Abstract: A pulley assembly is disclosed herein that includes a shaft having a shaft length. A plurality of rolling elements are supported on a radially outer surface of the at least one shaft. In one aspect, the plurality of rolling elements are cylindrical rollers, the cylindrical rollers can each have a rolling element length and a rolling element diameter, and a ratio of the rolling element length to the rolling element diameter can be at least 1.0. A pulley is provided that surrounds the plurality of rolling elements, the pulley defines an outer raceway for the rolling elements, and the pulley defines a support surface configured to support a cable. A pair of washers are also arranged on axially opposite outer sides of the pulley and the rolling elements.

Abstract: Ampoules for a semiconductor manufacturing precursors and methods of use are described. The ampoules include a container with an inlet port and an outlet port. The ampoules comprise an inlet plenum located between the inlet port and the cavity and an outlet plenum located between the outlet port and the cavity. A flow path is defined by a plurality of tubular walls and an ingress openings of the ampoule, through which a carrier gas flows in contact with the precursor.

Abstract: A pulley assembly is disclosed herein that includes a shaft having a shaft length. A plurality of rolling elements are supported on a radially outer surface of the at least one shaft. In one aspect, the plurality of rolling elements are cylindrical rollers, the cylindrical rollers can each have a rolling element length and a rolling element diameter, and a ratio of the rolling element length to the rolling element diameter can be at least 1.0. A pulley is provided that surrounds the plurality of rolling elements, the pulley defines an outer raceway for the rolling elements, and the pulley defines a support surface configured to support a cable. A pair of washers are also arranged on axially opposite outer sides of the pulley and the rolling elements.

Abstract: Bottom-fed ampoules for a semiconductor manufacturing precursors and methods of use are described. The ampoules comprise an outer cylindrical wall and an inner cylindrical wall defining a flow channel in between and a bottom wall having a top surface with a plurality of concentric elongate walls, each wall comprising an opening offset from the opening in adjacent walls defining a gas exchange zone through which a carrier gas flows in contact with the precursor.

Abstract: Bottom-fed ampoules for a semiconductor manufacturing precursors and methods of use are described. The ampoules comprise an outer cylindrical wall and an inner cylindrical wall defining a flow channel in between and a bottom wall having a top surface with a plurality of concentric elongate walls, each wall comprising an opening offset from the opening in adjacent walls defining a gas exchange zone through which a carrier gas flows in contact with the precursor.

Abstract: Ampoules for a semiconductor manufacturing precursors and methods of use are described. The ampoules include a container with an inlet port and an outlet port. The ampoules comprise an inlet plenum located between the inlet port and the cavity and an outlet plenum located between the outlet port and the cavity. A flow path is defined by a plurality of tubular walls and an ingress openings of the ampoule, through which a carrier gas flows in contact with the precursor.

Abstract: Bottom-fed ampoules for a semiconductor manufacturing precursors and methods of use are described. The ampoules comprise an outer cylindrical wall and an inner cylindrical wall defining a flow channel in between and a bottom wall having a top surface with a plurality of concentric elongate walls, each wall comprising an opening offset from the opening in adjacent walls defining a gas exchange zone through which a carrier gas flows in contact with the precursor.

Abstract: Ampoules for a semiconductor manufacturing precursors and methods of use are described. The ampoules include a container with an inlet port and an outlet port. The ampoules comprise an inlet plenum located between the inlet port and the cavity and an outlet plenum located between the outlet port and the cavity. A flow path is defined by a plurality of tubular walls and an ingress openings of the ampoule, through which a carrier gas flows in contact with the precursor.

Abstract: Bottom-fed ampoules for a semiconductor manufacturing precursors and methods of use are described. The ampoules comprise an outer cylindrical wall and an inner cylindrical wall defining a flow channel in between and a bottom wall having a top surface with a plurality of concentric elongate walls, each wall comprising an opening offset from the opening in adjacent walls defining a gas exchange zone through which a carrier gas flows in contact with the precursor.

Abstract: Ampoules for a semiconductor manufacturing precursors and methods of use are described. The ampoules include a container with an inlet port an outlet port, a manifold having a serpentine base creating a tortuous flow path and a filter media assembly in a bottom-fed configuration. The torturous flow path is defined by a plurality of elongate walls and a plurality of openings of the serpentine base ampoule, through which a carrier gas flows in contact with the precursor.

Abstract: A showerhead including a body having an opening, a first plate positioned within the opening and having a plurality of slots, a second plate positioned within the opening and having a plurality of slots, and wherein each of the first plate plurality of slots are concentrically aligned with the second plate plurality of slots.

Abstract: Ampoules for a semiconductor manufacturing precursors and methods of use are described. The ampoules include a container with an inlet port and an outlet port. The ampoules comprise an inlet plenum located between the inlet port and the cavity and an outlet plenum located between the outlet port and the cavity. A flow path is defined by a plurality of tubular walls and an ingress openings of the ampoule, through which a carrier gas flows in contact with the precursor.

Abstract: An apparatus and method are disclosed for monitoring and/or detecting concentrations of a chemical precursor in a reaction chamber. The apparatus and method have an advantage of operating in a high temperature environment. An optical emissions spectrometer (OES) is coupled to a gas source, such as a solid source vessel, in order to monitor or detect an output of the chemical precursor to the reaction chamber. Alternatively, a small sample of precursor can be periodically monitored flowing into the OES and into a vacuum pump, thus bypassing the reaction chamber.

Abstract: A method is disclosed for maximising the recovery of lithium from purified feed solutions in either chloride or sulphate media. The solubility of lithium carbonate is sufficiently high that conventional techniques do not recover all of the lithium. An ion exchange process has been developed wherein the residual lithium is also recovered, leading to essentially 100% recovery of the lithium in the process solution.

Abstract: A processes is disclosed for the recovery of cobalt, lithium and associated metals from lithium-ion batteries, comprising (i) shredding and pulverising the batteries under an inert atmosphere, (ii) leaching the batteries with sulphuric acid and sulphur dioxide under reducing conditions with a sub-stoichiometric amount of acid, (iii) recovery of copper by cementation, (iv) purification of the leach filtrate to precipitate iron and aluminium, along with some of the manganese and nickel if they are at low levels in the feed battery, (v) ion exchange to remove residual copper, nickel and manganese, (vi) precipitation of the purified solution with soda ash to recover all of the cobalt, and (vii) recovery of lithium as carbonate.

Abstract: Showerhead assemblies, gas distribution plates, and systems including the same are disclosed. Exemplary showerhead assemblies include a gas distribution plate. Exemplary gas distribution plates include apertures designed to direct a flow of gas and to reduce stagnation of gas on surfaces of the plates.

Abstract: Showerhead assemblies, gas distribution plates, and systems including the same are disclosed. Exemplary showerhead assemblies include a gas distribution plate. Exemplary gas distribution plates include apertures designed to direct a flow of gas and to reduce stagnation of gas on surfaces of the plates.

Abstract: Embodiments related to managing the process feed conditions for a semiconductor process module are provided. In one example, a gas channel plate for a semiconductor process module is provided. The example gas channel plate includes a heat exchange surface including a plurality of heat exchange structures separated from one another by intervening gaps. The example gas channel plate also includes a heat exchange fluid director plate support surface for supporting a heat exchange fluid director plate above the plurality of heat exchange structures so that at least a portion of the plurality of heat exchange structures are spaced from the heat exchange fluid director plate.

Abstract: A superficial flow sensor is provided, which may comprise a substrate, and a thin film comprising a self-rolled portion, a stationary portion, and a free ribbon portion. According to some aspects of the present disclosure, the self-rolled portion may be configured to have a residual stress and to deform under external forces.

Abstract: A showerhead including a body having an opening, a first plate positioned within the opening and having a plurality of slots, a second plate positioned within the opening and having a plurality of slots, and wherein each of the first plate plurality of slots are concentrically aligned with the second plate plurality of slots.