Patents by Inventor Byung-Soo So

Byung-Soo So has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20220130667
    Abstract: A method of manufacturing a stacked structure includes forming a first metal buffer layer including crystal grains on a base substrate, forming a second metal buffer material layer on the first metal buffer layer, and crystallizing the second metal buffer material layer to form a second metal buffer layer, wherein the second metal buffer material layer includes crystal grains, and a density of the crystal grains of the second metal buffer material layer is lower than a density of the crystal grains of the first metal buffer layer.
    Type: Application
    Filed: September 8, 2021
    Publication date: April 28, 2022
    Applicants: Samsung Display Co., LTD., Industry-Academic Cooperation Foundation, Yonsei University
    Inventors: Mann Ho CHO, Kwang Sik JEONG, Hyeon Sik KIM, Hyun Eok SHIN, Byung Soo SO, Ju Hyun LEE
  • Publication number: 20220102447
    Abstract: A method of manufacturing a polycrystalline silicon layer for a display device includes the steps of forming an amorphous silicon layer on a substrate, cleaning the amorphous silicon layer with hydrofluoric acid, rinsing the amorphous silicon layer with hydrogenated deionized water, and irradiating the amorphous silicon layer with a laser beam to form a polycrystalline silicon layer.
    Type: Application
    Filed: October 18, 2021
    Publication date: March 31, 2022
    Inventors: Dong-Sung LEE, Seo Jong OH, Byung Soo SO, Dong-min LEE
  • Patent number: 11282872
    Abstract: A laser apparatus includes a laser generator configured to generate a first laser beam proceeding along a first direction, and an inversion module configured to convert the first laser beam to a second laser beam proceeding along the first direction, the inversion module including a splitter configured to form a reflected laser beam by partially reflecting the first laser beam, and a transmitted laser beam by partially transmitting the first laser beam, and a prism configured to reflect the reflected laser beam.
    Type: Grant
    Filed: March 3, 2020
    Date of Patent: March 22, 2022
    Assignee: Samsung Display Co., Ltd.
    Inventors: Dong-Min Lee, Ji-Hwan Kim, Jongoh Seo, Byung Soo So, Dong-Sung Lee, Jonghoon Choi
  • Publication number: 20220084823
    Abstract: A laser irradiation apparatus includes a laser light source which emits a laser beam, a first lens through which the laser beam emitted from the laser light source passes, a first scanner which reflects the laser beam passing through the first lens and changes a direction of the laser beam, a second scanner which reflects the laser beam deflected by the first scanner and changes a direction of the laser beam, a plurality of second lenses through which the laser beam deflected by the second scanner passes, where at least one of the plurality of second lenses is configured to vibrate in one direction, and an optical element through which the laser beam passing through the plurality of second lenses passes, where the optical element is configured to correct an incident angle of the laser beam incident a substrate.
    Type: Application
    Filed: August 17, 2021
    Publication date: March 17, 2022
    Inventors: HIROSHI OKUMURA, JONGJUN BAEK, BYUNG SOO SO
  • Publication number: 20220063015
    Abstract: A laser irradiation apparatus includes a laser beam generator that generates a first laser beam, a beam expander that expands the first laser beam and outputs the expanded first laser beam as a second laser beam, a beam splitter that splits the second laser beam into third laser beams and outputs the third laser beams, and a beam condenser that condenses the third laser beams and outputs condensed third laser beams. The beam expander includes a first lens having a first focal length and a second lens having a second focal length. The first lens is disposed between the laser beam generator and the second lens, the second lens is disposed between the first lens and the beam splitter, and the laser beam generator is spaced apart from the first lens by the first focal length.
    Type: Application
    Filed: May 7, 2021
    Publication date: March 3, 2022
    Applicant: Samsung Display Co., Ltd.
    Inventors: JI-HWAN KIM, BYUNG SOO SO, JONGHOON CHOI
  • Publication number: 20220045107
    Abstract: A display device may include a substrate, a buffer layer on the substrate, a first active pattern on the buffer layer, the first active pattern having a first thickness, a second active pattern on the buffer layer spaced from the first active pattern and having a second thickness smaller than the first thickness, a first gate insulating layer on the first active pattern and the second active pattern, a first gate electrode on the first gate insulating layer, the first gate electrode overlapping the first active pattern, and a second gate electrode on the first gate insulating layer, the second gate electrode overlapping the second active pattern.
    Type: Application
    Filed: April 26, 2021
    Publication date: February 10, 2022
    Inventors: JONGHOON CHOI, JONGOH SEO, JI-HWAN KIM, JONGJUN BAEK, BYUNG SOO SO
  • Publication number: 20220045105
    Abstract: A display device may include a thin film transistor disposed on a substrate, and a display element electrically connected to the thin film transistor. The thin film transistor may include an active pattern including polycrystalline silicon, a gate insulation layer disposed on the active pattern, and a gate electrode disposed on the gate insulation layer. An average value of grain sizes of the active pattern may be in a range of about 400 nm to about 800 nm. An RMS value of a surface roughness of the active pattern may be about 4 nm or less. A method of manufacturing a polycrystalline silicon layer may include cleaning an amorphous silicon layer with hydrofluoric acid, rinsing the amorphous silicon layer with hydrogenated deionized water, and irradiating the amorphous silicon layer with a laser beam having an energy density of about 440 mJ/cm2 to about 490 mJ/cm2.
    Type: Application
    Filed: October 26, 2021
    Publication date: February 10, 2022
    Applicant: Samsung Display Co., LTD.
    Inventors: Dong-Sung LEE, Jongoh SEO, Byung Soo SO, Dong-min LEE, Yeon Hee JEON, Jonghoon CHOI
  • Patent number: 11183515
    Abstract: A display device may include a thin film transistor disposed on a substrate, and a display element electrically connected to the thin film transistor. The thin film transistor may include an active pattern including polycrystalline silicon, a gate insulation layer disposed on the active pattern, and a gate electrode disposed on the gate insulation layer. An average value of grain sizes of the active pattern may be in a range of about 400 nm to about 800 nm. An RMS value of a surface roughness of the active pattern may be about 4 nm or less. A method of manufacturing a polycrystalline silicon layer may include cleaning an amorphous silicon layer with hydrofluoric acid, rinsing the amorphous silicon layer with hydrogenated deionized water, and irradiating the amorphous silicon layer with a laser beam having an energy density of about 440 mJ/cm2 to about 490 mJ/cm2.
    Type: Grant
    Filed: March 17, 2020
    Date of Patent: November 23, 2021
    Assignee: SAMSUNG DISPLAY CO., LTD.
    Inventors: Dong-Sung Lee, Jongoh Seo, Byung Soo So, Dong-min Lee, Yeon Hee Jeon, Jonghoon Choi
  • Publication number: 20210359057
    Abstract: A display device and a method of manufacturing a display device are provided. A display device includes a lower conductive pattern disposed on a substrate, a lower insulating layer disposed on the lower conductive pattern, the lower insulating layer including a first lower insulating pattern including an overlapping region overlapping the lower conductive pattern, and a protruding region. The display device includes a semiconductor pattern disposed on the first lower insulating pattern and having a side surface, the side surface being aligned with a side surface of the first lower insulating pattern or disposed inward from the side surface of the first lower insulating pattern, a gate insulating layer disposed on the semiconductor pattern, a gate electrode disposed on the gate insulating layer, and an empty space disposed between the substrate and the protruding region of the first lower insulating pattern.
    Type: Application
    Filed: March 4, 2021
    Publication date: November 18, 2021
    Applicant: Samsung Display Co., LTD.
    Inventors: Jong Oh SEO, Byung Soo SO
  • Patent number: 11171000
    Abstract: A laser crystallization system includes a transfer part that transfers a substrate on which an amorphous silicon thin film is deposited into a chamber, a laser irradiation part that irradiates an excimer laser to the substrate for crystallization of the amorphous silicon thin film in the chamber, a stage that supports the substrate in the chamber, a measuring part that measures a light transmittance value of the substrate, and a controller that controls the laser irradiation part to irradiate the excimer laser to the substrate when the light transmittance value is equal to or lower than a reference transmittance value and controls the laser irradiation part not to irradiate the excimer laser to the substrate when the light transmittance value is higher than the reference transmittance value.
    Type: Grant
    Filed: May 1, 2020
    Date of Patent: November 9, 2021
    Assignee: SAMSUNG DISPLAY CO., LTD.
    Inventors: Jongoh Seo, Jonghoon Choi, Ji-Hwan Kim, Byung Soo So, Dong-Min Lee, Dong-Sung Lee
  • Patent number: 11164919
    Abstract: A method of manufacturing a polycrystalline silicon layer for a display device includes the steps of forming an amorphous silicon layer on a substrate, cleaning the amorphous silicon layer with hydrofluoric acid, rinsing the amorphous silicon layer with hydrogenated deionized water, and irradiating the amorphous silicon layer with a laser beam to form a polycrystalline silicon layer.
    Type: Grant
    Filed: November 11, 2019
    Date of Patent: November 2, 2021
    Assignee: Samsung Display Co., Ltd.
    Inventors: Dong-Sung Lee, Seo Jong Oh, Byung Soo So, Dong-min Lee
  • Patent number: 11145703
    Abstract: A display device may include a substrate, a first layer on the substrate, the first layer including a first portion having a first thickness and a second portion having a second thickness greater than the first thickness, a second layer on the first layer, an active pattern on the second layer, the active pattern overlapping only the first portion of the first layer, a gate electrode on the active pattern, a source electrode and a drain electrode on the gate electrode and connected to the active pattern, a first electrode connected to one of the source electrode and the drain electrode, a pixel defining layer on the first electrode, the pixel defining layer having an opening portion exposing at least a portion of the first electrode, an emission layer in the opening portion on the first electrode, and a second electrode on the emission layer.
    Type: Grant
    Filed: November 7, 2019
    Date of Patent: October 12, 2021
    Assignee: Samsung Display Co., Ltd.
    Inventors: Jongoh Seo, In Cheol Ko, Byung Soo So, Dong-min Lee, Dong-Sung Lee
  • Patent number: 11087980
    Abstract: A laser crystallization method includes exciting gas medium in an airtight container to generate laser beams; amplifying the laser beams by reflecting the laser beams between a high reflection mirror and a low reflection mirror respectively disposed facing opposite end portions of the airtight container, wherein a first transparent window and a second transparent window are fixed to respective end portions of the airtight container, and outputting the amplified laser beams; and disposing a cleaning mirror in a path of the laser beams that have propagated through the second transparent window.
    Type: Grant
    Filed: March 22, 2017
    Date of Patent: August 10, 2021
    Assignee: SAMSUNG DISPLAY CO., LTD.
    Inventors: Byung Soo So, Mee Jae Kang, Ho Seok Lee, Jae Gyun Lim, Sang Ho Jeon, Yeon Hee Jeon
  • Publication number: 20210143015
    Abstract: A laser irradiation apparatus includes: a laser module configured to emit a laser beam; a first optical system configured to scan the laser beam emitted from the laser module along a first direction; an optical element configured to refract the laser beam emitted from the first optical system; and a substrate supporter on which a base substrate to which the laser beam refracted through the optical element reaches is arranged.
    Type: Application
    Filed: June 19, 2020
    Publication date: May 13, 2021
    Inventors: Hiroshi OKUMURA, Jong Jun BAEK, Byung Soo SO
  • Patent number: 10944011
    Abstract: A display apparatus includes a base substrate, an active pattern on the base substrate including a source region, a drain region, and a channel region that is doped between the source region and the drain region, the channel region including polycrystalline silicon, and a gate electrode overlapping the channel region of the active pattern. The channel region may include a lower portion, an upper portion, and an intermediate portion between the upper portion and the lower portion, and a dopant density of the lower portion may be 80% or more of a dopant density of the upper portion.
    Type: Grant
    Filed: October 7, 2019
    Date of Patent: March 9, 2021
    Assignee: SAMSUNG DISPLAY CO., LTD.
    Inventors: Tae Hoon Yang, Kibum Kim, Jongjun Baek, Byung Soo So, Jong chan Lee, Woong Hee Jeong, Jaewoo Jeong
  • Publication number: 20210057218
    Abstract: A laser annealing device includes a stage, a laser generator, and a reflective member. The stage supports a substrate with a thin film formed thereon to be processed, and may be moved in a first direction at a set or predetermined speed. The laser generator irradiates a first area of the thin film with a laser beam while the stage is moved. The reflective member reflects a part of the laser beam, which is reflected from the first area of the thin film, to a second area of the thin film. The first area and the second area are spaced apart from each other.
    Type: Application
    Filed: August 19, 2020
    Publication date: February 25, 2021
    Inventors: Dong-Min LEE, Ji-Hwan KIM, Jongoh SEO, Byung Soo SO
  • Publication number: 20200388493
    Abstract: A laser crystallization system includes a transfer part that transfers a substrate on which an amorphous silicon thin film is deposited into a chamber, a laser irradiation part that irradiates an excimer laser to the substrate for crystallization of the amorphous silicon thin film in the chamber, a stage that supports the substrate in the chamber, a measuring part that measures a light transmittance value of the substrate, and a controller that controls the laser irradiation part to irradiate the excimer laser to the substrate when the light transmittance value is equal to or lower than a reference transmittance value and controls the laser irradiation part not to irradiate the excimer laser to the substrate when the light transmittance value is higher than the reference transmittance value.
    Type: Application
    Filed: May 1, 2020
    Publication date: December 10, 2020
    Applicant: Samsung Display Co., LTD.
    Inventors: Jongoh SEO, Jonghoon CHOI, Ji-Hwan KIM, Byung Soo SO, Dong-min LEE, Dong-Sung LEE
  • Publication number: 20200328237
    Abstract: A laser apparatus includes a laser generator configured to generate a first laser beam proceeding along a first direction, and an inversion module configured to convert the first laser beam to a second laser beam proceeding along the first direction, the inversion module including a splitter configured to form a reflected laser beam by partially reflecting the first laser beam, and a transmitted laser beam by partially transmitting the first laser beam, and a prism configured to reflect the reflected laser beam.
    Type: Application
    Filed: March 3, 2020
    Publication date: October 15, 2020
    Inventors: Dong-min LEE, Ji-Hwan KIM, Jongoh SEO, Byung Soo SO, Dong-Sung LEE, Jonghoon CHOI
  • Publication number: 20200303424
    Abstract: A display device may include a thin film transistor disposed on a substrate, and a display element electrically connected to the thin film transistor. The thin film transistor may include an active pattern including polycrystalline silicon, a gate insulation layer disposed on the active pattern, and a gate electrode disposed on the gate insulation layer. An average value of grain sizes of the active pattern may be in a range of about 400 nm to about 800 nm. An RMS value of a surface roughness of the active pattern may be about 4 nm or less. A method of manufacturing a polycrystalline silicon layer may include cleaning an amorphous silicon layer with hydrofluoric acid, rinsing the amorphous silicon layer with hydrogenated deionized water, and irradiating the amorphous silicon layer with a laser beam having an energy density of about 440 mJ/cm2 to about 490 mJ/cm2.
    Type: Application
    Filed: March 17, 2020
    Publication date: September 24, 2020
    Applicant: Samsung Display Co., LTD.
    Inventors: Dong-Sung LEE, Jongoh SEO, Byung Soo SO, Dong-min LEE, Yeon Hee JEON, Jonghoon CHOI
  • Publication number: 20200171600
    Abstract: A laser crystallizing apparatus may include a laser light source, an optical system, and an optical module. The laser light source may generate a laser beam. The optical system may convert the laser beam into a line laser beam. The optical module may disperse energy of the line laser beam in a first direction for generating a dispersed line laser beam. The first direction may be perpendicular to a lengthwise direction of the optical module.
    Type: Application
    Filed: November 27, 2019
    Publication date: June 4, 2020
    Inventors: Dong-Sung LEE, Dong-min LEE, Jongoh SEO, Byung Soo SO