Abstract: A display device includes a first electrode disposed on a substrate; a light emitting element disposed on the first electrode, the light emitting element being electrically connected to the first electrode; a second electrode disposed on the light emitting element, the second electrode being electrically connected to the light emitting element; a meta structure disposed on the second electrode, the meta structure overlapping the light emitting element; and a bank pattern disposed on the substrate, the bank pattern being spaced apart from the light emitting element.

Abstract: A display device may include a plurality of light emitting elements on a substrate and arranged in a matrix form along a first arrangement direction and a second arrangement direction crossing the first arrangement direction, and a first sub pixel area and a second sub pixel area each overlapping at least a portion of the plurality of light emitting elements, spaced from each other in a first direction, and extending in a second direction crossing the first direction. The second direction and the first arrangement direction may be non-parallel to each other.

Abstract: The display device includes a substrate including a plurality of pixel areas; and a pixel in each of the plurality of pixel areas. The pixel may include a pixel circuit layer on the substrate and including at least one transistor; a first electrode on the pixel circuit layer and electrically connected to the transistor; a plurality of light emitting elements on the first electrode and electrically connected to the first electrode; a second electrode on the plurality of light emitting elements; and a light blocking pattern on the second electrode and including a plurality of openings corresponding to each of the plurality of light emitting elements. Here, each of the plurality of pixel areas may include an emission area corresponding to each of the plurality of openings and a non-emission area excluding the emission area.

Abstract: A display device includes a substrate, and a display element part on the substrate, and including a light emitting element configured to emit light in a display direction, and a bank pattern that protrudes in the display direction, wherein the bank pattern and the light emitting element include a same material.

Abstract: A display device includes a pixel electrode disposed on a substrate and including a reflective electrode layer and an upper electrode layer, a contact electrode disposed on the pixel electrode, light-emitting elements disposed on the contact electrode and disposed perpendicular to the pixel electrode, a planarization layer disposed on the pixel electrode, the planarization layer filling a space between the light-emitting elements, and a common electrode disposed on the planarization layer and the light-emitting elements, and a size of the contact electrode is equal to a size of each of the light-emitting elements in a plan view, and the upper electrode layer is disposed on the reflective electrode layer and is in a polycrystalline phase.

Abstract: A display device includes: a substrate; a transparent electrode on one surface of the substrate; a reflective electrode on the transparent electrode; a transistor on the reflective electrode; and a light emitting element between the transparent electrode and the reflective electrode. The transistor overlaps the light emitting element.

Abstract: The display device includes a substrate including a plurality of pixel areas; and a pixel in each of the plurality of pixel areas. The pixel may include a pixel circuit layer on the substrate and including at least one transistor; a first electrode on the pixel circuit layer and electrically connected to the transistor; a plurality of light emitting elements on the first electrode and electrically connected to the first electrode; a second electrode on the plurality of light emitting elements; and a light blocking pattern on the second electrode and including a plurality of openings corresponding to each of the plurality of light emitting elements. Here, each of the plurality of pixel areas may include an emission area corresponding to each of the plurality of openings and a non-emission area excluding the emission area.

Abstract: Provided is a laminated glass, comprising: a soda lime glass; and a non-tempered alkali-free glass bonded to one surface of the soda lime glass, in which a thickness of the soda lime glass is larger than a thickness of the non-tempered alkali-free glass, and an elastic modulus of the non-tempered alkali-free glass is larger than an elastic modulus of the soda lime glass.

Abstract: Provided is glass with high temperature stability, a low coefficient of thermal expansion and a high mechanical strength, a light guide plate including the glass to replace the conventional PMMA and metal frame, and fabricating methods thereof. The glass according to the present disclosure is borosilicate glass containing 75˜85 wt % of SiO2, 5˜15 wt % of B2O3, 0˜5 wt % of Al2O3, R2O 1˜7 wt % where R is at least one of Li, Na and K, and <0.005 wt % of Fe2O3 and having the redox ratio 0.5 or more. This glass maintains luminance and has an excellent color difference reduction effect when used in a light guide plate.

Abstract: Provided is glass with high temperature stability, a low coefficient of thermal expansion and a high mechanical strength, a light guide plate including the glass to replace the conventional PMMA and metal frame, and fabricating methods thereof. The glass according to the present disclosure is borosilicate glass containing 75˜85 wt % of SiO2, 5˜15 wt % of B2O3, 0˜5 wt % of Al2O3, R2O 1˜7 wt % where R is at least one of Li, Na and K, and <0.005 wt % of Fe2O3 and having the redox ratio 0.5 or more. This glass maintains luminance and has an excellent color difference reduction effect when used in a light guide plate.

Abstract: A glass light-guide plate having a small color difference and a manufacturing method thereof are provided. The light-guide plate includes glass containing 70 to 85 wt % of SiO2, 5 to 20 wt % of B2O3, 0 to 5 wt % of Al2O3, 1 to 7 wt % of R2O (here, R is at least one of Li, Na, and K), 0 to 0.005 wt % of Fe2O3, and less than 0.002 wt % of a transition metal oxide for adjusting a color difference.

Abstract: Provided is a laminated glass, comprising: a soda lime glass; and a non-tempered alkali-free glass bonded to one surface of the soda lime glass, in which a thickness of the soda lime glass is larger than a thickness of the non-tempered alkali-free glass, and an elastic modulus of the non-tempered alkali-free glass is larger than an elastic modulus of the soda lime glass.

Abstract: A glass light-guiding plate which has high-temperature stability and is advantageous in being manufactured in a slim profile is provided. The glass light-guiding plate includes a glass plate including 75 to 85 wt % SiO2, 5 to 20 wt % B2O3, 1 to 5 wt % Al2O3, 3 to 8 wt % R2O (here, R is at least one of Li, Na, and K), and Fe2O3<0.0025 wt %.

Abstract: A glass light-guide plate having a small color difference and a manufacturing method thereof are provided. The light-guide plate includes glass containing 70 to 85 wt % of SiO2, 5 to 20 wt % of B2O3, 0 to 5 wt % of Al2O3, 1 to 7 wt % of R2O (here, R is at least one of Li, Na, and K), 0 to 0.005 wt % of Fe2O3, and less than 0.002 wt % of a transition metal oxide for adjusting a color difference.

Abstract: Provided is glass with high temperature stability, a low coefficient of thermal expansion and a high mechanical strength, a light guide plate including the glass to replace the conventional PMMA and metal frame, and fabricating methods thereof. The glass according to the present disclosure is borosilicate glass containing 75˜85 wt % of SiO2, 5˜15 wt % of B2O3, 0˜5 wt % of Al2O3, R2O 1˜7 wt % where R is at least one of Li, Na and K, and <0.005 wt % of Fe2O3 and having the redox ratio 0.5 or more. This glass maintains luminance and has an excellent color difference reduction effect when used in a light guide plate.

Abstract: A glass light-guiding plate which has high-temperature stability and is advantageous in being manufactured in a slim profile is provided. The glass light-guiding plate includes a glass plate including 75 to 85 wt % SiO2, 5 to 20 wt % B2O3, 1 to 5 wt % Al2O3, 3 to 8 wt % R2O (here, R is at least one of Li, Na, and K), and Fe2O3<0.0025 wt %.

Abstract: A method for fabricating an oxide thin film transistor includes sequentially forming a gate insulating film, an oxide semiconductor layer, and a first insulating layer; selectively patterning the oxide semiconductor layer and the first insulating layer to form an active layer and an insulating layer pattern on the gate electrode; forming a second insulating layer on the substrate having the active layer and the insulating layer pattern formed thereon; and selectively patterning the insulating layer pattern and the second insulating layer to form first and second etch stoppers on the active layer. The oxide semiconductor layer may be a ternary system or quaternary system oxide semiconductor comprising a combination of AxByCzO (A, B, C=Zn, Cd, Ga, In, Sn, Hf, Zr; x, y, z?0).

Abstract: An array substrate for an in-plane switching mode liquid crystal display device includes: a gate line on a substrate; a data line crossing the gate line to define a pixel region on the substrate; a common line parallel to and spaced apart from the gate line; a gate electrode connected to the gate line; a semiconductor layer disposed over the gate electrode, wherein an area of the semiconductor layer is less than an area of the gate electrode; a source electrode connected to the data line, and a drain electrode spaced apart from the source electrode, the source and drain electrodes disposed on the semiconductor layer; a plurality of pixel electrodes integrated with the drain electrode and extending from the drain electrode in the pixel region; and a plurality of common electrodes connected to the common line and alternately arranged with the plurality of pixel electrodes, wherein each of the source electrode, the drain electrode, the data line and the plurality of pixel electrodes are comprised from a first co

Abstract: A method of manufacturing an array substrate for a liquid crystal display device includes forming a gate electrode and a gate line on a substrate through a first mask process, forming a first insulating layer, an active layer, an ohmic contact layer, a buffer metallic layer, and a data line on the substrate including the gate electrode and the gate line through a second mask process, and forming a source electrode, a drain electrode, and a pixel electrode through a third mask process, the pixel electrode extending from the drain electrode, wherein the active layer is disposed over and within the gate electrode.

Abstract: A method for fabricating an oxide thin film transistor includes sequentially forming a gate insulating film, an oxide semiconductor layer, and a first insulating layer; selectively patterning the oxide semiconductor layer and the first insulating layer to form an active layer and an insulating layer pattern on the gate electrode; forming a second insulating layer on the substrate having the active layer and the insulating layer pattern formed thereon; and selectively patterning the insulating layer pattern and the second insulating layer to form first and second etch stoppers on the active layer. The oxide semiconductor layer may be a ternary system or quaternary system oxide semiconductor comprising a combination of AxByCzO (A, B, C?Zn, Cd, Ga, In, Sn, Hf, Zr; x, y, z?0).