Patents by Inventor Carl Zeiss SMT GmbH

Carl Zeiss SMT GmbH has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20130120820
    Abstract: A beam control apparatus for an illumination beam includes an imaging illumination optical unit assembly for imaging an intermediate focus of the illumination beam onto an object field to be illuminated. A control component that influences a beam path of the illumination beam is displaceable in at least one degree of freedom by at least one displacement actuator. A position sensor device of the beam control apparatus detects a position of the intermediate focus. A control device of the beam control apparatus is signal-connected to the position sensor device and the displacement actuator. From an intermediate focus position signal received from the position sensor device, the control device calculates control signals for the displacement actuator and forwards the latter to the displacement actuator for controlling the position of the intermediate focus. This results in a beam control apparatus which makes well-controllable illumination possible together with a simple construction.
    Type: Application
    Filed: November 14, 2012
    Publication date: May 16, 2013
    Applicant: Carl Zeiss SMT GmbH
    Inventor: Carl Zeiss SMT GmbH
  • Publication number: 20130120723
    Abstract: A microlithographic projection exposure apparatus includes a projection lens that is configured for immersion operation. For this purpose an immersion liquid is introduced into an immersion space that is located between a last lens of the projection lens on the image side and a photosensitive layer to be exposed. To reduce fluctuations of refractive index resulting from temperature gradients occurring within the immersion liquid, the projection exposure apparatus includes heat transfer elements that heat or cool partial volumes of the immersion liquid so as to achieve an at least substantially homogenous or at least substantially rotationally symmetric temperature distribution within the immersion liquid.
    Type: Application
    Filed: November 20, 2012
    Publication date: May 16, 2013
    Applicant: CARL ZEISS SMT GMBH
    Inventor: Carl Zeiss SMT GmbH
  • Publication number: 20130120863
    Abstract: For the production of mirrors for EUV lithography, substrates are suggested having a mean relative thermal longitudinal expansion of no more than 10 ppb across a temperature difference ?T of 15° C. and a zero-crossing temperature in the range between 20° C. and 40° C. For this purpose, at least one first and one second material having low thermal expansion coefficients and opposite gradients of the relative thermal expansion as a function of temperature are selected and a substrate is produced by mixing and bonding these materials.
    Type: Application
    Filed: November 2, 2012
    Publication date: May 16, 2013
    Applicant: CARL ZEISS SMT GMBH
    Inventor: CARL ZEISS SMT GMBH
  • Publication number: 20130114060
    Abstract: An illumination system of a microlithographic projection exposure apparatus includes an optical integrator that includes an array of optical raster elements. A condenser superimposes the light beams associated with the optical raster elements in a common field plane. A modulator modifies a field dependency of an angular irradiance distribution in an illuminated field. Units of the modulator are associated with one of the light beams and are arranged at a position in front of the condenser such that only the associated light beam impinges on a single modulator unit. The units are configured to variably redistribute, without blocking any light, a spatial and/or an angular irradiance distribution of the associated light beams. A control device controls the modulator units if it receives an input command that the field dependency of the angular irradiance distribution in the mask plane shall be modified.
    Type: Application
    Filed: December 27, 2012
    Publication date: May 9, 2013
    Applicant: CARL ZEISS SMT GMBH
    Inventor: Carl Zeiss SMT GmbH
  • Publication number: 20130114057
    Abstract: An optical imaging device, in particular for use in microlithography, includes a mask device for receiving a mask having a projection pattern, a projection device with an optical element group, a substrate device for receiving a substrate and an immersion zone. The optical element group is adapted to project the projection pattern onto the substrate and includes a plurality of optical elements with an immersion element to which the substrate is at least temporarily located adjacent to during operation. During operation, the immersion zone is located between the immersion element and the substrate and is at least temporarily filled with an immersion medium. A thermal attenuation device is provided, the thermal attenuation device being adapted to reduce fluctuations within the temperature distribution of the immersion element induced by the immersion medium.
    Type: Application
    Filed: December 12, 2012
    Publication date: May 9, 2013
    Applicant: CARL ZEISS SMT GMBH
    Inventor: CARL ZEISS SMT GMBH
  • Publication number: 20130105698
    Abstract: A method for locally resolved measurement of a radiation distribution (24) produced using a lithography mask (16) comprises providing a radiation converter (31, 131) having an at least two-dimensional arrangement of converter elements (32, 132) which can respectively be put in an active and a passive state, and are configured to convert incoming radiation in respect of its wavelength in the active state. The method further includes: manipulating the radiation converter (31, 131) several times such that respectively only a fraction of the converter elements (32, 132) adopts the active state, irradiating the radiation converter (31, 131) with the radiation distribution (24) after every manipulation of the radiation converter (31, 131) so that the active converter elements (32, 132) emit wavelength-converted measuring radiation (34), recording respective places of origin (54) of the measuring radiation at every irradiation with the radiation distribution (24).
    Type: Application
    Filed: December 18, 2012
    Publication date: May 2, 2013
    Applicant: CARL ZEISS SMT GMBH
    Inventor: Carl Zeiss SMT GmbH
  • Publication number: 20130100429
    Abstract: An optical system of a microlithographic projection exposure apparatus includes a multi facet mirror having a support plate and a plurality of mirror facets. Each mirror facet includes a mirror substrate and a reflective coating applied thereon, and is attached to the support plate. Actuators are provided that induce a deformation of the support plate. The deformation changes the orientation and/or position, but not the shape, of at least two mirror facets. In this way aberrations can be corrected.
    Type: Application
    Filed: December 14, 2012
    Publication date: April 25, 2013
    Applicant: Carl Zeiss SMT GmbH
    Inventor: Carl Zeiss SMT GmbH
  • Publication number: 20130100426
    Abstract: The disclosure relates to methods for producing mirrors, in particular facet mirrors, and projection exposure apparatuses equipped with the mirrors.
    Type: Application
    Filed: November 21, 2012
    Publication date: April 25, 2013
    Applicant: CARL ZEISS SMT GMBH
    Inventor: CARL ZEISS SMT GMBH
  • Publication number: 20130099132
    Abstract: To prevent reflective optical elements (2) for EUV lithography from becoming electrically charged as they are irradiated with EUV radiation (4), an optical system for EUV lithography is proposed, having a reflective optical element (2), including a substrate (21) with a highly reflective coating (22) emitting secondary electrons when irradiated with EUV radiation (4), and a source (3) of electrically charged particles, which is arranged in such a manner that electrically charged particles are applied to the reflective optical element (2), wherein the source (3) for the charge carrier compensation is exclusively a flood gun applying electrons to the reflective optical element (2).
    Type: Application
    Filed: December 13, 2012
    Publication date: April 25, 2013
    Applicant: CARL ZEISS SMT GMBH
    Inventor: CARL ZEISS SMT GmbH
  • Publication number: 20130100547
    Abstract: An optical element module includes an optical element unit and a support structure. The optical element module includes an optical element. The support structure includes a support device and a contact device connected to the support device. A surface of the contact device contacts a surface of the optical element unit and exerts a holding force on the optical element unit along a holding force direction.
    Type: Application
    Filed: November 30, 2012
    Publication date: April 25, 2013
    Inventor: Carl Zeiss SMT GmbH
  • Publication number: 20130100428
    Abstract: A mask (105) for EUV lithography includes a substrate (107), a multi-layer coating (108) applied to the substrate (107) and a mask structure (109) which is applied to the multi-layer coating (108) and which has an absorber material, the mask structure (109) having a maximum thickness of less than 100 nm, preferably not exceeding a maximum thickness of 30 nm, particularly preferably 20 nm, in particular 10 nm. Also disclosed is an EUV lithography system having such a mask (105) and a method for optimising the imaging of such a mask (105).
    Type: Application
    Filed: December 14, 2012
    Publication date: April 25, 2013
    Applicant: CARL ZEISS SMT GMBH
    Inventor: Carl Zeiss SMT GmbH
  • Publication number: 20130094010
    Abstract: A lithographic system includes a projection system for projecting an object field through a projection system's pupil onto an image field. The projection system includes an optical element located at the projection system's pupil. The projection system's pupil is manipulable with respect to normalized pupil heights by the optical element. Related processes are also disclosed.
    Type: Application
    Filed: September 25, 2012
    Publication date: April 18, 2013
    Applicant: CARL ZEISS SMT GMBH
    Inventor: CARL ZEISS SMT GMBH
  • Publication number: 20130088698
    Abstract: A micromirror of a micromirror array in an illumination system of a microlithographic projection exposure apparatus can be tilted through a respective tilt angle about two tilt axes. The micromirror is assigned three actuators which can respectively be driven by control signals in order to tilt the micromirror about the two tilt axes. Two control variables are specified, each of which is assigned to one tilt axis and which are both assigned to unperturbed tilt angles. For any desired combinations of the two control variables, as a function of the two control variables, one of the three actuators is selected and its control signal is set to a constant value, in particular zero. The control signals are determined so that, when the control signals are applied to the other two actuators, the micromirror adopts the unperturbed tilt angles as a function of the two control variables.
    Type: Application
    Filed: November 28, 2012
    Publication date: April 11, 2013
    Applicant: CARL ZEISS SMT GMBH
    Inventor: Carl Zeiss SMT GmbH
  • Publication number: 20130088701
    Abstract: An imaging optical system has a plurality of mirrors which image an object field in an object plane into an image field in an image plane. The imaging optical system has a pupil obscuration. The last mirror in the beam path of the imaging light between the object field and the image field has a through-opening for the passage of the imaging light. A penultimate mirror of the imaging optical system in the beam path of the imaging light between the object field and the image field has no through-opening for the passage of the imaging light. The imaging optical system has precisely eight mirrors. The result is an imaging optical system which exhibits a favorable combination of small imaging errors, manageable production and good throughput.
    Type: Application
    Filed: December 3, 2012
    Publication date: April 11, 2013
    Applicant: CARL ZEISS SMT GMBH
    Inventor: CARL ZEISS SMT GMBH
  • Publication number: 20130088695
    Abstract: A device serves for controlling temperature of an optical element provided in vacuum atmosphere. The device has a cooling apparatus having a radiational cooling part, arranged apart from the optical element, for cooling the optical element by radiation heat transfer. A controller serves for controlling temperature of the radiational cooling part. Further, the device comprises a heating part for heating the optical element. The heating part is connected to the controller for controlling the temperature of the heating part. The resulting device for controlling temperature in particular can be used with an optical element in a EUV microlithography tool leading to a stable performance of its optics.
    Type: Application
    Filed: November 14, 2012
    Publication date: April 11, 2013
    Applicant: CARL ZEISS SMT GMBH
    Inventor: CARL ZEISS SMT GMBH
  • Publication number: 20130083308
    Abstract: A substrate holder for receiving a substrate is provided, the substrate holder comprising a base element, at least three contact elements that are connected to the base element and arranged in a plane, wherein the substrate upon being received by the substrate holder can lie on the at least three contact elements, and wherein the contact element is connected to the base element in such a way that forces acting on the substrate in a direction of the plane are minimized by at least one contact element. Furthermore, a position measuring device for determining a positioning error of a structure element on a mask is provided, the position measuring device having a substrate holder that minimizes the forces acting on a substrate.
    Type: Application
    Filed: September 28, 2012
    Publication date: April 4, 2013
    Applicant: CARL ZEISS SMT GMBH
    Inventor: CARL ZEISS SMT GMBH
  • Publication number: 20130077074
    Abstract: A microlithographic projection exposure apparatus includes a projection light source. The apparatus also includes a heating light source for generating heating light which is at least partly absorbed by an optical element. An illumination optical unit directs the heating light onto the optical element such that the heating light has a predefined intensity distribution on an optical surface of the optical element. The illumination optical unit includes a deflection element which is a diffractive optical element or a refractive freeform element. The deflection element simultaneously directs the heating light impinging thereon in different directions.
    Type: Application
    Filed: September 26, 2012
    Publication date: March 28, 2013
    Applicant: CARL ZEISS SMT GMBH
    Inventor: Carl Zeiss SMT GmbH
  • Publication number: 20130077076
    Abstract: A microlithography illumination optical system is used to guide illumination light from a primary light source to an object field. A mirror array of the illumination optical system has a plurality of individual mirrors, which can be tilted independently of one another by actuators and are connected to associated tilting actuators. A controller is used to activate the actuators. A raster module of the illumination optical system has a plurality of raster elements to produce a spatially distributed arrangement of secondary light sources.
    Type: Application
    Filed: November 20, 2012
    Publication date: March 28, 2013
    Applicant: CARL ZEISS SMT GMBH
    Inventor: Carl Zeiss SMT GmbH
  • Publication number: 20130077077
    Abstract: An optical system for a microlithographic projection exposure apparatus and a microlithographic exposure method are disclosed. In an embodiment an optical system for a microlithographic projection exposure apparatus includes at least one mirror arrangement having a plurality of mirror elements which are displaceable independently of each other for altering an angular distribution of the light reflected by the mirror arrangement. The optical system also includes at least one manipulator downstream of the mirror arrangement in the light propagation direction. The manipulator has a raster arrangement of manipulator elements so that light incident on the manipulator during operation of the optical system is influenced differently in its polarization state and/or in its intensity in dependence on the incidence location.
    Type: Application
    Filed: October 25, 2012
    Publication date: March 28, 2013
    Applicant: CARL ZEISS SMT GMBH
    Inventor: CARL ZEISS SMT GMBH
  • Publication number: 20130070227
    Abstract: An imaging optical system for EUV projection lithography has a plurality of mirrors for imaging an object field in an object plane into an image field in an image plane. An image-side numerical aperture of the imaging optical system is at least 0.3. The imaging optical system has a pupil obscuration which is greater than 0.40 and an image filed size of at least 1 mm×10 mm. The imaging optical system can provide high quality imaging of the object.
    Type: Application
    Filed: November 19, 2012
    Publication date: March 21, 2013
    Applicant: CARL ZEISS SMT GMBH
    Inventor: Carl Zeiss SMT GmbH