 17, 2019
    Assignees: Samsung Electronics Co., Ltd., Sungkyunkwan University's Research & Business Foundation
    Inventors: Byeong-Hoon Kim, Byung-Hwan Kong, Sung-Han Lee, Sun Cho, Seung-Hwan Kang, Seung-Ho Lee, Han-Seo Ko
  • HEATING APPARATUS AND SUBSTRATE PROCESSING APPARATUS HAVING THE SAME
    Publication number: 20170218507
    Abstract: A heating apparatus including a side wall heat insulator configured to provide an inner space for receiving a reaction tube, an upper wall heat insulator covering a top portion of the side wall heat insulator, a heat generation part in an inner surface of the side wall heat insulator, and a heat compensating part on a lower surface of the upper wall heat insulator, the heat compensating part including a reflection surface in a first region on the lower surface of the upper wall heat insulator, the first region having a first emissivity less than an emissivity of the upper wall heat insulator may be provided.
    Type: Application
    Filed: January 27, 2017
    Publication date: August 3, 2017
    Applicants: Samsung Electronics Co., Ltd., SungKyunKwan University's Research & Business Foundation
    Inventors: BYEONG-HOON KIM, Byung-Hwan Kong, Sung-Han Lee, Sun Cho, Seung-Hwan Kang, Seung-Ho Lee, Han-Seo Ko