Patents by Inventor Byung Jin Choi

Byung Jin Choi has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20210358746
    Abstract: An apparatus is provided. The apparatus has a chuck having a first side configured to retain a superstrate or a template and a second side, an array of image sensors disposed at the second side of the chuck and spaced from the chuck, and an array of light sources disposed between the transparent chuck and the array of image sensors.
    Type: Application
    Filed: July 28, 2021
    Publication date: November 18, 2021
    Inventor: Byung-Jin Choi
  • Patent number: 11175786
    Abstract: A touch sensor according to an embodiment of the present invention includes a base layer including a first region and a second region, a touch sensing electrode layer disposed on the first region of the base layer, the touch sensing electrode layer including a plurality of touch sensing unit electrodes having openings formed therein, and a fingerprint sensing electrode layer including a plurality of fingerprint sensing unit electrodes disposed on the second region of the base layer. A space having the same shape as that of the openings is formed between neighboring fingerprint sensing unit electrodes of the plurality of fingerprint sensing unit electrodes.
    Type: Grant
    Filed: February 18, 2021
    Date of Patent: November 16, 2021
    Assignee: DONGWOOD FINE-CHEM CO., LTD
    Inventors: Byung Jin Choi, Dong Pil Park, Ju In Yoon, Jae Hyun Lee
  • Patent number: 11161280
    Abstract: Systems and methods for improving robust layer separation during the separation process of an imprint lithography process are described. Included are methods of matching strains between a substrate to be imprinted and the template, varying or modifying the forces applied to the template and/or the substrate during separation, or varying or modifying the kinetics of the separation process.
    Type: Grant
    Filed: January 31, 2019
    Date of Patent: November 2, 2021
    Assignee: Molecular Imprints, Inc.
    Inventors: Niyaz Khusnatdinov, Frank Y. Xu, Mario Johannes Meissl, Michael N. Miller, Ecron D. Thompson, Gerard M. Schmid, Pawan Kumar Nimmakayala, Xiaoming Lu, Byung-Jin Choi
  • Patent number: 11143957
    Abstract: An apparatus is described for separation of a nanoimprint template from a solidified patterned layer on a substrate that minimize separation defects, including last point of separation (LPOS) defects. The apparatus is configured to move the template and substrate relative to one another and determining an amount of pressure to apply to the backsides of the template and the substrate.
    Type: Grant
    Filed: March 26, 2020
    Date of Patent: October 12, 2021
    Assignee: Canon Kabushiki Kaisha
    Inventor: Byung-Jin Choi
  • Patent number: 11145535
    Abstract: A chuck is provided. The chuck comprises a plurality of lands protruding from a surface of the chuck, the lands defining a series of zones; and a trenched recessed from the surface of the chuck in at least one of the zones.
    Type: Grant
    Filed: August 15, 2019
    Date of Patent: October 12, 2021
    Assignee: CANON KABUSHIKI KAISHA
    Inventors: Byung-Jin Choi, Seth J. Bamesberger, Se-Hyuk Im
  • Patent number: 11139555
    Abstract: A film antenna according to an embodiment of the present invention includes a dielectric layer, an antenna pattern including a mesh structure on a top surface of the dielectric layer, and a dummy pattern on a top surface of the dielectric layer. The dummy pattern includes the same mesh structure as that of the antenna pattern. Optical properties are improved by the same mesh structure of the antenna pattern and the dummy pattern.
    Type: Grant
    Filed: May 4, 2020
    Date of Patent: October 5, 2021
    Assignees: DONGWOO FINE-CHEM CO., LTD, KREEMO INC.
    Inventors: Byung Jin Choi, Jong Min Kim, Yoon Ho Huh, Won Bin Hong
  • Patent number: 11107678
    Abstract: An apparatus is provided. The apparatus has a chuck having a first side configured to retain a superstrate or a template and a second side, an array of image sensors disposed at the second side of the chuck and spaced from the chuck, and an array of light sources disposed between the transparent chuck and the array of image sensors.
    Type: Grant
    Filed: November 26, 2019
    Date of Patent: August 31, 2021
    Assignee: CANON KABUSHIKI KAISHA
    Inventor: Byung-Jin Choi
  • Patent number: 11104057
    Abstract: In an embodiment, an imprint apparatus can include a substrate holder having a chucking region and a recessed support section; and a template holder, wherein the chucking region has more area as compared to a template region. In another embodiment, an imprint apparatus can include gas zones; and a gas controller that can be configured to adjust pressures within the gas zones to induce a convex curvature of a partial field of a workpiece used with the imprint apparatus. A method can include providing a workpiece within an imprint apparatus, wherein the workpiece includes a substrate and a formable material; and initially contacting a template with the formable material at a location spaced apart from the periphery of a partial field. In a particular embodiment, the method can further include modulating the substrate to form a convex shape contacting the template with the formable material.
    Type: Grant
    Filed: January 29, 2016
    Date of Patent: August 31, 2021
    Assignee: CANON KABUSHIKI KAISHA
    Inventors: Mario Johannes Meissl, Wei Zhang, Byung-Jin Choi, Zhengmao Ye
  • Patent number: 11101461
    Abstract: A composite cathode active material, a method of preparing the composite cathode active material, a cathode including the composite cathode active material, and a lithium battery including the cathode. The composite cathode active material includes a lithium intercalatable material; and a garnet oxide, wherein an amount of the garnet oxide is about 1.9 wt % or less, based on a total weight of the composite cathode active material.
    Type: Grant
    Filed: January 24, 2020
    Date of Patent: August 24, 2021
    Assignee: SAMSUNG ELECTRONICS CO., LTD.
    Inventors: Jun-young Mun, Jae-myung Lee, Gue-sung Kim, Yoon-sok Kang, Myung-hoon Kim, Jun-ho Park, Jin-hwan Park, Jae-gu Yoon, Byung-jin Choi
  • Patent number: 11094756
    Abstract: A digitizer module is formed on a film substrate which is used as a substrate of an OLED module and stacked with the OLED module, thereby providing an OLED integrated digitizer applicable to a flexible display device.
    Type: Grant
    Filed: February 22, 2019
    Date of Patent: August 17, 2021
    Assignee: DONGWOO FINE-CHEM CO., LTD.
    Inventors: Byung Jin Choi, Minhyuk Park, Seonghwan Park
  • Publication number: 20210191257
    Abstract: A nanofabrication method comprises receiving information regarding a distortion within an imprint system, generating a first drop pattern of formable material based on the received information, dispensing a first plurality of drops onto a substrate according to the first drop pattern, contacting the dispensed first plurality of drops with a patternless superstrate to form a first layer of formable material, forming a first cured layer by curing the first layer of formable material while the superstrate is contacting the first layer of formable material, separating the superstrate from the first cured layer, depositing an etch resistant layer on the first cured layer, generating a second drop pattern of formable material, dispensing a second plurality of drops onto the etch resistant layer according to the second drop pattern, and contacting the dispensed second plurality of drops with a patterned template to form a second layer of formable material.
    Type: Application
    Filed: December 20, 2019
    Publication date: June 24, 2021
    Inventors: Byung-Jin Choi, Anshuman Cherala
  • Patent number: 11043407
    Abstract: A method, comprising retaining a superstrate with a superstrate chuck; applying a pressure to deflect the superstrate toward a substrate, deflection of the superstrate being gradually extended along a radial direction; maintaining a vacuum applied to a perimeter of the superstrate and continuously retaining the superstrate with the chuck while the deflecting the superstrate by the pressure; releasing the vacuum from the perimeter of the superstrate; and releasing the superstrate from the chuck.
    Type: Grant
    Filed: August 15, 2019
    Date of Patent: June 22, 2021
    Assignee: CANON KABUSHIKI KAISHA
    Inventors: Byung-Jin Choi, Seth J. Bamesberger, Masaki Saito, Ozkan Ozturk
  • Publication number: 20210181622
    Abstract: A method and system for controlling a position of a moveable stage having a substrate supported thereon is provided. First position information representing a position of the substrate relative to a mark on an object is obtained from a sensor. Alignment prediction information is generated based on the obtained first position wherein the generated alignment prediction information including at least one parameter value. First trajectory information is generated and includes the at least one parameter value based on the obtained first position information and the generated alignment prediction information. Second trajectory information is generated based on the generated alignment prediction information first trajectory information and second position information, wherein the second position information represents a position of the moveable stage.
    Type: Application
    Filed: December 12, 2019
    Publication date: June 17, 2021
    Inventors: Mingji Lou, Jeffrey D. Klein, Takahiro Yoshida, Steven T. Jenkins, Byung-Jin Choi
  • Patent number: 11034057
    Abstract: A method is provided, comprising creating at least one crack at a point on an edge of a stack of at least a substrate and a superstrate; propagating the crack along the periphery; and moving the superstrate relative to the substrate to complete separation of the superstrate from the substrate.
    Type: Grant
    Filed: August 15, 2019
    Date of Patent: June 15, 2021
    Assignee: CANON KABUSHIKI KAISHA
    Inventors: Ozkan Ozturk, Seth J. Bamesberger, Masaki Saito, Alireza Aghili, Steven C. Shackleton, Byung-Jin Choi
  • Publication number: 20210173528
    Abstract: A touch sensor according to an embodiment of the present invention includes a base layer including a first region and a second region, a touch sensing electrode layer disposed on the first region of the base layer, the touch sensing electrode layer including a plurality of touch sensing unit electrodes having openings formed therein, and a fingerprint sensing electrode layer including a plurality of fingerprint sensing unit electrodes disposed on the second region of the base layer. A space having the same shape as that of the openings is formed between neighboring fingerprint sensing unit electrodes of the plurality of fingerprint sensing unit electrodes.
    Type: Application
    Filed: February 18, 2021
    Publication date: June 10, 2021
    Inventors: Byung Jin CHOI, Dong Pil PARK, Ju In YOON, Jae Hyun LEE
  • Patent number: 11020894
    Abstract: Control of lateral strain and lateral strain ratio (dt/db) between template and substrate through the selection of template and/or substrate thicknesses (Tt and/or Tb), control of template and/or substrate back pressure (Pt and/or Pb), and/or selection of material stiffness are described.
    Type: Grant
    Filed: October 30, 2018
    Date of Patent: June 1, 2021
    Assignee: Molecular Imprints, Inc.
    Inventors: Se-Hyuk Im, Mahadevan GanapathiSubramanian, Edward Brian Fletcher, Niyaz Khusnatdinov, Gerard M. Schmid, Mario Johannes Meissl, Anshuman Cherala, Frank Y. Xu, Byung Jin Choi, Sidlgata V. Sreenivasan
  • Publication number: 20210159075
    Abstract: An apparatus is provided. The apparatus has a chuck having a first side configured to retain a superstrate or a template and a second side, an array of image sensors disposed at the second side of the chuck and spaced from the chuck, and an array of light sources disposed between the transparent chuck and the array of image sensors.
    Type: Application
    Filed: November 26, 2019
    Publication date: May 27, 2021
    Inventor: Byung-Jin Choi
  • Publication number: 20210157229
    Abstract: Systems and methods for shaping a film. The method of shaping a film may comprise dispensing a polymerizable fluid as a plurality of droplets onto a substrate. The method of shaping a film may further comprise bringing an initial superstrate contact region of a superstrate into contact with an initial subset of droplets of the plurality of droplets. The initial subset of droplets may merge and form an initial fluid film over the initial substrate contact region. The method of shaping a film may further comprise prior to the superstrate coming into contact with the remaining plurality of droplets on the substrate, polymerizing a region of the initial fluid film on the initial substrate contact region.
    Type: Application
    Filed: November 25, 2019
    Publication date: May 27, 2021
    Inventors: Anshuman Cherala, Mario Johannes Meissl, Byung-Jin Choi
  • Patent number: 11003268
    Abstract: A touch sensor includes a base layer, first sensing electrodes arranged on the base layer along a first direction, second sensing electrodes arranged on the base layer along a second direction, first compensation electrodes on the first sensing electrodes, and second compensation electrodes on the second sensing electrodes. The first compensation electrodes entirely cover each of the first sensing electrodes in a plan view, and the second compensation entirely cover each of the second sensing electrodes in a plan view.
    Type: Grant
    Filed: March 19, 2019
    Date of Patent: May 11, 2021
    Assignee: DONGWOO FINE-CHEM CO., LTD.
    Inventors: Byung Jin Choi, Min Hyuk Park, Jae Hyun Lee
  • Patent number: 10996560
    Abstract: Reducing an alignment error of an imprint lithography template with respect to a substrate includes locating central alignment marks of the template with respect to corresponding central alignment marks of the substrate and locating peripheral alignment marks of the template with respect to corresponding peripheral alignment marks of the substrate. In-plane alignment error of the template is assessed based on relative positions of central alignment marks of the template and corresponding central alignment marks of the substrate. A combined alignment error of the template is assessed based on relative positions of peripheral alignment marks of the template and corresponding peripheral alignment marks of the substrate. Out-of-plane alignment error of the template is assessed based on a difference between the-combined and the in-plane alignment error of the template, and a relative position of the template and the substrate is adjusted to reduce the out-of-plane alignment error of the template.
    Type: Grant
    Filed: July 31, 2017
    Date of Patent: May 4, 2021
    Assignee: CANON KABUSHIKI KAISHA
    Inventors: Anshuman Cherala, Mario Johannes Meissl, Byung-Jin Choi