Patents by Inventor Chahal Neema

Chahal Neema has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20220221880
    Abstract: A method includes identifying time values for a length of time to carry out process fluid delivery within multiple processing chambers that concurrently process multiple substrates; translating each time value to a recipe parameter for execution of an operation of a processing recipe; and causing the operation to be performed using each recipe parameter as a control value to control valves of a fluid panel of the multiple processing chambers. For each processing chamber of the multiple processing chambers: causing the process fluid to flow to the processing chamber for a first period of time corresponding to a first time value; and causing the process fluid to flow to a divert foreline of the processing chamber for a second period of time, the second period of time being based on a timestep of the operation and the time value.
    Type: Application
    Filed: January 8, 2021
    Publication date: July 14, 2022
    Inventors: Mitesh Sanghvi, Venkatanarayana Shankaramurthy, Peter Standish, Anton Baryshnikov, Thorsten Kril, Chahal Neema, Vishal Suresh Jamakhandi, Abhijit Ashok Kangude
  • Publication number: 20220189793
    Abstract: Exemplary substrate processing systems may include a lid plate. The systems may include a gas splitter seated on the lid plate. The gas splitter may define a plurality of gas inlets and gas outlets. A number of gas outlets may be greater than a number of gas inlets. The systems may include a plurality of valve blocks that are interfaced with the gas splitter. Each valve block may define a number of gas lumens. An inlet of each of the gas lumens may be in fluid communication with one of the gas outlets. An interface between the gas splitter and each of the valve blocks may include a choke. The systems may include a plurality of output manifolds seated on the lid plate. The systems may include a plurality of output weldments that may couple an outlet of one of the gas lumens with one of the output manifolds.
    Type: Application
    Filed: December 14, 2020
    Publication date: June 16, 2022
    Applicant: Applied Materials, Inc.
    Inventors: Arun Chakravarthy Chakravarthy, Chahal Neema, Abhijit A. Kangude, Elizabeth Neville, Vishal S. Jamakhandi, Kurt R. Langeland, Syed A. Alam, Ming Xu, Kenneth Le
  • Publication number: 20220093426
    Abstract: Exemplary substrate processing systems may include a base. The systems may include a chamber body having a transfer region housing that defines a transfer region. The transfer region housing may include a first portion and a second portion. The systems may include a lid assembly positioned atop the chamber body. The lid assembly may include a lid and a lid stack. The systems may include one or more lift mechanisms that elevate the first portion of the transfer region housing and at least a portion of the lid assembly relative to the base. The first portion and the second portion may mate with one another when the transfer region housing is in an operational configuration. The first portion and the second portion may be separated when the first portion of the transfer region housing is elevated.
    Type: Application
    Filed: September 21, 2020
    Publication date: March 24, 2022
    Applicant: Applied Materials, Inc.
    Inventors: Samuel W. Shannon, Luke Bonecutter, Viren Kalsekar, Chahal Neema